公开(公告)号：US11822255B2

公开(公告)日：2023-11-21

申请号：US17389842

申请日：2021-07-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Slachter ,  Stefan Hunsche ,  Wim Tjibbo Tel ,  Anton Bernhard Van Oosten ,  Koenraad Van Ingen Schenau ,  Gijsbert Rispens ,  Brennan Peterson

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70633 ,  G03F7/705 ,  G03F7/70558 ,  G03F7/70625

Abstract: A method including obtaining (i) measurements of a parameter of the feature, (ii) data related to a process variable of a patterning process, (iii) a functional behavior of the parameter defined as a function of the process variable based on the measurements of the parameter and the data related to the process variable, (iv) measurements of a failure rate of the feature, and (v) a probability density function of the process variable for a setting of the process variable, converting the probability density function of the process variable to a probability density function of the parameter based on a conversion function, where the conversion function is determined based on the function of the process variable, and determining a parameter limit of the parameter based on the probability density function of the parameter and the measurements of the failure rate.

公开(公告)号：US11821859B2

公开(公告)日：2023-11-21

申请号：US17559950

申请日：2021-12-22

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco Wieland ,  Albertus Victor Gerardus Mangnus

IPC: G01N23/2251 ,  G01N23/203 ,  H01J37/10 ,  H01J37/244

CPC classification number: G01N23/2251 ,  G01N23/203 ,  H01J37/10 ,  H01J37/244

Abstract: The embodiments of the present disclosure provide various techniques for detecting backscatter charged particles, including accelerating charged particle sub-beams along sub-beam paths to a sample, repelling secondary charged particles from detector arrays, and providing devices and detectors which can switch between modes for primarily detecting charged particles and modes for primarily detecting secondary particles.

公开(公告)号：US20230367224A1

公开(公告)日：2023-11-16

申请号：US18225439

申请日：2023-07-24

Applicant: ASML Netherlands B.V.

Inventor： Hrishikesh PATEL ,  Yue MA ,  Günes MAKIBOGLU ,  Albert Pieter RIJPMA ,  Antonius Johannus VAN DER NET ,  Rens Henricus VERHEES ,  Zongquan YANG

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

Abstract: A radiation source includes a fuel supply, a collector, a debris mitigation system, and a temperature control system. The fuel supply device supplies fuel. The excitation device excites the fuel into a plasma. The collector collects radiation emitted by the plasma and directs the radiation to a beam exit. The debris mitigation system collects debris generated by the plasma and has a first component having a first conduit passing therethrough and a second component having a second conduit passing therethrough. The temperature control system increases or decreases temperatures of the first component and the second component by selectively heating or cooling a thermal transfer fluid circulating through the respective conduit. The temperature control system cools the first component to a first temperature that is below the melting point of the fuel and heats the second component to a second temperature that is above the melting point of the fuel.

公开(公告)号：US11808930B2

公开(公告)日：2023-11-07

申请号：US16650862

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: G02B21/02 ,  G02B9/00 ,  G02B13/18 ,  H01J37/22 ,  H01J37/28 ,  G09B9/10 ,  G01N23/2251

CPC classification number: G02B21/02 ,  G02B9/00 ,  G02B13/18 ,  G09B9/10 ,  H01J37/226 ,  H01J37/28 ,  G01N23/2251 ,  H01J2237/26 ,  H01J2237/2802

Abstract: An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive power.

公开(公告)号：US20230350301A1

公开(公告)日：2023-11-02

申请号：US17800649

申请日：2021-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Evgenia KURGANOVA ,  Gosse Charles DE VRIES ,  Alexey Olegovich POLYAKOV ,  Jim Vincent OVERKAMP ,  Teis Johan COENEN ,  Tamara DRUZHININA ,  Sonia CASTELLANOS ORTEGA ,  Olivier Christian Maurice LUGIER

IPC: G03F7/16 ,  G03F7/36 ,  H01L21/027

CPC classification number: G03F7/167 ,  G03F7/36 ,  H01L21/027

Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process material. A selected portion of the layer of deposition-process material is irradiated to modify the deposition-process material in the selected portion.

公开(公告)号：US20230335366A1

公开(公告)日：2023-10-19

申请号：US18213229

申请日：2023-06-22

Applicant: ASML Netherlands B.V.

Inventor： Alexander Hendrik Vincent VAN VEEN ,  Derk Ferdinand WALVOORT

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0437

Abstract: The invention relates to an exposure apparatus and a method for projecting a charged particle beam onto a target. The exposure apparatus comprises a charged particle optical arrangement comprising a charged particle source for generating a charged particle beam and a charged particle blocking element and/or a current limiting element for blocking at least a part of a charged particle beam from a charged particle source. The charged particle blocking element and the current limiting element comprise a substantially flat substrate provided with an absorbing layer comprising Boron, Carbon or Beryllium. The substrate further preferably comprises one or more apertures for transmitting charged particles. The absorbing layer is arranged spaced apart from the at least one aperture.

公开(公告)号：US20230334217A1

公开(公告)日：2023-10-19

申请号：US18206029

申请日：2023-06-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Chrysostomos BATISTAKIS ,  Roger Josef Maria JEURISSEN ,  Koen Gerhardus WINKELS

IPC: G03F7/20 ,  G06F30/3308 ,  G06F30/398 ,  G06F30/28

CPC classification number: G06F30/398 ,  G03F7/705 ,  G06F30/28 ,  G06F30/3308 ,  G03F7/70625 ,  G06F2119/18

Abstract: A method for determining a deformation of a resist in a patterning process. The method involves obtaining a resist deformation model of a resist having a pattern, the resist deformation model configured to simulate a fluid flow of the resist due to capillary forces acting on a contour of at least one feature of the pattern; and determining, via the resist deformation model, a deformation of a resist pattern to be developed based on an input pattern to the resist deformation model.

公开(公告)号：US20230333480A1

公开(公告)日：2023-10-19

申请号：US18028982

申请日：2021-11-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Christianus Wilhelmus Johannes BERENDSEN ,  Theodorus Wilhelmus POLET ,  Erik Henricus Egidius Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Koen CUYPERS

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70858

Abstract: A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus so that a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system including a replaceable plate with an outer surface that includes a plurality of fluid openings configured for supply and/or extraction of immersion liquid and/or gas in a channel between the fluid handling system and the substrate, wherein the outer surface is coated.

公开(公告)号：US11791132B2

公开(公告)日：2023-10-17

申请号：US16830204

申请日：2020-03-25

Applicant: ASML Netherlands B.V.

Inventor： Albertus Victor Gerardus Mangnus ,  Maikel Robert Goosen ,  Erwin Paul Smakman

IPC: H01J37/317 ,  H01J37/24 ,  H01J37/244 ,  H01J37/304

CPC classification number: H01J37/3177 ,  H01J37/243 ,  H01J37/244 ,  H01J37/3045 ,  H01J2237/0435

Abstract: Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.

公开(公告)号：US11782351B2

公开(公告)日：2023-10-10

申请号：US17636830

申请日：2020-07-15

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70275 ,  G03F7/70625 ,  G03F7/70641

Abstract: Disclosed is a detection apparatus for a metrology device operable to measure a parameter of interest from scattered radiation having been scattered from a sample. The detection device comprises a detector comprising an array of pixels. The array of pixels comprises imaging pixels for detecting an image from which the parameter of interest is determined, and direction detecting pixels for detecting the angle of incidence of said scattered radiation on said detector.