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    SYNTHETIC SILICA GLASS TUBE FOR THE PRODUCTION OF A PREFORM
    131.
    发明申请
    SYNTHETIC SILICA GLASS TUBE FOR THE PRODUCTION OF A PREFORM 审中-公开
    合成二氧化硅玻璃管用于生产预制物

    公开(公告)号：US20100260949A1

    公开(公告)日：2010-10-14

    申请号：US12820001

    申请日：2010-06-21

    Applicant: Oliver Ganz ,  Ralph Sattmann ,  Jan Vydra

    Inventor： Oliver Ganz ,  Ralph Sattmann ,  Jan Vydra

    IPC: B32B1/08 ,  C03C15/00

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B37/0124 ,  C03B37/01892 ,  C03B2201/04 ,  C03B2201/075 ,  Y10T428/13

    Abstract: Known synthetic quartz glass tubes for the production of a preform have an inner bore with a surface layer produced without using tools in the molten state and an inner zone. The aim of the invention is to provide a tube which does not release any OH groups to the surroundings. For this purpose, the surface layer (30) has a thickness of 10 μm and an average OH content of not more than 5 ppm by weight and an average surface roughness Ra of not more than 0.1 μm. The inner zone (34) that starts on the surface layer (30) and terminates 10 μm before the outer wall has an average OH content of not more than 0.2 ppm by weight. A simple and inexpensive method for producing a quartz tube of the above type is to continuously draw a tube strand from a softened quartz glass mass in a vertical drawing process. A scavenging gas is circulated through the inner bore of the tube, said gas having a water content of less than 100 ppb per weight. The front end of the tube strand (19) is closed by a flow obstacle (26) that is permeable the scavenging gas and that reduces the amount of scavenging gas (23) flowing through.

    Abstract translation: 用于生产预成型件的已知的合成石英玻璃管具有内孔，其具有在不使用处于熔融状态的工具和内部区域的情况下制备的表面层。 本发明的目的是提供一种不会向周围释放任何OH基团的管。 为此，表面层（30）的厚度为10μm，平均OH含量为5重量ppm以下，平均表面粗糙度Ra为0.1μm以下。 在表层（30）上开始并在外壁之前终止10μm的内部区域（34）具有不大于0.2重量ppm的平均OH含量。 用于生产上述类型的石英管的简单和便宜的方法是在垂直拉伸过程中连续地从软化的石英玻璃块抽取管束。 清除气体通过管的内孔循环，所述气体的含水量小于100ppb /重量。 管股（19）的前端由能够吸收清除气体的流动障碍物（26）封闭，并减少流过的清除气体（23）的量。

    Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component
    134.
    发明申请
    Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component 有权
    用于制造具有增强的耐辐射性的合成石英玻璃的光学部件的制造方法和用于制造该部件的坯料

    公开(公告)号：US20090004088A1

    公开(公告)日：2009-01-01

    申请号：US12148338

    申请日：2008-04-18

    Applicant: Bodo Kuehn ,  Steffen Kaiser ,  Denis Kassube ,  Kerstin Merget

    Inventor： Bodo Kuehn ,  Steffen Kaiser ,  Denis Kassube ,  Kerstin Merget

    IPC: C01B33/12 ,  C03B25/00

    CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/52 ,  Y02P40/57

    Abstract: To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C. lower than the high mean value of the fictive temperature according to method step (b).

    Abstract translation: 为了优化合成石英玻璃的光学部件，在石英玻璃坯料进行多段退火处理的情况下，关于压实和中心双折射，本发明提出了一种方法，包括以下步骤：（a） 第一处理阶段，其中在1130℃和1240℃之间的较高温度范围内处理石英玻璃坯料，（b）以第一高平均冷却速率将石英玻璃坯料冷却至低于1100℃的淬火温度 在石英玻璃中达到1100℃或更高平均值的假想温度，（c）第二处理阶段，其包括以第二低平均冷却速度冷却石英玻璃坯料 ，其中在950℃至1100℃的较低温度范围内处理石英玻璃坯料，使得石英玻璃中具有低至少50℃的低平均值的假想温度降低 比平均值高 根据方法步骤（b）的假想温度。

    Synthetic silica glass tube for the production of a preform, method for producing the same in a vertical drawing process and use of said tube
    136.
    发明申请
    Synthetic silica glass tube for the production of a preform, method for producing the same in a vertical drawing process and use of said tube 审中-公开
    用于生产预成型件的合成石英玻璃管，用于在垂直拉伸工艺中制造其的方法和所述管的使用

