X-ray source and method for generating X-ray radiation

    公开(公告)号:US11963286B2

    公开(公告)日:2024-04-16

    申请号:US17725152

    申请日:2022-04-20

    Applicant: Excillum AB

    Abstract: An X-ray source including: a liquid target source configured to provide a liquid target moving along a flow axis; an electron source configured to provide an electron beam; and a liquid target shaper configured to shape the liquid target to include a non-circular cross section with respect to the flow axis, wherein the non-circular cross section has a first width along a first axis and a second width along a second axis, wherein the first width is shorter than the second width, and wherein the liquid target includes an impact portion being intersected by the first axis; wherein the x-ray source is configured to direct the electron beam towards the impact portion such that the electron beam interacts with the liquid target within the impact portion to generate X-ray radiation.

    X-RAY SOURCE AND OPERATING METHOD THEREFOR
    3.
    发明公开

    公开(公告)号:US20240055216A1

    公开(公告)日:2024-02-15

    申请号:US18268934

    申请日:2021-12-21

    Inventor: Martin Leibfritz

    CPC classification number: H01J35/153 G01N23/223 H01J35/08

    Abstract: The invention relates to an x-ray source (100; 100a; 100b; 100c), comprising an electron source (110) for providing electrons (e) in the form of an electron beam (es) and a target element (120), on which the electrons (e) of the electron beam (es) of the electron source (110) are able to impinge, and at least one deflection device (140) enabling the electron beam (es) to be deflected from a propagation direction produced by the electron source (110), wherein the at least one deflection device (140) is configured to deflect the electron beam (es) at least intermittently with a trajectory (180) incident on the target element (120), but outside a center of the target element (120) or a region (150) of the target element (120) on which the electron beam (es) is incident in the case of a propagation direction without deflection, or wherein the at least one deflection device (140) is configured to deflect the electron beam (es) at least intermittently in such a way that the electron beam (es) is not incident on the target element (120).

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