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公开(公告)号：US20110021339A1
公开(公告)日：2011-01-27
申请号：US12507950
申请日：2009-07-23
Applicant: Susan Lee Schiefelbein , Charlene Marie Smith
Inventor： Susan Lee Schiefelbein , Charlene Marie Smith
CPC classification number: C03C3/06 , C03B32/00 , C03B2201/21 , C03C4/0071 , C03C4/0085 , C03C23/0025 , C03C2201/21 , C03C2201/23 , C03C2203/54
Abstract: A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E′ centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C.
Abstract translation: 石英玻璃制品，例如步进/扫描仪系统中的透镜，在小于约250nm的波长处具有饱和诱导吸收。 通过首先通过在这种缺陷处形成硅氢化物（SiH）来除去二氧化硅玻璃中的Si-O缺陷，并将石英玻璃与氢气一起加载到石英玻璃制品中通过SiH光解产生的E'中心反应而实现饱和诱导吸收 。 氢化硅是通过在至少475℃的温度下加载二氧化硅玻璃与分子氢形成的。在形成SiH之后，二氧化硅玻璃在小于475℃的温度下装载另外的分子氢。
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12.发明申请TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME 有权含氧二氧化硅玻璃和光学成员使用相同的EUV光刻公开(公告)号：US20100323872A1
公开(公告)日：2010-12-23
申请号：US12869035
申请日：2010-08-26
Applicant: Akio KOIKE , Yasutomi IWAHASHI , Shinya KIKUGAWA , Yuko TACHIBANA
Inventor： Akio KOIKE , Yasutomi IWAHASHI , Shinya KIKUGAWA , Yuko TACHIBANA
IPC: C03C3/04
CPC classification number: C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , G03F1/24 , G03F7/70958 , Y02P40/57
Abstract: The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.
Abstract translation: 本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能 通过从玻璃中释放氢气，保持很长一段时间。 本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。
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13.发明授权公开(公告)号：US07827824B2
公开(公告)日：2010-11-09
申请号：US11896948
申请日：2007-09-06
Applicant: Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
Inventor： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
CPC classification number: G03F7/70958 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/54 , Y02P40/57
Abstract: A synthetic quartz glass substrate having (i) an OH concentration of 1-100 ppm and a hydrogen molecule concentration of 1×1016-1×1019 molecules/cm3, (ii) an in-plane variation of its internal transmission at wavelength 193.4 nm which is up to 0.2%, and (iii) an internal transmission of at least 99.6% at wavelength 193.4 nm is suited for use with excimer lasers.
Abstract translation: （i）OH浓度为1-100ppm，氢分子浓度为1×1016-1×1019分子/ cm3的合成石英玻璃基板，（ii）其波长为193.4nm的内部透光率的面内变化 其高达0.2％，和（iii）在波长193.4nm处的至少99.6％的内部透射率适用于准分子激光器。
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14.发明申请公开(公告)号：US20090188281A1
公开(公告)日：2009-07-30
申请号：US12417466
申请日：2009-04-02
Applicant: Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
Inventor： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
IPC: C03C19/00
CPC classification number: C03B19/1469 , C03B19/1423 , C03B19/1453 , C03B2201/21 , C03B2207/06 , C03B2207/20 , C03B2207/22 , C03B2207/32 , C03B2207/34 , C03C3/06 , C03C4/0071 , C03C2201/21 , Y02P40/57
Abstract: When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm which is up to 0.2%, and (IV) the substrate has an internal transmittance of at least 99.6% at 193.4 nm. The synthetic quartz glass substrate has a high transmittance and a uniform transmittance distribution, and is adapted for use with excimer lasers, particularly ArF excimer lasers.
Abstract translation: 当由合成石英玻璃块制备合成石英玻璃基板时，（I）该嵌段的氢分子浓度为5×10 17 -1×10 19分子/ cm 3，（II）底物的氢分子浓度为5×10 15 -5×10 17分子/ cm 3 ，（III）衬底的内部透射率在193.4nm处具有高达0.2％的面内变化，（IV）衬底在193.4nm具有至少99.6％的内透射率。 合成石英玻璃基板具有高透射率和均匀的透射率分布，并且适用于准分子激光器，特别是ArF准分子激光器。
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15.发明申请Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component 有权用于制造具有增强的耐辐射性的合成石英玻璃的光学部件的制造方法和用于制造该部件的坯料公开(公告)号：US20090004088A1
公开(公告)日：2009-01-01
申请号：US12148338
申请日：2008-04-18
Applicant: Bodo Kuehn , Steffen Kaiser , Denis Kassube , Kerstin Merget
Inventor： Bodo Kuehn , Steffen Kaiser , Denis Kassube , Kerstin Merget
CPC classification number: C03B25/02 , C03B19/1453 , C03B32/00 , C03B2201/075 , C03B2201/21 , C03C3/06 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/42 , C03C2203/52 , Y02P40/57
Abstract: To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C. lower than the high mean value of the fictive temperature according to method step (b).
