公开(公告)号：US06865327B2

公开(公告)日：2005-03-08

申请号：US10247100

申请日：2002-09-19

Applicant: Robert M. Atkins ,  Alice W. Liu ,  Poul Kristensen ,  Morten Østergaard Pedersen ,  Stig Nissen Knudsen ,  Jan Levin Nielsen ,  Jake Bromage ,  Kai H. Chang

Inventor： Robert M. Atkins ,  Alice W. Liu ,  Poul Kristensen ,  Morten Østergaard Pedersen ,  Stig Nissen Knudsen ,  Jan Levin Nielsen ,  Jake Bromage ,  Kai H. Chang

IPC: C03B37/014 ,  C03C13/04 ,  G02B6/02

CPC classification number: C03C13/045 ,  C03B37/014 ,  C03B2201/03 ,  C03B2201/07 ,  G02B6/02

Abstract: Applicants have discovered the existence of loss peaks in optical fiber transmission systems using wavelengths in the E-band and the L-band. Specifically, they have discovered the existence of narrow loss peaks at 1440 nm, 1583 nm and 1614 nm. Because the peaks are relatively narrow, they cannot be easily removed by conventional gain equalizers in long haul transmission systems, and although the peaks are relatively small, they can nonetheless cause transmission channels to drop out in amplified DWDM transmission systems. Applicants have further discovered that these loss peaks are due to carbon contamination of the transmission fiber. Thus optical fibers should be fabricated essentially free of carbon contamination. This means eliminating carbon-containing reagents in preform and tube-making processes.

Abstract translation: 申请人已经发现在使用E波段和L波段的光纤传输系统中存在损耗峰值。 具体来说，他们已经发现在1440nm，1583nm和1614nm处存在窄的损耗峰。 由于峰值相对较窄，它们不能通过长距离传输系统中的常规增益均衡器容易地去除，尽管峰值相对较小，但是它们仍可能使传输信道在放大的DWDM传输系统中丢失。 申请人进一步发现，这些损失峰值是由于传输纤维的碳污染。 因此，光纤应该基本上没有碳污染。 这意味着在预成型件和制管工艺中消除含碳试剂。

公开(公告)号：US06835683B2

公开(公告)日：2004-12-28

申请号：US10311233

申请日：2002-12-17

Applicant: Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

Inventor： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

IPC: C03C306

CPC classification number: C03C4/0071 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/00 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

Abstract: A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.

Abstract translation: 本发明的石英玻璃构件是当其组成由SiO x表示时，x不小于1.85或不大于1.95，其中包含的氢分子的浓度不小于1×10 16分子/ cm <3>不超过5×10 18分子/ cm 3，并且其中在照射结束之前的吸收系数A与平均单脉冲中的1×10 4个ArF准分子激光脉冲之间的差AB 用ArF准分子激光照射停止600秒后的能量密度为2mJ / cm 2，第二吸收系数B为0.002cm -1以下。 当将该石英玻璃构件应用于投影曝光装置中的照明光学系统和/或投影光学系统时，可以实现均匀曝光，同时减小掩模版面和晶片上的曝光区域中的照度变化。

公开(公告)号：US06709997B2

公开(公告)日：2004-03-23

申请号：US09998328

申请日：2001-12-03

Applicant: Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

Inventor： Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

IPC: C03C1304

CPC classification number: G02B6/102 ,  C03B19/1453 ,  C03B32/00 ,  C03B37/01446 ,  C03B37/14 ,  C03B37/15 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0085 ,  C03C13/045 ,  C03C23/002 ,  C03C23/0025 ,  C03C23/003 ,  C03C23/0035 ,  C03C23/0095 ,  C03C25/6208 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/50 ,  G02B6/02 ,  Y02P40/57 ,  Y10S501/905

Abstract: A process of manufacturing a silica glass article comprising the steps of: (1) irradiating a silica glass article with electromagnetic waves to generate defects therein; and (2) immersing the thus irradiated silica glass article in an atmosphere comprising a hydrogen gas, thereby providing the resulting silica glass article with a characteristic that is effective for preventing it substantially from increasing its absorption within an ultraviolet region due to ultraviolet ray irradiation. Also disclosed are a silica glass article or a glass fiber produced according to the manufacturing process.

