公开(公告)号：US20060017051A1

公开(公告)日：2006-01-26

申请号：US11186879

申请日：2005-07-22

Applicant: Tadahiro Asaishi

Inventor： Tadahiro Asaishi

IPC: H01L23/58

CPC classification number: G01J1/429 ,  G01J1/04 ,  G01J1/044 ,  G01J1/0448 ,  G01J1/0462 ,  G01J1/08 ,  G01J1/1626 ,  G03F7/7085

Abstract: Disclosed is an apparatus that includes an output unit having a photoelectric converting element, for producing a signal corresponding to light incident on the photoelectric converting element, a restricting unit for restricting a light receiving region of the photoelectric converting element to one of a first region and a second region, and a calculating unit for calculating a sensitivity of the first region, on the basis of an output signal related to the first region and obtainable through cooperation of the output unit and the restricting unit, and of an output signal related to the second region and obtainable through cooperation of the output unit and the restricting unit.

Abstract translation: 公开了一种装置，包括具有光电转换元件的输出单元，用于产生与入射在光电转换元件上的光相对应的信号;限制单元，用于将光电转换元件的光接收区域限制在第一区域中的一个区域和 第二区域和计算单元，用于基于与第一区域有关的输出信号，通过输出单元和限制单元的协作来获得第一区域的灵敏度，以及与第一区域相关的输出信号， 第二区域，并且可通过输出单元和限制单元的协作获得。

公开(公告)号：US20060016999A1

公开(公告)日：2006-01-26

申请号：US10899702

申请日：2004-07-26

Applicant: Jiann-Der Lee ,  Chang-Bor Liao ,  Tsan-mu Kuo

Inventor： Jiann-Der Lee ,  Chang-Bor Liao ,  Tsan-mu Kuo

IPC: G01J1/42

CPC classification number: G01J1/429

Abstract: An apparatus for displaying the necessary suntan lotion and the skin care includes a UVA sensor and a UVB sensor respectively electrically connected to an operational amplifier that is electrically connected to a micro-processor for transmitting signal to the micro-processor. A UVA/UVB selector and a skin property selector are respectively electrically connected to the micro-processor for providing a calculating factor to the micro-processor. A series of LED is electrically connected to the micro-processor for showing the suggests from the micro-processor. A speaker is electrically connected to the micro-processor for reminding the user to select a suitable suntan lotion.

Abstract translation: 用于显示必要的防晒霜和皮肤护理的装置包括UVA传感器和UVB传感器，UVA传感器和UVB传感器分别电连接到电连接到微处理器的运算放大器，用于将信号传输到微处理器。 UVA / UVB选择器和皮肤特性选择器分别电连接到微处理器，以向微处理器提供计算因子。 一系列LED电连接到微处理器，用于显示微处理器的建议。 扬声器电连接到微处理器，用于提醒用户选择合适的防晒霜。

公开(公告)号：US06987269B2

公开(公告)日：2006-01-17

申请号：US10248074

申请日：2002-12-16

Applicant: Alan C. Janos ,  Betty Zhang

Inventor： Alan C. Janos ,  Betty Zhang

IPC: G01J5/02

CPC classification number: G01J1/429 ,  G11C16/18

Abstract: An apparatus and process for measuring light intensities includes the use of a probe. The probe is configured for monitoring a wavelength range from about 180 nanometers to about 270 nanometers (nm). The probe comprises a reflective and diffusive layer adapted for collecting light; a waveguide having one end in optical communication with the reflective and diffusive layer, wherein the waveguide has greater than about 50 percent transmission at wavelengths of about 180 nm to about 270 nm; a sensor probe in optical communication with the other end of the waveguide; and a filter intermediate to the waveguide and the sensor, wherein the filter is adapted to remove wavelengths greater than about 270 nm and has a percent transmission at wavelengths of about 180 nm to about 270 nm greater than about 50 percent.

Abstract translation: 用于测量光强度的装置和方法包括使用探针。 该探针配置用于监测约180纳米至约270纳米（nm）的波长范围。 探针包括适于收集光的反射和漫射层; 波导，其一端与反射和扩散层光学连通，其中波导在约180nm至约270nm的波长处具有大于约50％的透射率; 与波导的另一端光连通的传感器探头; 以及位于波导和传感器之间的滤波器，其中滤波器适于去除大于约270nm的波长并且具有大于约50％的约180nm至约270nm的波长的百分比透射率。

公开(公告)号：US20050280889A1

公开(公告)日：2005-12-22

申请号：US11098477

申请日：2005-04-05

Applicant: Nobuo Katsuzaki

Inventor： Nobuo Katsuzaki

IPC: F21V9/04 ,  F21V9/06 ,  G01J1/42 ,  G01J1/50 ,  G02B1/00 ,  G02B5/08 ,  G02B5/20

CPC classification number: G01J1/429 ,  G02B5/205

Abstract: A subject of the present invention is to achieve accurate measurement of an ultraviolet dose of a test region of a subject (patient) by a single measuring cycle, to provide a measuring tool not including any members requiring manual operations, to prevent an examiner from exposure to ultraviolet radiation and to improve safety. An optimum ultraviolet dose determining tool, for ultraviolet radiotherapy, is used to determine an optimum ultraviolet dose in advance. The optimum ultraviolet dose determining tool can be placed on the skin of a patient and is provided with an attenuation filter (1A, 1B or 1C) having a plurality of optical areas respectively having different, known ultraviolet-ray transmittances or reflectances.

