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    Micromachined capillary electrophoresis device
    131.
    发明授权
    Micromachined capillary electrophoresis device 失效
    微加工毛细管电泳装置

    公开(公告)号：US5824204A

    公开(公告)日：1998-10-20

    申请号：US671428

    申请日：1996-06-27

    Applicant: John H. Jerman

    Inventor： John H. Jerman

    IPC: B81B1/00 ,  B81C1/00 ,  G01N27/447 ,  G01N27/26

    CPC classification number: B81C1/00119 ,  G01N27/44791 ,  B81B2201/058 ,  B81B2203/0338 ,  B81B2203/0353 ,  B81C2201/014 ,  B81C2203/031

    Abstract: A micromachined structure for handling fluids with an applied high voltage, i.e. for electrophoresis, includes a glass or other highly insulative substrate on which are formed very small diameter capillary channels of e.g. silicon nitride. Due to the absence of a silicon substrate, this structure is highly electrically insulative. The silicon nitride channels are formed by a micro-machining and etch process, so that they are initially defined in an etched sacrificial silicon wafer by conformal coating of etched features in the silicon wafer with a silicon nitride layer, which is then patterned to define the desired channels. The silicon wafer is bonded to the glass substrate and the bulk of the silicon wafer is sacrificially etched away, leaving the desired silicon nitride channels with supporting silicon mesas. The remaining silicon nitride "shell" is bonded to the glass substrate and substantially duplicates the etched features in the original silicon wafer. The capillary channels are of a material such as low stress silicon nitride and there is no electrical shorting path to the highly insulative glass substrate.

    Abstract translation: 用于处理具有施加的高电压（即电泳）的流体的微加工结构包括玻璃或其它高度绝缘的基底，其上形成非常小直径的毛细管通道。 氮化硅。 由于没有硅衬底，这种结构是高度电绝缘的。 通过微加工和蚀刻工艺形成氮化硅沟道，使得它们最初在蚀刻的牺牲硅晶片中通过在氮化硅层中对硅晶片中的蚀刻特征进行保形涂覆来限定，该氮化硅层被图案化以限定 所需渠道。 将硅晶片结合到玻璃基板上，并将硅晶片的大部分牺牲蚀刻掉，留下所需的具有支撑硅台面的氮化硅沟道。 剩余的氮化硅“壳”结合到玻璃基板上，并且基本上复制了原始硅晶片中的蚀刻特征。 毛细通道是诸如低应力氮化硅的材料，并且没有到高绝缘性玻璃基板的电短路。

    Extremal microstructured surfaces
    132.
    发明授权
    Extremal microstructured surfaces 有权

    公开(公告)号：US12060261B2

    公开(公告)日：2024-08-13

    申请号：US16676293

    申请日：2019-11-06

    Applicant: BVW Holding AG

    Inventor： Lukas Bluecher ,  Michael Milbocker

    IPC: B81B1/00

    CPC classification number: B81B1/002 ,  B81B2201/058 ,  B81B2203/0307 ,  B81B2203/0353 ,  B81B2203/0361

    Abstract: The present application relates to multifunctional hierarchically microstructured surfaces and three-dimensional anchored interfacial domain structures. The multifunctional properties are extremal. In one aspect the microstructured surfaces may be super-adhesive. Examples of super-adhesive mechanisms may include gas trapping, fluid trapping, and solid wrinkle trapping. In another aspect the micro structured surfaces may be nearly adhesive-less. Examples of adhesive-less mechanisms may include inter-solid surface lubrication, energy conserving fluid flows, and super-low drag phase-phase lateral displacement. The extremal structures may be obtained by anchoring mechanisms. Examples of anchoring mechanisms may include Wenzel-Cassie formation, contact angle confusion, and capillary effects.

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