公开(公告)号：US20210299436A1

公开(公告)日：2021-09-30

申请号：US17346003

申请日：2021-06-11

Applicant: Centre National de la Recherche Scientifique ,  UNIVERSITE GRENOBLE ALPES

Inventor： Dipankar KALITA ,  Vincent BOUCHIAT ,  Laetitia MARTY ,  Nedjma BENDIAB

IPC: A61N1/04 ,  A61N1/36 ,  A61L15/58 ,  B05D1/00 ,  H01L29/16 ,  H01L29/167 ,  C01B32/194

Abstract: The invention concerns a method of forming a medical device, the method comprising: forming a graphene film (100) over a substrate (204); depositing, by gas phase deposition, a polymer material covering a surface of the graphene film (100); and removing the substrate (204) from the graphene film (100), wherein the polymer material forms a support (102) for the graphene film (100).

公开(公告)号：US11127583B2

公开(公告)日：2021-09-21

申请号：US16542036

申请日：2019-08-15

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Chung-Hao Chang ,  Chitong Chen

IPC: H01L21/02 ,  H01L21/027 ,  C23C16/455 ,  B05D1/00

Abstract: A method of treating a semiconductor substrate includes converting a first main side of the semiconductor substrate having a first coefficient of static friction relative to a surface of a wafer table to a second coefficient of static friction relative to the surface of the wafer table, wherein the second coefficient of static friction is less than the first coefficient of static friction. A photoresist layer is applied over a second main side of the semiconductor substrate having the first coefficient of static friction. The second main side opposes the first main side. The semiconductor substrate is placed on the wafer table so that the first main side of the semiconductor substrate faces the wafer table.

公开(公告)号：US20210283749A1

公开(公告)日：2021-09-16

申请号：US16336157

申请日：2017-09-18

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Aaron K. Nienaber ,  Grayce T. Huberty ,  Thomas J. Nelson ,  Ronald D. Apple ,  Louis S. Moren ,  Robinette S. Alkhas ,  Nathan E. Schultz ,  Tien T. Wu ,  Gerry A. Hoffdahl

IPC: B24D11/00 ,  C09K3/14 ,  B05D1/00

Abstract: Abrasive articles including a nonwoven fibrous substrate having a plurality of fibers, and a multiplicity of shaped abrasive particles, each shaped abrasive particle adhered to a corresponding fiber, each shaped abrasive particle having a length (L) and a width (W) determined in a direction substantially orthogonal to the length, the ratio of the length to the width defining an aspect ratio (L/W) of at least 1.1, each abrasive particle is oriented relative to its corresponding fiber, and more than 50% of the abrasive particles are oriented with respect to their corresponding fiber such that the abrasive particle length extends generally outwardly away from a surface of the corresponding fiber as determined visually using the Orientation Test. The shaped abrasive particles may have the geometric shape of a polygonal prism having two faces and at least three sides thereon. Methods of making the abrasive articles are also disclosed.

公开(公告)号：US11099150B1

公开(公告)日：2021-08-24

申请号：US17051781

申请日：2019-08-30

Applicant: QINGDAO UNIVERSITY

Inventor： Rijun Gui ,  Yujiao Sun ,  Hui Jin ,  Xiaowen Jiang

IPC: G01N27/327 ,  G01N27/30 ,  G01N27/48 ,  C12Q1/6825 ,  C12Q1/6886 ,  B05D1/00

Abstract: A method for preparing a ratiometric electrochemical miR3123 aptasensor based on a copper-based metal-organic framework (Cu-MOF) composite doped with black phosphorus nanosheets (BPNSs) and thionine (TH) is provided. TH/Cu-MOF is prepared by reacting TH with Cu-MOF precursor, and BPNSs/TH/Cu-MOF is prepared by drop coating the BPNSs and drop coated onto an electrode. A ferrocene (Fc)-labeled single-stranded DNA aptamer is adsorbed on the BPNSs to prepare aptamer-BPNSs/TH/Cu-MOF. Target molecule miR3123 is bonded with the single-stranded DNA aptamer Fc-DNA, Fc-DNA is forced to escape from the BPNSs. Electrochemical signals of Fc are, therefore, weakened while TH signals are slightly affected. The ratiometric electrochemical miR3123 aptasensor is constructed by fitting a linear relationship between peak current intensity ratios IFc/ITH and concentrations of the miR3123.

公开(公告)号：US20210245194A1

公开(公告)日：2021-08-12

申请号：US17269249

申请日：2019-08-19

Applicant: ORIGIN COMPANY, LIMITED

Inventor： Takayuki SUZUKI ,  Tatsuo OKUBO ,  Naoto OZAWA

IPC: B05D1/00 ,  B05D7/24

Abstract: A method for manufacturing a target object coated with a coating substance, whose edge face portions and flat face portion can be covered with the coating substance with a predetermined thickness, is provided. The target object T includes a flat face portion Tf and an edge face portion Te continuous from the portion Tf which includes a coating flat surface Tsp formed thereon which has a flat face. The portion Te includes a coating edge surface Tsc which includes at least one of a curved surface or a flat surface that is not parallel to the surface Tsp. The method includes a coating substance supply step of supplying the substance R along at least the surface Tsp, and an edge face portion coating substance adjustment step of adjusting the substance R supplied to the surface Tsc or moved from the surface Tsp to cover the surface Tsc at a predetermined thickness.

