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    BLANK OF TITANIUM-DOPED GLASS WITH A HIGH SILICA CONTENT FOR A MIRROR SUBSTRATE FOR USE IN EUV LITHOGRAPHY AND METHOD FOR THE PRODUCTION THEREOF
    151.
    发明申请
    BLANK OF TITANIUM-DOPED GLASS WITH A HIGH SILICA CONTENT FOR A MIRROR SUBSTRATE FOR USE IN EUV LITHOGRAPHY AND METHOD FOR THE PRODUCTION THEREOF 有权
    具有高二氧化硅含量的钛白粉玻璃用于在EUV光刻中使用的镜面基板及其生产方法

    公开(公告)号：US20150140257A1

    公开(公告)日：2015-05-21

    申请号：US14569535

    申请日：2014-12-12

    Applicant: Heraeus Quarzglas GmbH & Co. KG

    Inventor： Bodo Kuehn

    IPC: C03B23/20 ,  G02B5/10 ,  G03F7/20 ,  C03C3/06

    CPC classification number: C03B23/20 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  G02B5/10 ,  G03F7/708 ,  Y10T428/22 ,  Y10T428/24612

    Abstract: On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.

    Abstract translation: 基于具有高二氧化硅含量的钛掺杂玻璃的坯料的制造方法（玻璃）的基础是用于具有外表面的EUV光刻用的镜面基板，其目的是设置有 反射涂层，并且当反射镜基板按预期使用时被指定为高负载区域，以便提供可以以低成本生产的空白，并且在均匀性方面满足高要求并且不受起泡和条纹的影响， 提出了包括以下方法步骤的方法：（a）制造尺寸大到足以包围外轮廓的钛掺杂高品质玻璃的前体，（b）从掺钛玻璃制造圆柱形支撑体 ，（c）将所述前体和所述支撑体接合以形成复合体，和（d）加工所述复合体以形成所述反射镜基板坯料，其中，所述制造所述前体的步骤包括 一种均质化方法，其特征在于，通过使含硅化合物的火焰水解使绞合线形成的起始体扭转而形成前体坯料，所述支撑体形成为与前身均匀性较差的整体式玻璃块。

    Very low CTE slope doped silica-titania glass
    152.
    发明授权
    Very low CTE slope doped silica-titania glass 有权
    非常低的CTE斜率掺杂二氧化硅 - 二氧化钛玻璃

    公开(公告)号：US08901019B2

    公开(公告)日：2014-12-02

    申请号：US13835039

    申请日：2013-03-15

    Applicant: Corning Incorporated

    Inventor： Seshian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

    IPC: G03F1/22 ,  C03C3/06 ,  C03C4/00 ,  C03B19/14 ,  C03B19/12

    CPC classification number: G03F1/22 ,  C03B19/12 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/54

    Abstract: The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the halogen content can be in the range of 0.2 wt. % to 3 wt. % along with 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a fictive temperature Tf of less than 875° C. In an embodiment Tf is less than 825° C. In another embodiment Tf is less than 775° C.

    Abstract translation: 本公开涉及掺杂的二氧化硅 - 二氧化钛玻璃，DST玻璃，其基本上由0.1重量％ ％至5wt。 ％卤素，50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％至10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，卤素含量可以在0.2wt。 ％〜3重量％ ％和50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，DST玻璃的OH浓度小于100ppm。 在另一个实施方案中，OH浓度小于50ppm。 DST玻璃具有小于875℃的假想温度Tf。在一个实施方案中，Tf小于825℃。在另一个实施方案中，Tf小于775℃

    Process for production of synthetic quartz glass
    157.
    发明授权
    Process for production of synthetic quartz glass 有权
    合成石英玻璃生产工艺

    公开(公告)号：US08240172B2

    公开(公告)日：2012-08-14

    申请号：US13080704

    申请日：2011-04-06

    Applicant: Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

    Inventor： Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

    IPC: C03B37/018

    CPC classification number: C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42

