公开(公告)号：WO2021257712A2

公开(公告)日：2021-12-23

申请号：PCT/US2021/037642

申请日：2021-06-16

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： PLATOW, Wilhelm ,  BASSOM, Neil ,  SATOH, Shu ,  SILVERSTEIN, Paul ,  FARLEY, Marvin

IPC: H01J37/08 ,  H01J1/20 ,  H01J27/20 ,  H01J27/08 ,  H01J1/025 ,  H01J1/52 ,  H01J2201/19 ,  H01J2203/04 ,  H01J2237/08 ,  H01J2237/082

Abstract: An ion source for forming a plasma has a cathode with a cavity and a cathode surface defining a cathode step. A filament is disposed within the cavity, and a cathode shield has a cathode shield surface at least partially encircling the cathode surface. A cathode gap is defined between the cathode surface and the cathode shield surface, where the cathode gap defines a tortured path for limiting travel of the plasma through the gap. The cathode surface can have a stepped cylindrical surface defined by a first cathode diameter and a second cathode diameter, where the first cathode diameter and second cathode diameter differ from one another to define the cathode step. The stepped cylindrical surface can be an exterior surface or an interior surface. The first and second cathode diameters can be concentric or axially offset.