公开(公告)号：US08012894B2

公开(公告)日：2011-09-06

申请号：US12151172

申请日：2008-05-05

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Rostislav Radievich Khrapko

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Rostislav Radievich Khrapko

IPC: C03C3/06 ,  C03B19/06 ,  C03B19/00 ,  C03B37/00 ,  C03B37/018

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/31 ,  C03C2201/22 ,  C03C2201/23 ,  C03C2203/54

Abstract: A fused silica glass and a fused silica article having a combined concentration of at least one of OH and OD of up to about 50 ppm. The fused silica glass is formed by drying a fused silica soot blank or preform in an inert atmosphere containing a drying agent, followed by removal of residual drying agent from the dried soot blank by heating the dried soot blank in an atmosphere comprising an inert gas and of oxygen.

Abstract translation: 熔融石英玻璃和熔融二氧化硅制品，其具有高达约50ppm的OH和OD中的至少一种的组合浓度。 熔融二氧化硅玻璃通过在含有干燥剂的惰性气氛中干燥熔融二氧化硅烟灰坯料或预型体而形成，然后通过在包含惰性气体的气氛中加热干燥的烟灰坯料从干燥的烟灰坯中除去残留的干燥剂， 的氧气。

公开(公告)号：US20110207593A1

公开(公告)日：2011-08-25

申请号：US13028516

申请日：2011-02-16

Applicant: Carlos Duran ,  Kenneth Edward Hrdina ,  John Edward Maxon

Inventor： Carlos Duran ,  Kenneth Edward Hrdina ,  John Edward Maxon

IPC: C03C3/06 ,  C03C3/076 ,  C03B19/06 ,  C03B25/00

CPC classification number: C03B19/1407 ,  C03B19/1453 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/20

Abstract: This disclosure is directed to tailoring and improving the expansivity of low thermal expansion silica-titania glass through changes in the [OH] content and fictive temperature of the glasses. The [OH] concentration in the glass can be in the range of 600-2500 ppm. The fictive temperature, TF is less than 900° C.

Abstract translation: 本发明旨在通过玻璃的[OH]含量和假想温度的变化来定制和改善低热膨胀二氧化硅 - 二氧化钛玻璃的膨胀性。 玻璃中的[OH]浓度可以在600-2500ppm的范围内。 假想温度，TF低于900℃

公开(公告)号：US20110203318A1

公开(公告)日：2011-08-25

申请号：US13097687

申请日：2011-04-29

Applicant: Hisatoshi Otsuka ,  Kazuo Shirota

Inventor： Hisatoshi Otsuka ,  Kazuo Shirota

IPC: C03B20/00 ,  C03B19/01

CPC classification number: F23D14/22 ,  C03B19/1423 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/12 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/36 ,  C03B2207/40 ,  F23D14/32 ,  F23L2900/07002

Abstract: A method for manufacturing quartz glass using a main burner having a multi-tube assembly having a center tube, a first enclosure tube surrounding the center tube, a second enclosure tube surrounding the first enclosure tube, a tubular shell surrounding the multi-tube assembly, and a plurality of nozzles disposed within the tubular shell, a double-tube assembly surrounding at least a forward opening of the main burner includes feeding silica-forming compound to the center tube, a combustion-supporting gas to the first enclosure tube and the nozzles, a combustible gas to the second enclosure tube and the tubular shell, and a combustion-supporting gas to the double-tube assembly, forming oxyhydrogen flame for hydrolyzing or decomposing the silica-forming compound to form silica, depositing the silica on the target, and melting and vitrifying the deposited silica into quartz glass.

