Device for Sterilizing Containers by Way of Charge Carriers
    112.
    发明申请
    Device for Sterilizing Containers by Way of Charge Carriers 有权
    通过充电载体灭菌容器的装置

    公开(公告)号:US20110076187A1

    公开(公告)日:2011-03-31

    申请号:US12995086

    申请日:2009-05-05

    CPC classification number: H01J33/00 A61L2/087 A61L2202/23 B65B55/08 H01J33/04

    Abstract: A device for sterilizing containers may include a treatment head having an outlet window for the passing of charge carriers therethrough, a charge carrier generation source for generating charge carriers, an acceleration device disposed above the outlet window, and a cooling device for cooling the outlet window. The acceleration device accelerates the charge carriers in the direction of the outlet window. The cooling device includes a feed opening for a gaseous medium. The feed opening is disposed beneath the outlet window and directs the gaseous medium at least partially from below to the outlet window.

    Abstract translation: 用于对容器灭菌的装置可以包括具有用于使电荷载体通过的出口窗口的处理头,用于产生电荷载体的电荷载体产生源,设置在出口窗口上方的加速装置,以及用于冷却出口窗口的冷却装置 。 加速装置沿着出口窗的方向加速电荷载体。 冷却装置包括用于气体介质的进料口。 进料开口设置在出口窗口下方,并将气态介质至少部分地从下方引导到出口窗口。

    PULSED ELECTRON SOURCE, POWER SUPPLY METHOD FOR PULSED ELECTRON SOURCE AND METHOD FOR CONTROLLING A PULSED ELECTRON SOURCE
    113.
    发明申请
    PULSED ELECTRON SOURCE, POWER SUPPLY METHOD FOR PULSED ELECTRON SOURCE AND METHOD FOR CONTROLLING A PULSED ELECTRON SOURCE 有权
    脉冲电子源,脉冲电源的电源方法和控制脉冲电源的方法

    公开(公告)号:US20110057566A1

    公开(公告)日:2011-03-10

    申请号:US12812270

    申请日:2009-01-08

    Applicant: Maxime Makarov

    Inventor: Maxime Makarov

    CPC classification number: H01J3/021 H01J33/00 H01S3/0959 H01S3/09707

    Abstract: The invention relates to a pumped electron source (1) that comprises an ionisation chamber (4), an acceleration chamber (2) with an electrode (3) for extracting and accelerating primary ions and forming a secondary-electron beam, characterised in that said pumped electron source (1) comprises a power supply (11) adapted for applying to said electrode (3) a positive voltage for urging a primary plasma (17) outside the acceleration chamber (2), and a negative voltage pulse for extracting and accelerating the primary ions and forming a secondary-electron beam.

    Abstract translation: 本发明涉及一种泵浦电子源(1),其包括电离室(4),具有用于提取和加速初级离子并形成二次电子束的电极(3)的加速室(2),其特征在于所述 抽吸电子源(1)包括适于向所述电极(3)施加用于促使加速室(2)外部的初级等离子体(17)的正电压的电源(11)和用于提取和加速的负电压脉冲 初级离子并形成二次电子束。

    DEVICE AND METHOD OF SUPPLYING POWER TO AN ELECTRON SOURCE, AND ION-BOMBARDMENT-INDUCED SECONDARY-EMISSION ELECTRON SOURCE
    114.
    发明申请
    DEVICE AND METHOD OF SUPPLYING POWER TO AN ELECTRON SOURCE, AND ION-BOMBARDMENT-INDUCED SECONDARY-EMISSION ELECTRON SOURCE 有权
    向电子源供电的设备和方法以及离子轰击诱导的二次发射电子源

    公开(公告)号:US20110057565A1

    公开(公告)日:2011-03-10

    申请号:US12812245

    申请日:2009-01-08

    Applicant: Maxime Makarov

    Inventor: Maxime Makarov

    CPC classification number: H01J3/021 H01J33/00

    Abstract: The power supply device (14) for an ion-bombardment-induced secondary-emission electron source in a low-pressure chamber comprises a control input, two high-voltage outputs, a means for generating a plurality of positive pulses on a high-voltage output, and a means for generating a negative pulse on the other high-voltage output after at least some of the positive pulses.

