公开(公告)号：DE69116586T2

公开(公告)日：1996-08-01

申请号：DE69116586

申请日：1991-02-18

Applicant: TORAY INDUSTRIES

Inventor： TOGASHI OSAMU ,  UMETSU HIDEYUKI ,  IWAMOTO MASATOSHI

IPC: C08K3/18 ,  C08G65/48 ,  C08K3/22 ,  C08K7/00 ,  C08L25/18 ,  C08L71/12 ,  C08L73/00 ,  C08L77/00 ,  C08K3/24

公开(公告)号：DE69116586D1

公开(公告)日：1996-03-07

申请号：DE69116586

申请日：1991-02-18

Applicant: TORAY INDUSTRIES

Inventor： TOGASHI OSAMU ,  UMETSU HIDEYUKI ,  IWAMOTO MASATOSHI

IPC: C08K3/18 ,  C08G65/48 ,  C08K3/22 ,  C08K7/00 ,  C08L25/18 ,  C08L71/12 ,  C08L73/00 ,  C08L77/00 ,  C08K3/24

公开(公告)号：HK1006973A1

公开(公告)日：1999-03-26

申请号：HK98106118

申请日：1998-06-23

Applicant: TORAY INDUSTRIES

Inventor： FUKUMOTO TADAO ,  IWAMOTO MASATOSHI ,  KISHIMOTO AKIHIKO

IPC: C08L25/06 ,  C08L51/04 ,  C08L67/00 ,  C08L69/00 ,  C08L71/12 ,  C08L77/00 ,  C08L77/12 ,  G11B23/03 ,  C08L

Abstract: Thermoplastic resin compositions comprising 1 to 40 wt % a polyether ester amide (A) and 99 to 60 wt % of at least one thermoplastic resin (B) selected from styrene based resins, polyphenylene ether resins and polycarbonate resins are disclosed.These are permanently antistatic and in preferred forms are excellent in mechanical properties represented by impact resistance, heat resistance, moldability and also in the appearance and gloss of the moldings, and are suitable for housing of optical or magnetic recording media.

公开(公告)号：CA1335125C

公开(公告)日：1995-04-04

申请号：CA607358

申请日：1989-08-02

Applicant: TORAY INDUSTRIES

Inventor： OGAWA TAKUYA ,  IWAMOTO MASATOSHI ,  CHIBA KAZUMASA ,  YANO KAZUHISA

IPC: C08L33/24 ,  C08L51/04 ,  C08L33/04 ,  C08L25/12

Abstract: Disclosed is a resin composition comprising (A) from 1 - 98 wt. parts of a graft copolymer obtained by graft-polymerizing (a) 5 - 80 wt.% of a rubbery polymer and (b) 95 - 20 wt.% of a monomer mixture consisting of 40 - 90 wt.% of an aromatic vinyl compound, 60 - 10 wt.% of a vinyl cyanide compound and 0 - 50 wt.% of another ethylenically unsaturated compound copolymerizable therewith, (B) 1 - 40 wt.% parts of a modified copolymer selected from (B1) a modified vinyl copolymer obtained by polymerizing (a) 40 - 90 wt.% of an aromatic vinyl compound, (b) 60 - 10 wt.% of a vinyl cyanide compound, (c) 0.01 - 10 wt.% of a monomer having an epoxy, carboxyl or amino group, and (d) 0 - 40 wt.% of another ethylenically unsaturated compound, and (B2) a modified olefinic copolymer obtained by copolymerizing (e) 50 95 wt.% of ethylene or propylene, (f) 0.1 - 20 wt.% of a monomer having an epoxy, carboxyl or amino group, and (g) 0 - 40 wt.% of another ethylenically unsaturated compound, (C) 1 - 60 wt. parts of an imidized acrylic resin, and (D) from 0 - 90 wt. parts of a vinyl copolymer obtained by polymerizing (a) 40 - 90 wt.% of an aromatic vinyl compound, (b) 60 - 10 wt.% of a vinyl cyanide compound and (c) 0 - 40 wt.% of another ethylenically unsaturated compound, wherein the content of the rubbery polymer (a) in the graft copolymer (A) is 5 to 40 wt.% based on the resin composition. This resin composition gives a shaped article having a delustered and pleasing appearance and a good impact resistance.

