-
公开(公告)号：US09055657B2
公开(公告)日：2015-06-09
申请号：US13904117
申请日：2013-05-29
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Junichi Fujimoto , Osamu Wakabayashi
Abstract: An extreme ultraviolet light generation apparatus may include a droplet production device configured to produce a droplet of a target substance in a predetermined traveling direction, a first laser device configured to generate a first laser beam and irradiate the droplet with the first laser beam to diffuse the droplet, a second laser device configured to generate a second laser beam and irradiate the target substance diffused by irradiation of the first laser beam with the second laser beam to produce plasma of the diffused target substance and generate extreme ultraviolet light from the plasma of the target substance, and a beam shaping unit configured to elongate a beam spot of the first laser beam in the traveling direction of the droplet produced by the droplet production device.
Abstract translation: 极紫外线发生装置可以包括：液滴制造装置，其被配置为在预定的行进方向上产生目标物质的液滴;第一激光装置，其被配置为产生第一激光束并用第一激光束照射液滴， 液滴，第二激光装置，被配置为产生第二激光束并且通过用第二激光束照射第一激光束来照射被扩散的目标物质，以产生扩散目标物质的等离子体并从目标的等离子体产生极紫外光 以及光束整形单元，其被配置为在由液滴产生装置产生的液滴的行进方向上拉长第一激光束的束斑。
-
公开(公告)号：US08867583B2
公开(公告)日：2014-10-21
申请号：US13656917
申请日：2012-10-22
Applicant: Gigaphoton Inc.
Inventor： Tooru Abe , Takeshi Ohta , Hiroaki Tsushima , Osamu Wakabayashi
CPC classification number: H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
Abstract translation: 准分子激光装置包括气体供给单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 激光气体和第二激光气体到激光室的内部。 气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，以及气体供给单元提供第一激光器的部分气体置换控制 可以选择性地执行气体和第二激光气体到激光室的内部和排气单元部分地从激光室内部排出气体。
-
公开(公告)号：US08705035B2
公开(公告)日：2014-04-22
申请号：US13744334
申请日：2013-01-17
Applicant: Gigaphoton Inc.
Inventor： Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
IPC: G01N21/00
CPC classification number: B05B17/06 , B05B5/001 , B05B5/035 , B05B12/082 , G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A device for determining a target generation condition for a target generator which is driven by a pulse voltage to generate a droplet of a target material may include a detector configured to detect a target generated by the target generator and output a detection signal of the target, and a controller configured to control a pulse duration of the pulse voltage for driving the target generator. The controller can determine whether or not a target is generated by the target generator based on the detection signal, and determine whether or not the generated target includes a plurality of droplets based on the detection signal.
Abstract translation: 用于确定由脉冲电压驱动以产生目标材料的液滴的目标发生器的目标生成条件的装置可以包括检测器，被配置为检测由目标发生器产生的目标并输出目标的检测信号， 以及控制器，被配置为控制用于驱动目标发生器的脉冲电压的脉冲持续时间。 控制器可以基于检测信号来确定目标发生器是否产生目标，并且基于检测信号来确定生成的目标是否包括多个液滴。
-
94.发明授权公开(公告)号：US08692220B2
公开(公告)日：2014-04-08
申请号：US13767789
申请日：2013-02-14
Applicant: Gigaphoton Inc.
Inventor： Masato Moriya , Osamu Wakabayashi
IPC: H05G2/00
CPC classification number: H05G2/008 , H01S3/0007 , H01S3/005 , H01S3/0064 , H01S3/08095 , H01S3/1305 , H01S3/1307 , H01S3/2232 , H01S3/2308 , H01S3/2316 , H05G2/003
Abstract: A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller.
Abstract translation: 具有光轴和与驱动脉冲激光束的光束直径基本相同的光束直径的引导激光束被引入到放大从驱动激光振荡器输出的激光束的放大系统中。 引导激光束作为连续光从激光装置输出，并且通过引导激光束引入反射镜被引入到驱动脉冲激光束的光路中。 传感器检测激光束的角度（方向）和波前曲率的变化。 波前校正控制器基于传感器的测量结果向波前校正部输出信号。 波前校正部根据来自波前校正控制器的指示，将激光束的波前校正为规定的波前。
-
公开(公告)号：US20130064259A1
公开(公告)日：2013-03-14
申请号：US13671657
申请日：2012-11-08
Applicant: Gigaphoton Inc.
Inventor： Osamu Wakabayashi , Takashi Onose , Shinji Ito
IPC: H01S5/00
CPC classification number: H01S5/0085 , G02F1/37 , G02F2001/3507 , G02F2001/354 , H01S3/005 , H01S3/0092 , H01S3/0602 , H01S3/08027 , H01S3/0812 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2308 , H01S3/2375 , H01S3/2383
Abstract: A solid-state laser apparatus may include: a master oscillator configured to output laser light having at least one longitudinal mode, the master oscillator being capable of changing the spectral linewidth of the laser light output therefrom; at least one amplifier located downstream of the master oscillator on an optical path; a wavelength converter located downstream of the amplifier on the optical path; a detector configured to detect the spectrum of the laser light; and a controller configured to control the spectral linewidth of the laser light output from the master oscillator based on a detection result of the detector.
