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    Integrated Circuit Cooling Device
    93.
    发明申请
    Integrated Circuit Cooling Device 有权
    集成电路冷却装置

    公开(公告)号：US20070278663A1

    公开(公告)日：2007-12-06

    申请号：US10580324

    申请日：2004-11-12

    Applicant: Guillaume Bouche

    Inventor： Guillaume Bouche

    IPC: H01L23/34 ,  H01L21/4763

    CPC classification number: F04B43/043 ,  B81B7/0093 ,  B81B2201/036 ,  B81B2203/0127 ,  B81B2203/0315 ,  H01L23/473 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: A pump having: a cavity formed inside an insulating substrate, the upper part of the substrate being situated near the cavity having an edge; a conductive layer covering the inside of the cavity up to the edge and optionally covering the edge itself; a flexible membrane made of a conductive material placed above the cavity and resting against the edge; a dielectric layer covering the conductive layer or the membrane whereby insulating the portions of the conductive layer and of the membrane that are near one another; at least one aeration line formed in the insulating substrate that opens into the cavity via an opening in the conductive layer, and; terminals for applying a voltage between the conductive layer and the membrane.

    Abstract translation: 一种泵，具有：形成在绝缘基板内部的空腔，所述基板的上部位于具有边缘的所述空腔附近; 导电层，覆盖空腔的内部直到边缘并且可选地覆盖边缘本身; 由导电材料制成的柔性膜，放置在空腔上方并抵靠边缘; 覆盖导电层或膜的电介质层，由此绝缘导电层和膜彼此靠近的部分; 形成在所述绝缘基板中的至少一个通气线，所述曝气线经由所述导电层中的开口而进入所述空腔， 用于在导电层和膜之间施加电压的端子。

    Heat activated nanometer-scale pump
    94.
    发明申请
    Heat activated nanometer-scale pump 审中-公开
    热活化纳米级泵

    公开(公告)号：US20070048160A1

    公开(公告)日：2007-03-01

    申请号：US11490408

    申请日：2006-07-19

    Applicant: Joseph Pinkerton

    Inventor： Joseph Pinkerton

    IPC: F04B23/04

    CPC classification number: B81B3/0051 ,  B81B2201/036 ,  B81B2203/0118 ,  F04B19/00 ,  F04B19/006

    Abstract: A pump is provided that includes a nanometer-scale beam that is suspended in a housing. The housing may include a number of apertures such that molecules can move in and out of the housing. The nanometer-scale beam may be suspended as a jump rope or as a cantilever. The movement of the nanometer-scale beam may be mechanically stopped from moving in a particular way (e.g., towards a particular end of the housing). Thus, for example, the beam and the stop work together to pump molecules in the direction that the beam bounces off the stop. The speed and movement of the nanometer-scale beam can also be influenced either electrostatically or electromagnetically. As such, the speed and direction that a working substance is pumped by a nanometer-scale beam may be electrically controlled.

    Abstract translation: 提供了一种泵，其包括悬挂在壳体中的纳米级梁。 壳体可以包括多个孔，使得分子可以进出壳体。 纳米级光束可以作为跳绳或悬臂悬挂。 纳米级光束的移动可以机械地停止，以特定的方式移动（例如，朝向壳体的特定端部）。 因此，例如，梁和停止件一起工作以沿着梁从弹簧停止的方向泵送分子。 纳米级光束的速度和运动也可以受到静电或电磁场的影响。 因此，工作物质被纳米级光束泵送的速度和方向可以是电控制的。

    MEMS Device and Apparatus Having Such a MEMS Device
    100.
    发明公开
    MEMS Device and Apparatus Having Such a MEMS Device 审中-公开

    公开(公告)号：US20230406694A1

    公开(公告)日：2023-12-21

    申请号：US18334468

    申请日：2023-06-14

    Applicant: Infineon Technologies AG

    Inventor： Christian Bretthauer ,  Marco Haubold ,  Hans-Jörg Timme ,  Dominik Mayrhofer

    IPC: B81B3/00 ,  H04R19/02

    CPC classification number: B81B3/0021 ,  B81B3/007 ,  H04R19/02 ,  H04R2201/003 ,  B81B2203/06 ,  B81B2201/0257 ,  B81B2201/036 ,  B81B2203/0127

    Abstract: A MEMS device includes a substrate having a cavity and a membrane structure mechanically connected to the substrate and configured for deflecting out-of-plane with regard to a substrate plane and with a frequency in an ultrasonic frequency range to cause a fluid motion of the fluid in the cavity. The MEMS device includes a valve structure sandwiching the cavity together with the membrane structure, wherein the valve structure includes a planar perforated structure and a shutter structure opposing the perforated structure and arranged movably in-plane and with a frequency in the ultrasonic frequency range and with regard to the substrate plane and between a first position and a second position. The shutter structure is arranged to provide a first fluidic resistance for the fluid in the first position and a second, higher fluidic resistance for the fluid in the second position.

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