PITCH AND ORIENTATION UNIFORMITY FOR NANOIMPRINT STAMP FORMATION

    公开(公告)号:US20230375919A1

    公开(公告)日:2023-11-23

    申请号:US18320683

    申请日:2023-05-19

    Inventor: Jing JIANG Kang LUO

    Abstract: A system for nanoimprint lithography includes a master holder, a spacer, and a stamp support. The spacer supports the stamp support as a stamp material is cured to create a stamp. A method of forming an optical device using the nanoimprint lithography system with a spacer is provided. A system for the nanoimprint lithography may also include a master and a stamp support holder. The stamp support holder includes a plurality of projections defining a plurality of vacuum channels. The vacuum channels are in fluid communication with a vacuum source to support a stamp support as a stamp material is cured to create a stamp.

    METHODS OF GREYTONE IMPRINT LITHOGRAPHY TO FABRICATE OPTICAL DEVICES

    公开(公告)号:US20230341769A1

    公开(公告)日:2023-10-26

    申请号:US18333290

    申请日:2023-06-12

    CPC classification number: G03F7/0005 G02B5/1857 G03F7/0002

    Abstract: A method of imprinting a pattern on a substrate is provided. The method includes forming a first pattern on a plurality of masters using a method other than imprinting, the first pattern including a plurality of patterned features of varying sizes; measuring the patterned features at a plurality of locations on each of the masters; selecting a first master of the plurality of masters based on the measurements of the patterned features on each of the masters; using the first master to form a second pattern on an imprint template; and imprinting the first pattern on a first device with the imprint template.

    STAMP TREATMENT TO GUIDE SOLVENT REMOVAL DIRECTION AND MAINTAIN CRITICAL DIMENSION

    公开(公告)号:US20230194982A1

    公开(公告)日:2023-06-22

    申请号:US18091525

    申请日:2022-12-30

    CPC classification number: G03F7/0015 G03F7/0002

    Abstract: Embodiments described herein provide method a method of forming optical devices using nanoimprint lithography that maintains the critical dimension of the optical device structures. The method described herein accounts for lateral shrinkage of the solvent based resist during the cure process to maintain the critical dimension. The method includes disposing a stamp coating on a stamp having an inverse optical device pattern of inverse structures. The coating is disposed on sidewalls, inverse structure bottom, and inverse structure top of the inverse structures. The method includes etching the inverse structures such that the stamp coating remains on the sidewalls and is removed from the inverse structure top and bottom. The method further includes imprinting the stamp into an optical device material disposed and subjecting the imprintable optical device material to a cure process which transfers the optical device critical dimension to the optical device structures of the optical device pattern.

    METHODS TO FABRICATE 2D WEDGE AND LOCALIZED ENCAPSULATION FOR DIFFRACTIVE OPTICS

    公开(公告)号:US20220035251A1

    公开(公告)日:2022-02-03

    申请号:US17033201

    申请日:2020-09-25

    Abstract: A method of forming a three dimensional feature inwardly of a surface of a material includes providing a droplet dispenser including an outlet configured to dispense discrete droplets of a liquid material having a reactant therein capable of reacting with, and thereby removing, portions of the material layer with which the droplets come into contact, providing a support configured support the material thereon, the support, and the droplet dispenser, movable with respect to one another, such that the outlet of the droplet dispenser is positionable over different discrete areas of the surface of the material, and positioning the surface of the material under the droplet dispenser, and dispensing droplets to discrete portions of the surface of the material in a desired area thereof, to remove at least a portion of the material in the desired area and thereby form a three dimensional recess inwardly of the surface of the material.

Patent Agency Ranking