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91.发明申请METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL 审中-公开生产TIO2-SIO2玻璃体的方法，热处理TIO2-SIO2玻璃体，TIO2-SIO2玻璃体和EUVL光学基质的方法公开(公告)号：US20130276480A1
公开(公告)日：2013-10-24
申请号：US13922908
申请日：2013-06-20
Applicant: ASAHI GLASS COMPANY, LIMITED
Inventor： Akio KOIKE , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
IPC: C03B25/00
CPC classification number: C03B25/00 , B82Y10/00 , B82Y40/00 , C03B19/1453 , C03B2201/12 , C03B2201/23 , C03B2201/42 , G03F1/24 , Y02P40/57 , Y10T428/24355
Abstract: The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising: a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1 (° C.), heating the glass body after transparent vitrification at a temperature of T1+400° C. or more for 20 hours or more; and a step of cooling the glass body after the heating step up to T1−400 (° C.) from T1 (° C.) in an average temperature decreasing rate of 10° C./hr or less.
Abstract translation: 本发明涉及一种TiO 2 -SiO 2玻璃体的制造方法，其特征在于，在将透明玻璃化后的TiO 2 -SiO 2玻璃体的退火点作为T1（℃）时，将玻璃加热 在T1 + 400℃以上的温度下透明玻璃化后20个小时以上; 以及在10℃/小时以上的平均降温速度下，从T1（℃）加热至T1-400（℃）后将玻璃体冷却的工序。
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92.发明申请COPPER-CONTANING SILICA GLASS, METHOD FOR PRODUCING THE SAME, AND XENON FLASH LAMP USING THE SAME 有权二氧化硅铜玻璃及其制造方法及使用其的氙气灯公开(公告)号：US20120291488A1
公开(公告)日：2012-11-22
申请号：US13558698
申请日：2012-07-26
Applicant: Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
Inventor： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
CPC classification number: C03B19/1438 , C03B19/1453 , C03B2201/07 , C03B2201/23 , C03B2201/40 , C03C3/06 , C03C4/0071 , C03C4/085 , C03C4/12 , C03C23/0095 , C03C2201/23 , C03C2201/40 , C03C2203/44
Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
Abstract translation: 本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为 即使在高产量使用方面，长期稳定性也优异。 含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。
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公开(公告)号：US20120238434A1
公开(公告)日：2012-09-20
申请号：US13486485
申请日：2012-06-01
Applicant: Akio Koike , Takahiro Mitsumori , Tomonori Ogawa
Inventor： Akio Koike , Takahiro Mitsumori , Tomonori Ogawa
IPC: C03C3/06
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/10 , C03B2201/12 , C03B2201/23 , C03B2201/28 , C03B2201/42 , C03B2201/50 , C03C2201/10 , C03C2201/20 , C03C2201/28 , C03C2201/42
Abstract: The present invention relates to a TiO2-containing silica glass containing TiO2 in an amount of from 5 to 10 mass % and at least one of B2O3, P2O5 and S in an amount of from 50 ppb by mass to 5 mass % in terms of the total content.
Abstract translation: 本发明涉及含有5〜10质量％的TiO 2和B 2 O 3，P 2 O 5，S中的至少一种的含TiO 2的二氧化硅玻璃，其量为50ppb〜5质量％ 总内容
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94.发明申请METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL 审中-公开生产TIO2-SIO2玻璃体的方法，热处理TIO2-SIO2玻璃体，TIO2-SIO2玻璃体和EUVL光学基质的方法公开(公告)号：US20120100341A1
公开(公告)日：2012-04-26
申请号：US13299475
申请日：2011-11-18
Applicant: Akio KOIKE , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
Inventor： Akio KOIKE , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
CPC classification number: C03B25/00 , B82Y10/00 , B82Y40/00 , C03B19/1453 , C03B2201/12 , C03B2201/23 , C03B2201/42 , G03F1/24 , Y02P40/57 , Y10T428/24355
Abstract: The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising: a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1 (° C.), heating the glass body after transparent vitrification at a temperature of T1+400° C. or more for 20 hours or more; and a step of cooling the glass body after the heating step up to T1−400 (° C.) from T1 (° C.) in an average temperature decreasing rate of 10° C./hr or less.
Abstract translation: 本发明涉及一种TiO 2 -SiO 2玻璃体的制造方法，其特征在于，在将透明玻璃化后的TiO 2 -SiO 2玻璃体的退火点作为T1（℃）时，将玻璃加热 在T1 + 400℃以上的温度下透明玻璃化后20个小时以上; 以及在10℃/小时以上的平均降温速度下，从T1（℃）加热至T1-400（℃）后将玻璃体冷却的工序。
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95.发明授权TiO2-containing silica glass and optical member for EUV lithography using the same 有权含TiO 2的石英玻璃和使用其的EUV光刻的光学部件公开(公告)号：US08093165B2
公开(公告)日：2012-01-10
申请号：US12869035
申请日：2010-08-26
Applicant: Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa , Yuko Tachibana
Inventor： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa , Yuko Tachibana
IPC: C03C3/06 , C03B19/06 , C03B37/018 , C03B25/00
CPC classification number: C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , G03F1/24 , G03F7/70958 , Y02P40/57
Abstract: The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.
