公开(公告)号：US07271396B2

公开(公告)日：2007-09-18

申请号：US10492574

申请日：2002-10-04

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, the beam is defelcted to two edges of the aperture. From the signals required to obtain an extinction, a correction deflection field is calculated. Furter, a method for automatically aligning a beam of charged particles with an optical axis is provided. Thereby a defocusing is introduced and a signal calculated based on an introduced image shift is applied to a deflection unit. Further, a method for correction of the astigmatism is provided. Thereby the sharpness is evaluated for a sequence of frames measured whilst varying the signals to a stigmator.

Abstract translation: 本发明提供一种用于将带电粒子束自动对准孔的方法。 由此，光束被消除到光圈的两个边缘。 根据获得消光所需的信号，计算校正偏转场。 Furter提供了一种用于将带电粒子束自动对准光轴的方法。 从而引入散焦，并将基于引入的图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正像散的方法。 因此，对于在将信号改变为瞄准器的同时测量的帧序列来评估锐度。

公开(公告)号：US20070194234A1

公开(公告)日：2007-08-23

申请号：US11783732

申请日：2007-04-11

Applicant: Yoshinori Nakada ,  Shunsuke Koshihara ,  Ryulchirou Tamochi ,  Yayol Hosoya ,  Hidetoshi Morokuma

Inventor： Yoshinori Nakada ,  Shunsuke Koshihara ,  Ryulchirou Tamochi ,  Yayol Hosoya ,  Hidetoshi Morokuma

IPC: G21K7/00

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/221 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2826

Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.

公开(公告)号：US07253645B2

公开(公告)日：2007-08-07

申请号：US11069491

申请日：2005-02-28

Applicant: Christopher G. Talbot ,  Chiwoei Wayne Lo

Inventor： Christopher G. Talbot ,  Chiwoei Wayne Lo

IPC: G01R31/305 ,  G01R31/02 ,  G01N23/22

CPC classification number: H01J37/265 ,  G06T7/0004 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2485 ,  H01J2237/2817

Abstract: A method of detecting defects in a patterned substrate includes positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column having a field of view (FOV) with a substantially uniform resolution over the FOV; operating the charged-particle-beam optical column to acquire images of a region of the patterned substrate lying within the FOV by scanning the charged-particle beam over the patterned substrate; and comparing the acquired images to a reference to identify defects in the patterned substrate.

Abstract translation: 检测图案化衬底中的缺陷的方法包括相对于图案化衬底定位带电粒子束光学柱，具有在FOV上具有基本均匀分辨率的视场（FOV）的带电粒子束光学柱; 操作带电粒子束光学柱以通过在图案化衬底上扫描带电粒子束来获取位于FOV内的图案化衬底的区域的图像; 以及将获取的图像与参考值进行比较，以识别图案化衬底中的缺陷。

公开(公告)号：US20070158568A1

公开(公告)日：2007-07-12

申请号：US11645567

申请日：2006-12-27

Applicant: Taisuke Nakamura ,  Kuniyasu Nakamura

Inventor： Taisuke Nakamura ,  Kuniyasu Nakamura

IPC: G21K7/00

CPC classification number: H01J37/153 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/2802

Abstract: In the type of scanning transmission electron microscopes carrying an aberration corrector, a method of assuring more simplified and manipulatable adjustment of the corrector and a scanning transmission electron microscope having that function are provided. A Ronchigram image is acquired using a spherical standard specimen and parameters necessary for the adjustment are acquired from the thus obtained Ronchigram.

Abstract translation: 在携带像差校正器的扫描透射电子显微镜的类型中，提供了确保校正器的更简化和可操作调节的方法以及具有该功能的扫描透射电子显微镜。 使用球形标准样品获得Ronchigram图像，并且从由此获得的Ronchigram获得调整所需的参数。

公开(公告)号：US20070125948A1

公开(公告)日：2007-06-07

申请号：US11434142

申请日：2006-05-16

Applicant: Yo-Han Choi ,  Hee-Bom Kim

Inventor： Yo-Han Choi ,  Hee-Bom Kim

IPC: G21K7/00

CPC classification number: H01J37/265 ,  H01J37/222 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2485 ,  H01J2237/2817

Abstract: A method and apparatus for measuring a critical dimension (CD) are provided. Image data of a measurement pattern are generated. The measurement pattern may include a first surface and a second surface facing each other. The image data may include a first side and a second side corresponding to the first surface and the second surface of the measurement pattern, respectively. The image data may be edited to increase an overlap length of the first and second sides. A measurement window crossing the first and second sides in the edited image data is set. A distance between the first and second sides in the measurement window is measured.

