中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

231 records (took 0.023 seconds)

    Low expansivity, high transmission titania doped silica glass
    102.
    发明授权
    Low expansivity, high transmission titania doped silica glass 有权
    低膨胀性，高透射二氧化钛掺杂石英玻璃

    公开(公告)号：US08541325B2

    公开(公告)日：2013-09-24

    申请号：US13028472

    申请日：2011-02-16

    Applicant: Carlos Duran ,  Kenneth Edward Hrdina ,  Michael A Mueller

    Inventor： Carlos Duran ,  Kenneth Edward Hrdina ,  Michael A Mueller

    IPC: C03C3/06

    CPC classification number: C03C3/06 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/52 ,  G03F1/60 ,  G03F7/0002 ,  G03F7/70958

    Abstract: In one embodiment the present disclosure is directed to a silica-titania glass with an internal transmission of >90%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the internal transmission is >93%/cm at wavelengths from 340 nm to 840 nm. In a further embodiment the internal transmission is >95%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the disclosure is directed to a silica-titania glass with an overall transmission through an optic made of the glass is >84% at wavelengths from 340 nm to 840 nm. In another embodiment overall transmission through an optic made of the glass is >86% at wavelengths from 340 nm to 840 nm. In a further embodiment the overall transmission through an optic made of the glass is >88% at wavelengths from 330 nm to 840 nm. In a further embodiment the silica-titania glass has a Ti+3 concentration level [Ti3+] less than 3 ppm by weight.

    Abstract translation: 在一个实施方案中，本公开涉及在340nm至840nm的波长下具有> 90％/ cm 3的内透射率的二氧化硅 - 二氧化钛玻璃。 在另一个实施例中，在340nm至840nm的波长下，内透射率> 93％/ cm。 在另一个实施方案中，在340nm至840nm的波长下，内透射率> 95％/ cm。 在另一个实施方案中，本发明涉及一种二氧化硅 - 二氧化钛玻璃，其透射率通过玻璃制成的光学透镜在340nm至840nm的波长处> 84％。 在另一个实施例中，通过由玻璃制成的光学器件的整个透射在340nm至840nm的波长处为> 86％。 在另一实施例中，通过由玻璃制成的光学器件的整体透射在330nm至840nm的波长处为> 88％。 在另一个实施方案中，二氧化硅 - 二氧化钛玻璃具有小于3ppm重量的Ti + 3浓度水平[Ti 3+]。

    Process for producing porous quartz glass object, and optical member for EUV lithography
    104.
    发明授权
    Process for producing porous quartz glass object, and optical member for EUV lithography 失效
    用于生产多孔石英玻璃物体的方法和用于EUV光刻的光学构件

    公开(公告)号：US08356494B2

    公开(公告)日：2013-01-22

    申请号：US13210673

    申请日：2011-08-16

    Applicant: Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Akio Koike

    Inventor： Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Akio Koike

    IPC: C03B37/018 ,  C03C3/06

    CPC classification number: C03B19/1423 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/20 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44

    Abstract: A process for producing a porous quartz glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.

    Abstract translation: 一种制造多孔石英玻璃体的方法，该方法包括在燃烧器的火焰中水解金属掺杂剂前体和SiO 2前体以形成玻璃微粒，并将形成的玻璃微粒沉积并生长在基材上，其中燃烧器具有 至少两个喷嘴，其中含有（A）金属掺杂剂前体气体，（B）SiO 2前体气体，（C）H 2和O 2的一种气体的混合气体，以及（D）选自以下的一种或多种气体： 一组稀有气体，N 2，CO 2，卤化氢和H 2 O，一部分气体（D）为5-70mol％; 和（E）（C）的H 2和O 2的其它气体彼此供给到燃烧器的不同喷嘴中。

    PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY
    108.
    发明申请
    PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY 失效
    用于生产多孔石英玻璃物体的工艺和用于EUV光刻的光学部件

    公开(公告)号：US20110301015A1

    公开(公告)日：2011-12-08

    申请号：US13210673

    申请日：2011-08-16

    Applicant: Takahiro MITSUMORI ,  Yasutomi Iwahashi ,  Akio Koike

    Inventor： Takahiro MITSUMORI ,  Yasutomi Iwahashi ,  Akio Koike

    IPC: C03C3/04 ,  C03B20/00

    CPC classification number: C03B19/1423 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/20 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44

    Abstract: The present invention relates to a process for producing a porous quarts glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.

    Abstract translation: 本发明涉及一种制造多孔石英玻璃体的方法，该方法包括在燃烧器的火焰中水解金属掺杂剂前体和SiO 2前体以形成玻璃微粒，并将形成的玻璃微粒沉积和生长在基材上， 其中燃烧器具有至少两个喷嘴，其中包含（A）金属掺杂剂前体气体，（B）SiO 2前体气体，（C）H 2和O 2的一种气体的混合气体和（D）一种或 选自稀土气体，N 2，CO 2，卤化氢和H 2 O的更多气体，一部分气体（D）为5-70mol％; 和（E）（C）的H 2和O 2的其它气体彼此供给到燃烧器的不同喷嘴中。

    TiO2-containing silica glass for optical member for EUV lithography
    109.
    发明授权
    TiO2-containing silica glass for optical member for EUV lithography 失效
    用于EUV光刻的光学元件的含TiO 2的二氧化硅玻璃

    公开(公告)号：US08039409B2

    公开(公告)日：2011-10-18

    申请号：US12904236

    申请日：2010-10-14

    Applicant: Kenta Saitou ,  Akio Koike ,  Mitsuhiro Kawata

    Inventor： Kenta Saitou ,  Akio Koike ,  Mitsuhiro Kawata

    IPC: C03C3/06 ,  C03C3/076

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/42 ,  C03C3/076 ,  C03C4/0085 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

    Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3,000, of 70% or more.

    Abstract translation: 本发明提供一种含TiO 2的二氧化硅玻璃，可以得到透明度极高的透明性高且热膨胀系数基本上为零的温度区域的玻璃。 本发明涉及TiO 2浓度为3〜14质量％的用于EUV光刻用的光学部件的含TiO 2的二氧化硅玻璃， 在400〜700nm波长范围内，每1mm厚的内透射率，T400-700，97％以上; 在400〜3000nm的波长范围内，每1mm厚的内透射率，T400-3,000，70％以上。

    PROCESS FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS
    110.
    发明申请
    PROCESS FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS 有权
    合成石英玻璃生产工艺

    公开(公告)号：US20110179827A1

    公开(公告)日：2011-07-28

    申请号：US13080704

    申请日：2011-04-06

    Applicant: Chikaya TAMITSUJI ,  Kunio Watanabe ,  Akio Koike

    Inventor： Chikaya TAMITSUJI ,  Kunio Watanabe ,  Akio Koike

    IPC: C03B8/04 ,  C03B20/00

    CPC classification number: C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42

    Abstract: The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

    Abstract translation: 本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括：（a）沉积和生长通过玻璃成形的火焰水解得到的石英玻璃微粒子的工序 原料在基板上，从而形成多孔玻璃体; （b）将多孔玻璃体保持在填充有元素氟（F2）的反应容器或包含用惰性气体稀释的元素氟（F2）的混合气体并含有固体金属氟化物的步骤，从而获得 含氟多孔玻璃体; 和（c）将含氟多孔质玻璃体加热至透明玻璃化温度的步骤，得到含氟透明玻璃体。

Patent Agency Ranking