    Abstract translation: 用于低压室中的离子轰击诱发二次发射电子源的供电装置(14)包括控制输入端,两个高电压输出端,用于在高压电路上产生多个正脉冲的装置 输出,以及用于在至少一些正脉冲之后在另一高压输出上产生负脉冲的装置。

    PARTICLE THERAPY INSTALLATION
    115.
    发明申请
    PARTICLE THERAPY INSTALLATION 审中-公开
    颗粒治疗安装

    公开(公告)号:US20100320404A1

    公开(公告)日:2010-12-23

    申请号:US12918039

    申请日:2009-01-23

    Applicant: Eugene Tanke

    Inventor: Eugene Tanke

    CPC classification number: H01J27/18 A61N2005/1087 H01J33/00

    Abstract: A particle therapy system includes an ECR ion source for production of charged ions, which are accelerated in an accelerator unit that follows the ECR ion source. The accelerator unit accelerates the charged ions to an energy that is used for irradiation, where the magnetic fields of the ECR ion source are matched to operation of the ECR ion source for lightweight ions, such that the ECR ion source is operated in the afterglow mode. In the afterglow mode, an afterglow beam pulse is emitted from the ECR ion source after a microwave resonance pulse has been switched off. The current level of the afterglow beam pulse is higher than a current that is emitted from the ECR ion source during use of the microwave resonance pulse.

    Abstract translation: 颗粒治疗系统包括用于产生带电离子的ECR离子源,其在遵循ECR离子源的加速器单元中加速。 加速器单元将带电离子加速到用于照射的能量,其中ECR离子源的磁场与用于轻质离子的ECR离子源的操作相匹配,使得ECR离子源以余辉模式运行 。 在余辉模式中,在微波共振脉冲被关闭之后,从ECR离子源发射余辉光束脉冲。 余辉光束脉冲的当前电平高于在使用微波谐振脉冲期间从ECR离子源发射的电流。

    Electron gun with a focusing anode, forming a window for said gun and application thereof to irradiation and sterilization
    116.
    发明授权
    Electron gun with a focusing anode, forming a window for said gun and application thereof to irradiation and sterilization 失效
    具有聚焦阳极的电子枪,形成所述枪的窗口并将其应用于照射和灭菌

    公开(公告)号:US07800012B2

    公开(公告)日:2010-09-21

    申请号:US10576034

    申请日:2004-10-19

    CPC classification number: A61L2/087 A61L2202/23 G21K5/04 H01J33/00

    Abstract: An electron gun includes a sealed chamber under vacuum. A cathode having an emitting face is placed inside the chamber. An anode forms a sealed window, formed facing the emitting face in one of the walls of the chamber. The anode is capable of allowing electrons emitted by the emitting face to pass through. A biasing apparatus sets up a voltage between the anode and the cathode, capable of accelerating these electrons towards the anode, the electrons thus accelerated forming a beam that passes through the anode. The anode and the emitting face each have a curvature, the curvature of the anode making it capable of resisting a pressure difference between the inside and the outside of the chamber and being designed to cooperate with the curvature of the emitting face to focus the electron beam outside the chamber.

    Abstract translation: 电子枪包括真空下的密封室。 具有发射面的阴极被放置在室内。 阳极形成密封的窗口,其形成为面对腔室的一个壁中的发射面。 阳极能够允许由发射面发射的电子通过。 偏置装置在阳极和阴极之间建立电压,能够将这些电子加速到阳极,因此电子加速形成穿过阳极的光束。 阳极和发射面各自具有曲率,阳极的曲率使得其能够抵抗室的内部和外部之间的压力差,并被设计成与发射面的曲率配合以聚焦电子束 在室外。

    High-Dose X-Ray Tube
    117.
    发明申请
    High-Dose X-Ray Tube 审中-公开
    高剂量X射线管

    公开(公告)号:US20080267354A1

    公开(公告)日:2008-10-30

    申请号:US11596693

    申请日:2004-05-19

    Abstract: The invention relates to an X-ray tube (11) with a cathode that emits electrons (e−) into an interior chamber (40) that is under vacuum, and with a target (31, 32), configured as an anode, for generating high-dose X-radiation (γ), the cathode comprising at least one cold cathode (21, 22, 23) based on an electron (e−) emitting material having a field-enhancing structure (70). The invention especially relates to an X-ray tube (11) having a cold cathode (21, 22, 23) that comprises at least one support layer (201) for holding the electron (e−) emitting material, the emission area of the cold cathode (21, 22, 23) being defined by the shape of the support layer (201).