Abstract translation: 本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能 通过从玻璃中释放氢气，保持很长一段时间。 本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。
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Patent Agency Ranking
96.发明授权TIO2-containing silica glass and optical member for lithography using the same 有权含TiO 2的石英玻璃和使用其的光刻用光学构件公开(公告)号：US08034731B2
公开(公告)日：2011-10-11
申请号：US12862174
申请日：2010-08-24
Applicant: Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
Inventor： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/23 , C03B2201/42 , C03C2201/23 , C03C2203/44 , C03C2203/52 , C03C2203/54
Abstract: The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.
Abstract translation: 本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件时，其在高EUV能量光照射时的线性热膨胀系数基本为零。 本发明涉及具有1000℃以下的假想温度，600ppm以上的OH浓度，线性热膨胀系数为0ppb /℃的温度的含TiO 2的二氧化硅玻璃。 在20〜100℃的温度范围内的平均线性热膨胀系数为50ppb /℃以下。
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公开(公告)号：US07994083B2
公开(公告)日：2011-08-09
申请号：US11521683
申请日：2006-09-15
Applicant: Brian Lee Harper , Kenneth Edward Hrdina , John Edward LaSala
Inventor： Brian Lee Harper , Kenneth Edward Hrdina , John Edward LaSala
CPC classification number: C03C3/06 , C03B19/1453 , C03B32/00 , C03B2201/07 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03C2201/21 , C03C2201/23 , C03C2203/54 , G03F7/708 , Y10S501/905
Abstract: Disclosed are methods for hydrogen loading silica glass and silica glass comprising loaded H2. The methods can lead to H2 gradient in the glass material. Alternatively, the method may involve the use of varying H2 partial pressure of H2 in the atmosphere. Both can result in expedited hydrogen loading process.
Abstract translation: 公开了负载二氧化硅玻璃和含有负载H2的石英玻璃的氢的方法。 这些方法可能导致玻璃材料中的H2梯度。 或者，该方法可以涉及在大气中使用H 2的变化的H 2分压。 两者都可以产生加速氢气加载过程。
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公开(公告)号：US07964522B2
公开(公告)日：2011-06-21
申请号：US11891984
申请日：2007-08-14
Applicant: Lisa Anne Moore , Charlene Marie Smith
Inventor： Lisa Anne Moore , Charlene Marie Smith
CPC classification number: C03B19/1461 , C03B19/12 , C03B19/14 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C3/061 , C03C2201/11 , C03C2201/12 , C03C2201/21 , C03C2201/22 , C03C2201/40 , C03C2201/50 , Y02P40/57
Abstract: An F-doped silica glass, a process for making the glass, an optical member comprising the glass, and an optical system comprising such optical member. The glass material comprises 0.1-5000 ppm by weight of fluorine. The glass material according to certain embodiments of the present invention has low polarization-induced birefringence, low LIWFD and low induced absorption at 193 nm.
Abstract translation: F掺杂石英玻璃，制造玻璃的方法，包括玻璃的光学构件和包括这种光学构件的光学系统。 玻璃材料包含0.1-5000ppm重量的氟。 根据本发明的某些实施方案的玻璃材料在193nm处具有低偏振诱发双折射，低LIWFD和低诱导吸收。
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99.发明申请TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME 有权含氧二氧化硅玻璃和光学成员使用相同的EUV光刻公开(公告)号：US20100323872A1
公开(公告)日：2010-12-23
申请号：US12869035
申请日：2010-08-26
Applicant: Akio KOIKE , Yasutomi IWAHASHI , Shinya KIKUGAWA , Yuko TACHIBANA
Inventor： Akio KOIKE , Yasutomi IWAHASHI , Shinya KIKUGAWA , Yuko TACHIBANA
IPC: C03C3/04
CPC classification number: C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , G03F1/24 , G03F7/70958 , Y02P40/57
Abstract: The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.
Abstract translation: 本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能 通过从玻璃中释放氢气，保持很长一段时间。 本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。
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100.发明授权公开(公告)号：US07827824B2
公开(公告)日：2010-11-09
申请号：US11896948
申请日：2007-09-06
Applicant: Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
Inventor： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
CPC classification number: G03F7/70958 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/54 , Y02P40/57
Abstract: A synthetic quartz glass substrate having (i) an OH concentration of 1-100 ppm and a hydrogen molecule concentration of 1×1016-1×1019 molecules/cm3, (ii) an in-plane variation of its internal transmission at wavelength 193.4 nm which is up to 0.2%, and (iii) an internal transmission of at least 99.6% at wavelength 193.4 nm is suited for use with excimer lasers.
Abstract translation: （i）OH浓度为1-100ppm，氢分子浓度为1×1016-1×1019分子/ cm3的合成石英玻璃基板，（ii）其波长为193.4nm的内部透光率的面内变化 其高达0.2％，和（iii）在波长193.4nm处的至少99.6％的内部透射率适用于准分子激光器。
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