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    A HIGH-PRECISION OPTICAL SURFACE PREPARED BY SAGGING FROM A MASTERPIECE
    1.
    发明申请
    A HIGH-PRECISION OPTICAL SURFACE PREPARED BY SAGGING FROM A MASTERPIECE 审中-公开
    高精度光学表面，由精密仪器打标而成

    公开(公告)号：WO2006050891A3

    公开(公告)日：2006-08-24

    申请号：PCT/EP2005011894

    申请日：2005-11-08

    Applicant: ZEISS CARL SMT AG ,  EGLE WILHELM ,  DINGER UDO ,  MATTHES AXEL

    Inventor： EGLE WILHELM ,  DINGER UDO ,  MATTHES AXEL

    IPC: G21K1/06 ,  B24B13/00 ,  G03F7/20

    CPC classification number: G03F7/70166 ,  C03B23/0252 ,  C03B23/0357 ,  G03F7/70175 ,  G03F7/70958 ,  G21K1/06 ,  G21K2201/067

    Abstract: A method of making a high-precision optical surface which may be used either as a Wolter-type segment in an X-ray mirror system or in a collector of a EUVL system or as a spherical, aspherical, or free form normal or grazing incidence mirror in an EUVL system is prepared by sagging a thin flat glass sheet onto a masterpiece, in particular a mandrel, made from a temperature-resistant material, such as an alumina based ceramic or a keatite glass ceramic. The glass sheet is polished to the desired surface roughness (14), is posi­tioned to an upper surface of the masterpiece (16), and is heated (18) to effect sagging onto the upper surface of the masterpiece for generating a shaped body. Thereafter, the shaped body is cooled and removed from the masterpiece, is mounted within a holder (22), is inspected for deviations from the specification (24) preferably using interferometric measurements, and is corrected for defects (26), preferably using ion beam figuring.

    Abstract translation: 一种制造高精度光学表面的方法，该光学表面可以用作X射线反射镜系统中的Wolter型段或EUVL系统的集光器，或者用作球面，非球面或自由形式的法向或掠入射 EUVL系统中的反射镜是通过将薄的平板玻璃下垂到由耐热材料（例如氧化铝基陶瓷或热晶玻璃陶瓷）制成的杰作，特别是心轴上制备的。 将玻璃板抛光到所需的表面粗糙度（14），定位到杰作（16）的上表面，并被加热（18）以实现下垂到杰作的上表面以产生成形体。 之后，将成形体冷却并从杰作中取出，安装在保持器（22）内，优选使用干涉测量检查与规格（24）的偏差，并且针对缺陷（26）进行校正，优选使用离子束 搞清楚。

    3.
    发明专利
    未知

    公开(公告)号：DE102005053415A1

    公开(公告)日：2007-05-10

    申请号：DE102005053415

    申请日：2005-11-04

    Applicant: ZEISS CARL LASER OPTICS GMBH

    Inventor： ANDERL WILLI ,  BINGEL ULRICH ,  WEIGL BERNHARD ,  DINGER UDO ,  KUHN JOCHEN ,  MARCZUK PIOTR ,  HAFNER WOLFGANG ,  MATTHES AXEL

    IPC: G02B5/08 ,  G02B7/195 ,  G03F7/20

    Abstract: The present invention relates to an optical collector for use in EUV lithography, comprising at least one optically effective element in form of a mirror shell having a substantially cup-shaped structure which heats up when irradiated with light, further comprising at least one mounting element for fastening the at least one optically effective element on a holding structure, the at least one optically effective element having a body, and further comprising an active cooling system, which has at least one cooling conduit to which a cooling medium can be admitted, wherein the at least one cooling conduit is provided on a cooling body which is directly connected with the body of the optically effective element or is integrated in same.

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