Abstract translation: 一种制造石英玻璃制品的方法，包括以下步骤：（1）用电磁波照射石英玻璃制品以在其中产生缺陷; 和（2）将这样照射的二氧化硅玻璃制品浸入包括氢气的气氛中，从而使得到的石英玻璃制品具有有效地防止紫外线辐射在紫外线区域内大幅吸收的特征。 还公开了根据制造方法制造的石英玻璃制品或玻璃纤维。

公开(公告)号：US20030195107A1

公开(公告)日：2003-10-16

申请号：US10317068

申请日：2002-12-12

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

IPC: C03C010/16 ,  C03C003/112

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cmnull1 (I2250) to the scattering peak intensity of 800 cmnull1 (I800), i.e. I2250/I800, of at most 1null10null4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2null10null3 cmnull1.

Abstract translation: 一种用于光学用的合成石英玻璃，其用于通过在含有氟的紫外线区域至真空紫外线区域的范围内的光照射而使用，该散射峰强度比例为2250cm <上标> -1 >（I <下标> 2250 ）到800 cm <上标> -1>（I <下标> 800 ）的散射峰强度，即I <下标> 2250 / I 在激光拉曼光谱中，最多为1×10 <上标> -4>的<下标> 800 ，其吸光系数为245nm，最多为2×10 <上标> -3> cm -1>。

公开(公告)号：US20020061810A1

公开(公告)日：2002-05-23

申请号：US09998328

申请日：2001-12-03

Applicant: Sumitomo Electric Industries, Ltd.

Inventor： Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

IPC: C03C013/04 ,  C03C003/06

CPC classification number: G02B6/102 ,  C03B19/1453 ,  C03B32/00 ,  C03B37/01446 ,  C03B37/14 ,  C03B37/15 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0085 ,  C03C13/045 ,  C03C23/002 ,  C03C23/0025 ,  C03C23/003 ,  C03C23/0035 ,  C03C23/0095 ,  C03C25/6208 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/50 ,  G02B6/02 ,  Y02P40/57 ,  Y10S501/905

Abstract: A process of manufacturing a silica glass article comprising the steps of: (1) irradiating a silica glass article with electromagnetic waves to generate defects therein; and (2) immersing the thus irradiated silica glass article in an atmosphere comprising a hydrogen gas, thereby providing the resulting silica glass article with a characteristic that is effective for preventing it substantially from increasing its absorption within an ultraviolet region due to ultraviolet ray irradiation. Also disclosed are a silica glass article or a glass fiber produced according to the manufacturing process.

Abstract translation: 一种制造石英玻璃制品的方法，包括以下步骤：（1）用电磁波照射石英玻璃制品以在其中产生缺陷; 和（2）将这样照射的二氧化硅玻璃制品浸入包括氢气的气氛中，从而使得到的石英玻璃制品具有有效地防止紫外线辐射在紫外线区域内大幅吸收的特征。 还公开了根据制造方法制造的石英玻璃制品或玻璃纤维。

公开(公告)号：US06376401B1

公开(公告)日：2002-04-23

申请号：US09387773

申请日：1999-09-01

Applicant: Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

Inventor： Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

IPC: C03B2000

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2203/44

Abstract: A synthetic silica glass having a high transmittance for vacuum ultraviolet rays, for example F2 excimer laser beam with a wavelength of 157 nm, a high uniformity and a high durability and useful for ultraviolet ray-transparent optical glass materials is produced from a high-purity silicon compound, for example silicon tetrachloride, by heat treating an accumulated porous silica material at a temperature not high enough to convert the porous silica material to a transparent silica glass in an inert gas atmosphere for a time sufficient to cause the OH groups to be condensed and removed from the glass, and exhibits substantially no content of impurities other than OH group a difference between highest and lowest fictional temperatures of 50° C. or less and a transmittance of 157 nm ultraviolet rays through a 10 mm optical path of 60% or more, and optically a OH group content of 1 to 70 ppm, a Cl content less than 1 ppm, a total content of impurity metals of 50 ppb or less, a content of each individual impurity metal less than 10 ppb, and an ultraviolet ray-transmittance at 172 to 200 nm of 40% or more even after the glass is exposed to an irradiation of ultraviolet rays at 160 to 300 nm for one hour.

