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公开(公告)号：DE2723867A1
公开(公告)日：1978-01-05
申请号：DE2723867
申请日：1977-05-26
Applicant: UBE INDUSTRIES
Inventor： KANEDA TAKAHO , ISHIKAWA SEIJI , DAIMON HIROSHI , KATSURA TOSHIO , MAEDA TATSUAKI , ICHIHARA CHIBA , HONDO TADAHIRO
Abstract: Fibers of a copolyamide derived from a diamine component including 10 to 50 mole % of benzidine sulfone or 2,7-diaminophenanthridone and 90 to 50 mole % of p-phenylene diamine and a dicarboxylic acid component derived from a reactive derivative of terephthalic acid are disclosed. The fibers have an initial modulus of elasticity of at least 400 g/d and a tensile strength of at least 16 g/d. The fibers have in combination various desirable properties, such as excellent initial modulus of elasticity, high tensile strength, high knot strength, high heat resistance and good adhesiveness to various plastics, rubbers and adhesives, and they are valuably used in various industrial fields as fibrous reinforcers and for production of fiber-reinforced plastics and rubber products.
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公开(公告)号：DE3662109D1
公开(公告)日：1989-03-23
申请号：DE3662109
申请日：1986-10-07
Applicant: UBE INDUSTRIES , SEIBU OIL CO
Inventor： ISHIKAWA SEIJI , HIRANO SHUUICHI , MATSUMOTO YUKIO , KAIBARA TUTOMU , SUGIYAMA KENJI , MORISHIGE TAKUO
Abstract: A process for producing a pitch useful as a raw material for carbon fibers, which comprises(1) heat-treating at least one starting material selected from the group consisting of a heavy oil obtained by fluid catalytic cracking of a petroleum, a distillate or a residual oil obtained by distilling the heavy oil, and a pitch obtained by heat-treating any of the foregoing materials at a temperature of 350 to 550 °C,(2) separating and removing insoluble substances from the reaction mixture obtained in step (1) to obtain a first treated mixture,(3) heating the first treated mixture obtained in step (2) at a temperature of 250 to 400 °C and removing light fractions which distill at said temperature to obtain a second treated mixture, and(4) treating the second treated mixture obtained in step (3) at a temperature of 430 to 550 °C.
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公开(公告)号：DE2900264A1
公开(公告)日：1979-07-12
申请号：DE2900264
申请日：1979-01-04
Applicant: UBE INDUSTRIES
Inventor： KANEDA TAKAHO , ISHIKAWA SEIJI , DAIMON HIROSHI , KATSURA TOSHIO , HONDO TADAHIRO , UEDA MASAHIRO
Abstract: A novel copolyamide fiber having an excellent initial modulus of elasticity and mechanical strength, is made from a copolyamide consisting essentially of unit A of the formula (A): (A) unit (B) of the formula (B): (B) and unit (C) of the formula (C): (C) wherein CH3 groups in the formula (A) are located in the ortho-position to NH groups, the sum of the amount of units (A) and (B) is substantially equimolar to the amount of unit (C) and the molar ratio of unit (A) to unit (B) is from 10/90 to 50/50.
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公开(公告)号：JPH118451A
公开(公告)日：1999-01-12
申请号：JP15967897
申请日：1997-06-17
Applicant: UBE INDUSTRIES
Inventor： ISHIKAWA SEIJI , YASUNO HIROSHI
Abstract: PROBLEM TO BE SOLVED: To use a stainless metal board as a board and to form a fine pattern high in insulating properties by a method, wherein photosetting polyimide siloxane whose initial elastic modulus is prescribed is used, and a laminate is formed through a transfer method. SOLUTION: A copper pattern 2 and a stainless metal plate 3 are bonded together with a patterned photosetting polyimide siloxane 4 into a laminate as a printed wiring board 1, wherein photosetting polyimide siloxane has an initial elastic modulus of 5 to 150 kg/mm , preferably 10 to 130 kg/mm , and the laminate is formed through a transfer method. It is preferable that organic solvent-soluble photosensitive polyimide siloxane be used as the photosensitive polyimide siloxane, wherein aromatic tetracarboxylic acid di-anhydride and diamine composed of aromatic diamine and diaminopolysiloxane are polymerized and turned into an imide for the formation of polyimide siloxane, and a compound possessed of (meta)acryloil groups is added to polyimide siloxane or condensation-reacted on polyimide siloxane to obtain organic solvent-soluble photosensitive polyimide siloxane.
