公开(公告)号：US09612525B2

公开(公告)日：2017-04-04

申请号：US15137954

申请日：2016-04-25

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: G03F1/24 ,  C03B19/14 ,  C03C3/06 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/81 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/42 ,  Y02P40/57

Abstract: Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.

公开(公告)号：US09580350B2

公开(公告)日：2017-02-28

申请号：US14921487

申请日：2015-10-23

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

IPC: C03C3/06 ,  C03C3/076 ,  C03C10/00 ,  C03B19/14 ,  C03B19/06 ,  C03B19/12 ,  C03B32/00

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/12 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/10 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/076 ,  C03C10/0009 ,  C03C2201/10 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2201/50 ,  C03C2201/54 ,  C03C2201/58 ,  C03C2203/54

Abstract: Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (Tf), and low expansivity slope.

Abstract translation: 超低膨胀二氧化钛 - 二氧化硅玻璃。 玻璃具有高羟基含量，并且任选地包括一种或多种掺杂剂。 代表性的可选掺杂剂包括硼，碱元素，碱土金属元素或诸如Nb，Ta，Al，Mn，Sn Cu和Sn的金属。 玻璃通过包括蒸汽固结以增加羟基含量的方法制备。 高羟基含量或掺杂剂和高羟基含量的组合降低了玻璃的假想温度，以提供具有非常低的热膨胀系数（CTE），低假想温度（Tf）和低膨胀斜率的玻璃。

公开(公告)号：US09416040B2

公开(公告)日：2016-08-16

申请号：US14569535

申请日：2014-12-12

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Bodo Kuehn

IPC: C03B23/20 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  G02B5/10 ,  G03F7/20

CPC classification number: C03B23/20 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  G02B5/10 ,  G03F7/708 ,  Y10T428/22 ,  Y10T428/24612

Abstract: On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.

公开(公告)号：US09399000B2

公开(公告)日：2016-07-26

申请号：US13477396

申请日：2012-05-22

Applicant: Kipyung Ahn ,  Guangjun Xu ,  Martin Panchula ,  Samuel Conzone ,  Tianjun Rong ,  Konstantin S. Zuyev ,  Yen Zhou

Inventor： Kipyung Ahn ,  Guangjun Xu ,  Martin Panchula ,  Samuel Conzone ,  Tianjun Rong ,  Konstantin S. Zuyev ,  Yen Zhou

IPC: C03C3/06 ,  A61J1/00 ,  B65D1/00 ,  C03C4/00 ,  C03B1/00

CPC classification number: C03C3/06 ,  A61J1/00 ,  A61J1/1468 ,  B65D1/00 ,  C03B1/00 ,  C03B17/04 ,  C03C4/00 ,  C03C4/085 ,  C03C4/20 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/3423 ,  C03C2201/42 ,  C03C2203/10 ,  C03C2204/00 ,  Y10T428/131

Abstract: A high silica glass composition comprising about 92 to about 99.9999 wt. % SiO2 and from about 0.0001 to about 8 wt. % of at least one dopant selected from Al2O3, CeO2, TiO2, La2O3, Y2O3, Nd2O3, other rare earth oxides, and mixtures of two or more thereof. The glass composition has a working point temperature ranging from 600 to 2,000° C. These compositions exhibit stability similar to pure fused quartz, but have a moderate working temperature to enable cost effective fabrication of pharmaceutical packages. The glass is particularly useful as a packaging material for pharmaceutical applications, such as, for example pre-filled syringes, ampoules and vials.

Abstract translation: 高二氧化硅玻璃组合物包含约92-约99.9999wt。 ％SiO 2和约0.0001-约8wt。 选自Al 2 O 3，CeO 2，TiO 2，La 2 O 3，Y 2 O 3，Nd 2 O 3，其它稀土氧化物中的至少一种掺杂剂的％，以及其两种或更多种的混合物。 玻璃组合物的工作点温度范围为600至2000℃。这些组合物表现出与纯熔融石英相似的稳定性，但具有适度的工作温度以使药物包装成本有效地制造。 该玻璃特别可用作药物应用的包装材料，例如预填充注射器，安瓿和小瓶。

公开(公告)号：US20160185645A1

公开(公告)日：2016-06-30

申请号：US14911506

申请日：2014-07-22

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： Stefan OCHS ,  Klaus BECKER ,  Stephan THOMAS

IPC: C03B19/14 ,  C03C4/00 ,  G03F1/52 ,  C03C3/00

CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/00 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2204/00 ,  G03F1/52 ,  G03F1/60

Abstract: The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+≦5×10−4.

