公开(公告)号：WO2022240998A1

公开(公告)日：2022-11-17

申请号：PCT/US2022/028786

申请日：2022-05-11

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： PLATOW, Wilhelm ,  SILVERSTEIN, Paul ,  BASSOM, Neil ,  FARLEY, Marvin ,  SPORLEDER, David

IPC: H01J37/08 ,  H01J37/317 ,  H01J27/08 ,  H01J2237/0807 ,  H01J27/024 ,  H01J37/3171

Abstract: An ion source has an arc chamber having first and second ends and an aperture plate to enclose a chamber volume. An extraction aperture is disposed between the first and second ends. A cathode is near the first end of the arc chamber, and a repeller is near the second end. A generally U-shaped first bias electrode is on a first side of the extraction aperture within the chamber volume. A generally U-shaped second bias electrode is on a second side of the extraction aperture within the chamber volume, where the first and second bias electrodes are separated by a first distance proximate to the extraction aperture and a second distance distal from the extraction aperture. An electrode power supply provides a first and second positive voltage to the first and second bias electrodes, where the first and second positive voltages differ by a predetermined bias differential.

公开(公告)号：WO2017197378A1

公开(公告)日：2017-11-16

申请号：PCT/US2017/032603

申请日：2017-05-15

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen ,  SILVERSTEIN, Paul

IPC: H01J37/08 ,  H01J37/317

CPC classification number: H01J37/3002 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/061

Abstract: An ion implantation system is provided having one or more conductive components comprised of one or more of lanthanated tungsten and a refractory metal alloyed with a predetermined percentage of a rare earth metal. The conductive component may be a component of an ion source, such as one or more of a cathode, cathode shield, a repeller, a liner, an aperture plate, an arc chamber body, and a strike plate. The aperture plate may be associated with one or more of an extraction aperture, a suppression aperture and a ground aperture.

Abstract translation: 提供了一种离子注入系统，其具有由一种或多种镧系元素的钨和难熔金属组成的一种或多种导电组分，该导电组分与预定百分比的稀土金属形成合金。 导电部件可以是离子源的部件，例如阴极，阴极护罩，推斥极，衬垫，孔板，电弧室主体和冲击板中的一个或多个。 孔板可以与提取孔，抑制孔和接地孔中的一个或多个相关联。

公开(公告)号：WO2021257712A2

公开(公告)日：2021-12-23

申请号：PCT/US2021/037642

申请日：2021-06-16

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： PLATOW, Wilhelm ,  BASSOM, Neil ,  SATOH, Shu ,  SILVERSTEIN, Paul ,  FARLEY, Marvin

IPC: H01J37/08 ,  H01J1/20 ,  H01J27/20 ,  H01J27/08 ,  H01J1/025 ,  H01J1/52 ,  H01J2201/19 ,  H01J2203/04 ,  H01J2237/08 ,  H01J2237/082

Abstract: An ion source for forming a plasma has a cathode with a cavity and a cathode surface defining a cathode step. A filament is disposed within the cavity, and a cathode shield has a cathode shield surface at least partially encircling the cathode surface. A cathode gap is defined between the cathode surface and the cathode shield surface, where the cathode gap defines a tortured path for limiting travel of the plasma through the gap. The cathode surface can have a stepped cylindrical surface defined by a first cathode diameter and a second cathode diameter, where the first cathode diameter and second cathode diameter differ from one another to define the cathode step. The stepped cylindrical surface can be an exterior surface or an interior surface. The first and second cathode diameters can be concentric or axially offset.

公开(公告)号：WO2017176675A1

公开(公告)日：2017-10-12

申请号：PCT/US2017/025845

申请日：2017-04-04

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen ,  SILVERSTEIN, Paul

IPC: H01J27/08 ,  H01J9/32 ,  H01J37/08

CPC classification number: H01J37/32431 ,  G21F1/06 ,  H01J9/32 ,  H01J11/28 ,  H01J27/08 ,  H01J37/08 ,  H01J37/3171 ,  H01J37/32541 ,  H01J37/32559 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/31701

Abstract: An arc chamber has a liner having a recessed surface and a hole having a first diameter. The liner has a lip extending upwardly from the surface toward the surface that surrounds the hole and has a second diameter. An electrode has a shaft and head. The shaft has a third diameter that is less than the first diameter and passes through the body and hole and is electrically isolated from the liner by an annular gap. The head has a fourth diameter and a third surface having an electrode lip extending downwardly from the third surface toward the second surface. The electrode lip has a fifth diameter that is between the second and fourth diameters. A spacing between the liner lip and electrode lip defines a labyrinth seal and generally prevents contaminants from entering the annular gap.

