Aerogel-bases mold for MEMS fabrication and formation thereof
    167.
    发明授权
    Aerogel-bases mold for MEMS fabrication and formation thereof 有权
    用于MEMS制造和形成的基于气凝胶的模具

    公开(公告)号:US08851442B2

    公开(公告)日:2014-10-07

    申请号:US12017944

    申请日:2008-01-22

    Abstract: The invention is directed to a patterned aerogel-based layer that serves as a mold for at least part of a microelectromechanical feature. The density of an aerogel is less than that of typical materials used in MEMS fabrication, such as poly-silicon, silicon oxide, single-crystal silicon, metals, metal alloys, and the like. Therefore, one may form structural features in an aerogel-based layer at rates significantly higher than the rates at which structural features can be formed in denser materials. The invention further includes a method of patterning an aerogel-based layer to produce such an aerogel-based mold. The invention further includes a method of fabricating a microelectromechanical feature using an aerogel-based mold. This method includes depositing a dense material layer directly onto the outline of at least part of a microelectromechanical feature that has been formed in the aerogel-based layer.

    Abstract translation: 本发明涉及用作至少部分微机电特征的模具的图案化气凝胶基层。 气凝胶的密度小于MEMS制造中使用的典型材料的密度,例如多晶硅,氧化硅,单晶硅,金属,金属合金等。 因此,可以以明显高于在较致密的材料中形成结构特征的速率的速率在气凝胶层中形成结构特征。 本发明还包括一种图案化气凝胶层以产生这种基于气凝胶的模具的方法。 本发明还包括使用基于气凝胶的模具制造微机电特征的方法。 该方法包括将致密材料层直接沉积在已经形成在气凝胶层中的微机电特征的至少一部分的轮廓上。

    Fine metal structure, process for producing the same, fine metal mold and device
    169.
    发明授权
    Fine metal structure, process for producing the same, fine metal mold and device 失效
    精细金属结构,制造方法,精细金属模具及装置

    公开(公告)号:US08741380B2

    公开(公告)日:2014-06-03

    申请号:US12859802

    申请日:2010-08-20

    Abstract: A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern.

    Abstract translation: 精细的金属结构,其表面具有高强度,高精度和大纵横比的微喷射体; 以及没有缺陷的金属微细结构的制造方法。 提供了具有微喷射体的表面的细金属结构,其特征在于,微喷射体具有10纳米至10微米的最小厚度或最小直径,并且微喷射体的最小厚度或最小直径(D)与高度 的微喷射体(H)H / D大于1.还提供了一种制造精细金属结构的方法,其特征在于,在其表面上提供具有细凹凸图案的基板,将分子无电镀催化剂 然后进行无电解电镀,从而形成具有凹凸图案的金属层,并将金属层与基板分离,从而获得配备有经过上述凹凸图案的反转传送的表面的精细金属结构。

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