Abstract translation: Ti掺杂的二氧化硅玻璃中存在的Ti3 +离子会引起玻璃的棕色染色，导致镜片检查变得更加困难。 在Ti掺杂的二氧化硅玻璃中减少Ti3 +离子有利于Ti4 +离子的已知方法包括足够高比例的OH基，并在玻璃化之前进行氧处理，这两者都有缺点。 为了提供一种Ti掺杂石英玻璃的成本有效的制造方法，其在羟基含量小于120ppm时，在400nm的波长范围内显示出至少70％的内部透射率（样品厚度10mm） 在玻璃化之前，将TiO 2 -SiO 2烟炱体用氮氧化物进行调理处理。 由Ti掺杂的石英玻璃制成的坯料的比例为Ti3 + / Ti4 +＆nlE; 5×10-4。

公开(公告)号：US09324894B2

公开(公告)日：2016-04-26

申请号：US14358237

申请日：2012-09-27

Applicant: AGC GLASS EUROPE

Inventor： Audrey Dogimont ,  Sebastien Hennecker ,  Thomas Lambricht

IPC: B32B17/00 ,  B32B15/00 ,  H01L31/048 ,  C03C3/087 ,  C03C3/095 ,  C03C4/00 ,  G02B1/10 ,  G02B1/11 ,  G02B5/08 ,  H01L31/052 ,  H01L31/0392

CPC classification number: H01L31/0481 ,  C03C3/087 ,  C03C3/095 ,  C03C4/0092 ,  C03C2201/20 ,  C03C2201/32 ,  C03C2201/3423 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2201/54 ,  C03C2204/00 ,  G02B1/10 ,  G02B1/105 ,  G02B1/11 ,  G02B1/18 ,  G02B5/08 ,  H01L31/0392 ,  H01L31/048 ,  H01L31/0525 ,  Y02E10/50

Abstract: The invention relates to an extra-clear glass sheet, i.e. a glass sheet with high energy transmission, which can be used in particular in the field of solar energy. Specifically, the invention relates to a glass sheet having a composition that includes, in an amount expressed in wt % for the total weight of the glass: 60-78% of SiO2; 0-10% of Al2O3; 0-5% of B2O3; 0-15% of CaO; 0-10% of MgO; 5-20% of Na2O; 0-10% of K2O; 0-5% of BaO, wherein the total amount of iron (in the form of Fe2O3) is 0.002-0.03%, and the composition includes a ratio of manganese/(total iron) of 1 to 8.5, the manganese content being expressed in the form of MnO in wt % relative to the total weight of the glass.

Abstract translation: 本发明涉及一种特别透明的玻璃板，即具有高能量传输的玻璃板，其特别可用于太阳能领域。 具体地说，本发明涉及一种玻璃片，其组成包括以玻璃总重量的wt％表示的量：60-78％的SiO 2; 0-10％的Al2O3; 0-5％的B2O3; 0-15％的CaO; 0-10％的MgO; 5-20％的Na2O; 0-10％K2O; 0-5％的BaO，其中铁（以Fe 2 O 3形式）的总量为0.002-0.03％，组成包括锰/（总铁）的比例为1至8.5，锰含量表示在 MnO的形式相对于玻璃的总重量为wt％。

公开(公告)号：US20150218039A1

公开(公告)日：2015-08-06

申请号：US14604998

申请日：2015-01-26

Applicant: Corning Incorporated

Inventor： William R. Angell, IV ,  Sezhian Annamalai ,  Carlos Alberto Duran ,  John Edward Maxon

IPC: C03C3/076 ,  C03B19/09 ,  C03C3/06

CPC classification number: C03C3/076 ,  C03B19/09 ,  C03B19/1407 ,  C03B19/1415 ,  C03B2201/42 ,  C03B2207/50 ,  C03C3/06 ,  C03C3/062 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/10 ,  C03C2203/40 ,  G03F1/24 ,  G03F1/60

Abstract: A glass article for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass article includes a silica-titania glass having a compositional gradient through the glass article, the compositional gradient being defined by the functions: [TiO2]=(c+f(x,y,z)), and [SiO2]=(100−{c+f(x,y,z)}−δ(x,y,z)) wherein [TiO2] is the concentration of titania in wt. %, [SiO2] is the concentration of silica in wt. %, c is the titania concentration in wt. % for a predetermined zero crossover temperature (Tzc), f(x, y, z) is a function in three-dimensional space that defines the difference in average composition of a volume element centered at the coordinates (x, y, z) with respect to c, and δ(x, y, z) is a function in three-dimensional space that defines the sum of all other components of a volume element centered at the coordinates (x, y, z).