公开(公告)号：DE3788818T2

公开(公告)日：1994-06-30

申请号：DE3788818

申请日：1987-04-13

Applicant: TORAY INDUSTRIES

Inventor： FUKUMOTO TADAO ,  IWAMOTO MASATOSHI ,  KISHIMOTO AKIHIKO

IPC: C08L25/06 ,  C08L51/04 ,  C08L67/00 ,  C08L69/00 ,  C08L71/12 ,  C08L77/00 ,  C08L77/12 ,  G11B23/03

Abstract: Thermoplastic resin compositions comprising 1 to 40 wt % a polyether ester amide (A) and 99 to 60 wt % of at least one thermoplastic resin (B) selected from styrene based resins, polyphenylene ether resins and polycarbonate resins are disclosed.These are permanently antistatic and in preferred forms are excellent in mechanical properties represented by impact resistance, heat resistance, moldability and also in the appearance and gloss of the moldings, and are suitable for housing of optical or magnetic recording media.

公开(公告)号：CA1302623C

公开(公告)日：1992-06-02

申请号：CA574691

申请日：1988-08-12

Applicant: TORAY INDUSTRIES

Inventor： FUKUMOTO TADAO ,  YANO KAZUHISA ,  IWAMOTO MASATOSHI

IPC: C08L77/12 ,  C08G69/44 ,  C08G77/12 ,  C08L25/08 ,  C08L25/16 ,  C08L33/04 ,  C08L33/06 ,  C08L33/18 ,  C08L33/20 ,  C08L33/24 ,  C08L35/06 ,  C08L51/00 ,  C08L51/04 ,  C08L63/08 ,  C08L73/00 ,  C08L77/00

Abstract: A transparent polyether-ester amide having a permanently antistatic property is obtained by copolymerizing (a) an aminocarboxylic acid, a lactam, or a salt derived from a diamine and a dicarboxylic acid; (b) a diol of the formula: (I), (II) and (III) wherein R1 and R2 are an ethylene oxide or propylene oxide group, Y is covalent bond, alkylene, alkylidene, cycloalkylidene, arylalkylidene, O, SO, SO2 , CO, S, CF2 , C(CF3)2 or NH, X is H, alkyl, halogen, sulfonic acid or salt thereof, ? is 0 or an integer of 1 - 4, and m and n an integer of 1 - 15; (c) a poly(alkylene oxide)glycol or a diol of the formula: HO - R3 - OH (IV) wherein R3 is alkylene, alkylidene, cycloalkylidene or arylalkylidene; and (d) a dicarboxylic acid; wherein the content of the polyether-ester units is 10 to 90 wt.%. The polyether-ester amide is used preferably as a blend thereof with a graft copolymerization product formed by graft-polymerizing (a) a rubbery polymer with (b) a monomer mixture of a methacrylic or acrylic acid ester, an aromatic vinyl monomer and an optional vinyl cyanide monomer, this product having a refractive index approximately similar to that of the polyether-ester amide.

公开(公告)号：DE3853180T2

公开(公告)日：1995-08-17

申请号：DE3853180

申请日：1988-08-11

Applicant: TORAY INDUSTRIES

Inventor： FUKUMOTO TADAO ,  YANO KAZUHISA ,  IWAMOTO MASATOSHI

IPC: C08L77/12 ,  C08G69/44 ,  C08G77/12 ,  C08L25/08 ,  C08L25/16 ,  C08L33/04 ,  C08L33/06 ,  C08L33/18 ,  C08L33/20 ,  C08L33/24 ,  C08L35/06 ,  C08L51/00 ,  C08L51/04 ,  C08L63/08 ,  C08L73/00 ,  C08L77/00

Abstract: A transparent polyether-ester amide having a permanently antistatic property is obtained by copolymerizing (a) an aminocarboxylic acid, a lactam, or a salt derived from a diamine and a dicarboxylic acid; (b) a diol of the formula: wherein R and R are an ethylene oxide or propylene oxide group, Y is covalent bond, alkylene, alkylidene, cycloalkylidene, arylalkylidene, O, SO, SO2 , CO, S, CF2 , C(CF3)2 or NH, X is H, alkyl, halogen, sulfonic acid or salt thereof, l is 0 or an integer of 1 - 4, and m and n an integer of 1 - 15; (c) a poly(alkylene oxide)glycol or a diol of the formula: HO - R - OH (IV) wherein R is alkylene, alkylidene, cycloalkylidene or arylalkylidene; and (d) a dicarboxylic acid; wherein the content of the polyether-ester units is 10 to 90 wt.%. The polyether-ester amide is used preferably as a blend thereof with a graft copolymerization product formed by graft-polymerizing (a) a rubbery polymer with (b) a monomer mixture of a methacrylic or acrylic acid ester, an aromatic vinyl monomer and an optional vinyl cyanide monomer, this product having a refractive index approximately similar to that of the polyether-ester amide.

