Abstract:
A silica optical fiber is provided, which contains a pure-silica core and a cladding layer formed on the pure-silica core, wherein the pure-silica core contains a C element and has a content of elements belonging to the third period-the seventh period of the periodic table, except Si element that constitutes the quartz structure, of not more than 100 ppm. The present invention can provide a silica optical fiber superior in the resistance to high energy electromagnetic waves such as UV light and &ggr;-rays.
Abstract:
A method for making silica includes delivering a silica precursor comprising a perfluorinated group to a conversion site and passing the silica precursor through a conversion flame to produce silica soot.
Abstract:
Optical waveguide fiber having low water peak as well as optical waveguide fiber preforms and methods of making optical waveguide fiber preforms from which low water peak and/or low hydrogen aged attenuation optical waveguide fibers are formed, including optical waveguide fiber and preforms made via OVD. The fibers may be hydrogen resistant, i.e. exhibit low hydrogen aged attenuation. A low water peak, hydrogen resistant optical waveguide fiber is disclosed which exhibits an optical attenuation at a wavelength of about 1383 nm which is less than or equal to an optical attenuation exhibited at a wavelength of about 1310 nm.
Abstract:
Methods of fabricating an optical fiber preform and a method of fabricating an optical fiber of the invention realize the fabrication of an optical fiber having desirable transmission characteristics in the entire wavelength rage of about 1.3 to 1.6 nullm. The fabrication method comprisses a porous core rod producing step of depositing a first cladding (3) having an outer diameter D so as to surround a core (2) having an outer diameter d to produce a porous core rod (1) of D/dnull4.0 by VAD. Then, the porous core rod (1) is dehydrated to reduce the OH group concentration to 0.8 ppb or less by weight ratio. The porous core rod (1) is formed to be transparent for a vitrified core rod (4) and is heated and stretched. Thereafter, a second cladding is obtained by depositing a second porous cladding (5) around the vitrified core rod (4) by VAD to be dehydrated, transparent and vitrified. The optical fiber preform thus fabricated is drawn to form into an optical fiber and is then allowed to stand in a deuterium gas atmosphere for a predetermined period.
Abstract:
High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.
Abstract translation:公开了适用于在190nm以下的VUV波长区域中用于光刻应用的光掩模基板的高纯度直接沉积玻璃化硅氧氟化物玻璃。 本发明的直接沉积玻璃化硅氧氟化物玻璃在157nm波长附近是透射的,使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是在真空紫外(VUV)波长区域中显示非常高的透射率的干直接沉积玻璃化硅氧氟化物玻璃,同时保持通常与高纯度熔融二氧化硅相关的优异的热和物理性能。 除了含氟且具有很少或不含OH含量之外,本发明的适用于157nm的光掩模衬底的直接沉积玻璃化氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。
Abstract:
High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.
Abstract translation:公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的,使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是“真空”的氟氧化硅玻璃,其在真空紫外(VUV)波长区域中表现出非常高的透射率,同时保持通常与高纯度熔融石英相关的优异的热和物理性能。 除了含氟并且具有很少或不含OH含量之外,本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。
Abstract:
A large optical preform 303 is made by a modified chemical vapor deposition (MCVD) process by depositing successive layers of core and cladding materials onto the inside surface of a rotating glass tube 33 having a hydroxyl ion (OH.sup.-) level that is less than 0.5 parts per million (ppm) by weight. The tube is then collapsed inwardly to form a core rod 301 in which the deposited core material 31 has a diameter that is greater than about 5 millimeters and the deposited cladding material 32 has an outside diameter that is less than about 15 millimeters. A machine-vision system 140, 150, 160 monitors and controls the diameter of the glass tube by regulating the pressure within the tube. Moreover, the machine-vision system monitors and controls the straightness of the tube by varying its rotational speed according to angular position. After the core rod 301 is formed, it is plasma etched to remove contaminants, and then overclad with two glass jackets 34, 35 having a hydroxyl ion (OH.sup.-) level that is less than 1.0 ppm by weight to create a large preform 303 from which about 400 kilometers of singlemode optical fiber can be drawn per meter of length.
Abstract:
A glass preform which is used for fabricating an optical fiber, has substantially no bubbles therein and contains sufficient amount of fluorine is produced by a method comprising steps of: forming a porous glass soot body from a glass-forming raw material, removing trapped gas and water from pores of the soot body by heating the soot body under pressure lower than several ten Torr. at a temperature at which the soot body is not vitrified, filling the pores of the soot body with a gas containing SiF.sub.4 and uniformly adding fluorine to the soot body, vitrifying the fluorine-added soot body into a transparent glass body, boring said transparent glass body to form a bore therein, and inserting a highly pure quartz rod in said bore to form a glass preform, or a method forming a glass soot composite body having a core portion consisting of a solid glass and a peripheral portion consisting of a porous glass mass, removing trapped gas and water from pores of the soot composite body by heating the soot composite body under a pressure lower than several ten Torr. at a temperature at which the porous glass mass is not vitrified, filling the pores in the porous glass mass of the soot composite body with a gas containing SiF.sub.4 and uniformly adding fluorine to the soot glass mass, and vitrifying the fluorine-added soot glass mass into a transparent glass mass to form a glass preform.
Abstract:
The present invention providesa process for the dehydrating and purifying treatment by heating a porous glass preform for an optical fiber by passing the porous glass preform through a muffle tube having a SiC layer at least on its inner surface at a high temperature under an atmosphere containing an inert gas and a silicon halogenide gas;a process for the fluorine-doping treatment by heating a porous glass preform for an optical fiber by passing a porous glass preform through a muffle tube having a SiC layer at least on its inner surface at a high temperature under an atmosphere containing a fluorine compound gas and an inert gas; anda process for the vitrifying treatment by heating a porous glass preform for an opticla fiber by passing the preform, which has been previously dehydrated and purified, through a muffle tube having a SiC layer at least on its inner surface at a high temperature under an atmosphere gas.
Abstract:
The invention relates to microstructured optical fibers that are drawn through hollow channels and have a core region, which extends along a fiber longitudinal axis, and a jacket region surrounding the core region. The aim of the invention is to reduce a damping increase due to corrosion and to reduce the emission of chlorine on the basis of the microstructured optical fibers. This is achieved in that at least some of the hollow channels are delimited by a wall material made of synthetic quartz glass which has a chlorine concentration of less than 300 wt. ppm and oxygen deficiency centers in a concentration of at least 2×1015 cm-3.