公开(公告)号：US20080224039A1

公开(公告)日：2008-09-18

申请号：US11821028

申请日：2007-06-21

Applicant: Takayuki Nakamura ,  Toshimichi Iwai ,  Soichi Shida ,  Mitsuo Hiroyama

Inventor： Takayuki Nakamura ,  Toshimichi Iwai ,  Soichi Shida ,  Mitsuo Hiroyama

IPC: G01N23/00

CPC classification number: G01B15/00 ,  H01J37/045 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/24585

Abstract: A scanning electron microscope with a length measurement function includes an electron gun emitting an electron beam, a measurement target region setting unit for setting a measurement region for a pattern formed on a sample, a storing unit for storing the designated measurement region, a beam blanker unit for controlling an irradiation of the electron beam depending on the measurement region, and a control unit for extracting the designated measurement region from the storing unit, interrupting the electron beam with the beam blanker unit in a region other than the measurement region, irradiating the electron beam passed through the beam blanker unit onto the sample in the measurement region, capturing an image of the measurement region, and measuring the pattern. The measurement region may be represented by a pair of measurement regions, and the respective regions may have the same areas as each other.

Abstract translation: 具有长度测量功能的扫描电子显微镜包括发射电子束的电子枪，用于设置样品上形成的图案的测量区域的测量对象区域设置单元，用于存储指定测量区域的存储单元，光束消除器 用于根据测量区域控制电子束的照射的单元，以及用于从存储单元提取指定的测量区域的控制单元，在除了测量区域之外的区域中用光束消除单元中断电子束，照射 电子束通过光束消隐单元通过测量区域中的样品，捕获测量区域的图像，并测量图案。 测量区域可以由一对测量区域表示，并且各个区域可以具有彼此相同的面积。

公开(公告)号：US20080128617A1

公开(公告)日：2008-06-05

申请号：US11984319

申请日：2007-11-15

Applicant: Kohei Yamaguchi ,  Kenji Obara

Inventor： Kohei Yamaguchi ,  Kenji Obara

IPC: G01N23/22

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/216 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24495

Abstract: A technique executes autofocus adjustment stably even when a plurality of patterns or foreign matter capable of being imaged only by a specific detector are included independently. Such an image as a concavo-convex image having a weak contrast can be picked up. The technique can automatically focus such an image even when it is difficult to find a focus position in the image. A scanning electron microscope includes a plurality of detectors for detecting secondary signals from a specimen when irradiated with an electron beam, and a calculation unit for combining the signals obtained from the detectors. At least two of the detectors are provided to be symmetric with respect to the electron beam. The focus of the electron beam is adjusted based on the signals of the detectors or on a signal corresponding to a combination of the signals.

Abstract translation: 即使独立地包括仅能够由特定检测器成像的多个图案或异物也能够稳定地执行自动聚焦调整。 可以拾取这样的具有弱对比度的凹凸图像的图像。 即使在图像中难以找到焦点位置，该技术也可以自动对焦这样的图像。 扫描电子显微镜包括多个用于在用电子束照射时检测来自样本的次级信号的检测器，以及用于组合从检测器获得的信号的计算单元。 至少两个检测器被提供为相对于电子束对称。 基于检测器的信号或对应于信号的组合的信号来调整电子束的焦点。

公开(公告)号：US07375330B2

公开(公告)日：2008-05-20

申请号：US11396654

申请日：2006-04-04

Applicant: Hiromi Inada ,  Hiroyuki Tanaka ,  Shun-ichi Watanabe ,  Shigeto Isakozawa ,  Mitsugu Sato ,  Atsushi Takane ,  Satoshi Yamaguchi

Inventor： Hiromi Inada ,  Hiroyuki Tanaka ,  Shun-ichi Watanabe ,  Shigeto Isakozawa ,  Mitsugu Sato ,  Atsushi Takane ,  Satoshi Yamaguchi

IPC: G01N23/00

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J37/265 ,  H01J2237/15 ,  H01J2237/2487 ,  H01J2237/2826

Abstract: Charged particle beam equipment has a processing unit for calibrating dimension values of an enlarged specimen image, and means for changing the amount by which a charged particle beam is scanned. Also, a specimen stand has a mechanism for holding a specimen having a periodical structure or a specimen simultaneously having a periodical structure and a non-periodica structure, and a storage device for automatically changing a magnification for an enlarged specimen image, and storing measured values at all magnifications.

