Gas discharge chamber
    122.
    发明授权
    Gas discharge chamber 有权
    气体放电室

    公开(公告)号:US08855167B2

    公开(公告)日:2014-10-07

    申请号:US13931840

    申请日:2013-06-29

    Abstract: A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a axis and a axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their axis.

    Abstract translation: 使用减少由于机械应力(窗口保持器和激光气体压力)的破裂的氟化钙晶体,来自光吸收等的热应力的气体放电室增加了输出激光器的线性极化的程度,并抑制了劣化 由于强紫外线(特别是ArF)激光照射。 气体放电室的第一窗口(2)和第二窗口(3)具有与其氟化钙晶体的(111)晶面平行的入射面和发射平面。 关于进入氟化钙晶体的激光通过包括第一窗口(2)和第二窗口(3)中的每一个的<111>轴和<001>轴的平面的布置,从内侧看 室(1),第一窗口(2)和第二窗口(3)被布置在围绕其<111>轴线沿相同方向旋转相同角度的位置。

    Solid-state laser apparatus and laser system
    123.
    发明授权
    Solid-state laser apparatus and laser system 有权
    固态激光装置和激光系统

    公开(公告)号:US08625645B2

    公开(公告)日:2014-01-07

    申请号:US13671657

    申请日:2012-11-08

    Abstract: A solid-state laser apparatus may include: a master oscillator configured to output laser light having at least one longitudinal mode, the master oscillator being capable of changing the spectral linewidth of the laser light output therefrom; at least one amplifier located downstream of the master oscillator on an optical path; a wavelength converter located downstream of the amplifier on the optical path; a detector configured to detect the spectrum of the laser light; and a controller configured to control the spectral linewidth of the laser light output from the master oscillator based on a detection result of the detector.

    Abstract translation: 固态激光装置可以包括:主振荡器,被配置为输出具有至少一个纵向模式的激光,所述主振荡器能够改变从其输出的激光的谱线宽度; 位于主振荡器的下游的至少一个放大器在光路上; 位于光路上的放大器下游的波长转换器; 检测器,被配置为检测激光的光谱; 以及控制器,被配置为基于检测器的检测结果来控制从主振荡器输出的激光的谱线宽度。

    Extreme ultraviolet light source apparatus and method of generating ultraviolet light
    124.
    发明授权
    Extreme ultraviolet light source apparatus and method of generating ultraviolet light 有权
    极紫外光源装置和产生紫外光的方法

    公开(公告)号:US08604453B2

    公开(公告)日:2013-12-10

    申请号:US13904731

    申请日:2013-05-29

    CPC classification number: G21K5/00 G03F7/70033 H05G2/00 H05G2/003 H05G2/008

    Abstract: An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

    Abstract translation: 一种极紫外光源装置,其特征在于,所述极紫外光源装置包括:前脉冲激光光源,其产生前脉冲激光光源,所述极紫外光源装置包括:前脉冲激光光源,其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶, 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体,在与目标区域不同的区域产生预等离子体,不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。

    LASER APPARATUS
    125.
    发明申请
    LASER APPARATUS 有权
    激光装置

    公开(公告)号:US20130315270A1

    公开(公告)日:2013-11-28

    申请号:US13895524

    申请日:2013-05-16

    Abstract: A laser apparatus may include an optical resonator, a laser chamber, an optical loss adjustment mechanism, and a spectral line width adjustment mechanism. The optical resonator includes a mirror configured to reflect a part of light and a grating. The laser chamber is provided in the optical resonator and contains a laser gain medium, configured to emit a laser beam. The optical loss adjustment mechanism is provided in the optical resonator and configured to adjust an optical loss of the laser beam. The spectral line width adjustment mechanism is provided in the optical resonator and configured to adjust a spectral line width of the laser beam.

    Abstract translation: 激光装置可以包括光学谐振器,激光室,光学损失调整机构和光谱线宽度调节机构。 光学谐振器包括被配置为反射一部分光和光栅的反射镜。 激光室设置在光学谐振器中并且包含被配置为发射激光束的激光增益介质。 光损耗调整机构设置在光谐振器中并且被配置为调整激光束的光损失。 光谱线宽度调节机构设置在光学谐振器中并且被配置为调整激光束的谱线宽度。

    TARGET SUPPLY DEVICE
    126.
    发明申请
    TARGET SUPPLY DEVICE 有权
    目标供应装置

    公开(公告)号:US20130240645A1

    公开(公告)日:2013-09-19

    申请号:US13715897

    申请日:2012-12-14

    Applicant: GIGAPHOTON INC

    CPC classification number: B65D47/06 H05G2/005 H05G2/006

    Abstract: A target supply device may include a tank formed cylindrically with a first material, a cylindrical portion for covering the tank, the cylindrical portion being formed of a second material having higher tensile strength than the first material, a first lid formed of the second material and having a through-hole, the first lid being provided at one end in an axial direction of the cylindrical portion, a second lid formed of the second material and provided at another end opposite the one end in the axial direction of the cylindrical portion, and a nozzle provided to be in fluid communication with the interior of the tank and to pass through the through-hole, the nozzle being formed of the first material.

    Abstract translation: 目标供给装置可以包括:具有第一材料的圆柱形的罐,用于覆盖罐的圆柱形部分,圆柱形部分由具有比第一材料更高的拉伸强度的第二材料形成,第一盖由第二材料形成, 具有通孔,所述第一盖设置在所述圆筒部的轴向的一端,所述第二盖由所述第二材料形成,并且设置在所述圆筒部的轴向的一端的相反侧的另一端,以及 喷嘴,其设置成与所述罐的内部流体连通并且穿过所述通孔,所述喷嘴由所述第一材料形成。

    Laser device and electronic device manufacturing method

    公开(公告)号:US12300962B2

    公开(公告)日:2025-05-13

    申请号:US18177088

    申请日:2023-03-01

    Abstract: A laser device includes a first actuator configured to adjust an oscillation wavelength of pulse laser light; a second actuator configured to adjust a spectral line width of the pulse laser light; and a processor configured to determine a target spectral line width by reading data specifying a number of irradiation pulses of the pulse laser light with which one location of an irradiation receiving object is irradiated and a difference between a shortest wavelength and a longest wavelength, control the second actuator based on the target spectral line width, and control the first actuator so that the oscillation wavelength periodically changes every number of the irradiation pulses between the shortest wavelength and the longest wavelength.

    Laser system and electronic device manufacturing method

    公开(公告)号:US12160085B2

    公开(公告)日:2024-12-03

    申请号:US17220993

    申请日:2021-04-02

    Abstract: A laser system according to one aspect of the present disclosure includes a wavelength-variable first solid-state laser device configured to output a first pulse laser beam; a wavelength conversion system including a first nonlinear crystal configured to wavelength-convert the first pulse laser beam and a first rotation stage configured to change a first incident angle of the first pulse laser beam on the first nonlinear crystal; an excimer amplifier configured to amplify a pulse laser beam wavelength-converted by the wavelength conversion system; and a control unit configured to receive, from an external device, data of a target center wavelength of an excimer laser beam output from the excimer amplifier, control a wavelength of the first pulse laser beam in accordance with the instructed target center wavelength, and control the first incident angle on the first nonlinear crystal in accordance with an average value of the target center wavelength.

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