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公开(公告)号：JPH10265571A
公开(公告)日：1998-10-06
申请号：JP4612298
申请日：1998-01-23
Applicant: UBE INDUSTRIES
Inventor： ISHIKAWA SEIJI , YASUNO HIROSHI , SAKURAI HIROYUKI
IPC: G03F7/038 , C08F290/06 , C08G73/10 , C08G77/452 , C08L79/08 , C08L83/10 , C09D5/00 , C09D179/08 , C09D183/10 , G03F7/075 , H01B3/30 , H01B3/46
Abstract: PROBLEM TO BE SOLVED: To obtain the subject compound exhibiting excellent solubility in organic solvents and high photosensitivity, capable of forming cured films excellent in heat resistance and flexibility, and useful for electric insulating films, etc., by reacting a specific polyimidesiloxane with a (meth)acryloyl group- containing compound. SOLUTION: This photosensitive polymidesiloxane is soluble in organic solvents, and is obtained by subjecting (B) a (meth)acryloyl group-containing compound to an addition reaction or a condensation reaction to or with (A) a polyimidesiloxane obtained by polymerizing (A1 ) a compound of formula I (X is O, CO, a direct bond) with (A2 ) the same moles of a diamine comprising (A2 ') a compound of formula II [Y is O, CH2 , SO2 , a direct bond, etc.; Z is OH, COOH, SH; (m1 ), (m2 ) are each 1] and (A2 ") compound of formula III [R1 is a divalent hydrocarbon; R2 is a 1-3C alkyl, phenyl; (n) is 3-50] e.g. in amounts of 5-80 mol.% and 95-20 mol.%, respectively, and subsequently converting the obtained polyamic acid to the polyimide.
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Patent Agency Ranking
公开(公告)号：JPH09118808A
公开(公告)日：1997-05-06
申请号：JP21704896
申请日：1996-08-19
Applicant: UBE INDUSTRIES
Inventor： ISHIKAWA SEIJI , YASUNO HIROSHI , NAKATANI MASAYUKI , YAMAMOTO SHIGERU
Abstract: PROBLEM TO BE SOLVED: To obtain the subject composition containing a soluble polyimidesiloxane, an epoxy resin and mica, excellent in heat resistance, adhesiveness, chemical resistance and storing stability, and useful as a printing ink, etc. SOLUTION: This polyimidesiloxane contains (A) 100 pts.wt. organic solvent soluble polyimidesiloxane expressed by formulas I to III [R1 is a tetra-valent residue obtained by removing four carboxylic acids from an aromatic tetracarboxylic acid; R2 is a divalent residue obtained by removing two amino groups from a diaminopolysiloxane of formula IV; R3 is a divalent residue obtained by removing two amino groups from the compound of formula V; R4 is a divalent residue obtained by removing two amino groups from a diamino compound other than the formula IV and V; (n1) is 3-30; R5 is a divalent hydrocarbon, etc.; R6 is a 1-3C alkyl, etc.; X is a direct bonding, etc.; (r1 ) is OH, etc.; (n2 ) is 1, 2; (n3 ) is 0-3; (m1) to (m3) are 45-95mol.%, 0.5-40mol.% and the rest respectively in 100mol.% total of each components], (B) 1-50 pts.wt. epoxy resin and (C) 2-150 pts.wt. mica.
