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公开(公告)号：US20200134824A1
公开(公告)日：2020-04-30
申请号：US16177034
申请日：2018-10-31
Applicant: FEI COMPANY
Inventor： Umesh ADIGA
Abstract: Smart metrology methods and apparatuses disclosed herein process images for automatic metrology of desired features. An example method at least includes extracting a region of interest from an image, the region including one or more boundaries between different sections, enhancing at least the extracted region of interest based on one or more filters, generating a multi-scale data set of the region of interest based on the enhanced region of interest, initializing a model of the region of interest; optimizing a plurality of active contours within the enhanced region of interest based on the model of the region of interest and further based on the multi-scale data set, the optimized plurality of active contours identifying the one or more boundaries within the region of interest, and performing metrology on the region of interest based on the identified boundaries.
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公开(公告)号：US10607811B1
公开(公告)日：2020-03-31
申请号：US16289292
申请日：2019-02-28
Applicant: FEI Company
Inventor： Ali Mohammadi-Gheidari , Ivan Lazić , Eric Bosch , Gerard van Veen
IPC: H01J37/00 , H01J37/28 , H01J37/244 , H01J37/09 , H01J37/147
Abstract: Techniques for multi-beam scanning transmission charged particle microscopy are disclosed herein. An example apparatus at least includes a charged particle beam column to produce a plurality of charged particle beams and irradiate a specimen with each of the plurality of charged particle beams, and an imaging system to collect charged particles of each of the charged particle beams of the plurality of charged particle beams that traverse the specimen during said irradiation, and to direct each charged particle beam of the plurality of the charged particle beams after traversing the sample onto a detector, where each charged particle beam includes a barycenter, and where the detector is disposed in an intermediate location between a back focal plane and an imaging plane of the imaging system.
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113.发明申请公开(公告)号：US20200066482A1
公开(公告)日：2020-02-27
申请号：US16542053
申请日：2019-08-15
Applicant: FEI Company
IPC: H01J37/252 , H01J37/20 , G02B21/34 , H01J37/244
Abstract: The invention relates to a charged particle microscope (CPM) that at least includes a sample holder, for holding a sample, and a manipulator device arranged for transferring a lamella created in said sample out of said sample, wherein said manipulator device comprises a first elongated manipulator member with a first outer end, and a second elongated manipulator member with a second outer end. The outer ends are movable for mechanically gripping and releasing said lamella. In embodiments, the elongated manipulator members comprise off-set parts that increase manoeuvrability, accessibility, and monitorability of the manipulator device during use.
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公开(公告)号：US10546719B2
公开(公告)日：2020-01-28
申请号：US15987847
申请日：2018-05-23
Applicant: FEI Company
Inventor： Noel Thomas Franco , Kenny Mani , Chad Rue , Joe Christian , Jeffrey Blackwood
IPC: H01J37/305 , H01L21/67 , H01L21/263 , H01L21/3065 , H01J37/22 , G01N1/44 , G01N1/28
Abstract: Method for preparing site-specific, plan-view lamellae from multilayered microelectronic devices. A focused ion beam that is directed, with an etch-assisting gas, toward an uppermost layer of a device removes at least that uppermost layer and thereby exposes an underlying layer over, or comprising, a target area from which the site-specific, plan-view lamella is to be prepared, wherein the focused ion beam is in a face-on orientation in removing the uppermost layer to expose the underlying layer. In a preferred embodiment, the etch-assisting gas comprises methyl nitroacetate. In alternative embodiments, the etch-assisting gas is methyl acetate, ethyl acetate, ethyl nitroacetate, propyl acetate, propyl nitroacetate, nitro ethyl acetate, methyl methoxyacetate, or methoxy acetylchloride.
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公开(公告)号：US20200025696A1
公开(公告)日：2020-01-23
申请号：US16516837
申请日：2019-07-19
Applicant: FEI Company
Inventor： Pavel Potocek
IPC: G01N23/2251 , H01J37/28 , H01J37/26
Abstract: Techniques for adapting an adaptive specimen image acquisition system using an artificial neural network (ANN) are disclosed. An adaptive specimen image acquisition system is configurable to scan a specimen to produce images of varying qualities. An adaptive specimen image acquisition system first scans a specimen to produce a low-quality image. An ANN identifies objects of interest within the specimen image. A scan mask indicates regions of the image corresponding to the objects of interest. The adaptive specimen image acquisition system scans only the regions of the image corresponding to the objects of interest, as indicated by the scan mask, to produce a high-quality image. The low-quality image and the high-quality image are merged in a final image. The final image shows the objects of interest at a higher quality, and the rest of the specimen at a lower quality.