Abstract translation: 对于真空紫外线具有高透射率的合成二氧化硅玻璃，例如波长为157nm的F2准分子激光束，高均匀性和高耐久性并且可用于紫外线透明光学玻璃材料由高纯度 硅化合物，例如四氯化硅，通过在不足够高的温度下热处理积聚的多孔二氧化硅材料，以在惰性气体气氛中将多孔二氧化硅材料转化为透明的石英玻璃足以使OH基团冷凝的时间 并且从玻璃中除去，并且基本上不含OH基团中的杂质含量，最高和最低虚构温度之间的差别为50℃或更低，通过10mm光路的157nm紫外线的透射率为60％或 更多地，光学地含有1至70ppm的OH基含量，小于1ppm的Cl含量，50ppb以下的杂质金属的总含量， 即使玻璃暴露于160〜300nm的紫外线照射1小时，每一种杂质金属小于10ppb，而在172〜200nm的紫外线透射率为40％以上。

公开(公告)号：US06265115B1

公开(公告)日：2001-07-24

申请号：US09397577

申请日：1999-09-16

Applicant: George Edward Berkey ,  Lisa Anne Moore ,  Charles Chunzhe Yu

Inventor： George Edward Berkey ,  Lisa Anne Moore ,  Charles Chunzhe Yu

IPC: G03F900

CPC classification number: C03C4/0085 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/02 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/32 ,  C03B2207/52 ,  C03B2207/54 ,  C03B2207/66 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  G03F1/60

Abstract: The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.

Abstract translation: 本发明包括制造光刻光掩模坯料的方法。 本发明还包括光刻光掩模坯料和用于生产光刻光掩模的预成型件。 制造光刻光掩模坯料的方法包括提供烟灰沉积表面，产生SiO 2烟灰颗粒并将SiO 2烟灰颗粒投射到烟灰沉积表面。 该方法包括在沉积表面上依次沉积SiO 2烟灰颗粒的层，以形成由SiO 2烟灰颗粒的连续层组成的粘结SiO 2多孔玻璃预制体，并使相干的SiO 2玻璃预制体脱水以从预成型体中去除OH。 将SiO 2暴露于含氟化合物并与其反应，并固化成具有平行的条纹层的无孔氟氧化硅玻璃体。 该方法还包括将固化的氟氧化硅玻璃体形成为具有平坦表面的光掩模坯料，其中条纹层的取向平行于光掩模坯料平面。

公开(公告)号：US6143676A

公开(公告)日：2000-11-07

申请号：US214894

申请日：1999-01-14

Applicant: Norio Ohashi ,  Michiyo Kuriyama ,  Shigeru Yamagata ,  Shigemasa Sunada

Inventor： Norio Ohashi ,  Michiyo Kuriyama ,  Shigeru Yamagata ,  Shigemasa Sunada

IPC: C03B19/14 ,  C03B23/047 ,  C03B32/00 ,  C03C3/06 ,  C03B9/10 ,  G02B1/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B23/047 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/52

Abstract: An object of the present invention is to provide a synthetic silica glass optical material which exhibits excellent transmittance as well as durability for high output power vacuum ultraviolet rays, being emitted from, for example, ArF excimer lasers and Xe.sub.2 excimer lamps, and to provide a method for producing the same. A synthetic silica glass optical material for high output power vacuum ultraviolet rays made from ultra high purity synthetic silica glass for use in the wavelength region of from 165 to 195 nm, containing OH groups at a concentration of from 5 to 300 wtppm with a fluctuation width in OH group concentration (.DELTA.OH/cm) of 10 wtppm or less, containing hydrogen molecules at a concentration of from 1.times.10.sup.17 to 1.times.10.sup.19 molecule/cm.sup.3 with a fluctuation width in hydrogen molecule concentration (.DELTA.H.sub.2 /cm) of 1.times.10.sup.17 molecule/cm.sup.3 or lower, and containing chlorine at a concentration of 50 wtppm or lower. Also claimed is a method for producing the same.