Abstract translation: 带电粒子束设备具有用于校准放大的标本图像的尺寸值的处理单元和用于改变扫描带电粒子束的量的装置。 此外，试样台具有用于保持具有周期性结构的试样或同时具有周期性结构和非周期性结构的试样的机构，以及用于自动改变放大的试样图像的倍率的存储装置，并存储测量值 在所有放大倍率。

公开(公告)号：US07375323B2

公开(公告)日：2008-05-20

申请号：US11655946

申请日：2007-01-22

Applicant: Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

Inventor： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC: G21K1/08 ,  H01J3/14

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Abstract translation: 提供具有使用多极透镜的像差校正器的电子束装置。 电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得 物镜的物体在任一种扫描模式下都不会改变。 如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。 这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。

公开(公告)号：US07358493B2

公开(公告)日：2008-04-15

申请号：US11147260

申请日：2005-06-08

Applicant: William Roberts ,  Christopher Gould

Inventor： William Roberts ,  Christopher Gould

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/216 ,  H01J2237/2817

Abstract: A method and apparatus according to the present invention define optimal conditions for a scanning electron microscope (SEM), preferably a critical dimension scanning electron microscope (CDSEM). The present invention provides an image quality monitor that utilizes image processing and optimization to maintain image quality at a desired level. Images from a stage sample are automatically collected, while microscope operational parameters are determined based on image processing to enable continuous monitoring of microscope operation. The technique may be performed manually or automatically and generates set points for beam conditioning elements to produce or maintain ideal beam conditions to enhance image quality. The present invention generates data indicating optimized values for each beam alignment parameter. The optimized values are applied to the internal microscope values to optimize the beam. The results may be provided to the technician, a data storage system or directly to the microscope control mechanisms.

Abstract translation: 根据本发明的方法和装置限定扫描电子显微镜（SEM）的最佳条件，优选临界尺寸扫描电子显微镜（CDSEM）。 本发明提供了利用图像处理和优化将图像质量保持在期望水平的图像质量监视器。 自动收集舞台样本的图像，而基于图像处理确定显微镜操作参数，以实现显微镜操作的连续监视。 该技术可以手动或自动执行，并且产生用于波束调节元件的设定点以产生或维持理想波束条件以增强图像质量。 本发明产生指示每个光束对准参数的优化值的数据。 将优化值应用于内部显微镜值以优化光束。 结果可以提供给技术人员，数据存储系统或直接提供给显微镜控制机构。

公开(公告)号：US20080063257A1

公开(公告)日：2008-03-13

申请号：US11931693

申请日：2007-10-31

Applicant: Takashi HIROI ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

Inventor： Takashi HIROI ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

IPC: G06K9/00

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/8854 ,  G01N2021/8861 ,  G01N2021/8864 ,  G01R31/311 ,  G03F1/86 ,  G06T1/0007 ,  G06T7/0002 ,  G06T7/001 ,  G06T2200/24 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/28

Abstract: An apparatus for processing a defect candidate image, including: an imager for taking an enlarged image of a specimen; an image processor for processing the image taken by the imager to detect defect candidates existing on the specimen and classify the detected defect candidates into one of plural defect classes; a memory for storing information of the defect candidates including the images of the defect candidates and the classified defect class data outputted from the image processor; and a display unit having a display screen for displaying information stored in the memory, wherein the display unit displays an image of the defect candidates together with the defect class data stored in the memory and the displayed defect class data is changeable on the display screen, and the memory changes the stored defect class data of the displayed defect candidate to the changed defect class data.

Abstract translation: 一种用于处理缺陷候选图像的装置，包括：用于拍摄样本的放大图像的成像器; 图像处理器，用于处理由成像器拍摄的图像以检测存在于样本上的缺陷候选，并将检测到的缺陷候选分类为多个缺陷类别中的一个; 存储器，用于存储包括缺陷候选图像和从图像处理器输出的分类缺陷类别数据的缺陷候选的信息; 以及显示单元，具有用于显示存储在存储器中的信息的显示屏幕，其中所述显示单元与存储在存储器中的缺陷类别数据一起显示缺陷候选的图像，并且显示的缺陷类别数据可在显示屏幕上变化， 并且存储器将存储的缺陷候选的缺陷类别数据改变为改变的缺陷类别数据。

公开(公告)号：US20070269101A1

公开(公告)日：2007-11-22

申请号：US11782274

申请日：2007-07-24

Applicant: Takashi HIROI ,  Masahiro WATANABE ,  Chie SHISHIDO ,  Aritoshi SUGIMOTO ,  Maki TANAKA ,  Hiroshi MIYAI ,  Asahiro KUNI ,  Yasuhiko NARA

Inventor： Takashi HIROI ,  Masahiro WATANABE ,  Chie SHISHIDO ,  Aritoshi SUGIMOTO ,  Maki TANAKA ,  Hiroshi MIYAI ,  Asahiro KUNI ,  Yasuhiko NARA

IPC: G06K9/00

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/8854 ,  G01N2021/8861 ,  G01N2021/8864 ,  G01R31/311 ,  G03F1/86 ,  G06T1/0007 ,  G06T7/0002 ,  G06T7/001 ,  G06T2200/24 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/28

Abstract: A pattern inspection apparatus including: an image detecting part for detecting a digital image of an object substrate; a display having a screen on which the digital image of the object substrate and/or a distribution of defect candidates in a map form are displayable; an input device for inputting information of a non-inspection region to be masked on the object substrate by defining a region on the screen on which said distribution of defect candidates is displayed in a map form; a memory part for storing coordinate data, pattern data or feature quantity data of the non-inspection region to be masked on the object substrate inputted on the screen by the input device; and a defect judging part in which the digital image detected by the image detecting part is examined in a state that a region matching with a condition stored in the memory part is masked and a defect is detected in a region other than said masked region.

