公开(公告)号：US20170130321A1

公开(公告)日：2017-05-11

申请号：US15359527

申请日：2016-11-22

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Michinobu MIZUMURA ,  Shuji KUDO ,  Koichi KAJIYAMA

IPC: C23C14/04 ,  C25D5/02 ,  G06F3/041 ,  C23C14/08 ,  C23C14/34 ,  C25D3/12 ,  C25D5/14

Abstract: The present invention provides a deposition mask including: a mask layer having an aperture pattern that is formed in conformity with a transparent electrode to be formed on a display surface of a display panel, with the same shape and size as the transparent electrode; and a support layer having plural support lines formed on one surface of the mask layer across the aperture pattern. In the mask, an arrangement pitch for the support lines of the support layer is set so as to reduce moire fringes or diffraction fringes that appear due to shadows of the support lines, which are transferred onto the transparent electrode as unevenness in deposition thickness.

公开(公告)号：US20170099737A1

公开(公告)日：2017-04-06

申请号：US15380957

申请日：2016-12-15

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Koichi KAJIYAMA ,  Michinobu MIZUMURA

IPC: H05K3/10 ,  B05D1/32 ,  B05D1/02

CPC classification number: H05K3/108 ,  B05D1/02 ,  B05D1/32 ,  C23C24/08 ,  H01L51/0003 ,  H05K1/097 ,  H05K3/0076 ,  H05K2201/0108 ,  H05K2201/0257 ,  H05K2201/0326 ,  H05K2201/10151 ,  H05K2203/0557 ,  H05K2203/101 ,  H05K2203/1105

Abstract: The present invention includes the steps of applying a liquid deposition material on a display surface of a display panel through a metal mask which is in close contact with the display surface of the display panel, while heating the metal mask; and forming thin film patterns by heating and baking the applied liquid deposition material.

公开(公告)号：US20160194745A1

公开(公告)日：2016-07-07

申请号：US15071125

申请日：2016-03-15

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Shigeto SUGIMOTO ,  Koichi KAJIYAMA ,  Michinobu MIZUMURA ,  Syuji KUDO ,  Eriko KIMURA ,  Hany Maher AZIZ ,  Yoshitaka KAJIYAMA

IPC: C23C14/04 ,  B23K26/00 ,  B23K26/342 ,  H01L51/00

CPC classification number: B05B12/20 ,  B23K26/342 ,  B23K26/359 ,  B23K26/382 ,  C23C14/042 ,  C23C14/24 ,  C23C14/34 ,  C23C14/48 ,  H01L51/0011 ,  H01L51/5012 ,  Y10T156/10

Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.

公开(公告)号：US20140199808A1

公开(公告)日：2014-07-17

申请号：US14214428

申请日：2014-03-14

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Shigeto SUGIMOTO ,  Koichi KAJIYAMA ,  Michinobu MIZUMURA ,  Syuji KUDO ,  Eriko KIMURA ,  Hany Maher AZIZ ,  Yoshitaka KAJIYAMA

IPC: B05B15/04 ,  B23K26/38 ,  H01L51/00

CPC classification number: B05B12/20 ,  B23K26/342 ,  B23K26/359 ,  B23K26/382 ,  C23C14/042 ,  C23C14/24 ,  C23C14/34 ,  C23C14/48 ,  H01L51/0011 ,  H01L51/5012 ,  Y10T156/10

Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.

Abstract translation: 用于通过沉积在基板上形成具有预定形状的薄膜图案的沉积掩模包括透射可见光并具有穿透树脂膜的开口图案并具有与薄膜相同的形状和尺寸的树脂膜 图案，以对应于基板上的薄膜图案的预先确定的形成区域。