中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

349 records (took 0.023 seconds)

    Silica glass containing TiO2 and optical material for EUV lithography
    93.
    发明授权
    Silica glass containing TiO2 and optical material for EUV lithography 有权
    含二氧化硅的玻璃和用于EUV光刻的光学材料

    公开(公告)号：US07462574B2

    公开(公告)日：2008-12-09

    申请号：US11174533

    申请日：2005-07-06

    Applicant: Yasutomi Iwahashi ,  Akio Koike

    Inventor： Yasutomi Iwahashi ,  Akio Koike

    IPC: C03C3/06 ,  G02B1/00 ,  C03B19/00 ,  C03B19/14

    CPC classification number: C03C3/06 ,  C03B19/1484 ,  C03B2201/42 ,  C03C4/0085 ,  C03C2201/42

    Abstract: A silica glass containing TiO2, characterized in that the fluctuation of the refractive index (Δn) is at most 2×10−4 within an area of 30 mm×30 mm in at least one plane. A silica glass containing TiO2, characterized in that the TiO2 concentration is at least 1 mass %, and the striae pitch is at most 10 μm. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, and the fluctuation of the refractive index (Δn) is at most 2×10−4 in a plane perpendicular to the incident light direction. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, wherein the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % in a plane perpendicular to the incident light direction.

    Abstract translation: 含有TiO 2的二氧化硅玻璃，其特征在于，在至少一个平面中，在30mm×30mm的面积内，折射率（Deltan）的波动至多为2×10 -4。 含有TiO 2的二氧化硅玻璃，其特征在于TiO 2浓度为1质量％以上，条纹间距为10μm以下。 一种用于EUV光刻的光学材料，其特征在于它由含有TiO 2的二氧化硅玻璃制成，并且在垂直于入射光方向的平面中折射率（Deltan）的波动为至多2×10 -4。 一种用于EUV光刻的光学材料，其特征在于，其由TiO 2的二氧化硅玻璃制成，其中TiO 2浓度为至少1质量％，并且TiO 2浓度的最大值和最小值之间的差为至多0.06 在垂直于入射光方向的平面中的质量％。

    Polishing method for extreme ultraviolet optical elements and elements produced using the method
    94.
    发明申请
    Polishing method for extreme ultraviolet optical elements and elements produced using the method 审中-公开
    使用该方法制备的极紫外光学元件和元件的抛光方法

    公开(公告)号：US20080132150A1

    公开(公告)日：2008-06-05

    申请号：US11699287

    申请日：2007-01-29

    Applicant: Gregory John Arserio ,  Robert Sabia ,  Brian Daniel Sylvia

    Inventor： Gregory John Arserio ,  Robert Sabia ,  Brian Daniel Sylvia

    IPC: B24B1/00

    CPC classification number: B24B13/00 ,  B82Y10/00 ,  B82Y40/00 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/42 ,  C03C3/04 ,  C03C19/00 ,  G03F1/24 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

    Abstract: The invention is directed to polished glass substrates suitable for extreme ultraviolet lithography. The elements are silica-titania glass elements having a coefficient of thermal expansion of 0±30×10−9/° C. or less, and containing 5-10 wt. % titania. The polished elements have a mid-spatial frequency peak-to-valley roughness of 2.0 ml/cm2/min. Generally the flow rates are in the range of 2.0-10 ml/cm2/min. Glass substrates suitable for extreme ultraviolet lithography element have a coefficient of thermal expansion of 0±30×10−9/° C. or less. A particular glass suitable for EUVL use is silica-titania glass containing 5-10 wt. % titania.

    Abstract translation: 本发明涉及适用于极紫外光刻的抛光玻璃基板。 元素是具有0±30×10 -9 /℃或更低的热膨胀系数的二氧化硅 - 二氧化钛玻璃元素，并且含有5-10重量％ 二氧化钛。 抛光元件具有<10nm的中空间频率峰谷粗糙度和<0.20nm平均粗糙度的高空间频率粗糙度。 本发明还涉及一种用于生产适用于极紫外光刻（“EUVL”）的光学元件的方法，该方法至少具有以下步骤：提供所需光学元件形状的玻璃基片，并使用 高磨料浆料流速> 2.0ml / cm 2 / min。 通常流速在2.0-10ml / cm 2 / min的范围内。 适用于极紫外光刻元件的玻璃基板的热膨胀系数为0±30×10 -9 /℃以下。 适用于EUVL的特定玻璃是含有5-10重量％的二氧化硅 - 二氧化钛玻璃。 二氧化钛。

    SILICA GLASS CONTAINING TiO2 AND PROCESS FOR ITS PRODUCTION
    95.
    发明申请
    SILICA GLASS CONTAINING TiO2 AND PROCESS FOR ITS PRODUCTION 有权
    含二氧化硅的二氧化硅玻璃及其生产工艺

