公开(公告)号：US20230011267A1

公开(公告)日：2023-01-12

申请号：US17836611

申请日：2022-06-09

Applicant: FEI Company

Inventor： Kun Liu ,  Steven J. Randolph

IPC: H01J37/075 ,  H01J37/28

Abstract: A charged particle beam source, such as for use in an electron microscope, can include a mounting member defining a first opening at a free end of the mounting member and a bore extending from the first opening into the mounting member along a longitudinal axis of the mounting member. A second opening can be defined in a side wall of the mounting member and can extend between an outer surface of the mounting member and the bore, the second opening being spaced apart from the first opening along the longitudinal axis of the mounting member. An emitter member can be received in the bore and aligned along the longitudinal axis of the mounting member. A fixative material can be received in the bore and in the second opening to retain the emitter member in the bore.

公开(公告)号：US20230005710A1

公开(公告)日：2023-01-05

申请号：US17853727

申请日：2022-06-29

Applicant: FEI Company

Inventor： Maarten Bischoff ,  Bert Freitag

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/26

Abstract: The disclosure relates to a method for examining a sample in a scanning transmission charged particle microscope. The method comprises the steps of providing a scanning transmission charged particle microscope, having an illuminator and a scanning unit. The method comprises the steps of providing a desired dose for at least a first sample location of the plurality of sample locations; and determining, using a controller of the microscope, a first set of parameter settings for the illuminator and the scanning unit for substantially achieving the desired dose at the first sample location.

公开(公告)号：US20230005708A1

公开(公告)日：2023-01-05

申请号：US17843215

申请日：2022-06-17

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Daniel Boecker

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/153

Abstract: A method includes: providing position data for a plurality of areas on the sample which are to be inspected; providing a first raster arrangement of the plurality of individual particle beams, with a single field of view on the sample assigned to each individual particle beam; defining the position of a nominal scanning area in each single field of view in relation to the first raster arrangement, with the dimensions of the nominal scanning area smaller than the complete single field of view; determining an individual position deviation between a nominal scanning area and the area to be inspected for the at least one individual particle beam; changing the first raster arrangement based on the determined individual position deviation to produce a second raster arrangement of the plurality of individual particle beams; and area-wise scanning the sample using the plurality of individual particle beams in the second raster arrangement.

公开(公告)号：US20220415605A1

公开(公告)日：2022-12-29

申请号：US17778526

申请日：2019-11-21

Applicant: Hitachi High-Tech Corporation

Inventor： Shingo HAYASHI ,  Hideto DOHI ,  Zhaohui CHENG ,  Hideyuki KAZUMI

IPC: H01J37/153 ,  H01J37/244 ,  H01J37/28

Abstract: A charged particle optical system includes an aberration corrector 209 that corrects aberration of a charged particle beam and has multipoles of a plurality of stages. The aberration corrector generates a plurality of multipole fields in a superimposed manner for each of the multipoles of the plurality of stages in order to correct the aberration of the charged particle beam. In order to reduce the influence of a parasitic field due to distortion of the multipole, for a first multipole field to be generated in a multipole of any stage among the plurality of stages, a value of a predetermined correction voltage or correction current to be applied to a plurality of poles for generating the first multipole field is corrected so as to eliminate movement of an observation image obtained based on electrons detected from a detector 215 by irradiating a sample with the charged particle beam before and after the first multipole field is generated.

公开(公告)号：US20220415602A1

公开(公告)日：2022-12-29

申请号：US17773897

申请日：2019-12-13

Applicant: Hitachi High-Tech Corporation

Inventor： Tomoyo SASAKI

IPC: H01J37/073 ,  H01J37/28 ,  H01J37/26 ,  H01J37/08

Abstract: The present disclosure provides a charged particle beam device capable of simultaneously achieving protection of a charged particle source against electrical discharging inside a charged particle gun and highly accurate control of the charged particle gun, for both DC and AC components. A charged particle gun according to the present disclosure is configured such that an extraction voltage and an acceleration voltage are superposed and supplied to a charged particle beam source, a wiring between the charged particle beam source and a voltage circuit is covered with first and second enclosures, the first enclosure is configured to be connected to an extraction electrode, and the second enclosure is configured to be connected to an acceleration electrode and to a reference voltage of the voltage circuit.

