Measuring light source, and measuring system for detecting a reflection spectrum

    公开(公告)号:US10180352B2

    公开(公告)日:2019-01-15

    申请号:US15694318

    申请日:2017-09-01

    Abstract: A measuring light source includes a hollow body having a diffusely reflective inner surface. Formed in the hollow body are a concave, concave mirror-shaped illumination space, a tubular light shaping space, and a concave, concave mirror-shaped light exit space, which have a shared axis. A light source for generating light is at least partially situated in the illumination space. The light exit space has a light exit. The illumination space and the light exit space with their concave mirror shapes are situated opposite one another and are connected by the tubular light shaping space. A diffusely reflecting reflective disk for reflecting the light, reflected from the inner surface of the hollow body situated in the light exit space, through the light exit to outside the hollow body is situated in the hollow body.

    Silicon film optical filtering systems and methods of fabrication

    公开(公告)号:US10162091B1

    公开(公告)日:2018-12-25

    申请号:US14885843

    申请日:2015-10-16

    Abstract: An optical filter has a layer of silicon film deposited onto a metallic substrate surface at a silicon film thickness corresponding to a wavelength of light to be filtered from incoming light. The critical coupling of light to the optical cavity formed by the silicon film on metal surface results in a strong and near perfect absorption of the light at a resonance wavelength and strong absorption in the wavelength region near the peak absorption wavelength. Other wavelengths of the incoming wave are reflected by the device so the spectral content of light is changed. By controlling the thickness of the silicon film and/or other factors, such as the extent to which the silicon film is annealed or the type of metal beneath the silicon film, the wavelength of the light absorbed by the silicon film can be precisely controlled.

    Method of determining the concentration of a gas component and a spectrometer for this purpose

    公开(公告)号:US10119906B2

    公开(公告)日:2018-11-06

    申请号:US15192120

    申请日:2016-06-24

    Applicant: SICK AG

    Abstract: The invention relates to a method of determining the concentration of a gas component comprising the steps: generating and guiding a light beam having a wavelength variable in a wavelength range through a measurement volume in which the gas component having an absorption in the wavelength range is present; tuning the wavelength range; detecting the intensity of the light beam after passage through the measurement volume; storage of measurement points during the tuning that respectively consist of a point in time and an associated intensity value, to obtain a direct absorption line; generating an artificial measurement curve from the stored measurement points by shifting the measurement points on the time axis; wherein the shift takes place so that an artificial modulation results in the wavelength time extent; and evaluating the artificial measurement curve in accordance with the method of the wavelength modulation spectroscopy and determining a first concentration value therefrom.

Patent Agency Ranking