Abstract translation: PCT No.PCT / EP98 / 02965 Sec。 371日期1999年1月14日第 102（e）日期1999年1月14日PCT提交1998年5月20日PCT公布。 第WO98 / 52879号公报 日期：1998年11月26日本发明的目的是提供一种合成石英玻璃光学材料，其表现出优异的透射率以及从例如ArF准分子激光器和Xe2准分子灯发射的高输出功率真空紫外线的耐久性 并提供其制造方法。 一种用于高浓度合成石英玻璃的高输出功率真空紫外线的合成二氧化硅玻璃光学材料，用于波长范围为165至195nm的OH基，其浓度为5至300重量ppm，具有波动宽度 OH分子浓度（DELTA OH / cm）为10重量ppm以下，含有浓度为1×10 17〜1×10 19分子/ cm 3的氢分子，氢分子浓度的波动宽度（DELTA H2 / cm）为1×10 17分子/ cm 3， 较低，含有浓度为50重量ppm以下的氯。 还要求保护其的方法。

公开(公告)号：US5958809A

公开(公告)日：1999-09-28

申请号：US915562

申请日：1997-08-21

Applicant: Seishi Fujiwara ,  Hiroyuki Hiraiwa ,  Kazuhiro Nakagawa ,  Shouji Yajima ,  Norio Komine ,  Hiroki Jinbo

Inventor： Seishi Fujiwara ,  Hiroyuki Hiraiwa ,  Kazuhiro Nakagawa ,  Shouji Yajima ,  Norio Komine ,  Hiroki Jinbo

IPC: C03B8/04 ,  C03B19/14 ,  C03B37/014 ,  C03C3/06 ,  C03C4/00 ,  G03F7/20 ,  C03C13/04

CPC classification number: C03B19/14 ,  C03B37/014 ,  C03B37/0142 ,  C03C3/06 ,  C03C4/0085 ,  G03F7/2004 ,  C03B2201/07 ,  C03B2207/66 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/46 ,  Y02P40/57 ,  Y10S501/905

Abstract: The invention relates to fluorine-containing silica glasses, and methods of their production. The silica glass may be used for an ultraviolet light optical system in which light in a wavelength region of 200 nm or less, such as an ArF (193 nm) excimer laser, is used. The invention also relates to a projection exposure apparatus containing fluorine-containing glass of the invention.

Abstract translation: 本发明涉及含氟二氧化硅玻璃及其制造方法。 石英玻璃可以用于其中使用200nm以下的波长区域的光，例如ArF（193nm）准分子激光器的紫外线光学系统。 本发明还涉及包含本发明的含氟玻璃的投影曝光装置。

公开(公告)号：US5141786A

公开(公告)日：1992-08-25

申请号：US485954

申请日：1990-02-27

Applicant: Takaaki Shimizu ,  Masatoshi Takita

Inventor： Takaaki Shimizu ,  Masatoshi Takita

IPC: C03B8/02 ,  C03B19/06 ,  C03B19/10 ,  C03B19/12 ,  C03C1/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/1065 ,  C03B19/12 ,  C03B20/00 ,  C03C1/006 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C2201/23 ,  C03C2203/26 ,  Y10S65/90 ,  Y10T428/131 ,  Y10T428/1314

Abstract: A synthetic silica glass article made by hydrolyzing an alkoxysilane and thermally sintering the resulting silica; this synthetic silica glass article has a viscosity of not lower than 10.sup.10 poise at 140.degree. C., and contains, as metallic impurities, less than 1 ppm at Al, less than 0.2 ppm of Fe, less than 0.2 ppm of Na, less than 0.2 ppm of K, less than 0.01 ppm of Li, less than 0.2 ppm of Ca, less than 0.02 ppm of Ti, less than 0.01 ppm of B, less than 0.01 of P, less than 0.01 ppm of As.