公开(公告)号：US20090203511A1

公开(公告)日：2009-08-13

申请号：US12420443

申请日：2009-04-08

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Susan Lee Schiefelbein

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Susan Lee Schiefelbein

IPC: C03C3/04 ,  C03B19/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm2. The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and H2 concentration levels less than about 5.0×1017 molecules/cm3′ and preferably less than about 2.0×1017 molecules/cm3.

Abstract translation: 公开了一种合成石英玻璃光学材料，其特征在于波长小于约250nm，特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤， 具体地，在经受约193nm处的激光器操作的100亿脉冲和大约70μJ/ cm 2的能量密度下，在633nm处测量的激光感应波前失真在约-1.0和1.0nm / cm之间。 本发明的合成石英玻璃光学材料包含小于约600ppm，优选小于200ppm的OH浓度水平和小于约5.0×10 17分子/ cm 3'，优选小于约2.0×10 17分子/ cm 3的H 2浓度水平 。

公开(公告)号：US07506522B2

公开(公告)日：2009-03-24

申请号：US11148764

申请日：2005-06-08

Applicant: Daniel Joseph Bleaking ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Kenneth E. Hrdina ,  Pushkar Tandon ,  John E. Maxon ,  Kimberly Ann Wilbert

Inventor： Daniel Joseph Bleaking ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Kenneth E. Hrdina ,  Pushkar Tandon ,  John E. Maxon ,  Kimberly Ann Wilbert

IPC: C03B20/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.

Abstract translation: 公开了在垂直于光轴的平面中具有高OH浓度均匀性的高纯度合成石英玻璃材料及其制备方法。 玻璃具有高折射率均匀性。 该玻璃在193nm处可以具有至少99.65％/ cm的高内部透射率。 该方法不需要后烧结均质化步骤。 组合均匀性高，因此具有高折射率均匀性的控制因素包括烟灰预制件中的初始局部烟灰密度均匀性和缓慢烧结，特别是固结期间的等温处理。

公开(公告)号：US20080292881A1

公开(公告)日：2008-11-27

申请号：US12182327

申请日：2008-07-30

Applicant: Masaaki TAKATA ,  Noriyuki AGATA ,  Tomonori OGAWA ,  Kei IWATA

Inventor： Masaaki TAKATA ,  Noriyuki AGATA ,  Tomonori OGAWA ,  Kei IWATA

IPC: C03C3/06 ,  C03B37/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/23 ,  C03C2201/23 ,  Y02P40/57 ,  Y10T428/2982

Abstract: The present invention provides a synthetic quartz glass having a diameter of 100 mm or more for using in an optical apparatus comprising a light source emitting a light having a wavelength of 250 nm or less, the synthetic quartz glass having, in a region located inward from the periphery thereof by 10 mm or more in a plane perpendicular to the optical axis of the synthetic quartz glass: a birefringence of 0.5 nm or less per thickness of 1 cm with respect to a light having a wavelength of 193 nm; an OH group concentration of 60 ppm or less; an averaged differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of not less than −60 ppm and less than −8 ppm; and an unbiased standard deviation σ of a differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of 10 ppm or less, the unbiased standard deviation σ being determined with the following formula (1): σ = ∑ i = 1 n  ( X i - X _ ) 2 n - 1   providing ;   X i = Δ   n _ OHi Δ   r i * = n _ OHi - n _ OHi + 1 r i * - r i + 1 * : ( 1 ) differential OH group concentration at measurement point i normalized with respect to the radius R of the synthetic quartz glass; n _ OHi = n OHi - 1 + n OHi + n OHi + 1 3 : OH group concentration at measurement point i in terms of moving average for three points including the two points before and after the measurement point i; r i * = r i R : radius at measurement point i normarized with respect to the radius R of the synthetic quartz glass; X: average of OH group concentrations Xi in the whole evaluation region; and n: number of measurement points in the evaluation region (integer of 2 or more).

公开(公告)号：US20070145332A1

公开(公告)日：2007-06-28

申请号：US10582117

申请日：2004-11-30

Applicant: Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

Inventor： Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

IPC: C09K11/66 ,  C03B8/00 ,  C03B19/00

CPC classification number: C03C4/0071 ,  C03B19/06 ,  C03B19/063 ,  C03B19/066 ,  C03B19/1005 ,  C03B19/1065 ,  C03B19/108 ,  C03B19/1095 ,  C03B20/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/34 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/23 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/3488 ,  C03C2201/36 ,  C03C2203/22 ,  C03C2203/30 ,  C03C2203/44 ,  C03C2203/52

Abstract: The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.

