Defect inspection device and defect inspection method

    公开(公告)号:US12044627B2

    公开(公告)日:2024-07-23

    申请号:US17597319

    申请日:2019-07-24

    Abstract: This defect inspection device for emitting illumination light onto a moving and rotating sample and inspecting for sample defects by scanning the sample in a spiral shape or concentric circle shapes comprises: an illumination and detection unit comprising an emission optical system and a detection optical system; a rotary stage for rotating the sample; a rectilinear stage for rectilinearly moving the rotary stage; and a controller for controlling the illumination and detection unit, rotary stage, and rectilinear stage. On the linear path of the rectilinear stage are a scanning start position where illumination light is emitted onto the sample and scanning is started and a sample delivery position where movement of the sample to the scanning start position starts. When the sample arrives at the scanning start position, the defect inspection device starts emitting the illumination light onto the sample without waiting for the rotation speed of the rotary stage to rise to a specified rotation speed for scanning and raises the rotation speed of the rotary stage to the specified rotation speed while scanning the sample.

    System and method for optical mapping of semiconductor wafers at cryogenic temperatures under transmission geometry

    公开(公告)号:US20240201105A1

    公开(公告)日:2024-06-20

    申请号:US18143257

    申请日:2023-05-04

    Applicant: EPIR, Inc.

    Abstract: A method of contactless, non-destructive contamination-free 2-dimensional mapping of the cutoff wavelength (or bandgap) and the minority carrier lifetime, which is measured through photo-excited excess free carrier absorption decay method, in semiconductor thin film materials and wafers, including typical semiconductor wafers such as Si, Ge, GaAs, and GaSb as well as narrow gap semiconductors such as InSb, type II superlattices (T2SLs) and HgCdTe, at variable temperatures from room temperature down to 2K, utilizing a three-chamber arrangement in which the external chamber and cold chamber are held at ultra-high vacuum and the innermost (sample) chamber is held at cryogenic temperature to cool wafer or thin film samples through gaseous thermal transfer media to cryogenic temperatures down to 1.9 K under pumping. To achieve full-range wafer mapping, the measurement and sensing components for transmitted and reflected light, including infrared probing beam sources, such as long-wavelength infrared lasers, fast HgCdTe detectors, or detector liner or 2-dimensional arrays mounted in liquid nitrogen dewars or thermoelectric (TE)-cooled detector housings, excitation lasers with a wavelength shorter than the bandgap of the sample to be measured, a broadband infrared source with focusing mirror, light grating with mirror and its other accessories including the motion execution and control components, and a linear LWIR array in a liquid nitrogen Dewar, are positioned outside all three chambers and can be moved through a carriage mounting to create the radial component of the mapping motion domain. The rotation of the sample holder is controlled through a drive gear located inside the sample chamber and creates the angular component of the mapping motion domain.

    Waveguide-based detection system with scanning light source
    118.
    发明授权
    Waveguide-based detection system with scanning light source 有权
    具有扫描光源的基于波导的检测系统

    公开(公告)号:US09423397B2

    公开(公告)日:2016-08-23

    申请号:US14194437

    申请日:2014-02-28

    Inventor: Reuven Duer

    Abstract: The invention provides methods and devices for generating optical pulses in one or more waveguides using a spatially scanning light source. A detection system, methods of use thereof and kits for detecting a biologically active analyte molecule are also provided. The system includes a scanning light source, a substrate comprising a plurality of waveguides and a plurality of optical sensing sites in optical communication with one or more waveguide of the substrate, a detector that is coupled to and in optical communication with the substrate, and means for spatially translating a light beam emitted from said scanning light source such that the light beam is coupled to and in optical communication with the waveguides of the substrate at some point along its scanning path. The use of a scanning light source allows the coupling of light into the waveguides of the substrate in a simple and cost-effective manner.

    Abstract translation: 本发明提供了使用空间扫描光源在一个或多个波导中产生光脉冲的方法和装置。 还提供了检测系统,其使用方法和用于检测生物活性分析物分子的试剂盒。 该系统包括扫描光源,包括多个波导的基板和与基板的一个或多个波导光学通信的多个光学感测位置,耦合到基板并与光学连接的检测器,以及装置 用于空间地平移从所述扫描光源发射的光束,使得所述光束在沿其扫描路径的某点处耦合到所述衬底的波导并与所述衬底的波导光通信。 使用扫描光源允许以简单且成本有效的方式将光耦合到衬底的波导中。

    SPECTROSCOPY APPARATUS AND METHODS
    119.
    发明申请
    SPECTROSCOPY APPARATUS AND METHODS 审中-公开
    光谱仪器和方法

    公开(公告)号:US20160238533A1

    公开(公告)日:2016-08-18

    申请号:US15025464

    申请日:2014-09-30

    Applicant: RENISHAW PLC

    Abstract: This invention concerns spectroscopy apparatus comprising a light source arranged to generate a light profile on a sample, a photodetector having at least one photodetector element for detecting characteristic light generated from interaction of the sample with light from the light source, a support for supporting the sample, the support movable relative to the light profile, and a processing unit. The processing unit is arranged to associate a spectral value recorded by the photodetector element at a particular time with a point on the sample predicted to have generated the characteristic light recorded by the photodetector element at the particular time based on relative motion anticipated to have occurred between the support and the light profile.

    Abstract translation: 本发明涉及光谱装置,其包括被配置为在样品上产生光分布的光源,具有至少一个光电探测元件的光电检测器,该光电检测元件用于检测由样品与来自光源的光的相互作用产生的特征光;支撑样品 ,相对于光轮廓可移动的支撑件,以及处理单元。 处理单元被布置为将由特定时间的光电检测器元件记录的光谱值与预测的样品上的点相关联,以在特定时间基于由光电检测器元件记录的特征光,基于预期发生在 支持和光线。

    System and method for determining wear of a worn surface
    120.
    发明授权
    System and method for determining wear of a worn surface 有权
    确定磨损表面磨损的系统和方法

    公开(公告)号:US09404843B2

    公开(公告)日:2016-08-02

    申请号:US14510330

    申请日:2014-10-09

    Abstract: A method of determining wear of a worn surface of a machine component includes providing a scanning device at a distance from the worn surface. The method also includes moving at least one of the scanning device and the worn surface relative to the other and generating a set of data points via the scanning device. Each data point of the set of data points is indicative of a depth of a corresponding point on the worn surface relative to a reference plane. The method further includes determining a maximum depth of the worn surface based on the set of data points and comparing the maximum depth to a reference value to determine a next step in a remanufacturing process of the machine component.

    Abstract translation: 确定机器部件的磨损表面的磨损的方法包括提供距磨损表面一定距离的扫描装置。 该方法还包括相对于另一扫描装置和磨损表面中的至少一个移动并经由扫描装置产生一组数据点。 数据点集合中的每个数据点表示磨损表面上相对于参考平面的对应点的深度。 该方法还包括基于该组数据点确定磨损表面的最大深度,并将最大深度与参考值进行比较,以确定机器部件的再制造过程中的下一步骤。

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