公开(公告)号：US08017536B2

公开(公告)日：2011-09-13

申请号：US12226861

申请日：2007-09-04

Applicant: Juergen Weber ,  Tatsuhiro Sato ,  Ralf Schneider ,  Achim Hofmann ,  Christian Gebauer

Inventor： Juergen Weber ,  Tatsuhiro Sato ,  Ralf Schneider ,  Achim Hofmann ,  Christian Gebauer

IPC: C03C3/06 ,  C03B19/06 ,  C03B19/00

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/24 ,  C03B2201/34 ,  C03B2201/36 ,  C03C4/20 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2203/10 ,  C03C2203/54

Abstract: The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO2 and dopant). Starting from this, to provide a quartz glass component for use in semiconductor manufacture in an environment with etching action, which component is distinguished by both high purity and high resistance to dry etching and avoids known drawbacks caused by co-doping with aluminum oxide, it is suggested according to the invention that the first dopant should be nitrogen and that the mean content of metastable hydroxyl groups of the quartz glass is less than 30 wtppm.

Abstract translation: 本发明从用于半导体制造的石英玻璃的已知组件开始，至少在近表面区域中的该组分表现出第一掺杂剂和第二氧化物掺杂剂的共掺杂，所述第二掺杂剂含有一种或多种稀有金属 - 浓度为0.1-3重量％的矿物金属。 每个（基于SiO 2和掺杂剂的总质量）。 从此开始，为了在具有蚀刻作用的环境中提供用于半导体制造的石英玻璃组分，该组分通过高纯度和高耐干蚀刻性而被区分，并避免了与氧化铝共掺杂引起的已知缺点。 根据本发明建议第一掺杂剂应为氮，并且石英玻璃的亚稳态羟基的平均含量小于30重量ppm。

公开(公告)号：US08012894B2

公开(公告)日：2011-09-06

申请号：US12151172

申请日：2008-05-05

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Rostislav Radievich Khrapko

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Rostislav Radievich Khrapko

IPC: C03C3/06 ,  C03B19/06 ,  C03B19/00 ,  C03B37/00 ,  C03B37/018

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/31 ,  C03C2201/22 ,  C03C2201/23 ,  C03C2203/54

Abstract: A fused silica glass and a fused silica article having a combined concentration of at least one of OH and OD of up to about 50 ppm. The fused silica glass is formed by drying a fused silica soot blank or preform in an inert atmosphere containing a drying agent, followed by removal of residual drying agent from the dried soot blank by heating the dried soot blank in an atmosphere comprising an inert gas and of oxygen.

Abstract translation: 熔融石英玻璃和熔融二氧化硅制品，其具有高达约50ppm的OH和OD中的至少一种的组合浓度。 熔融二氧化硅玻璃通过在含有干燥剂的惰性气氛中干燥熔融二氧化硅烟灰坯料或预型体而形成，然后通过在包含惰性气体的气氛中加热干燥的烟灰坯料从干燥的烟灰坯中除去残留的干燥剂， 的氧气。

公开(公告)号：US20110092354A1

公开(公告)日：2011-04-21

申请号：US12902238

申请日：2010-10-12

Applicant: Carlos Duran ,  Kenneth Edward Hrdina ,  Ulrich Wilhelm Heinz Neukirch

Inventor： Carlos Duran ,  Kenneth Edward Hrdina ,  Ulrich Wilhelm Heinz Neukirch

IPC: C03C3/04 ,  C03B25/00

CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2201/23

Abstract: A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.

Abstract translation: 制造具有均匀的假想温度的二氧化硅玻璃的方法。 将玻璃制品在目标假想温度下加热，或以低于假想温度变化率的速率加热或冷却一段足以使玻璃的假想温度达到3°的时间 C.目标虚构温度。 然后将二氧化硅玻璃从目标假想温度冷却至低于玻璃应变点的温度，其冷却速率大于目标假想温度下玻璃的松弛率。 二氧化硅玻璃具有在退火步骤之后变化小于3℃的假想温度。 还描述了通过该方法制备的二氧化硅玻璃。

公开(公告)号：US07906446B2

公开(公告)日：2011-03-15

申请号：US12556848

申请日：2009-09-10

Applicant: Douglas Clippinger Allan ,  Dana Craig Bookbinder ,  Ulrich W H Neukirch ,  Charlene Marie Smith

Inventor： Douglas Clippinger Allan ,  Dana Craig Bookbinder ,  Ulrich W H Neukirch ,  Charlene Marie Smith

IPC: C03C3/06

CPC classification number: C03B19/1453 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/23 ,  C03C2203/54

Abstract: Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.

