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公开(公告)号：US09448484B2
公开(公告)日：2016-09-20
申请号：US14531877
申请日：2014-11-03
Applicant: Texas Instruments Incorporated
Inventor： Patrick I. Oden , James C. Baker , Sandra Zheng , William C. McDonald , Lance W. Barron
CPC classification number: G03F7/36 , B81B3/00 , G02B26/0841 , G03F7/16 , G03F7/20
Abstract: A method of forming a micro-electromechanical systems (MEMS) pixel, such as a DMD-type pixel, by depositing a photoresist spacer layer upon a substrate. The photoresist spacer layer is exposed to a grey-scale lithographic mask to shape an upper surface of the photoresist spacer layer. A control member is formed upon the shaped spacer layer, and has a sloped portion configured to maximize energy density. An image member is configured to be positioned as a function of the control member to form a spatial light modulator (SLM).
Abstract translation: 通过在衬底上沉积光致抗蚀剂隔离层来形成诸如DMD型像素的微机电系统（MEMS）像素的方法。 将光致抗蚀剂间隔层暴露于灰度级光刻掩模以形成光致抗蚀剂间隔层的上表面。 控制构件形成在成形间隔层上，并且具有被配置为使能量密度最大化的倾斜部分。 图像构件被配置为根据控制构件定位以形成空间光调制器（SLM）。
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2.发明授权公开(公告)号：US09864188B2
公开(公告)日：2018-01-09
申请号：US14531842
申请日：2014-11-03
Applicant: Texas Instruments Incorporated
Inventor： Patrick I. Oden , James C. Baker , Sandra Zheng , William C. McDonald , Lance W. Barron
CPC classification number: G02B26/0841 , B81B3/00
Abstract: A method of forming a micro-electromechanical systems (MEMS) pixel, such as a DMD type pixel, by forming a substrate having a non-planar upper surface, and depositing a photoresist spacer layer upon the substrate. The spacer layer is exposed to a grey-scale lithographic mask to shape an upper surface of the spacer layer. A control member is formed upon the planarized spacer layer, and an image member is formed over the control member. The image member is configured to be positioned as a function of the control member to form a spatial light modulator (SLM). The spacer layer is planarized by masking a selected portion of the spacer layer with a grey-scale lithographic mask to remove binge in the selected portion.
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公开(公告)号：US20200207608A1
公开(公告)日：2020-07-02
申请号：US16814001
申请日：2020-03-10
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor： Patrick Ian Oden , James Carl Baker , Sandra Zheng , William C. McDonald
Abstract: In described examples, a microelectromechanical system (MEMS) includes a first element and a second element. The first element is mounted on a substrate and has a first contact surface. The second element is mounted on the substrate and has a second contact surface that protrudes from the second element to form an acute contact surface. The first element and/or the second element is/are operable to move in: a first direction, such that the first contact surface comes in contact with the second contact surface; and a second direction, such that the second contact surface separates from the first contact surface.
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公开(公告)号：US10589980B2
公开(公告)日：2020-03-17
申请号：US15481704
申请日：2017-04-07
Applicant: Texas Instruments Incorporated
Inventor： Patrick Ian Oden , James Carl Baker , Sandra Zheng , William C. McDonald
Abstract: In described examples, a microelectromechanical system (MEMS) includes a first element and a second element. The first element is mounted on a substrate and has a first contact surface. The second element is mounted on the substrate and has a second contact surface that protrudes from the second element to form an acute contact surface. The first element and/or the second element is/are operable to move in: a first direction, such that the first contact surface comes in contact with the second contact surface; and a second direction, such that the second contact surface separates from the first contact surface.
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公开(公告)号：US20170084453A1
公开(公告)日：2017-03-23
申请号：US15369000
申请日：2016-12-05
Applicant: Texas Instruments Incorporated
Inventor： Sandra Zheng , Mark James Smiley , Douglas Jay Levack , Ronald Dean Powell
IPC: H01L21/02 , H01L21/027
CPC classification number: H01L21/02282 , C23C18/00 , H01L21/02118 , H01L21/0273
Abstract: A method, which forms an air-bubble-free thin film with a high-viscosity fluid resin, initially dispenses the fluid resin on an outer region of a semiconductor wafer while the semiconductor wafer is spinning, and then dispenses the fluid resin onto the center of the semiconductor wafer after the semiconductor wafer has stopped spinning.