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公开(公告)号：JPH09118807A
公开(公告)日：1997-05-06
申请号：JP21704796
申请日：1996-08-19
Applicant: UBE INDUSTRIES
Inventor： ISHIKAWA SEIJI , YASUNO HIROSHI , NAKATANI MASAYUKI , YAMAMOTO SHIGERU
Abstract: PROBLEM TO BE SOLVED: To obtain the subject composition containing a soluble polyimidesiloxane, an epoxy resin and barium sulfate, excellent in heat resistance, adhesiveness, chemical resistance and storing stability, and useful as a printing ink, etc. SOLUTION: This polyimidesiloxane contains (A) 100 pts.wt. organic solvent soluble polyimidesiloxane expressed by formulas I to III [R1 is a tetra valent residue obtained by removing four carboxylic acids from an aromatic tetracarboxylic acid; R2 is a divalent residue obtained by removing two amino groups from a diaminopolysiloxane of formula IV; R3 is a divalent residue obtained by removing two amino groups from the compound of formula V; R4 is a divalent residue obtained by removing two amino groups from a diamino compound other than the formula IV and V; (n1) is 3-30; R5 is a divalent hydrocarbon, etc.; R6 is a 1-3C alkyl, etc.; X is a direct bonding, etc.; (r1 ) is OH, etc.; (n) is 1, 2; (n3) is 0-3; (m1) to (m3) are 45-95mol.%, 0.5-40mol.% and the rest, respectively in 100mol.% total of each component], (B) 1-50 pts.wt. epoxy resin and (C) 2-150 pts.wt. barium sulfate.
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公开(公告)号：JPH0829791A
公开(公告)日：1996-02-02
申请号：JP16424194
申请日：1994-07-15
Applicant: UBE INDUSTRIES
Inventor： ISHIKAWA SEIJI , YASUNO HIROSHI
IPC: G02F1/1337
Abstract: PURPOSE:To prevent the lowering of contrast ratio caused by the change of the state of boundary between a polymer and a liquid crystal with the apply of high voltage or energizing for a long term by using the polymer consisting essentially of polyimide siloxane. CONSTITUTION:A polymer dispersion type liquid crystal is composed of the polymer consisting essentially of polyimide siloxane and the liquid crystal. And the polyimide siloxane is obtained by polymerizing and imidating an aromatic tetracarboxylic acid component consisting essentially of 2,3,3',4'-biphenyl tetracarboxylic acid and a diamine component composed of 45-80mol% diaminopolysiloxane expressed by a formula, 0.5-40mol% diaminobenzoic acid and balance an aromatic diamine having benzene rings of >=2. In the formula, R1 represents bivalent hydrocarbon residue, R2 represents individually a 1-3C alkyl group or a phenyl group and (l) represents integers of 3-30.
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公开(公告)号：JPH0797446A
公开(公告)日：1995-04-11
申请号：JP24151493
申请日：1993-09-28
Applicant: UBE INDUSTRIES
Inventor： ISHIKAWA SEIJI , NAKATANI MASAYUKI , FUKUDA HIROYUKI
Abstract: PURPOSE:To obtain a polyethersulfone having glycidyl ether groups by a simple and convenient method without producing a by-product. CONSTITUTION:A polyethersulfone having glycidyl groups is obtd. by reacting epichlorohydrin with a polyethersulfone polymn. soln. obtd. by polycondensing a dihalogenodiphenyl compd. with a dihydric phenol in the presence of an alkali metal compd. in an org. polar solvent.
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公开(公告)号：JPH06263873A
公开(公告)日：1994-09-20
申请号：JP5561393
申请日：1993-03-16
Applicant: UBE INDUSTRIES
Inventor： KIUCHI MASAYUKI , OZAWA HIDEO , ISHIKAWA SEIJI , NAKATANI MASAYUKI
Abstract: PURPOSE:To obtain at good efficiency a polyether sulfone small in a content of residues such as solvent as unreacted monomer and having excellent properties by feeding a water-containing polyether sulfone to an extruder provided with a vacuum vent hole and melt-extruding the polymer. CONSTITUTION:The production process of the polyether sulfone comprises feeding a water-containing polyether sulfone to an extruder provided with a vacuum vent hole and melt-extruding the polymer. According to this process, residues such as solvent, unreacted monomer and oligomer can be removed at good efficiency from the polyether sulfone separated from the reaction solution, and therefore, a polyaryl ether sulfone less colored excellent in heat resistance and mechanical strengths can be produced.
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