Abstract translation: 本发明涉及一种用于经济地生产用于由任何形式或尺寸的激光 - 活性石英玻璃制成的部件的坯料的方法。 该方法包括以下方法步骤：a）制备固体含量为至少40wt。 ％，包括SiO 2纳米粉末和掺杂剂，其包括流体中的稀土金属和过渡金属的阳离子，b）通过搅拌分散体制粒，除去水分以形成掺杂的SiO 水分含量小于35重量％的球形多孔粒状颗粒颗粒。 ％，密度至少为0.95g / cm 3，c）通过加热到至少1000℃的温度来干燥和纯化SiO 2颗粒。 以形成OH含量小于10ppm的掺杂多孔SiO 2颗粒，以及d）在还原气氛中烧结或熔合掺杂的SiO 2颗粒，得到坯料 来自掺杂石英玻璃。

公开(公告)号：US20070105704A1

公开(公告)日：2007-05-10

申请号：US11583619

申请日：2006-10-19

Applicant: Dana Bookbinder ,  Richard Fiacco ,  Ulrich Neukirch

Inventor： Dana Bookbinder ,  Richard Fiacco ,  Ulrich Neukirch

IPC: C03C3/06 ,  C03B8/00 ,  C03B19/06

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B20/00 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/42 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/22 ,  C03C2201/23

Abstract: What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-doped synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

Abstract translation: 公开的内容包括能够用于低于约300nm的光刻中的光学元件的OD掺杂合成石英玻璃。 发现OD掺杂的合成二氧化硅玻璃具有比具有相当浓度的OH的非OD掺杂的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了制造掺杂OD的合成二氧化硅玻璃，包含这种玻璃的光学构件以及包括这种光学构件的光刻系统的方法。 由于在约193nm处极度低的偏振诱发双折射值，该玻璃特别适用于浸没式光刻系统。

公开(公告)号：US07022633B2

公开(公告)日：2006-04-04

申请号：US10317068

申请日：2002-12-12

Applicant: Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

IPC: C03C3/06 ,  G01N23/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.

Abstract translation: 一种用于光学用途的合成石英玻璃，其通过在含有氟的紫外区域至真空紫外区域的范围内的光照射而使用，所述氟化物具有2250cm -1的散射峰强度 （I 2250）相对于800cm -1（I 800）的散射峰强度，即I 2250 在激光拉曼光谱中，其最大吸收系数为245nm，最多为2×10 3，最大为1×10 -4， SUP> -3cm -1 -1。

公开(公告)号：US06982232B2

公开(公告)日：2006-01-03

申请号：US10842979

申请日：2004-05-11

Applicant: Nicholas F. Borrelli ,  Charlene M. Smith ,  Johannes Moll

Inventor： Nicholas F. Borrelli ,  Charlene M. Smith ,  Johannes Moll

IPC: C03C3/06

CPC classification number: G03F7/70041 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/23 ,  G03F7/70058 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70966

Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

Abstract translation: 公开了平版印刷方法。 在一种这样的方法中，用于产生具有小于约300nm的波长的紫外光刻辐射的脉冲紫外辐射源，其注量小于10mJ / cm 2 /脉冲和高纯度熔融石英光刻 分子氢浓度在约0.02×10 18分子/ cm 3至约0.18×10 18分子/ cm 3之间的玻璃 。 用紫外光刻法形成光刻图案; 光刻图案被减少以产生减小的光刻图案; 并且将还原的光刻图案投影到紫外线照射敏感光刻介质上以形成印刷光刻图案。 形成，还原和突出步骤中的至少一个步骤包括通过高纯度熔融石英光刻玻璃传输紫外光刻辐射。 还描述了平版印刷系统和高纯度熔融石英光刻玻璃。

公开(公告)号：US20050276555A1

公开(公告)日：2005-12-15

申请号：US11141203

申请日：2005-06-01

Applicant: Tetsuya Haruna ,  Shinji Ishikawa ,  Toshiki Taru ,  Tetsutarou Katayama ,  Nobuyuki Taira

Inventor： Tetsuya Haruna ,  Shinji Ishikawa ,  Toshiki Taru ,  Tetsutarou Katayama ,  Nobuyuki Taira

IPC: G02B6/02 ,  C03B37/018

CPC classification number: C03B37/01807 ,  C03B37/01876 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/34 ,  C03B2201/36 ,  C03B2203/22 ,  C03B2207/90

Abstract: A method produces a glass body that contains a reduced amount of OH groups in the metallic-oxide-containing glass layer and that has a reduced amount of transmission loss due to OH groups when the glass body is transformed into an optical fiber. The production method produces an optical glass body. An optical fiber contains the optical glass body in at least one part of its region for guiding a lightwave. The production method includes the following steps: (a) introducing into a glass pipe a gas containing an organometallic compound and a glass-forming material; (b) decomposing the organometallic compound into an organic constituent and a metallic constituent; (c) heating and oxidizing the metallic constituent so that produced glass particles containing a metallic oxide are deposited on the inner surface of the glass pipe to form a glass-particle-deposited layer; and (d) consolidating the deposited layer to form a metallic-oxide-containing glass layer.

