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公开(公告)号：US20230035404A1
公开(公告)日：2023-02-02
申请号：US17758067
申请日：2020-12-24
Applicant: NOVA LTD.
Inventor： Yonatan OREN , Gilad BARAK
IPC: G01N21/956 , G01N21/95
Abstract: A combined OCD and photoreflectance system and method for improving the OCD performance in measurements of optical properties of a target sample. The system comprises (a) either a single channel OCD set-up comprised of a single probe beam configured in a direction normal/oblique to the target sample or a multi-channel OCD set-up having multiple probe beams configured in normal and oblique directions to the target sample for measuring the optical properties of the target sample, (b) at least one laser source for producing at least one laser beam, (c) at least one modulation device to turn the at least one laser beam into at least one alternatingly modulated laser beam, and (d) at least one spectrometer for measuring spectral components of the at least one light beam reflecting off said target sample; wherein the at least one alternatingly modulated laser beam is alternatingly modulating the spectral reflectivity of the target sample,
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公开(公告)号：US20220310356A1
公开(公告)日：2022-09-29
申请号：US17722421
申请日：2022-04-18
Applicant: NOVA LTD
Inventor： VLADIMIR MACHAVARIANI , MICHAEL SHIFRIN , DANIEL KANDEL , VICTOR KUCHEROV , IGOR ZISELMAN , RONEN URENSKI , MATTHEW SENDELBACH
Abstract: A metrology method for use in determining one or more parameters of a three-dimensional patterned structure, the method including performing a fitting procedure between measured TEM image data of the patterned structure and simulated TEM image data of the patterned structure, determining a measured Lamellae position of at least one measured TEM image in the TEM image data from a best fit condition between the measured and simulated data, and generating output data indicative of the simulated TEM image data corresponding to the best fit condition to thereby enable determination therefrom of the one or more parameters of the structure.
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公开(公告)号：US20160058619A1
公开(公告)日：2016-03-03
申请号：US14471009
申请日：2014-08-28
Applicant: OIDO NOVA LTD.
Inventor： Liat GOLDFARB , David Natan ARLINSKY
IPC: A61F11/10
Abstract: An ear protector device includes an earplug to insert into an ear canal of a user. The earplug includes a plurality of inflatable structures arranged along a longitudinal axis of the earplug. A length of the earplug is extendible to increase a distance between two of the inflatable structures. Each inflatable element is laterally inflatable when inserted into the ear canal so as to substantially fill a cross section of the ear canal.
Abstract translation: 耳塞装置包括插入用户耳道的耳塞。 耳塞包括沿着耳塞的纵向轴线布置的多个可充气结构。 耳塞的长度可延伸以增加两个可充气结构之间的距离。 每个充气元件在插入到耳道中时可横向充气，以便基本上填充耳道的横截面。
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公开(公告)号：US12298182B2
公开(公告)日：2025-05-13
申请号：US18600698
申请日：2024-03-09
Applicant: NOVA LTD.
Inventor： Gilad Barak , Yonatan Oren
Abstract: A polarized Raman Spectrometric system for defining parameters of a polycrystalline material, the system comprises a polarized Raman Spectrometric apparatus, a computer-controlled sample stage for positioning a sample at different locations, and a computer comprising a processor and an associated memory. The polarized Raman Spectrometric apparatus generates signal(s) from either small sized spots at multiple locations on a sample or from an elongated line-shaped points on the sample, and the processor analyzes the signal(s) to define the parameters of said polycrystalline material.
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公开(公告)号：US20250130172A1
公开(公告)日：2025-04-24
申请号：US18936790
申请日：2024-11-04
Applicant: NOVA LTD.
Inventor： Elad Schleifer , Yonatan Oren , Amir Shayari , Eyal Hollander , Valery Deich , Shimon YALOV , Gilad Barak
Abstract: An optical measurement system, which include an illumination path that is configured to illuminate an illuminated area of a sample; a collection path configured to collect illumination emitted from the illuminated area as a result of the illumination of the illuminated area; a spatial filter that is tunable; a Raman detector; and wherein the spatial filter is positioned upstream to the Raman detector, and is configured to spatially filter the illumination emitted from the illuminated area to provide spatially filtered illumination. The Raman detector is configured to receive the spatially filtered illumination and to generate one or more Raman spectra.
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Patent Agency Ranking
公开(公告)号：US20250123210A1
公开(公告)日：2025-04-17
申请号：US18810435
申请日：2024-08-20
Applicant: NOVA LTD.
Inventor： Gilad Barak , Yanir HAINICK , Yonatan OREN , Vladimir Machavariani
Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.
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公开(公告)号：US20250003882A1
公开(公告)日：2025-01-02
申请号：US18760099
申请日：2024-07-01
Applicant: NOVA LTD
Inventor： GILAD BARAK , YANIR HAINICK , YONATAN OREN
Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.
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公开(公告)号：US12165023B2
公开(公告)日：2024-12-10
申请号：US17904872
申请日：2021-02-23
Applicant: NOVA LTD. , INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Dexin Kong , Daniel Schmidt , Aron J. Cepler , Marjorie Cheng , Roy Koret , Igor Turovets
Abstract: A method, a system, and a non-transitory computer readable medium for measuring a local critical dimension uniformity of an array of two-dimensional structural elements, the method may include obtaining an acquired optical spectrometry spectrum of the array; feeding the acquired optical spectrometry spectrum of the array to a trained machine learning process, wherein the trained machine learning process is trained to map an optical spectrometry spectrum to an average critical dimension (CD) and a local critical dimension uniformity (LCDU); and outputting, by the trained machine learning process, the average CD and the LCDU of the array.
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公开(公告)号：US20240271926A1
公开(公告)日：2024-08-15
申请号：US18566919
申请日：2022-06-03
Applicant: NOVA LTD.
Inventor： Dror SHAFIR , Zvi Gorohovsky , Jacob Ofek , Daphna Peimer , Tal Heilpern , Dana Szafranek , Gilad BARAK , Smadar Ferber
IPC: G01B11/06
CPC classification number: G01B11/06
Abstract: A method for semiconductor device metrology. The method may include creating a time-domain representation of wavelength-domain measurement data of light reflected by a three dimensional (3D) patterned structure of a semiconductor device; selecting one or more relevant peaks of the time-domain representation and at least one irrelevant portion of the time-domain representation. One or more relevant peaks occur during one or more relevant time periods; and are associated with corresponding relevant reference peaks that are associated with different versions of a reference 3D patterned structure.
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公开(公告)号：US20240069445A1
公开(公告)日：2024-02-29
申请号：US18241923
申请日：2023-09-04
Applicant: NOVA LTD
Inventor： RAN YACOBY , BOAZ STURLESI
CPC classification number: G03F7/70625 , G03F7/70508 , G06N3/08
Abstract: A system and methods for OCD metrology are provided including receiving multiple first sets of scatterometric data, dividing each set into k sub-vectors, and training, in a self-supervised manner, k2 auto-encoder neural networks that map each of the k sub-vectors to each other. Subsequently multiple respective sets of reference parameters and multiple corresponding second sets of scatterometric data are received and a transfer neural network (NN) is trained. Initial layers include a parallel arrangement of the k2 encoder neural networks. Target output of the transfer NN training is set to the multiple sets of reference parameters and feature input is set to the multiple corresponding second sets of scatterometric data, such that the transfer NN is trained to estimate new wafer pattern parameters from subsequently measured sets of scatterometric data.
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