公开(公告)号：US20050057738A1

公开(公告)日：2005-03-17

申请号：US10769373

申请日：2004-01-30

Applicant: Toshihiko Tsuji

Inventor： Toshihiko Tsuji

IPC: G03B27/54 ,  G03F7/20 ,  G21K1/00 ,  H01L21/027

CPC classification number: G03F7/702 ,  G21K2201/06

Abstract: Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art, an illumination optical system for illuminating an object surface includes an optical unit that converts light from a light source section into approximately parallel light, and includes first and second mirrors, wherein the first mirror has an opening, through which light reflected by the second mirror passes.

Abstract translation: 为了提供照明光学系统和使用该照明光学系统的曝光装置，其提供了比现有技术更光亮的用于照射掩模的光的角度分布，用于照射物体表面的照明光学系统包括：光学单元，其将来自 光源部分成近似平行的光，并且包括第一和第二反射镜，其中第一反射镜具有开口，第二反射镜反射的光穿过该开口。

公开(公告)号：US06438199B1

公开(公告)日：2002-08-20

申请号：US09679718

申请日：2000-09-29

Applicant: Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni

Inventor： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni

IPC: G21K504

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70091 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

Abstract: The invention concerns an illumination system, particularly for microlithography with wavelengths ≦193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus. To transform the rectangular images of the first raster elements into the segment of the annulus, the second optical component comprises a first field mirror for shaping the field to the segment of the annulus.

Abstract translation: 本发明涉及一种照明系统，特别是对于具有波长<= 193nm的微光刻，其包括光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将光源变换成由所述出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有多个第一光栅元件的第一光学元件，其被成像到所述图像平面中，产生至少部分地叠加在所述图像平面中的场上的多个图像。 第一光栅元件以第一偏转角偏转入射光束，其中第一偏转角中的至少两个是不同的。 第一光栅元件优选地是矩形的，其中该场是环的一段。 为了将第一光栅元件的矩形图像变换成环形的区段，第二光学部件包括用于将场成形为环形部分的第一场镜。

公开(公告)号：US06198793B1

公开(公告)日：2001-03-06

申请号：US09305017

申请日：1999-05-04

Applicant: Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger

Inventor： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger

IPC: G21K504

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G21K2201/06

Abstract: The invention concerns an illumination system for wavelengths ≦193 nm, particularly for EUV lithography, with at least one light source, which has an illumination A in a predetermined surface; at least one device for producing secondary light sources; at least one mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements; one or more optical elements, which are arranged between the mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements and the reticle plane, whereby the optical elements image the secondary light sources in the exit pupil of the illumination system. The illumination system is characterized by the fact that the raster elements of the one or more mirror or lenses are shaped and arranged in such a way that the images of the raster elements cover by means of the optical elements the major portion of the reticle plane and that the exit pupil defined by aperture and filling degree is illuminated.

Abstract translation: 本发明涉及用于波长<= 193nm的照明系统，特别是对于EUV光刻，具有至少一个在预定表面具有照明A的光源; 至少一个用于产生二次光源的装置; 至少一个镜子或透镜装置，其包括至少一个反射镜或一个透镜，其被组合成光栅元件; 布置在包括至少一个反射镜或一个透镜的反射镜或透镜装置之间的一个或多个光学元件，其被组织成光栅元件和光罩平面，由此光学元件将出射光瞳中的次级光源成像 照明系统的特征在于，一个或多个镜子或透镜的光栅元件被成形和布置成使得光栅元件的图像通过光学元件覆盖主要部分 并且照明由孔径和填充度限定的出射光瞳。

公开(公告)号：US5509043A

公开(公告)日：1996-04-16

申请号：US276140

申请日：1994-07-18

Applicant: Paul Van Der Sluis

Inventor： Paul Van Der Sluis

IPC: G01N23/20 ,  G21K1/06 ,  G21K7/00

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/062

Abstract: An X-ray analysis apparatus comprises a dispersive system of crystals for monochromatizing an incoming beam in a diffractometer or for analyzing an X-ray beam in an X-ray spectrometer. The system of crystals comprises crystals whose crystal lattice planes do not extend parallel to effectively reflective crystal surfaces. As a result, a substantially higher effective radiation intensity can be obtained, for example notably for (220) crystal faces in germanium.

Abstract translation: X射线分析装置包括用于在衍射仪中单色入射光束或用于在X射线光谱仪中分析X射线束的晶体分散系统。 晶体系统包括晶体，其晶格面不平行于有效反射的晶体表面延伸。 结果，可以获得显着更高的有效辐射强度，例如特别是对于锗中的（220）晶面。

公开(公告)号：US5485498A

公开(公告)日：1996-01-16

申请号：US269593

申请日：1994-07-01

Applicant: Whitson G. Waldo, III ,  Eric Brodsky ,  Franco Cerrina

Inventor： Whitson G. Waldo, III ,  Eric Brodsky ,  Franco Cerrina

IPC: G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70058 ,  G21K1/06 ,  G21K2201/06

Abstract: An x-ray interface (40) provides increased x-ray collection efficiency for use in x-ray photolithography. The interface (40) comprises a housing (44) having a plurality of mirrored funnels (46) for collecting the x-rays. The mirrored funnels (46) are shaped to partially collimate and focus the x-rays. The interface (40) collects a greater percentage of the available x-rays from an x-ray source, and the interface (40) also permits a greater number of beamlines to be coupled to the x-ray source.