    Abstract translation: 本发明涉及一种具有阴极的X射线管(11),该阴极将电子(e-)发射到处于真空状态的内部腔室(40)内,并且与靶(31,32)配置为阳极,用于 产生高剂量X射线(γ),所述阴极包括基于具有场增强结构(70)的电子(e-)发射材料的至少一个冷阴极(21,22,23)。 本发明特别涉及一种具有冷阴极(21,22,23)的X射线管(11),该冷阴极包括用于保持电子(e-)发射材料的至少一个支撑层(201),该发射区域 冷阴极(21,22,23)由支撑层(201)的形状限定。

    Particle beam processing apparatus and materials treatable using the apparatus
    118.
    发明授权
    Particle beam processing apparatus and materials treatable using the apparatus 有权
    使用该设备可处理的粒子束处理设备和材料

    公开(公告)号:US07026635B2

    公开(公告)日:2006-04-11

    申请号:US10631678

    申请日:2003-07-31

    Abstract: Methods, and materials made by the methods, are provided herein for treating materials with a particle beam processing device. According to one illustrative embodiment, a method for treating a material with a particle beam processing device is provided that includes: providing a particle beam generating assembly including at least one filament for creating a plurality of particles; applying an operating voltage greater than about 110 kV to the filament to create the plurality of particles; causing the plurality of particles to pass through a thin foil having a thickness of about 10 microns or less; and treating a material with the plurality of particles.

    Abstract translation: 本文提供了通过方法制备的方法和材料,用于使用粒子束处理装置处理材料。 根据一个示例性实施例,提供了一种用粒子束处理装置处理材料的方法,其包括:提供粒子束产生组件,其包括用于产生多个颗粒的至少一个细丝; 向灯丝施加大于约110kV的工作电压以产生多个颗粒; 使多个颗粒通过厚度为约10微米或更小的薄箔; 以及用多个颗粒处理材料。

    Electron irradiation system
    119.
    发明申请
    Electron irradiation system 审中-公开
    电子辐射系统

    公开(公告)号:US20050012051A1

    公开(公告)日:2005-01-20

    申请号:US10694440

    申请日:2003-10-28

    Abstract: Device for irradiation of at least one article/product by means of beams, especially by means of high-energy electron beams which can be produced in an irradiation system, the beams emerging from the electron accelerator in a radiation area, comprises at least one scanner means (54) which defines the radiation area (56), the radiation area (56) being formed spaced apart from the scanner means (54) in at least one plane (En) in which there is at least one transport means (TEn), and by means of which at least one bar-shaped/pipe-shaped article (Gr) and/or other articles (Gn) can be moved into the irradiation position.

    Abstract translation: 用于通过光束照射至少一个物品/产品的装置,特别是通过能够在照射系统中产生的高能电子束,在辐射区域中从电子加速器出射的光束包括至少一个扫描器 限定辐射区域(56)的装置(54),辐射区域(56)在至少一个平面(En)中与扫描器装置(54)隔开形成,其中存在至少一个传送装置(TEn) ,并且借助于其可以将至少一个条形/管状制品(Gr)和/或其它制品(Gn)移动到照射位置。

    Electron beam measurement method and electron beam irradiation processing device
    120.
    发明授权
    Electron beam measurement method and electron beam irradiation processing device 有权
    电子束测量方法和电子束照射处理装置

    公开(公告)号:US06657212B2

    公开(公告)日:2003-12-02

    申请号:US09725270

    申请日:2000-11-29

    CPC classification number: G01R19/0061 H01J7/44 H01J33/00

    Abstract: An electron beam irradiation processing device including an electron beam tube and a current detection unit disposed outside of the window of the electron beam tube. The electron beam tube is adapted to radiate electron beams and has a window and an associated power-source unit that provides a power source. The current detection unit includes at least one of a conductor and a semiconductor covered by an insulating film, and an electron beam level measurement unit having a current measurement unit that measures the current flowing through the current detection unit. The amount of electron beams output from the electron beam tube is controlled by controlling the power-source unit as a function of the current flowing through the current detection unit. In addition, a method of measuring amount of electron beams radiated from an electron beam tube with a window including the steps of providing a current detection unit and measuring amount of electron beams radiated from the electron beam tube by measuring the current flowing through the current detection unit.

    Abstract translation: 一种电子束照射处理装置,包括设置在电子束管的窗口外的电子束管和电流检测单元。 电子束管适于辐射电子束,并具有提供电源的窗口和相关联的电源单元。 电流检测单元包括由绝缘膜覆盖的导体和半导体中的至少一个,以及电子束电平测量单元,其具有测量流过电流检测单元的电流的电流测量单元。 通过控制电源单元作为流过电流检测单元的电流的函数来控制从电子束管输出的电子束的量。 另外,测量从具有窗口的电子束管辐射的电子束量的方法,包括以下步骤:通过测量流过电流检测的电流来提供电流检测单元和测量从电子束管辐射的电子束的量 单元。

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