    Abstract: The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

    Abstract translation: 本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括：（a）沉积和生长通过玻璃成形的火焰水解得到的石英玻璃微粒子的工序 原料在基板上，从而形成多孔玻璃体; （b）将多孔玻璃体保持在填充有元素氟（F2）的反应容器或包含用惰性气体稀释的元素氟（F2）的混合气体并含有固体金属氟化物的步骤，从而获得 含氟多孔玻璃体; 和（c）将含氟多孔质玻璃体加热至透明玻璃化温度的步骤，得到含氟透明玻璃体。

    TITANIA-DOPED QUARTZ GLASS MEMBER AND MAKING METHOD
    158.
    发明申请
    TITANIA-DOPED QUARTZ GLASS MEMBER AND MAKING METHOD 有权
    TITANIA-DOPED QUARTZ玻璃成员和制作方法

    公开(公告)号：US20120104336A1

    公开(公告)日：2012-05-03

    申请号：US13345936

    申请日：2012-01-09

    Applicant: Shigeru MAIDA ,  Hisatoshi Otsuka

    Inventor： Shigeru MAIDA ,  Hisatoshi Otsuka

    IPC: C03C4/04

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/0026 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  Y10T428/31616

    Abstract: In a titania-doped quartz glass member having a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member has a surface with a high level of precision and thus can be formed into an EUV lithography photomask substrate which is improved in flatness and thermal expansion properties.

    Abstract translation: 在具有反射高达70nm波长的EUV光的表面的二氧化钛掺杂石英玻璃构件中，表面中的折射率分布在构件的中心80％区域内仅具有一个极值点。 掺杂二氧化钛的石英玻璃构件具有高精度的表面，因此可以形成为平面度和热膨胀性能提高的EUV光刻光掩模基板。

    Titania-doped quartz glass member and making method
    159.
    发明授权
    Titania-doped quartz glass member and making method 有权
    二氧化钛掺杂石英玻璃构件及制造方法

    公开(公告)号：US08105734B2

    公开(公告)日：2012-01-31

    申请号：US12496688

    申请日：2009-07-02

    Applicant: Shigeru Maida ,  Hisatoshi Otsuka

    Inventor： Shigeru Maida ,  Hisatoshi Otsuka

    IPC: G03F1/00 ,  C03B19/06

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/0026 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  Y10T428/31616

    Abstract: In a titania-doped quartz glass member having a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member has a surface with a high level of precision and thus can be formed into an EUV lithography photomask substrate which is improved in flatness and thermal expansion properties.

    Abstract translation: 在具有反射高达70nm波长的EUV光的表面的二氧化钛掺杂石英玻璃构件中，表面中的折射率分布在构件的中心80％区域内仅具有一个极值点。 掺杂二氧化钛的石英玻璃构件具有高精度的表面，因此可以形成为平面度和热膨胀性能提高的EUV光刻光掩模基板。

    METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS
    160.
    发明申请
    METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS 审中-公开
    合成石英玻璃的生产方法

    公开(公告)号：US20110239707A1

    公开(公告)日：2011-10-06

    申请号：US13078427

    申请日：2011-04-01

    Applicant: Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

    Inventor： Chikaya Tamitsuji ,  Kunio Watanabe ,  Akio Koike

    IPC: C03B20/00

    CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42

    Abstract: The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of a pressure of Pb1 and a temperature of 400° C. or lower, and followed by maintaining in the reaction vessel under condition of a pressure Pb2 lower than the pressure Pb1 and a temperature of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

    Abstract translation: 本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括以下工序（a）〜（c）：（a）沉积和生长石英玻璃微粒，其由 将玻璃形成材料火焰水解成基材，从而形成多孔玻璃体; （b）在Pb1的压力和温度为400℃以下的元素含氟（F2）的气氛下，将多孔玻璃体保持在反应容器中，然后在反应容器的保持条件 压力Pb2低于压力Pb1，温度为400℃以下，得到含氟多孔玻璃体; 和（c）将玻璃化炉中的含氟多孔质玻璃体加热至透明玻璃化温度，得到含氟透明玻璃体。

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