Abstract translation: 一种使用具有多管组件的主燃烧器制造石英玻璃的方法，所述多管组件具有中心管，围绕中心管的第一外壳管，围绕第一外壳管的第二外壳管，围绕多管组件的管状外壳， 以及设置在所述管状壳体内的多个喷嘴，围绕所述主燃烧器的至少前部开口的双管组件包括将二氧化硅形成化合物输送到所述中心管，向所述第一外壳管和所述喷嘴 ，到第二外壳管和管状壳体的可燃气体，以及到双管组件的燃烧负载气体，形成用于水解或分解二氧化硅形成化合物以形成二氧化硅的氢氧焰，将二氧化硅沉积在靶上， 并将沉积的二氧化硅熔融并玻璃化成石英玻璃。

公开(公告)号：US07975507B2

公开(公告)日：2011-07-12

申请号：US11833397

申请日：2007-08-03

Applicant: Keigo Hino

Inventor： Keigo Hino

IPC: C03B19/06 ,  C03B8/04

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/04 ,  C03B2201/23 ,  C03C2201/23

Abstract: The invention provides a process for producing a synthetic quartz glass, comprising: (a) depositing fine quartz glass particles synthesized by flame hydrolysis of a glass-forming material, on a substrate, to form a porous quartz glass base; (b) presintering the porous quartz glass base; (c) heat-treating the presintered porous quartz glass base by holding it under vacuum at a temperature in the range of from 1,100° C. to below the vitrification temperature for a certain time period; and (d) heating the thus heat-treated porous quartz glass base to a temperature not lower than the vitrification temperature to obtain a synthetic quartz glass. According to the process for synthetic quartz glass production of the invention, a synthetic quartz glass having a reduced OH group amount and a uniform OH group concentration can be obtained. From the synthetic quartz glass, an optical member having excellent optical properties can be obtained.

Abstract translation: 本发明提供了一种生产合成石英玻璃的方法，包括：（a）在基材上沉积通过玻璃形成材料的火焰水解合成的精细石英玻璃颗粒，以形成多孔石英玻璃基底; （b）预烧结多孔石英玻璃基底; （c）通过将预烧结的多孔石英玻璃基板在1100℃至低于玻璃化温度的温度下在真空下进行一段时间的热处理; 和（d）将由此热处理的多孔石英玻璃基底加热至不低于玻璃化温度的温度，以获得合成石英玻璃。 根据本发明的合成石英玻璃的制造方法，可以得到OH基量少且OH基浓度均匀的合成石英玻璃。 可以从合成石英玻璃得到光学特性优异的光学部件。

公开(公告)号：US20110092354A1

公开(公告)日：2011-04-21

申请号：US12902238

申请日：2010-10-12

Applicant: Carlos Duran ,  Kenneth Edward Hrdina ,  Ulrich Wilhelm Heinz Neukirch

Inventor： Carlos Duran ,  Kenneth Edward Hrdina ,  Ulrich Wilhelm Heinz Neukirch

IPC: C03C3/04 ,  C03B25/00

CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2201/23

Abstract: A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.

Abstract translation: 制造具有均匀的假想温度的二氧化硅玻璃的方法。 将玻璃制品在目标假想温度下加热，或以低于假想温度变化率的速率加热或冷却一段足以使玻璃的假想温度达到3°的时间 C.目标虚构温度。 然后将二氧化硅玻璃从目标假想温度冷却至低于玻璃应变点的温度，其冷却速率大于目标假想温度下玻璃的松弛率。 二氧化硅玻璃具有在退火步骤之后变化小于3℃的假想温度。 还描述了通过该方法制备的二氧化硅玻璃。

公开(公告)号：US07923394B2

公开(公告)日：2011-04-12

申请号：US12132922

申请日：2008-06-04

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: C03C3/06 ,  C03C3/04 ,  C03C3/076

CPC classification number: C03B19/1423 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1453 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/23 ,  G03F7/0002

Abstract: In the nanoimprint lithography, titania-doped quartz glass having an internal transmittance distribution of up to 10% at wavelength 365 nm is suited for use as nanoimprint molds.