Abstract translation: 弧室具有具有凹入表面和具有第一直径的孔的衬套。 该衬里具有从该表面向着围绕该孔的表面向上延伸并具有第二直径的唇缘。 一个电极有一个轴和头。 轴具有第三直径，其小于第一直径并且穿过主体和孔并且通过环形间隙与衬套电隔离。 头部具有第四直径和第三表面，第三表面具有从第三表面朝向第二表面向下延伸的电极唇缘。 电极唇具有在第二和第四直径之间的第五直径。 衬套唇缘和电极唇缘之间的间距限定了迷宫式密封，并且通常防止污染物进入环形间隙。

公开(公告)号：WO2017127525A1

公开(公告)日：2017-07-27

申请号：PCT/US2017/014106

申请日：2017-01-19

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen ,  SILVERSTEIN, Paul

IPC: H01J27/02 ,  H01J27/08

CPC classification number: H01J17/06 ,  H01J17/186 ,  H01J27/022 ,  H01J27/08 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/006 ,  H01J2237/061

Abstract: An ion source has an arc chamber having an arc chamber body. An electrode extends into an interior region of the arc chamber body, and a cathode shield has a body that is cylindrical having an axial hole. The axial hole is configured to pass the electrode therethrough. First and second ends of the body have respective first and second gas conductance limiters. The first gas conductance limiter extends from an outer diameter of the body and has a U-shaped lip. The second gas conductance limiter has a recess for a seal to protect the seal from corrosive gases and maintain an integrity of the seal. A gas source introduces a gas to the arc chamber body. A liner has an opening configured to pass the cathode shield therethrough, where the liner has a recess.

Abstract translation: 离子源具有具有电弧室主体的电弧室。 电极延伸到电弧室主体的内部区域中，并且阴极护罩具有具有轴向孔的圆柱形主体。 轴向孔构造成使电极穿过其中。 本体的第一和第二端具有相应的第一和第二气体传导限制器。 第一气体传导限制器从主体的外径延伸并具有U形唇缘。 第二气体传导限制器具有用于密封件的凹槽，以保护密封件免受腐蚀性气体影响并保持密封件的完整性。 气源将气体引入电弧室主体。 衬里具有开口，该开口构造成使阴极护罩穿过其中，其中衬里具有凹部。

公开(公告)号：WO2017127521A1

公开(公告)日：2017-07-27

申请号：PCT/US2017/014098

申请日：2017-01-19

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  HSIEH, Tseh-Jen ,  SILVERSTEIN, Paul

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/063 ,  H01J37/09 ,  H01J37/08 ,  H01J37/05 ,  H01J37/12 ,  H01J37/147

CPC classification number: H01J37/045 ,  H01J37/04 ,  H01J37/05 ,  H01J37/08 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/3171 ,  H01J2237/083

Abstract: An optics plate for an ion implantation system, the optics plate comprising a pair of aperture assemblies. Each pair of aperture assemblies respectively comprises a first aperture member, a second aperture member; and an aperture fastener, wherein the aperture fastener fastens the first aperture member to the second aperture member. An aperture tip may be also fastened to the second aperture member. One or more of the first aperture member, second aperture member, aperture tip, and aperture fastener is made of one or more of a refractory metal, tungsten, lanthanated tungsten alloy, yttrium tungsten alloy, and/or graphite and silicon carbide. The aperture assemblies may define an extraction electrode assembly, a ground electrode assembly, or other electrode assembly in the ion implantation system.

Abstract translation: 一种用于离子注入系统的光学板，所述光学板包括一对孔组件。 每对孔组件分别包括第一孔构件，第二孔构件; 和孔眼紧固件，其中孔眼紧固件将第一光圈构件紧固到第二光圈构件。 孔顶端也可以固定到第二孔构件。 第一孔构件，第二孔构件，孔口顶端和孔眼紧固件中的一个或多个由难熔金属，钨，镧系钨合金，钇钨合金和/或石墨和碳化硅中的一种或多种制成。 孔组件可限定离子注入系统中的引出电极组件，接地电极组件或其他电极组件。