Abstract translation: 提供了一种用于测量临界尺寸（CD）的方法和装置。 产生测量图案的图像数据。 测量图案可以包括彼此面对的第一表面和第二表面。 图像数据可以分别包括对应于测量图案的第一表面和第二表面的第一侧和第二侧。 可以编辑图像数据以增加第一和第二侧的重叠长度。 设置与编辑图像数据中的第一和第二边交叉的测量窗口。 测量测量窗口中的第一和第二侧之间的距离。

公开(公告)号：US20070120065A1

公开(公告)日：2007-05-31

申请号：US11599611

申请日：2006-11-15

Applicant: Atsushi Takane ,  Satoru Yamaguchi ,  Mitsugu Sato

Inventor： Atsushi Takane ,  Satoru Yamaguchi ,  Mitsugu Sato

IPC: G01K1/08

CPC classification number: H01J37/1471 ,  H01J37/265 ,  H01J2237/1501 ,  H01J2237/216 ,  H01J2237/28

Abstract: A charged particle beam apparatus is provided which can prevent the accuracy of positional shift detection from being degraded owing to differences in picture quality, so that even when the state of a charged particle beam is changed at the time that optical conditions are changed or the optical axis changes with time, an auto adjustment of the optical axis can be realized easily and highly accurately. In the charged particle beam apparatus, evaluation or adjustment of focusing is conducted before the deflection condition of an alignment deflector for optical axis adjustment is changed or a table of focus adjustment amounts in correspondence with deflection conditions of the alignment deflector is provided, whereby when the deflection condition of the alignment deflector is changed, a focus adjustment is carried out in accordance with the table.

Abstract translation: 提供一种带电粒子束装置，其可以防止由于图像质量的差异而导致的位置偏移检测的精度降低，使得即使当光学条件改变时带电粒子束的状态改变或光学条件改变时， 轴随时间变化，可以容易且高精度地实现光轴的自动调节。 在带电粒子束装置中，在用于光轴调节的对准偏转器的偏转状态改变之前进行聚焦的评估或调整，或者提供与对准偏转器的偏转条件相对应的焦点调整量表， 改变对准偏转器的偏转状态，根据该表进行焦点调整。

公开(公告)号：US07217923B2

公开(公告)日：2007-05-15

申请号：US11197584

申请日：2005-08-05

Applicant: Fumihiro Sasajima ,  Osamu Komuro ,  Fumio Mizuno

Inventor： Fumihiro Sasajima ,  Osamu Komuro ,  Fumio Mizuno

IPC: G01N23/225

CPC classification number: G03F7/70608 ,  G01N23/225 ,  G06T7/0004 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2487

Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.

公开(公告)号：US20070085007A1

公开(公告)日：2007-04-19

申请号：US11582955

申请日：2006-10-19

Applicant: Mine Araki ,  Shunya Watanabe ,  Chisato Kamiya ,  Mitsugu Sato ,  Atsushi Takane ,  Akinari Morikawa ,  Atsushi Miyaki ,  Toru Ishitani

Inventor： Mine Araki ,  Shunya Watanabe ,  Chisato Kamiya ,  Mitsugu Sato ,  Atsushi Takane ,  Akinari Morikawa ,  Atsushi Miyaki ,  Toru Ishitani

IPC: G21K7/00

CPC classification number: H01J37/265 ,  H01J2237/221

Abstract: There is disclosed a charged particle beam device which judges whether or not an image based on a dark-field signal has an appropriate atomic number contrast. Input reference information, a bright-field image or a back-scattered electron image is compared with a dark-field image, and it is judged whether or not a correlation value between them or the dark-field image has a predetermined contrast. According to such a constitution, it is possible to obtain information by which it is judged whether or not the dark-field image has an appropriate atomic number contrast.