Abstract translation: 固态激光装置可以包括：主振荡器，被配置为输出具有至少一个纵向模式的激光，所述主振荡器能够改变从其输出的激光的谱线宽度; 位于主振荡器的下游的至少一个放大器在光路上; 位于光路上的放大器下游的波长转换器; 检测器，被配置为检测激光的光谱; 以及控制器，被配置为基于检测器的检测结果来控制从主振荡器输出的激光的谱线宽度。
-
Patent Agency Ranking
公开(公告)号：US12237640B2
公开(公告)日：2025-02-25
申请号：US17819013
申请日：2022-08-11
Applicant: Gigaphoton Inc.
Inventor： Koichi Fujii , Osamu Wakabayashi
IPC: G03F7/20 , H01S3/08 , H01S3/1055 , H01S3/106
Abstract: A line narrowing device includes a first prism; first and second gratings arranged on the optical path of the light beam having passed through the first prism at positions different in a direction of grooves of either the first grating or the second grating; a beam adjustment optical system arranged on the optical path of the light beam between the first prism and at least one grating of the first and second gratings, and causing a first portion of the light beam to be incident on the first grating and causing a second portion of the light beam to be incident on the second grating; a first actuator adjusting an incident angle of the first portion on the first grating; a second actuator adjusting an incident angle of the second portion on the second grating; and a third actuator adjusting an energy ratio of the first and second portions.
-
公开(公告)号：US11264773B2
公开(公告)日：2022-03-01
申请号：US16674994
申请日：2019-11-05
Applicant: Gigaphoton Inc.
Inventor： Daisuke Tei , Osamu Wakabayashi
IPC: H01S3/034 , H01S3/081 , C30B29/12 , G02B1/02 , G02B27/12 , G03F7/20 , H01S3/08 , H01S3/13 , H01S3/22 , H01S3/225 , G02B27/10
Abstract: A laser apparatus including an optical element made of a CaF2 crystal and configured to transmit an ultraviolet laser beam obliquely incident on one surface of the optical element, the electric field axis of the P-polarized component of the laser beam propagating through the optical element coinciding with one axis contained in of the CaF2 crystal, with the P-polarized component defined with respect to the one surface. A method for manufacturing an optical element, the method including causing a seed CaF2 crystal to undergo crystal growth along one axis contained in to form an ingot, setting a cutting axis to be an axis inclining by an angle within 14.18±5° with respect to the crystal growth direction toward the direction of another axis contained in , which differs from the crystal growth direction, and cutting the ingot along a plane perpendicular to the cutting axis.
-
公开(公告)号：US10673200B2
公开(公告)日：2020-06-02
申请号：US15973846
申请日：2018-05-08
Applicant: Gigaphoton Inc.
Inventor： Yousuke Fujimaki , Hiroaki Tsushima , Hiroyuki Ikeda , Osamu Wakabayashi
IPC: H01S3/134 , H01S3/036 , H01S3/038 , H01S3/097 , H01S3/11 , H01S3/225 , H01S3/23 , H01S3/08 , H01S3/13
Abstract: An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.
-
公开(公告)号：US10651049B2
公开(公告)日：2020-05-12
申请号：US16055325
申请日：2018-08-06
Inventor： Hiroshi Ikenoue , Tomoyuki Ohkubo , Osamu Wakabayashi
IPC: H01L21/324 , B23K26/03 , B23K26/066 , B23K26/06 , B23K26/08 , H01L21/02 , B23K26/354 , H01L21/268 , B23K26/064 , B23K26/073 , H01L21/263 , B23K103/00 , B23K101/40
Abstract: A laser annealing device includes: a CW laser device configured to emit continuous wave laser light caused by continuous oscillation to preheat the amorphous silicon; a pulse laser device configured to emit the pulse laser light toward the preheated amorphous silicon; an optical system configured to guide the continuous wave laser light and the pulse laser light to the amorphous silicon; and a control unit configured to control an irradiation energy density of the continuous wave laser light so as to preheat the amorphous silicon to have a predetermined target temperature less than a melting point thereof, and configured to control at least one of a fluence and a number of pulses of the pulse laser light so as to crystallize the preheated amorphous silicon.
-
公开(公告)号：US10256594B2
公开(公告)日：2019-04-09
申请号：US15616163
申请日：2017-06-07
Applicant: GIGAPHOTON INC.
Inventor： Takashi Onose , Osamu Wakabayashi
IPC: H01S3/091 , G02F1/37 , G02F1/355 , H01S3/06 , H01S3/067 , H01S3/094 , H01S3/0941 , H01S3/107 , H01S3/109 , H01S3/16 , G02F1/35 , G03F7/20 , H01S3/23 , H01S3/00 , H01S3/10 , H01S3/225
Abstract: A solid-state laser system may include first and second solid-state laser units, a wavelength conversion system, an optical shutter, and a controller. The first solid-state laser unit and the second solid-state laser unit may output first pulsed laser light with a first wavelength and second pulsed laser light with a second wavelength, respectively. The controller may perform first control and second control. The first control may cause the first and second pulsed laser light to enter the wavelength conversion system at a substantially coincidental timing, thereby causing the wavelength conversion system to output third pulsed laser light with a third wavelength converted from the first wavelength and the second wavelength, and the second control may prevent the first and second pulsed laser light from entering the wavelength conversion system at the coincidental timing, thereby preventing the wavelength conversion system from outputting the third pulsed laser light.
-
-
-
-
-
-
-
-
-
Search Results
167
records
(took 0.023 seconds)