公开(公告)号：US20220406563A1

公开(公告)日：2022-12-22

申请号：US17897080

申请日：2022-08-26

Applicant: ASML Netherlands B.V.

Inventor： Laura DEL TIN ,  Almut Johanna STEGEMANN ,  German AKSENOV ,  Diego MARTINEZ NEGRETE GASQUE ,  Pieter Lucas BRANDT

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/28 ,  H01J37/09 ,  H01J37/20

Abstract: Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focusing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.

公开(公告)号：US20220392793A1

公开(公告)日：2022-12-08

申请号：US17820117

申请日：2022-08-16

Applicant: Carl Zeiss SMT GmbH

Inventor： Alex Buxbaum ,  Eugen Foca ,  Chuong Huynh ,  Dmitry Klochkov ,  Thomas Korb ,  Jens Timo Neumann ,  Baohua Niu

IPC: H01L21/67 ,  H01J37/28 ,  H01J37/305 ,  H01J37/22 ,  G06T7/00 ,  G06T7/50 ,  G06T7/30

Abstract: The present disclosure relates to dual beam device and three-dimensional circuit pattern inspection techniques by cross sectioning of inspection volumes with large depth extension exceeding 1 μm below the surface of a semiconductor wafer, as well as methods, computer program products and apparatuses for generating 3D volume image data of a deep inspection volume inside a wafer without removal of a sample from the wafer. The disclosure further relates to 3D volume image generation and cross section image alignment methods utilizing a dual beam device for three-dimensional circuit pattern inspection.

公开(公告)号：US20220392743A1

公开(公告)日：2022-12-08

申请号：US17891983

申请日：2022-08-19

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/317

Abstract: A charged-particle assessment tool comprising: a condenser lens array, a collimator, a plurality of objective lenses and an electric power source. The condenser lens array configured to divide a beam of charged particles into a plurality of sub-beams and to focus each of the sub-beams to a respective intermediate focus. The collimator being at each intermediate focus and configured to deflect a respective sub-beam so that it is incident on the sample substantially normally. The plurality of objective lenses, each configured to project one of the plurality of charged-particle beams onto a sample. Each objective lens comprises: a first electrode; and a second electrode that is between the first electrode and the sample. The electric power source configured to apply first and second potentials to the first and second electrodes respectively such that the respective charged-particle beam is decelerated to be incident on the sample with a desired landing energy.

公开(公告)号：US20220392740A1

公开(公告)日：2022-12-08

申请号：US17775993

申请日：2020-11-30

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Junya MAEDA ,  Kyogo KANEKO ,  Kuniyoshi YAMAUCHI

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/18

Abstract: A light emitter is a light emitter for converting incident electrons into light, and includes a multiple quantum well structure for generating the light by incidence of the electrons, and an electron incident surface provided on the multiple quantum well structure. A certain barrier layer included in a plurality of barrier layers constituting the multiple quantum well structure is thicker than another barrier layer included in the plurality of barrier layers and located on the electron incident surface side with respect to the certain barrier layer.

公开(公告)号：US20220392738A1

公开(公告)日：2022-12-08

申请号：US17831144

申请日：2022-06-02

Applicant: JEOL Ltd.

Inventor： Takeshi Otsuka

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/244

Abstract: A charged particle beam apparatus acquires a scanned image by scanning a specimen with a charged particle beam, and detecting charged particles emitted from the specimen. The apparatus includes a charged particle beam source that emits the charged particle beam; an irradiation optical system that scans the specimen with the charged particle beam; a plurality of detection units that detects the charged particles emitted from the specimen; and an image processing unit that reconstructs a profile of a specimen surface of the specimen, based on a plurality of detection signals outputted from the plurality of detection units. The image processing unit: determines an inclination angle of the specimen surface, based on the plurality of detection signals; processing to determine a height of the specimen surface, based on the scanned image; and reconstructs the profile of the specimen surface, based on the inclination angle and the height.