Abstract translation: 在纳米压印光刻中，在365nm处具有高达10％的内部透射率分布的二氧化钛掺杂石英玻璃适合用作纳米压印模具。

公开(公告)号：US07906446B2

公开(公告)日：2011-03-15

申请号：US12556848

申请日：2009-09-10

Applicant: Douglas Clippinger Allan ,  Dana Craig Bookbinder ,  Ulrich W H Neukirch ,  Charlene Marie Smith

Inventor： Douglas Clippinger Allan ,  Dana Craig Bookbinder ,  Ulrich W H Neukirch ,  Charlene Marie Smith

IPC: C03C3/06

CPC classification number: C03B19/1453 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/23 ,  C03C2203/54

Abstract: Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.

Abstract translation: 公开了具有低偏振诱发双折射的合成石英玻璃，用于制造玻璃的方法和包含由玻璃制成的光学元件的光刻系统。 当在大约193nm处的准分子激光脉冲具有约40μJ·cm-2·pulse-1的注量和脉冲长度时，石英玻璃具有在633nm处测量的偏振诱发双折射小于约0.1nm / cm 对于5×109脉冲，约25ns。

公开(公告)号：US20100323871A1

公开(公告)日：2010-12-23

申请号：US12868900

申请日：2010-08-26

Applicant: Akio Koike ,  Kenta Saito ,  Long Shao ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio Koike ,  Kenta Saito ,  Long Shao ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/04

CPC classification number: C03B19/1453 ,  C03B19/1415 ,  C03B2201/075 ,  C03B2201/23 ,  C03B2201/42 ,  C03B2207/70 ,  C03B2207/81 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.

Abstract translation: 本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。 本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

公开(公告)号：US20100317505A1

公开(公告)日：2010-12-16

申请号：US12862174

申请日：2010-08-24

Applicant: Akio KOIKE ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio KOIKE ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54

Abstract: The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.

Abstract translation: 本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件时，其在高EUV能量光照射时的线性热膨胀系数基本为零。 本发明涉及具有1000℃以下的假想温度，600ppm以上的OH浓度，线性热膨胀系数为0ppb /℃的温度的含TiO 2的二氧化硅玻璃。 在20〜100℃的温度范围内的平均线性热膨胀系数为50ppb /℃以下。

公开(公告)号：US20100247048A1

公开(公告)日：2010-09-30

申请号：US12742720

申请日：2008-11-13

Applicant: Haruo Ooizumi ,  Masayoshi Hachiwaka ,  Takaharu Kinoshita ,  Muneaki Ichihara ,  Masataka Kon

Inventor： Haruo Ooizumi ,  Masayoshi Hachiwaka ,  Takaharu Kinoshita ,  Muneaki Ichihara ,  Masataka Kon

IPC: G02B6/036 ,  B29D11/00

CPC classification number: C03B37/01211 ,  C03B37/01446 ,  C03B37/018 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2203/23 ,  G02B6/02271 ,  G02B6/0365 ,  G02B6/03683

Abstract: An optical fiber includes: a core (1) having an outer diameter (D1) of greater than or equal to 8.2 μm and less than or equal to 10.2 μm; a first cladding (2) surrounding the core (1) and having an outer diameter (D2) of greater than or equal to 30 μm and less than or equal to 45 μm; a second cladding (3) surrounding the first cladding (2) and having a thickness (T) of greater than or equal to 7.4 μm; and a support layer (4) surrounding the second cladding (3). The relative refractive index difference which is the ratio of the difference between the refractive index of the support layer (4) and that of the second cladding (3) to the refractive index of the support layer (4) is greater than or equal to 0.5%.

Abstract translation: 光纤包括：具有大于或等于8.2μm且小于或等于10.2μm的外径（D1）的芯体（1）; 围绕所述芯（1）并且具有大于或等于30μm且小于或等于45μm的外径（D2）的第一包层（2）; 围绕所述第一包层（2）并具有大于或等于7.4μm的厚度（T）的第二包层（3）; 以及围绕所述第二包层（3）的支撑层（4）。 支撑层（4）的折射率与第二包层（3）的折射率之间的差与支撑层（4）的折射率之差的相对折射率差大于或等于0.5 ％。