Abstract translation: 本发明的主题是通过单个测量周期来实现对象（患者）的测试区域的紫外线剂量的精确测量，以提供不包括需要手动操作的任何部件的测量工具，以防止检查者暴露 对紫外线辐射和提高安全性。 用于紫外线照射的最佳紫外线剂量测定工具用于预先确定最佳紫外线剂量。 最佳的紫外线剂量测定工具可以放置在患者的皮肤上，并且具有分别具有不同的已知紫外线透射率或反射率的多个光学区域的衰减滤光器（1A，1B或1C）。

公开(公告)号：US06952264B2

公开(公告)日：2005-10-04

申请号：US10023376

申请日：2001-12-13

Applicant: David W. Kuhns ,  Thomas M. Clausen ,  Olester Benson, Jr. ,  Steven R. Vanhoose

Inventor： David W. Kuhns ,  Thomas M. Clausen ,  Olester Benson, Jr. ,  Steven R. Vanhoose

IPC: B05D3/06 ,  B05D7/00 ,  B41F23/04 ,  G01J1/00 ,  G01J1/02 ,  G01J1/04 ,  G01J1/42 ,  G21K5/00 ,  G21K5/04 ,  G01N21/84

CPC classification number: G01J1/02 ,  B41F23/0406 ,  G01J1/0271 ,  G01J1/04 ,  G01J1/0403 ,  G01J1/0425 ,  G01J1/0462 ,  G01J1/42 ,  G01J1/429

Abstract: The invention includes a method for collecting radiation. An electromechanical radiation collection device is disposed in a roll to collect radiation directed at the roll. The invention is also an apparatus comprising a roll having an outer surface. An electromechanical radiation collection device is disposed in the roll.

Abstract translation: 本发明包括收集辐射的方法。 机电辐射收集装置设置在卷筒中以收集指向卷筒的辐射。 本发明也是一种包括具有外表面的辊的设备。 机电辐射收集装置设置在卷筒中。

公开(公告)号：US20050174576A1

公开(公告)日：2005-08-11

申请号：US11075973

申请日：2005-03-08

Applicant: Rajasekhar Rao ,  John Melchior ,  Holger Glatzel

Inventor： Rajasekhar Rao ,  John Melchior ,  Holger Glatzel

IPC: G01B9/02 ,  G01J1/42 ,  G01J9/02 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC classification number: G01J1/4257 ,  G01J1/429 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/024 ,  G01J3/027 ,  G01J3/26 ,  G01J9/02 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Δλ=λ0[DOD2−DID2]/[8f2−D02], where λ0 is an assumed constant wavelength and D0=(DOD−DID)/2, and f is the focal length. The optical detector may be a photodiode array. The wavemeter may have an optical interferometer having a slit function; the slit function and the focal length being selected to deliver to the optical detector the two innermost fringes of the optical interference ring pattern. The optical detector may comprise an array of pixels each having a height and width and the array having a total width; and an aperture at the optical input to the optical interferometer may selectively input to the optical interferometer a portion of a beam of light sufficient for the output of the etalon to illuminate the optical detector over the height of each respective pixel height and the total width. The optical interferometer may comprise an etalon having a slit function of 3 pm or less and a finesses of 25 or greater; and the focal length may be 1.5 meters. A second stage diffuser may be placed between the first stage diffuser and the etalon delivering a narrow cone of light to the etalon, and an aperture between the second stage diffuser and the etalon may deliver to the etalon a thin strip of the narrow cone of light.

公开(公告)号：US20050151656A1

公开(公告)日：2005-07-14

申请号：US11002774

申请日：2004-12-02

Applicant: Wai Yuen

Inventor： Wai Yuen

IPC: G01J1/42 ,  G01N1/22 ,  G01N15/06 ,  G01W1/04 ,  G01W1/06 ,  G01W1/00

CPC classification number: G01W1/06 ,  G01J1/429 ,  G01N1/2273 ,  G01N15/06 ,  G01W1/04

Abstract: In one embodiment, a weather sensing station includes one or more remote wireless sense units for sensing environmental conditions. A base station processes wireless signals from the wireless sense units and indicates the environmental conditions. A running display string may be used to display the data on a display string of the base station. Wireless sense units may include an air quality sense unit and, for example, a UV sensor. Air quality information and UV energy information may then be determined and displayed as data or indicated through graphical symbols.