Abstract translation: 一种方法产生玻璃体，其在含金属氧化物的玻璃层中含有少量的OH基团，并且当玻璃体转变成光纤时，其具有由OH基导致的传输损失量减少的玻璃体。 该制造方法产生光学玻璃体。 光纤在其区域的至少一部分中包含用于引导光波的光学玻璃体。 制造方法包括以下步骤：（a）向玻璃管内导入含有有机金属化合物和玻璃形成材料的气体; （b）将有机金属化合物分解成有机成分和金属成分; （c）加热和氧化金属成分，使得在玻璃管的内表面上沉积含有金属氧化物的玻璃颗粒，形成玻璃颗粒沉积层; 和（d）固结沉积层以形成含金属氧化物的玻璃层。

公开(公告)号：US20050257570A1

公开(公告)日：2005-11-24

申请号：US10519016

申请日：2003-07-07

Applicant: Richard Schmidt ,  Karsten Brauer

Inventor： Richard Schmidt ,  Karsten Brauer

IPC: C03B8/04 ,  C03B37/014 ,  C03B37/018 ,  H05H1/30 ,  C03B37/012

CPC classification number: H05H1/30 ,  C03B37/01426 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/12

Abstract: The invention relates to a method for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method, according to which a hydrogen-free media flow containing a glass starting material and a carrier gas is fed to a multi-nozzle deposition burner. The glass starting material is introduced into a plasma zone by the deposition burner and is oxidized therein while forming SiO2 particles, and the SiO2 particles are deposited on a deposition surface while being directly vitrified. In order to increase the deposition efficiency, the invention provides that the deposition burner (1) focuses the media flow toward the plasma zone (4) by. A multi-nozzle plasma burner, which is suited for carrying out the method and which is provided with a media nozzle for feeding a media flow to the plasma zone, is characterized in that the media nozzle (7) is designed so that it is focussed toward the plasma zone (4). The focussing is effected by a tapering (6) of the media nozzle (7).

Abstract translation: 本发明涉及一种通过使用等离子体辅助沉积方法由合成石英玻璃制造空白模具的方法，根据该方法，将含有玻璃原料和载气的无氢介质流供给到多喷嘴沉积 刻录机。 通过沉积燃烧器将玻璃原料引入等离子体区，并在其中氧化，同时形成SiO 2颗粒，并将SiO 2颗粒沉积在沉积表面上，同时 被直接玻璃化。 为了提高沉积效率，本发明提供了沉积燃烧器（1）将介质流聚焦到等离子体区（4）。 多喷嘴等离子体燃烧器适用于执行该方法并且设置有用于将介质流馈送到等离子体区域的介质喷嘴，其特征在于，介质喷嘴（7）被设计成使其聚焦 朝向等离子体区（4）。 聚焦由介质喷嘴（7）的锥形（6）实现。

公开(公告)号：US20050223747A1

公开(公告)日：2005-10-13

申请号：US11004027

申请日：2004-12-02

Applicant: Laura Ball ,  Bruno Baney ,  Dana Bookbinder ,  Keith House ,  Rostislav Khrapko ,  Susan Schiefelbein ,  Lisa Moore

Inventor： Laura Ball ,  Bruno Baney ,  Dana Bookbinder ,  Keith House ,  Rostislav Khrapko ,  Susan Schiefelbein ,  Lisa Moore

IPC: C03B37/00 ,  C03B37/012 ,  C03B37/014 ,  C03B37/018 ,  C03C3/06 ,  C03C13/04 ,  C03C15/00 ,  C03C21/00 ,  C03C25/60 ,  C03C25/68 ,  C03B37/027

CPC classification number: C03C3/06 ,  C03B37/01211 ,  C03B37/01228 ,  C03B37/01426 ,  C03B37/01807 ,  C03B37/01861 ,  C03B37/01892 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/50 ,  C03B2201/54 ,  C03B2203/26 ,  C03B2207/30 ,  C03B2207/90 ,  C03C25/602 ,  C03C25/607 ,  C03C25/68 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2203/50 ,  G02B6/02

Abstract: A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.

Abstract translation: 公开了一种通过将碱金属扩散到玻璃制品的表面中形成掺杂碱金属氧化物的光纤的方法。 石英玻璃制品可以是管或棒的形式，或者是管或棒的集合。 含有碱金属的二氧化硅玻璃制品和可能已经无意地扩散到玻璃制品中的杂质被蚀刻到足以除去杂质的深度。 石英玻璃制品可以进一步加工以形成完整的光纤预型件。 当预成型件被拉入光纤时，表现出低的衰减。