Abstract translation: 公开了具有低偏振诱发双折射的合成石英玻璃，用于制造玻璃的方法和包含由玻璃制成的光学元件的光刻系统。 当在大约193nm处的准分子激光脉冲具有约40μJ·cm-2·pulse-1的注量和脉冲长度时，石英玻璃具有在633nm处测量的偏振诱发双折射小于约0.1nm / cm 对于5×109脉冲，约25ns。

公开(公告)号：US20100323871A1

公开(公告)日：2010-12-23

申请号：US12868900

申请日：2010-08-26

Applicant: Akio Koike ,  Kenta Saito ,  Long Shao ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio Koike ,  Kenta Saito ,  Long Shao ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/04

CPC classification number: C03B19/1453 ,  C03B19/1415 ,  C03B2201/075 ,  C03B2201/23 ,  C03B2201/42 ,  C03B2207/70 ,  C03B2207/81 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.

Abstract translation: 本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。 本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

公开(公告)号：US20100180634A1

公开(公告)日：2010-07-22

申请号：US12688332

申请日：2010-01-15

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: C03B20/00 ,  C03B19/08

CPC classification number: C03B19/1453 ,  C03B19/1469 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2207/20 ,  Y02P40/57

Abstract: Disclosed is a method of producing a synthetic quartz glass for excimer laser by depositing on a target silica particulates obtained by subjecting a silica raw material to vapor-phase hydrolysis or oxidative decomposition in an oxyhydrogen flame in a vacuum sintering furnace to form a porous silica base material, vitrifying the porous silica base material, and subjecting the vitrified material to hot forming, an annealing treatment and a hydrogen doping treatment, wherein the vitrification of the porous silica base material includes: (a) a step of holding a vacuum pressure at or below 20.0 Pa in a temperature range from 400° C., inclusive, to 900° C., exclusive; (b) a step of holding a vacuum pressure at or below 10.0 Pa in a temperature range from 900° C., inclusive, to 1100° C., exclusive; and (c) a step of holding a vacuum pressure at or below 3.0 Pa in a temperature range from 1100° C. to a transparent-vitrification temperature.

Abstract translation: 公开了一种通过在真空烧结炉中在氧氢火焰中使二氧化硅原料进行气相水解或氧化分解而获得的目标二氧化硅微粒上沉积以制备准分子激光的合成石英玻璃的方法，以形成多孔二氧化硅基质 材料，玻璃化多孔二氧化硅基材，以及对玻璃化材料进行热成型，退火处理和氢掺杂处理，其中多孔二氧化硅基材的玻璃化包括：（a）将真空压力保持在或 低于20.0Pa，温度范围为400℃，至900℃，独占; （b）在900℃以上至1100℃的温度范围内保持真空压力为10.0Pa以下的工序。 和（c）在1100℃的温度范围内保持真空压力等于或低于3.0Pa的步骤至透明玻璃化温度。

公开(公告)号：US20100034998A1

公开(公告)日：2010-02-11

申请号：US12448998

申请日：2008-01-15

Applicant: Gerhard Schoetz ,  Karsten Braeuer ,  Jan Vydra

Inventor： Gerhard Schoetz ,  Karsten Braeuer ,  Jan Vydra

IPC: C03C13/04 ,  C03B37/018 ,  B28B23/08

CPC classification number: C03B37/01426 ,  C03B37/01211 ,  C03B37/01466 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2203/42 ,  C03C3/06

Abstract: To improve a known method for making a quartz glass tube as a semifinished product for the manufacture of optical fibers, the tube comprising an inner fluorine-doped quartz glass layer and an outer quartz glass layer, so as to achieve inexpensive manufacture and improved dimensional stability of the quartz glass tube, it is suggested according to the invention that the quartz glass of the inner layer should be produced in a first plasma deposition process with formation of an inner layer having a wall thickness of at least 1.5 mm, with a fluorine content of at least 1.5% by wt. being set in the quartz glass, and that the quartz glass of the outer layer should be produced in a second plasma deposition process and deposited directly or indirectly on the inner layer with formation of a composite tube, and that the composite tube should be elongated into the quartz glass tube.