    公开(公告)号：US20080103037A1

    公开(公告)日：2008-05-01

    申请号：US11957855

    申请日：2007-12-17

    Applicant: Yasutomi IWAHASHI ,  Akio Koike

    Inventor： Yasutomi IWAHASHI ,  Akio Koike

    IPC: C03C3/04

    CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

    Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

    Abstract translation: 含有TiO 2的二氧化硅玻璃，其具有至多1200℃的假想温度，至少100ppm的F浓度和0±200ppb /℃的热膨胀系数。 0至100℃。一种制备含有TiO 2的石英玻璃的方法，其包括在通过玻璃形成材料的火焰水解获得的目标石英玻璃颗粒上形成多孔玻璃体的步骤 ，获得含氟多​​孔玻璃体的步骤，获得含氟玻璃化玻璃体的步骤，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

    Method for manufacturing grin lens and grin lens
    96.
    发明申请
    Method for manufacturing grin lens and grin lens 有权
    制造咧嘴透镜和笑脸镜片的方法

    公开(公告)号：US20070160854A1

    公开(公告)日：2007-07-12

    申请号：US10569280

    申请日：2005-04-12

    Applicant: Hiroyoshi Matsumura ,  Taro Suzuki ,  Toru Achiwa

    Inventor： Hiroyoshi Matsumura ,  Taro Suzuki ,  Toru Achiwa

    IPC: C03B8/00 ,  B32B17/06 ,  B32B9/00

    CPC classification number: G02B3/0087 ,  C03B19/12 ,  C03B23/047 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2203/26

    Abstract: A method for manufacturing a GRIN lens includes the steps of forming a wet gel provided with a concentration distribution having a different concentration of a refractive index distribution imparting metal that differs in concentration in a radial direction, drying the wet gel to form a dry gel having a bulk specific gravity ρ (g/cm3), sintering the dry gel to form a GRIN lens base material and stretching the GRIN lens base material while heating. The method is characterized in that, in the step of sintering the dry gel, partial pressures of oxygen during sintering at 800° C. or higher are 10−1 Pa or lower and also the relation between a rate of temperature increase ν (° C./hr) and a bulk density ρ of the dry gel during sintering at 1,000 to 1,150° C. is defined by ν≦105*EXP (−12ρ). As a result of this, the GRIN lens, which has a large numerical aperture and a small diameter, can stably and easily be manufactured.

    Abstract translation: 制造GRIN透镜的方法包括以下步骤：形成具有浓度分布的湿凝胶，所述浓缩分布具有不同浓度的在径向上浓度不同的折射率分布赋予金属，干燥湿凝胶以形成具有 堆积比重rho（g / cm 3），烧结干凝胶以形成GRIN透镜基材并在加热时拉伸GRIN透镜基材。 该方法的特征在于，在烧结干凝胶的步骤中，800℃以上的烧结时的氧分压为10〜PaPa以下， 的温度上升nu（℃/小时），在1000至1150℃的烧结期间的干凝胶的体积密度rho由nu <10×5×EXP（-12rho） 。 作为其结果，可以稳定且容易地制造具有大数值孔径和小直径的GRIN透镜。

    Reduced striae low expansion glass and elements, and a method for making same
    97.
    发明申请
    Reduced striae low expansion glass and elements, and a method for making same 审中-公开
    减少条纹低膨胀玻璃和元素，以及制造它的方法

    公开(公告)号：US20070137253A1

    公开(公告)日：2007-06-21

    申请号：US11445071

    申请日：2006-05-31

    Applicant: Lorrie Beall ,  John Maxon ,  William Rosch ,  Robert Sabia

    Inventor： Lorrie Beall ,  John Maxon ,  William Rosch ,  Robert Sabia

    IPC: C03B37/07 ,  C03B37/018

    CPC classification number: C03B19/1453 ,  C03B2201/42 ,  C03C3/06

    Abstract: The invention is directed to a method for reducing striae in ultra-low expansion glass by heat-treating the glass at temperatures above 1600° C. for a time in the range of 72-288 hours. In one embodiment of the invention the glass is heat treated without forcing the glass to flow or “move”. The invention was found to reduce the magnitude of striae in an ultra-low expansion glass by 500%, and particularly reduces most of the “higher frequency” striae.

    Abstract translation: 本发明涉及一种通过在高于1600℃的温度下将玻璃热处理72-88小时的时间来减少超低膨胀玻璃中的条纹的方法。 在本发明的一个实施例中，玻璃被热处理而不强迫玻璃流动或“移动”。 发现本发明将超低膨胀玻璃中的条纹幅度减小了500％，特别是减少了大部分“较高频率”的条纹。

Patent Agency Ranking