Abstract translation: 公开了一种带电粒子束装置，其判断基于暗场信号的图像是否具有适当的原子序数对比度。 将输入参考信息，亮场图像或背散射电子图像与暗视场图像进行比较，并且判断它们之间的相关值或暗视场图像是否具有预定的对比度。 根据这样的结构，可以获得判断暗场图像是否具有适当的原子序数对比度的信息。

公开(公告)号：US20060284088A1

公开(公告)日：2006-12-21

申请号：US11439538

申请日：2006-05-24

Applicant: Fumihiko Fukunaga ,  Kouichi Hayakawa ,  Masayoshi Takeda

Inventor： Fumihiko Fukunaga ,  Kouichi Hayakawa ,  Masayoshi Takeda

IPC: G21K7/00

CPC classification number: H01J37/265 ,  H01J37/21 ,  H01J37/222 ,  H01J37/244 ,  H01J2237/004 ,  H01J2237/216 ,  H01J2237/2487 ,  H01J2237/2817

Abstract: A charged particle application circuit pattern inspection apparatus and method are disclosed, in which the reduction in the rejection rate attributable to an out-of-focus state due to the change in the charge condition on the sample surface is prevented and the false information is reduced to improve the apparatus reliability. The image acquisition position on a sample is stored in an image acquisition position storage unit, a focus correction value is stored in a focus correction value storage unit in accordance with the image acquisition position and the sample charge condition, the inspection conditions and the sample to be inspected are input from an input unit, the sample charge condition is evaluated in accordance with the image position acquisition position, and the focal point is corrected by a focus correction unit.

Abstract translation: 公开了一种带电粒子应用电路图案检查装置和方法，其中防止由于样品表面上的充电条件的变化而导致的失焦状态的抑制率的降低，并且错误信息被减少 提高设备的可靠性。 将样本上的图像获取位置存储在图像获取位置存储单元中，根据图像获取位置和样本计费条件，检查条件和样本将聚焦校正值存储在聚焦校正值存储单元中 被检查是从输入单元输入的，根据图像位置获取位置评估样本计费条件，并且通过聚焦校正单元校正焦点。

公开(公告)号：US07151258B2

公开(公告)日：2006-12-19

申请号：US10897434

申请日：2004-07-23

Applicant: Nobuo Kochi ,  Hirotami Koike ,  Yasuko Tsuruga ,  Shinichi Okada

Inventor： Nobuo Kochi ,  Hirotami Koike ,  Yasuko Tsuruga ,  Shinichi Okada

IPC: H01J37/28

CPC classification number: H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2611

Abstract: To provide an electron beam system capable of performing three-dimensional measurement of a sample with high precision irrespective of the tilt angle and height of the sample. The electron beam system has a correction factor storing section 32 for storing a correction factor at a reference tilt angle with respect to a plane which is used to tilt a sample by a sample tilting section 5, an approximate coordinate measuring section 28 for obtaining an approximate shape or approximate coordinate values of the sample based on an output corresponding to a stereo image from an electron beam detecting section 4, an image correcting section 30 for correcting the stereo image according to the tilt angle created by the sample tilting section 5 based on the shape or coordinate values of the sample obtained in the approximate coordinate measuring section 28 using a correction factor stored in the correction factor storing section 32, and a precise coordinate measuring section 34 for obtaining a shape or coordinate values of the sample which are more precise than those obtained in the approximate coordinate measuring section 28 based on a corrected stereo image obtained in the image correcting section 30.

Abstract translation: 提供能够以高精度执行样品的三维测量的电子束系统，而与样品的倾斜角度和高度无关。 电子束系统具有校正因子存储部分32，用于存储相对于用于通过样本倾斜部分5倾斜样本的平面的参考倾斜角的校正因子，用于获得近似坐标测量部分28的近似坐标测量部分28 基于与来自电子束检测部分4的立体图像相对应的输出的样本的形状或近似坐标值，用于根据由样本倾斜部分5产生的倾斜角校正立体图像的图像校正部分30 使用存储在校正因子存储部分32中的校正因子在近似坐标测量部分28中获得的样本的形状或坐标值，以及精确坐标测量部分34，用于获得样本的形状或坐标值，其比 基于所获得的校正立体图像在近似坐标测量部分28中获得的那些 在图像校正部30中。