Abstract translation: 一种图案检查装置，包括：图像检测部，用于检测对象基板的数字图像; 具有可以显示对象基板的数字图像的屏幕和/或以地图形式的缺陷候选的分布的显示器; 输入装置，用于通过在屏幕上定义要以掩模形式显示所述缺陷候选的分布的区域来输入要被掩蔽在对象基板上的不检查区域的信息; 用于存储由输入装置输入到屏幕上的待掩蔽的待检查区域的坐标数据，图案数据或特征量数据的存储部分; 以及缺陷判断部分，其中在与存储在存储器部分中的条件匹配的区域被屏蔽并且在除了所述屏蔽区域之外的区域中检测到缺陷的状态下，检查由图像检测部分检测到的数字图像。

公开(公告)号：US07294833B2

公开(公告)日：2007-11-13

申请号：US10847885

申请日：2004-05-19

Applicant: Takehiko Konno ,  Hiroshi Miyai

Inventor： Takehiko Konno ,  Hiroshi Miyai

IPC: H01J37/28

CPC classification number: H01J37/3045 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2817 ,  H01L22/12 ,  H01L22/20

Abstract: An inspection system includes a SEM visual inspection apparatus for detecting a defect in a semiconductor sample in steps of manufacturing a semiconductor device and a review apparatus for observing, at a high resolution, the defect in the semiconductor sample detected by the SEM visual inspection apparatus. The system has a function of transmitting an alignment dictionary image as one of alignment parameters to be set by the SEM visual inspection apparatus using an inspection recipe to the review apparatus.

Abstract translation: 一种检查系统包括用于在制造半导体器件的步骤中检测半导体样品中的缺陷的SEM目视检查装置和用于以高分辨率观察由SEM目视检查装置检测的半导体样品中的缺陷的检查装置。 该系统具有将对准字典图像作为将由SEM目视检查装置使用检查配方设置的对准参数之一传送给检查装置的功能。

公开(公告)号：US20070235659A1

公开(公告)日：2007-10-11

申请号：US11689870

申请日：2007-03-22

Applicant: Asher Pearl

Inventor： Asher Pearl

IPC: G21K1/08

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The invention provides a method and apparatus for automatically aligning a beam of charged particles with an aperture. Thereby, a defocusing is introduced and a signal calculated based on an image shift is applied to a deflection unit. Further, a method for correction of astigmatism is provided. Thereby, the sharpness is evaluated for a set of frames generated whilst varying the signals to a stigmator.

Abstract translation: 本发明提供一种用于将带电粒子束自动对准孔的方法和装置。 由此，引入散焦，并将基于图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正散光的方法。 因此，对于在将信号改变为标示符时产生的一组帧来评估清晰度。

公开(公告)号：US20070222464A1

公开(公告)日：2007-09-27

申请号：US11704228

申请日：2007-02-09

Applicant: Toshifumi Honda ,  Takehiro Hirai

Inventor： Toshifumi Honda ,  Takehiro Hirai

IPC: G01R31/305

CPC classification number: G01R31/307 ,  G01R31/2884 ,  H01J37/265 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/221 ,  H01J2237/24564 ,  H01J2237/2487 ,  H01J2237/2594 ,  H01J2237/2817 ,  H01J2237/30416

Abstract: In a traditional method for automatically obtaining high-magnification images of defects by using an electron microscope for defect-reviewing of a semiconductor wafer, high-magnification images of a voltage contrast changing part are obtained in the case of defects generating voltage contrast change, this made difficult to observe defects themselves generating voltage contrast change. In the present invention, based on energy of secondary electron to be detected, after obtaining two types of images, namely an image making voltage contrast conspicuous easily, and an image not making it easily, and acquiring a shape change area adjacent to a voltage contrast change area based on this area as a defect location, a high-magnification image can automatically be obtained.

Abstract translation: 在通过使用电子显微镜自动获得高倍率图像的传统方法中，通过使用电子显微镜对半导体晶片进行缺陷检查，在产生电压对比度变化的缺陷的情况下，获得电压对比度变化部分的高倍率图像， 难以观察缺陷本身产生电压对比度变化。 在本发明中，基于被检测的二次电子的能量，在获得两种类型的图像之后，即容易形成明显的图像形成电压对比度，以及不容易进行图像的图像，并且获取与电压对比相邻的形状变化区域 基于该区域的变化区域作为缺陷位置，可以自动获得高倍率图像。