Abstract:
What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-doped synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.
Abstract:
A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.
Abstract:
A first step, in which P2O5-containing glass is deposited inside a silica glass pipe, and a second step, in which a Cl2-containing gas is introduced into the pipe and the P2O5-containing glass is dehydrated by heating the pipe, are repeated alternately. A third step, in which glass that does not contain P2O5 is deposited on the inside of the silica glass pipe, may further be provided such that the first step, the second step, and the third step are repeatedly performed in this order. A rare-earth-doped optical fiber, which has a attenuation of 15 dB/km or less at a wavelength of 1200 nm, comprises a core region and a cladding region enclosing the core region, wherein the core region includes phosphorus of 3 wt % or more, aluminum of 0.3 wt % or more, a rare-earth element of 500 wtppm or more, and chlorine of 0.03 wt % or more, and the cladding region has a refractive index that is lower than the refractive index of the core region.
Abstract:
Disclosed are high purity synthetic silica material having an internal transmission at 193 nm of at least 99.65%/cm and method of preparing such material. The material is also featured by a high compositional homogeneity in a plane transverse to the intended optical axis. The soot-to-glass process for making the material includes a step of consolidating the soot preform in the presence of H2O and/or O2.
Abstract:
A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.
Abstract:
An optical member comprising OD-doped silica glass, optionally doped with fluorine. The optical member is particularly advantageous for use in connection with radiation having a wavelength shorter than about 248 nm. In certain embodiments the optical member can be advantageously used for wavelength as short as about 157 nm.
Abstract:
For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface.The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.
Abstract:
Disclosed is an optical fiber having a silica-based core comprising an alkali metal oxide selected from the group consisting of K2O, Na2O, LiO2, Rb2O, Cs2O and mixtures thereof in an average concentration in said core between about 50 and 500 ppm by weight, said core further comprising chlorine and fluorine, wherein the average concentration of fluorine in said core is greater than the average concentration of alkali metal oxide in said core and the average concentration of chlorine in said core is greater than the average concentration of alkali metal oxide in said core; and a silica-based cladding surrounding and directly adjacent the core. By appropriately selecting the concentration of alkali metal oxide dopant in the core and the cladding, a low loss optical fiber may be obtained.
Abstract translation:公开了一种光纤,其具有二氧化硅基核,其包含选自K 2 O 2,Na 2 O,LiO 2 O 2的碱金属氧化物, 其中所述核心中的平均浓度为约50-500ppm(重量),所述核心还包含氯和/或 氟,其中所述芯中的氟的平均浓度大于所述芯中的碱金属氧化物的平均浓度,并且所述芯中的平均氯浓度大于所述芯中碱金属氧化物的平均浓度; 以及围绕并直接邻近芯的二氧化硅基包层。 通过适当地选择芯和包层中的碱金属氧化物掺杂剂的浓度,可以获得低损耗光纤。
Abstract:
The invention relates to a synthetic quartz glass that can be produced by direct precipitation by means of flame hydrolysis of a silicon precursor, especially a chlorine-containing silicon precursor, which quartz glass when irradiated with laser pulses at a wavelength of 193 nm at an energy density (H) of up to H=1.5 mJ/cm2 and at a repetition frequency of the laser pulses of up to R=4 kHz is characterized by the following properties: in the range of energy densities of up to 1.5 mJ/cm2, the equilibrium absorption of quartz glass rises sublinearly with the energy density for all repetition frequencies of the laser pulses; the dependency of the equilibrium absorption on the repetition frequency of the laser pulses is sublinear; and the relationship of equilibrium absorption and energy density (H) can be described as a function of H1.7; the H2 content being at least 0.2·1018 molecules/cm3. Other aspects of the invention relate to a process for producing such a synthetic quartz glass.
Abstract translation:本发明涉及一种合成石英玻璃,其可以通过使用硅前体,特别是含氯的硅前体进行火焰水解直接沉淀来制备,该石英玻璃在能量为193nm的激光脉冲下照射时, 高达H = 1.5mJ / cm 2的密度(H)和高达R = 4kHz的激光脉冲的重复频率的特征在于以下特性:在能量密度范围内 高达1.5mJ / cm 2,石英玻璃的平衡吸收与激光脉冲的所有重复频率的能量密度成线性上升; 平衡吸收对激光脉冲重复频率的依赖性是亚线性的; 平衡吸收和能量密度(H)的关系可以描述为H <1.7的函数; H 2含量为至少0.2×10 18分子/ cm 3。 本发明的其它方面涉及一种生产这种合成石英玻璃的方法。
Abstract:
The present invention concerns a quartz glass blank for an optical component for the transmission of ultraviolet radiation of a wave length of 250 nm and under, as well as its utilization in microlithography in connection with ultraviolet radiation of a wavelength of 250 nm and under. Such quartz glass blank is to have low induced absorption, while being optimized in respect of compaction and de-compaction. The quartz glass blank according to the invention has the following properties: A glass structure essentially free of oxygen defect sites; a H2 content in the range of 3×1017 molecules/cm3 to 2.0×1018 molecules/cm3; an OH content in the range of 500 weight ppm to 1000 weight ppm; a SiH group content of less than 2×1017 molecules/cm3; a chlorine content in the range of 60 weight ppm to 120 weight ppm; a refractive index inhomogeneity, Δn, of less than 2 ppm; and a stress birefringence of less than 2 nm/cm. For utilization according to the invention, the quartz glass blank—in respect of its minimum and maximum hydrogen content, CH2min and CH2max, as well as its OH content COH—is in accordance with the scaling laws (2), (3) and (4), and P standing for the pulse number and ε for the energy density: CH2min[molecules/cm3]=1.0×108ε2P , (2) CH2max[molecules/cm3]=2×1019ε, (3) COH[weight ppm]=1700ε[mJ/cm2]0.4±50 . (4)