Abstract translation: x射线界面（40）提供了用于x射线光刻的增加的x射线收集效率。 接口（40）包括具有用于收集X射线的多个镜像漏斗（46）的壳体（44）。 镜像的漏斗（46）被成形为部分地准直和聚焦x射线。 接口（40）从x射线源收集更多百分比的可用x射线，并且接口（40）还允许更多数量的束线耦合到x射线源。

公开(公告)号：US5361292A

公开(公告)日：1994-11-01

申请号：US060335

申请日：1993-05-11

Applicant: William C. Sweatt

Inventor： William C. Sweatt

IPC: G02B27/64 ,  G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70108 ,  G02B27/642 ,  G03F7/702 ,  G03F7/70233 ,  G21K1/06 ,  G21K2201/06

Abstract: A series of segments of a parent aspheric mirror having one foci at at a si-point source of radiation and the other foci at the radius of a ring field have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ring field camera about one of the beams and fall onto the ring field radius as a coincident image as an arc of the ring field.

Abstract translation: 具有位于准点辐射源处的一个焦点并且在环形场半径处的另一个焦点的父非球面反射镜的一系列段具有由一组反射镜平移和旋转的所有光束中的一个或全部，使得 所有的光束通过围绕其中一个光束的环形场摄像机的真实入射光瞳，并且作为环形场的圆弧落在环形场半径上作为重合图像。

公开(公告)号：US5274435A

公开(公告)日：1993-12-28

申请号：US841421

申请日：1992-02-26

Applicant: Michael C. Hettrick

Inventor： Michael C. Hettrick

IPC: G01J3/18 ,  G01J3/20 ,  G02B5/18 ,  G21K1/06

CPC classification number: G02B5/1861 ,  G01J3/18 ,  G01J3/189 ,  G01J3/20 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/064

Abstract: An optical system and method comprising a diffraction grating which rotates about its surface normal to change the magnitude of the wavelength diffracted to an image location. At grazing incidence, such a rotation is determined to maintain the diffracted image in focus over a wide range in scanned wavelength. Monochromator and spectrometer embodiments include plane and curved surface gratings with both classical and varied-spaced groove patterns, and a variety of illumination geometries. In the simplest case, a grazing incidence monochromator is constructed in which a self-focusing classical spherical grating scans the value in wavelength which is transmitted between fixed slits located on the Rowland circle of the grating. The diffracted image remains in perfect focus over two octaves in wavelength at high efficiency, with both entrance and exit slits fixed in position, and the radiation aperture is constant.

Abstract translation: 一种光学系统和方法，包括围绕其表面法线旋转的衍射光栅，以将衍射的波长的大小改变为图像位置。 在掠入射处，确定这样的旋转以使衍射图像在扫描波长的宽范围内保持焦点。 单色器和光谱仪实施例包括具有经典和不同间隔的凹槽图案的平面和曲面光栅以及各种照明几何形状。 在最简单的情况下，构建了掠入射单色仪，其中自聚焦经典球形光栅扫描位于光栅的罗兰圆上的固定狭缝之间传输的波长值。 衍射图像以高效率保持在两个八度波长上的完美对焦，入射和出射狭缝均固定在适当位置，辐射孔径恒定。

公开(公告)号：US5268954A

公开(公告)日：1993-12-07

申请号：US961789

申请日：1992-10-14

Applicant: Frederic H. Middleton

Inventor： Frederic H. Middleton

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/062 ,  G21K2201/067

Abstract: A mounting mechanism for a double crystal monochromator or the like has a parallelogram based mounting mechanism in which two of the vertices of the parallelogram are fixed in position, and two vertices are free to translate back and forth in a straight line parallel to the fixed base of the parallelogram. One diffractor is mounting for pivoting at one of the fixed vertices, and the second diffractor is mounted for pivoting at an adjacent movable vertex. The surfaces of the diffractors are maintained parallel as the angle of the diffractors with respect to input and output beams to the monochromator is changed to change the wavelength being passed. The diffractor mounted at the fixed pivot may be connected to a large diameter wheel which in turn is connected by a band to a smaller diameter wheel mounted for rotation at the other fixed vertex of the parallelogram, with a pivotable arm connected to the smaller wheel to rotate therewith. Another larger diameter wheel is connected to the diffractor at the movable vertex and is connected by a band to a smaller diameter wheel at the adjacent movable vertex of the parallelogram, where the smaller wheel is connected by a slider to the pivotable arm. As the movable diffractor is translated in position, the arm pivots to cause the small wheels to move through the same angle of angular displacement as the pivotable arm. The corresponding angular displacement of the diffractors may be one half the angular displacement of the pivotable arm where the larger wheels are twice the diameter of the smaller wheels.

Abstract translation: 双晶单色仪等的安装机构具有基于平行四边形的安装机构，其中平行四边形的两个顶点被固定就位，并且两个顶点在平行于固定基座的直线中来回自由地平移 的平行四边形。 一个衍射器安装用于在固定顶点之一处枢转，并且第二衍射器被安装用于在相邻的可动顶点处枢转。 当衍射器相对于单色器的输入和输出光束的角度改变以改变所通过的波长时，衍射器的表面保持平行。 安装在固定枢轴处的衍射器可以连接到大直径轮，该大直径轮又通过带连接到安装成在平行四边形的另一固定顶点处旋转的较小直径的轮，其中可枢转臂连接到较小的轮到 与其一起旋转。 另一个较大直径的轮在可移动顶点处连接到衍射器，并且通过带连接到平行四边形的相邻可移动顶点处的较小直径的轮，其中较小的轮通过滑块连接到可枢转臂。 当可移动衍射器平移时，臂枢转以使小轮移动通过与可枢转臂相同的角位移角度。 衍射器的相应角位移可以是可枢转臂的角位移的一半，其中较大的轮是较小轮的直径的两倍。