Abstract translation: 为了改进用于制造石英玻璃管作为制造光纤的半成品的已知方法，该管包括内部掺氟石英玻璃层和外部石英玻璃层，以便实现便宜的制造和改善的尺寸稳定性 的石英玻璃管，根据本发明提出，内层的石英玻璃应该在第一等离子体沉积工艺中生产，形成壁厚至少为1.5mm的内层，氟含量 至少1.5重量％。 设置在石英玻璃中，并且外层的石英玻璃应该在第二等离子体沉积工艺中生产并直接或间接沉积在内层上，形成复合管，并且复合管应该被拉长成 石英玻璃管。

公开(公告)号：US20090232463A1

公开(公告)日：2009-09-17

申请号：US12381302

申请日：2009-03-10

Applicant: Lance Gibson ,  David Peckham ,  Robert Lingle, JR.

Inventor： Lance Gibson ,  David Peckham ,  Robert Lingle, JR.

IPC: G02B6/036

CPC classification number: G02B6/03683 ,  C03B37/01211 ,  C03B37/01228 ,  C03B37/014 ,  C03B37/018 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/31 ,  C03B2203/22

Abstract: The specification describes an improved optical fiber produced by a hybrid VAD/MCVD process. The core of the fiber is produced using VAD and the inner cladding layer has a depressed index and is produced using MCVD. In preferred embodiments, the optical power envelope is essentially entirely contained in VAD produced core material and the MCVD produced depressed index cladding material. Optical loss is minimized by confining most of the optical power to the VAD core where OH presence is low, as well as by maximizing the optical power in the un-doped silica region. The MCVD substrate tube material is essentially devoid of optical power.

Abstract translation: 本说明书描述了通过混合VAD / MCVD工艺生产的改进的光纤。 使用VAD制造纤维的芯，并且内包层具有凹陷指数，并且使用MCVD制造。 在优选实施例中，光功率包层基本上完全包含在VAD生产的芯材料中，并且MCVD产生凹陷的折射率包层材料。 通过将大部分光功率限制在其中OH存在低的VAD核心以及通过使未掺杂二氧化硅区域中的光功率最大化来将光损耗最小化。 MCVD衬底管材料基本上没有光学功率。

公开(公告)号：US07501367B2

公开(公告)日：2009-03-10

申请号：US11403267

申请日：2006-04-13

Applicant: Bodo Kuehn ,  Stephan Ochs ,  Steffen Kaiser ,  Denis Kassube

Inventor： Bodo Kuehn ,  Stephan Ochs ,  Steffen Kaiser ,  Denis Kassube

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57

Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.

Abstract translation: 提供用于投影透镜系统的石英玻璃的光学部件，用于工作波长低于250nm的浸没式光刻，其被优化用于线偏振UV激光辐射，特别是关于由各向异性密度变化引起的压实和双折射 根据本发明，建议石英玻璃应显示几种性能的组合：特别是基本上没有氧缺陷的玻璃结构，羟基的平均含量小于60重量ppm，氟的平均含量小于 10重量ppm，氯的平均含量小于1重量ppm。 一种制造这种光学元件的方法包括以下方法步骤：在还原条件下制备和干燥SiO 2烟炱体，并在玻璃化之前或期间用与石英玻璃结构的氧缺陷反应的试剂处理干燥的烟炱体。

公开(公告)号：US20080066497A1

公开(公告)日：2008-03-20

申请号：US11630405

申请日：2006-03-30

Applicant: Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

Inventor： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

IPC: C03C3/06 ,  C03B19/14 ,  H01L21/00

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/09 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/24 ,  C03B2201/32 ,  C03C15/00 ,  C03C19/00 ,  C03C23/0025 ,  C03C23/006 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/54 ,  C30B25/12 ,  C30B31/14 ,  C30B35/00 ,  Y02P40/57

Abstract: An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.

Abstract translation: 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其假想温度低于1250℃，在1200℃的温度下其粘度至少为10-13Pa。制备这种石英玻璃的经济方法包括以下方法步骤 ：将SiO 2原料熔化，得到石英玻璃坯料，将SiO 2原料或石英玻璃坯料进行脱水处理，加热SiO _{2 原料或石英玻璃坯料，在含氨气氛中在1050℃至1850℃的范围内的氮化温度，使用石英玻璃的石英玻璃 将玻璃坯料设定为1250℃以下的假想温度，进行表面处理 石英玻璃夹具形成石英玻璃夹具。}