Abstract translation: 提供了一种用于极光紫外光刻（EUVL）的玻璃制品。 玻璃制品包括通过玻璃制品具有组成梯度的二氧化硅 - 二氧化钛玻璃，组成梯度由以下功能定义：[TiO 2] =（c + f（x，y，z））和[SiO 2] =（ 100- {c + f（x，y，z）}-δ（x，y，z））其中[TiO 2]是二氧化钛的重量浓度。 ％，[SiO2]是二氧化硅的重量浓度。 ％，c是以重量计的二氧化钛浓度。 对于预定的零交叉温度（Tzc），f（x，y，z）是三维空间中的函数，其定义以坐标（x，y，z）为中心的体积元素的平均成分的差异与 对于c而言，δ（x，y，z）是定义以坐标（x，y，z）为中心的体元素的所有其他分量的和的三维空间中的函数。

公开(公告)号：US20150183677A1

公开(公告)日：2015-07-02

申请号：US14660561

申请日：2015-03-17

Applicant: NIKON CORPORATION

Inventor： Toshio YOSHINARI

IPC: C03B19/14 ,  C03B11/08 ,  C03C3/06

CPC classification number: C03B19/1415 ,  C03B11/08 ,  C03B19/1469 ,  C03B23/0493 ,  C03B32/005 ,  C03B2201/42 ,  C03B2207/70 ,  C03B2207/80 ,  C03B2215/44 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44 ,  G03F1/60

Abstract: A method for manufacturing an SiO2—TiO2 based glass upon a target by a direct method, includes: an ingot growing step of growing an SiO2—TiO2 based glass ingot having a predetermined length on the target by flame hydrolysis by feeding a silicon compound and a titanium compound into an oxyhydrogen flame, wherein the ingot growing step includes: a first step of increasing a ratio of a feed rate of the titanium compound to a feed rate of the silicon compound as the SiO2—TiO2 based glass ingot grows until the ratio reaches a predetermined value; and a second step of gradually growing the SiO2—TiO2 based glass ingot after the ratio has reached the predetermined value in the first stage with keeping the ratio within a predetermined range.

Abstract translation: 通过直接法在靶材上制造SiO 2 -TiO 2基玻璃的方法包括：通过将硅化合物进料火焰水解生长具有预定长度的SiO 2 -TiO 2基玻璃锭的锭生长步骤， 钛化合物变成氢氧焰，其中所述锭生长步骤包括：第一步骤，当所述SiO 2 -TiO 2基玻璃锭生长直到所述比率达到时，增加所述钛化合物的进料速率与所述硅化合物的进料速率的比率 预定值 以及在比率达到规定值的情况下在第一阶段中将SiO 2 -TiO 2基玻璃锭逐渐生长的第二步骤，并将比例保持在预定范围内。

公开(公告)号：US08931307B2

公开(公告)日：2015-01-13

申请号：US13499352

申请日：2010-09-28

Applicant: Bodo Kuehn

Inventor： Bodo Kuehn

IPC: B32B17/00 ,  C03B23/13 ,  C03B23/20 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06

CPC classification number: C03B23/20 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  G02B5/10 ,  G03F7/708 ,  Y10T428/22 ,  Y10T428/24612

Abstract: On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.

Abstract translation: 基于具有高二氧化硅含量的钛掺杂玻璃的坯料的制造方法（玻璃）的基础是用于具有外表面的EUV光刻用的镜面基板，其目的是设置有 反射涂层，并且当反射镜基板按预期使用时被指定为高负载区域，以便提供可以以低成本生产的空白，并且在均匀性方面满足高要求并且不受起泡和条纹的影响， 提出了包括以下方法步骤的方法：（a）制造尺寸大到足以包围外轮廓的钛掺杂高品质玻璃的前体，（b）从掺钛玻璃制造圆柱形支撑体 ，（c）将所述前体和所述支撑体接合以形成复合体，和（d）加工所述复合体以形成所述反射镜基板坯料，其中，所述制造所述前体的步骤包括 一种均质化方法，其特征在于，通过使含硅化合物的火焰水解使绞合线形成的起始体扭转而形成前体坯料，所述支撑体形成为与前身均匀性较差的整体式玻璃块。

公开(公告)号：US20140155246A1

公开(公告)日：2014-06-05

申请号：US13835039

申请日：2013-03-15

Applicant: CORNING INCORPORATED

Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

IPC: G03F1/22

CPC classification number: G03F1/22 ,  C03B19/12 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/54

Abstract: The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the halogen content can be in the range of 0.2 wt. % to 3 wt. % along with 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a fictive temperature Tf of less than 875° C. In an embodiment Tf is less than 825° C. In another embodiment Tf is less than 775° C.

Abstract translation: 本公开涉及掺杂的二氧化硅 - 二氧化钛玻璃，DST玻璃，其基本上由0.1重量％ ％至5wt。 ％卤素，50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，卤素含量可以在0.2wt。 ％〜3重量％ ％和50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，DST玻璃的OH浓度小于100ppm。 在另一个实施方案中，OH浓度小于50ppm。 DST玻璃具有小于875℃的假想温度Tf。在一个实施方案中，Tf小于825℃。在另一个实施方案中，Tf小于775℃