Abstract translation: 在一个实施例中，天气感测站包括用于感测环境条件的一个或多个远程无线感测单元。 基站处理来自无线感测单元的无线信号并指示环境条件。 可以使用正在运行的显示字符串来显示基站的显示串上的数据。 无线感测单元可以包括空气质量感测单元和例如UV传感器。 然后可以确定空气质量信息和UV能量信息，并将其显示为数据或通过图形符号指示。

公开(公告)号：US20050140293A1

公开(公告)日：2005-06-30

申请号：US10511086

申请日：2003-04-11

Applicant: Tadashi Kitahara ,  Yoshiro Nomoto ,  Norio Ichikawa

Inventor： Tadashi Kitahara ,  Yoshiro Nomoto ,  Norio Ichikawa

IPC: G01J1/42 ,  H01J40/04 ,  H01J40/06

CPC classification number: G01J1/02 ,  G01J1/0204 ,  G01J1/0271 ,  G01J1/429 ,  H01J40/04

Abstract: A substrate 18, a cathode 20 and an anode 22 are stored in a space demarcated by a casing 10, and the space is evacuated. The cathode 20 and the anode 22 are provided on the same surface of a substrate 18 having electric insulation, and have a comb-tooth shape so as to be mutually engaged. Therefore, the area of the part in which the cathode 20 and the anode 22 approach each other becomes larger, and thereby photoelectrons discharged from the cathode 20 through the incidence of ultraviolet rays are transmitted in the vacuum, and are favorably collected in the anode 22.

Abstract translation: 衬底18，阴极20和阳极22存储在由壳体10划分的空间中，并且空间被抽空。 阴极20和阳极22设置在具有电绝缘性的基板18的相同表面上，并且具有梳齿形状以相互接合。 因此，阴极20和阳极22接近的部分的面积变大，从而通过紫外线的入射从阴极20排出的光电子在真空中传输，并且有利地收集在阳极22中 。

公开(公告)号：US06906787B2

公开(公告)日：2005-06-14

申请号：US10716938

申请日：2003-11-20

Applicant: Marcus Adrianus Van De Kerhof ,  Wilhelmus Petrus De Boeij ,  Marcel Maurice Hemerik

Inventor： Marcus Adrianus Van De Kerhof ,  Wilhelmus Petrus De Boeij ,  Marcel Maurice Hemerik

IPC: G21K5/00 ,  G01J1/42 ,  G01J1/58 ,  G01T1/20 ,  G02B5/26 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  G03B27/54 ,  G03B27/72

CPC classification number: G03F7/70558 ,  G01J1/429 ,  G01J1/58 ,  G03F7/7085

Abstract: A lithographic projection apparatus includes a radiation system for providing a projection beam of primary radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, a radiation sensor which is moveable in a path traversed by the projection beam, for receiving primary radiation out of the projection beam, the sensor including a radiation-sensitive material which converts incident primary radiation into secondary radiation, a radiation detector capable of detecting said secondary radiation emerging from said material, and a filter material for preventing secondary radiation from traveling in a direction away from the radiation detector.

Abstract translation: 光刻投影装置包括用于提供初级辐射的投影光束的辐射系统，用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构，用于保持基板的基板台， 系统，用于将图案化的光束投影到基板的目标部分上，辐射传感器，其可在由投影光束穿过的路径中移动，用于将一次辐射从投影光束接收，该传感器包括转换入射的辐射敏感材料 初级辐射进入次级辐射，能够检测从所述材料出射的所述次级辐射的辐射检测器和用于防止二次辐射沿远离辐射检测器的方向行进的过滤材料。

公开(公告)号：US20050104004A1

公开(公告)日：2005-05-19

申请号：US10991369

申请日：2004-11-19

Applicant: Tohru Takeuchi ,  Yutaka Masuda

Inventor： Tohru Takeuchi ,  Yutaka Masuda

IPC: G01N21/47 ,  G01J5/00

CPC classification number: G01N21/474 ,  G01J1/02 ,  G01J1/0233 ,  G01J1/029 ,  G01J1/04 ,  G01J1/0411 ,  G01J1/08 ,  G01J1/429 ,  G01N21/255 ,  G01N21/33 ,  G01N2021/4702 ,  G01N2021/4757 ,  G01N2201/0221 ,  G01N2201/0621 ,  G01N2201/0625 ,  G01N2201/0627

Abstract: A reflected ultraviolet light measuring device, a measuring method for measuring ultraviolet light reflection intensity by using the reflected ultraviolet light measuring device, and a valuation method for evaluating ultraviolet light absorbability of an object by using measuring results by the method, said device comprising an irradiating unit comprising a at least one light emitting diode for irradiating ultraviolet light on an object, and a light receiving unit for receiving a reflected light from the object, wherein the light receiving unit is arranged at an angle in which a regular reflected light from the object does not enter.

Abstract translation: 反射紫外线测量装置，使用反射的紫外光测量装置测量紫外光反射强度的测量方法，以及通过使用该方法的测量结果来评估对象的紫外光吸收性的估值方法，所述装置包括照射 包括用于在物体上照射紫外光的至少一个发光二极管的单元和用于接收来自所述物体的反射光的光接收单元，其中所述光接收单元被布置成从所述物体发出规则反射光的角度 不进入