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Patent Agency Ranking
公开(公告)号：US11932529B2
公开(公告)日：2024-03-19
申请号：US16814001
申请日：2020-03-10
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor： Patrick Ian Oden , James Carl Baker , Sandra Zheng , William C. McDonald
CPC classification number: B81B3/001 , G02B26/0833 , G03F7/0035 , G03F7/16 , B81B2201/042 , B81C2201/0157
Abstract: In described examples, a microelectromechanical system (MEMS) includes a first element and a second element. The first element is mounted on a substrate and has a first contact surface. The second element is mounted on the substrate and has a second contact surface that protrudes from the second element to form an acute contact surface. The first element and/or the second element is/are operable to move in: a first direction, such that the first contact surface comes in contact with the second contact surface; and a second direction, such that the second contact surface separates from the first contact surface.
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公开(公告)号：US09960034B2
公开(公告)日：2018-05-01
申请号：US15369000
申请日：2016-12-05
Applicant: Texas Instruments Incorporated
Inventor： Sandra Zheng , Mark James Smiley , Douglas Jay Levack , Ronald Dean Powell
IPC: H01L21/469 , H01L21/02 , C23C18/00 , H01L21/027
CPC classification number: H01L21/02282 , C23C18/00 , H01L21/02118 , H01L21/0273
Abstract: A method, which forms an air-bubble-free thin film with a high-viscosity fluid resin, initially dispenses the fluid resin on an outer region of a semiconductor wafer while the semiconductor wafer is spinning, and then dispenses the fluid resin onto the center of the semiconductor wafer after the semiconductor wafer has stopped spinning.
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公开(公告)号：US20180290880A1
公开(公告)日：2018-10-11
申请号：US15481704
申请日：2017-04-07
Applicant: Texas Instruments Incorporated
Inventor： Patrick Ian Oden , James Carl Baker , Sandra Zheng , William C. McDonald
Abstract: In described examples, a microelectromechanical system (MEMS) includes a first element and a second element. The first element is mounted on a substrate and has a first contact surface. The second element is mounted on the substrate and has a second contact surface that protrudes from the second element to form an acute contact surface. The first element and/or the second element is/are operable to move in: a first direction, such that the first contact surface comes in contact with the second contact surface; and a second direction, such that the second contact surface separates from the first contact surface.
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公开(公告)号：US09548199B2
公开(公告)日：2017-01-17
申请号：US14481813
申请日：2014-09-09
Applicant: Texas Instruments Incorporated
Inventor： Sandra Zheng , Mark James Smiley , Douglas Jay Levack , Ronald Dean Powell
IPC: H01L21/469 , H01L21/02 , C23C18/00
CPC classification number: H01L21/02282 , C23C18/00 , H01L21/02118 , H01L21/0273
Abstract: A method, which forms an air-bubble-free thin film with a high-viscosity fluid resin, initially dispenses the fluid resin on an outer region of a semiconductor wafer while the semiconductor wafer is spinning, and then dispenses the fluid resin onto the center of the semiconductor wafer after the semiconductor wafer has stopped spinning.
Abstract translation: 利用高粘度流体树脂形成无气泡的薄膜的方法，首先在半导体晶片旋转的同时在半导体晶片的外部区域分配流体树脂，然后将流体树脂分配到中心 在半导体晶片停止旋转之后的半导体晶片。
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公开(公告)号：US20160124311A1
公开(公告)日：2016-05-05
申请号：US14531877
申请日：2014-11-03
Applicant: Texas Instruments Incorporated
Inventor： Patrick I. Oden , James C. Baker , Sandra Zheng , William C. McDonald , Lance W. Barron
CPC classification number: G03F7/36 , B81B3/00 , G02B26/0841 , G03F7/16 , G03F7/20
Abstract: A method of forming a micro-electromechanical systems (MEMS) pixel, such as a DMD-type pixel, by depositing a photoresist spacer layer upon a substrate. The photoresist spacer layer is exposed to a grey-scale lithographic mask to shape an upper surface of the photoresist spacer layer. A control member is formed upon the shaped spacer layer, and has a sloped portion configured to maximize energy density. An image member is configured to be positioned as a function of the control member to form a spatial light modulator (SLM).
Abstract translation: 通过在衬底上沉积光致抗蚀剂隔离层来形成诸如DMD型像素的微机电系统（MEMS）像素的方法。 将光致抗蚀剂间隔层暴露于灰度级光刻掩模以形成光致抗蚀剂间隔层的上表面。 控制构件形成在成形间隔层上，并且具有被配置为使能量密度最大化的倾斜部分。 图像构件被配置为根据控制构件定位以形成空间光调制器（SLM）。
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