    公开(公告)号：US20060191294A1

    公开(公告)日：2006-08-31

    申请号：US10550049

    申请日：2004-03-19

    Applicant: Oliver Ganz ,  Ralph Sattmann ,  Jan Vydra

    Inventor： Oliver Ganz ,  Ralph Sattmann ,  Jan Vydra

    IPC: C03B37/025 ,  C03B37/02

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B37/0124 ,  C03B37/01892 ,  C03B2201/04 ,  C03B2201/075 ,  Y10T428/13

    Abstract: Known synthetic quartz glass tubes for the production of a preform have an inner bore with a surface layer produced without using tools in the molten state and an inner zone. The aim of the invention is to provide a tube which does not release any OH groups to the surroundings. For this purpose, the surface layer (30) has a thickness of 10 μm and an average OH content of not more than 5 ppm by weight and an average surface roughness Ra of not more than 0.1 μm. The inner zone (34) that starts on the surface layer (30) and terminates 10 μm before the outer wall has an average OH content of not more than 0.2 ppm by weight. A simple and inexpensive method for producing a quartz tube of the above type is to continuously draw a tube strand from a softened quartz glass mass in a vertical drawing process. A scavenging gas is circulated through the inner bore of the tube, said gas having a water content of less than 100 ppb per weight. The front end of the tube strand (19) is closed by a flow obstacle (26) that is permeable the scavenging gas and that reduces the amount of scavenging gas (23) flowing through.

    Abstract translation: 用于生产预成型件的已知的合成石英玻璃管具有内孔，其具有在不使用处于熔融状态的工具和内部区域的情况下制备的表面层。 本发明的目的是提供一种不会向周围释放任何OH基团的管。 为此，表面层（30）的厚度为10μm，平均OH含量为5重量ppm以下，平均表面粗糙度R a a为0.1μm以下。 在表层（30）之前开始并在外壁具有不大于0.2重量ppm的平均OH含量之前终止10um的内部区域（34）。 用于生产上述类型的石英管的简单和便宜的方法是在垂直拉伸过程中连续地从软化的石英玻璃块抽取管束。 清除气体通过管的内孔循环，所述气体的含水量小于100ppb /重量。 管股（19）的前端由能够吸收清除气体的流动障碍物（26）封闭，并减少流过的清除气体（23）的量。

    Synthetic quartz glass
    139.
    发明申请
    Synthetic quartz glass 审中-公开
    合成石英玻璃

    公开(公告)号：US20050176572A1

    公开(公告)日：2005-08-11

    申请号：US10509029

    申请日：2003-03-26

    Applicant: Hideo Hosono ,  Kouichi Kajihara ,  Masahiro Hirano ,  Yoshiaki Ikuta ,  Shinya Kikukawa

    Inventor： Hideo Hosono ,  Kouichi Kajihara ,  Masahiro Hirano ,  Yoshiaki Ikuta ,  Shinya Kikukawa

    IPC: C03B20/00 ,  C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C23/00 ,  G02B1/02 ,  G03F7/20

    CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/21 ,  C03C3/06 ,  C03C23/0025 ,  C03C2201/21 ,  C03C2203/40 ,  C03C2203/50 ,  G02B1/02 ,  Y02P40/57

    Abstract: Disclosed is a synthetic silica glass for use with light having a wavelength of 150 to 200 nm, which has an OH group at a concentration of less than 1 ppm, an oxygen-excess type defect at a concentration of 1×1016 defects/cm3 or less, a hydrogen molecule at a concentration of less than 1×1017 molecules/cm3, and a non-bridging oxygen radical at a concentration of 1×1016 radicals/cm3 or less in the state after the synthetic silica glass is irradiated with light of a xenon excimer lamp having an energy density of 10 mW/cm2 and 3 kJ/cm2 or with light of an F2 laser by 107 pulses at an energy density of 10 mJ/cm2/pulse. The synthetic silica glass can exhibit excellent resistance to ultraviolet light with a wavelength of 150 to 190 nm when incorporated in a device using ultraviolet light with a wavelength of 150 to 190 nm as a light source.

    Abstract translation: 公开了一种合成石英玻璃，其用于波长为150至200nm的光，其具有浓度小于1ppm的OH基，浓度为1×10 16的氧过量型缺陷， SUP>缺陷/ cm 3以下，浓度小于1×10 17分子/ cm 3的氢分子， 在合成石英玻璃用具有能量密度的氙准分子灯的光照射之后的状态下，以1×10 16个/ cm 3以下的浓度桥接氧自由基 10mW / cm 2和3kJ / cm 2的光，或者具有10 2激光的光的10 / >脉冲，能量密度为10mJ / cm 2 /脉冲。 合成石英玻璃当掺入使用波长为150〜190nm的紫外光的装置中作为光源时，可以表现出优异的抗紫外线，波长为150〜190nm。

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