公开(公告)号：US11085111B2

公开(公告)日：2021-08-10

申请号：US16157886

申请日：2018-10-11

Applicant: The Boeing Company

Inventor： Paul S. Nordman ,  Jiangtian Cheng

IPC: B32B33/00 ,  B05D1/00 ,  B32B37/00 ,  C23C16/01 ,  B32B15/04 ,  C23C16/06 ,  C23C16/40

Abstract: A method for fabricating a structural part is disclosed. The method can include forming a plurality of layers on a base of a system having one or more application heads. Forming the plurality of layers can include forming alternating layers of a first material and a second material. Forming the alternating layers can include forming a first layer from the first material, and forming a second layer adjacent the first layer from the second material. The plurality of layers can form the structural part, and one or more dimensions of the structural part can be greater than or equal to about 0.05 cm.

公开(公告)号：US11084914B2

公开(公告)日：2021-08-10

申请号：US16208693

申请日：2018-12-04

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Michael Mulzer ,  Jieqian Zhang ,  Joseph Kao

IPC: B05D1/00 ,  C08J7/046 ,  C09D7/20 ,  C09D7/47 ,  C09D7/63 ,  C09D7/40 ,  C09D4/00 ,  C09D143/04 ,  C08J7/16 ,  C08L33/12 ,  C08L75/16 ,  C08L83/04 ,  C08K5/1515

Abstract: Display substrates having a hard coat layer on a colorless polyimide substrate are formed from hard coat compositions having certain organic solvents that do not substantially impact the optical and mechanical properties of the colorless polyimide substrate.

公开(公告)号：US11052422B2

公开(公告)日：2021-07-06

申请号：US16503288

申请日：2019-07-03

Applicant: Creative Coatings Co., Ltd.

Inventor： Eiji Sato ,  Hitoshi Sakamoto

IPC: B05D1/00 ,  B05D1/18 ,  H01G13/00 ,  H01C17/28 ,  H05K1/18 ,  B05C3/09 ,  B05C13/02 ,  H01G2/06 ,  H01G4/005

Abstract: An electronic component manufacturing method includes a blotting process of bringing a conductive paste applied to an end portion of each electronic component body held by a jig into contact with a surface of a surface plate. The blotting process includes simultaneous performance of a distance changing process of changing the distance between an end face of each electronic component body and the surface of the surface plate and a position changing process of changing a two-dimensional position where the end face of the electronic component body is projected on the surface of the surface plate in such a manner that the direction of the movement of two-dimensional position in parallel to the surface of the surface plate successively varies (e.g., along a circular path).

公开(公告)号：US20210184183A1

公开(公告)日：2021-06-17

申请号：US16649680

申请日：2019-12-13

Applicant: WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO,, LTD.

Inventor： Yamin WANG

IPC: H01L51/56 ,  H01L51/50 ,  H01L51/00 ,  B05D1/00 ,  B05D3/00 ,  C23C14/35 ,  C23C14/24 ,  C23C14/08 ,  C23C14/18

Abstract: A manufacturing method of a graphene oxide film, an organic light-emitting diode (OLED) and a manufacturing method thereof are provided. The OLED includes a substrate, an anode, a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, an electron injection layer, and a cathode stacked in sequence. The hole injection layer is a graphene oxide layer having a concentration ranging from 0.3 to 1 mg/ml. The hole transport layer is any one of N,N′-diphenyl-N,N′-bis(3-tolyl)-1,1′-biphenyl-4,4′-diamine, 1,4-bis(diphenylamino) biphenyl, or N,N′-diphenyl-N,N′-bis(1-naphthyl)-1,1′-biphenyl-4,4′-diamine.

公开(公告)号：US11035041B2

公开(公告)日：2021-06-15

申请号：US16378799

申请日：2019-04-09

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yoji Iizuka

IPC: C23C16/52 ,  B05D1/00

Abstract: There is provided a film-forming apparatus and a film-forming method. The film-forming apparatus, in a first period, sets the second heater to a temperature T1 at which no film is formed on a substrate disposed on the mounting stand without supplying a precursor gas into the process container, in a second period, sets the second heater to a temperature T2 at which no film is formed on the substrate and supplies a precursor gas into the process container from the precursor gas supply pipe, in a third period, sets the second heater to a film-forming temperature T3, and in the first to third periods, sets the first heater to a temperature T4 at which no film is formed on a periphery of a gas supply port of the precursor gas supply pipe.