公开(公告)号：DE3788818D1

公开(公告)日：1994-03-03

申请号：DE3788818

申请日：1987-04-13

Applicant: TORAY INDUSTRIES

Inventor： FUKUMOTO TADAO ,  IWAMOTO MASATOSHI ,  KISHIMOTO AKIHIKO

IPC: C08L25/06 ,  C08L51/04 ,  C08L67/00 ,  C08L69/00 ,  C08L71/12 ,  C08L77/00 ,  C08L77/12 ,  G11B23/03

Abstract: Thermoplastic resin compositions comprising 1 to 40 wt % a polyether ester amide (A) and 99 to 60 wt % of at least one thermoplastic resin (B) selected from styrene based resins, polyphenylene ether resins and polycarbonate resins are disclosed.These are permanently antistatic and in preferred forms are excellent in mechanical properties represented by impact resistance, heat resistance, moldability and also in the appearance and gloss of the moldings, and are suitable for housing of optical or magnetic recording media.

公开(公告)号：CA2063194A1

公开(公告)日：1992-09-19

申请号：CA2063194

申请日：1992-03-17

Applicant: TORAY INDUSTRIES

Inventor： ONISHI KOJI ,  KATAOKA SHIRO ,  IWAMOTO MASATOSHI

IPC: B29C49/00 ,  B29K77/00 ,  B29L22/00 ,  C08G69/26 ,  C08J5/00 ,  C08K7/02 ,  C08K9/06 ,  C08L23/08 ,  C08L23/26 ,  C08L51/06 ,  C08L53/02 ,  C08L77/00 ,  C08L77/06 ,  C08G69/00 ,  C08L57/00 ,  C08L101/00

Abstract: The resin composition of the present invention allows the molding of a hollow molded product, able to stably form a long parison and having a three-dimensionally curved shape, by the formation of a copolyamide having a melting point of 225.degree.C or more and a crystallization temperature of 230.degree.C or less obtained by a polymerization of 66, 6T and 6I components at a specific compounding ratio.

公开(公告)号：HK1007319A1

公开(公告)日：1999-04-09

申请号：HK98106553

申请日：1998-06-25

Applicant: TORAY INDUSTRIES

Inventor： FUKUMOTO TADAO ,  YANO KAZUHISA ,  IWAMOTO MASATOSHI

IPC: C08G69/44 ,  C08G77/12 ,  C08L77/12 ,  C08L25/08 ,  C08L25/16 ,  C08L33/04 ,  C08L33/06 ,  C08L33/18 ,  C08L33/20 ,  C08L33/24 ,  C08L35/06 ,  C08L51/00 ,  C08L51/04 ,  C08L63/08 ,  C08L73/00 ,  C08L77/00 ,  C08G ,  C08L

Abstract: A transparent polyether-ester amide having a permanently antistatic property is obtained by copolymerizing (a) an aminocarboxylic acid, a lactam, or a salt derived from a diamine and a dicarboxylic acid; (b) a diol of the formula: wherein R and R are an ethylene oxide or propylene oxide group, Y is covalent bond, alkylene, alkylidene, cycloalkylidene, arylalkylidene, O, SO, SO2 , CO, S, CF2 , C(CF3)2 or NH, X is H, alkyl, halogen, sulfonic acid or salt thereof, l is 0 or an integer of 1 - 4, and m and n an integer of 1 - 15; (c) a poly(alkylene oxide)glycol or a diol of the formula: HO - R - OH (IV) wherein R is alkylene, alkylidene, cycloalkylidene or arylalkylidene; and (d) a dicarboxylic acid; wherein the content of the polyether-ester units is 10 to 90 wt.%. The polyether-ester amide is used preferably as a blend thereof with a graft copolymerization product formed by graft-polymerizing (a) a rubbery polymer with (b) a monomer mixture of a methacrylic or acrylic acid ester, an aromatic vinyl monomer and an optional vinyl cyanide monomer, this product having a refractive index approximately similar to that of the polyether-ester amide.