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Patent Agency Ranking
116.发明授权公开(公告)号：US10538844B2
公开(公告)日：2020-01-21
申请号：US14851962
申请日：2015-09-11
Applicant: FEI Company
Inventor： James Bishop , Toan Trong Tran , Igor Aharonovich , Charlene Lobo , Milos Toth
Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.
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公开(公告)号：US20200013580A1
公开(公告)日：2020-01-09
申请号：US16453699
申请日：2019-06-26
Applicant: FEI Company
Inventor： Alexander Henstra , Pleun Dona
IPC: H01J37/153 , H01J37/244 , H01J37/22
Abstract: Disclosed herein are electron microscopes with improved imaging. An example electron microscope at least includes an illumination system, for directing a beam of electrons to irradiate a specimen, an elongate beam conduit, through which the beam of electrons is directed; a multipole lens assembly configured as an aberration corrector, and a detector for detecting radiation emanating from the specimen in response to said irradiation, wherein at least a portion of said elongate beam conduit extends at least through said aberration corrector and has a composite structure comprising an outer tube of electrically insulating material, and an inner skin of electrically conductive material with an electrical conductivity σ and a thickness t, with σt
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公开(公告)号：US10475629B2
公开(公告)日：2019-11-12
申请号：US15170672
申请日：2016-06-01
Applicant: FEI Company
Inventor： John Mitchels , Rudolf Johannes Peter Gerardus Schampers , Michal Hrouzek , Tomas Gardelka
IPC: H01J37/34 , C23C14/35 , H01J37/26 , H01J37/28 , H01J37/06 , H01J37/08 , H01J37/18 , H01J37/20 , H01J37/285 , H01J37/32
Abstract: A charged-particle microscope, comprising a vacuum chamber in which are provided: A specimen holder for holding a specimen in an irradiation position; A particle-optical column, for producing a charged particle beam and directing it so as to irradiate the specimen; A detector, for detecting a flux of radiation emanating from the specimen in response to irradiation by said beam, wherein: Said vacuum chamber comprises an in situ magnetron sputter deposition module, comprising a magnetron sputter source for producing a vapor stream of target material; A stage is configured to move a sample comprising at least part of said specimen between said irradiation position and a separate deposition position at said deposition module; Said deposition module is configured to deposit a layer of said target material onto said sample when held at said deposition position.
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公开(公告)号：US10403469B2
公开(公告)日：2019-09-03
申请号：US15099302
申请日：2016-04-14
Applicant: FEI Company
Inventor： Ivan Lazic , Eric Gerardus Theodoor Bosch
Abstract: A method is presented for sub-surface imaging of a specimen in a charged particle microscope. A series of images, with individual members In is collected, with a value of a beam parameter P varied for each image, thereby compiling a measurement set M={(In, Pn)}, with P being the focus position along the charged particle axis. The data for the images are recorded using signals from a segmented detector. The signals from segments combined and compiled to yield a vector field. Mathematical processing then deconvolves the vector field, resulting in depth-resolved imagery of the specimen.
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公开(公告)号：US10366860B2
公开(公告)日：2019-07-30
申请号：US15901858
申请日：2018-02-21
Applicant: FEI Company
Inventor： N. William Parker , Mark W. Utlaut , Laurens Franz Taemsz Kwakman , Thomas G. Miller
IPC: H01J35/08 , G01N23/046 , G21K7/00 , H01J35/14
Abstract: An x-ray target, a method of using the x-ray target, and a computer program product with instructions for carrying out a method of using the x-ray target. The x-ray target includes a substrate made from a soft x-ray producing material and a high aspect ratio structure made from a hard x-ray producing material. The hard x-ray producing material is embedded in the substrate, formed on the substrate, cantilevered out from the edge of the substrate, or any combination thereof. The high aspect ratio structure comprises a plurality of high aspect ratio structures arranged in one or more grids or arrays, and the high aspect ratio structures in one of the one or more grids or arrays are arranged to form a Hadamard matrix structure.
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