Abstract translation: 为了优化合成石英玻璃的光学部件，在石英玻璃坯料进行多段退火处理的情况下，关于压实和中心双折射，本发明提出了一种方法，包括以下步骤：（a） 第一处理阶段，其中在1130℃和1240℃之间的较高温度范围内处理石英玻璃坯料，（b）以第一高平均冷却速率将石英玻璃坯料冷却至低于1100℃的淬火温度 在石英玻璃中达到1100℃或更高平均值的假想温度，（c）第二处理阶段，其包括以第二低平均冷却速度冷却石英玻璃坯料 ，其中在950℃至1100℃的较低温度范围内处理石英玻璃坯料，使得石英玻璃中具有低至少50℃的低平均值的假想温度降低 比平均值高 根据方法步骤（b）的假想温度。
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Patent Agency Ranking
16.发明申请公开(公告)号：US20080119346A1
公开(公告)日：2008-05-22
申请号：US11896948
申请日：2007-09-06
Applicant: Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
Inventor： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
CPC classification number: G03F7/70958 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/54 , Y02P40/57
Abstract: A synthetic quartz glass substrate having (i) an OH concentration of 1-100 ppm and a hydrogen molecule concentration of 1×1016-1×1019 molecules/cm3, (ii) an in-plane variation of its internal transmission at wavelength 193.4 nm which is up to 0.2%, and (iii) an internal transmission of at least 99.6% at wavelength 193.4 nm is suited for use with excimer lasers.
Abstract translation: 一种合成石英玻璃基板，其具有（i）OH浓度为1-100ppm，氢分子浓度为1×10 16×10 9分子/ cm 3， （ⅱ）其波长193.4nm处的内部透射的面内变化，其最高达0.2％，和（iii）在波长193.4nm处的至少99.6％的内部透射率适用于准分子激光器 。
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公开(公告)号：US07172983B2
公开(公告)日：2007-02-06
申请号：US11087885
申请日：2005-03-23
Applicant: Jochen Alkemper , Joerg Schuhmacher , Hrabanus Hack , Oliver Sohr
Inventor： Jochen Alkemper , Joerg Schuhmacher , Hrabanus Hack , Oliver Sohr
CPC classification number: C03C3/06 , C03C2201/21 , C03C2201/42 , C03C2203/44 , C03C2203/50
Abstract: The invention discloses an SiO2—TiO2 glass, which is preferably made by flame-hydrolysis and which distinguishes itself by increased resistance to radiation, especially in connection with EUV lithography. By purposefully reducing the hydrogen content, clearly improved resistance to radiation and reduced shrinking is achieved.
Abstract translation: 本发明公开了一种SiO 2 -TiO 2 SiO 2玻璃，其优选通过火焰水解制备，并且通过增加的耐辐射性，特别是与EUV光刻相关联来自身区分。 通过有目的地降低氢含量，实现了明显改善的耐辐射性和减少的收缩。
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公开(公告)号：US20060137397A1
公开(公告)日：2006-06-29
申请号：US11148504
申请日：2005-06-08
Applicant: Dana Bookbinder , Richard Fiacco , Kenneth Hrdina , Lisa Moore , Susan Schiefelbein
Inventor： Dana Bookbinder , Richard Fiacco , Kenneth Hrdina , Lisa Moore , Susan Schiefelbein
CPC classification number: C03C3/06 , C03B19/1453 , C03B19/1469 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2203/40 , C03C2203/54 , G03F7/70958
Abstract: Disclosed are high purity synthetic silica material having an internal transmission at 193 nm of at least 99.65%/cm and method of preparing such material. The material is also featured by a high compositional homogeneity in a plane transverse to the intended optical axis. The soot-to-glass process for making the material includes a step of consolidating the soot preform in the presence of H2O and/or O2.
Abstract translation: 公开了具有193nm以上的内透射率为至少99.65％/ cm 3的高纯度合成二氧化硅材料及其制备方法。 该材料的特征还在于横向于预期光轴的平面中具有高的组成均匀性。 用于制造材料的烟灰对玻璃工艺包括在H 2 O 2和/或O 2 2的存在下固化烟灰预制件的步骤。
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19.发明申请Synthetic quartz glass optical material for yag laser with higher harmonic 有权合成石英玻璃光学材料用于具有较高谐波的yag激光公开(公告)号：US20050239626A1
公开(公告)日：2005-10-27
申请号：US10523323
申请日：2003-07-19
Applicant: Akira Fujinoki , Hiroyuki Nishimura , Kunio Yoshida
Inventor： Akira Fujinoki , Hiroyuki Nishimura , Kunio Yoshida
CPC classification number: C03C4/0085 , C03C3/06 , C03C2201/21 , C03C2201/23
Abstract: It is an object of the present invention to provide synthetic quartz glass optical materials suitable for use in YAG of higher order harmonics. The damage threshold value in J/cm2 (energy density at which cracks occur generated by irradiation) is to be considered when synthetic quartz glass material is irradiated with YAG laser of third or higher order harmonics with single pulses or continuously. Regarding a synthetic quartz glass optical material in use for the optical parts constituting the prism and lens used in a laser beam machine, this invention provides a synthetic quartz glass material suitably used for the YAG laser with the third or higher order of harmonic, choosing the following conditions: OH group concentration is in the range of ≧1 to ≦300 ppm; contained hydrogen molecule concentration is in the range of ≧2×1018 to ≧2×1019 molecules/cm3; transmittance of ultraviolet rays at 245 nm of wavelength is 99.9% or more; and the fictive temperature is in the range of ≧880 to ≦990° C.
Abstract translation: 本发明的目的是提供适用于较高次谐波的YAG的合成石英玻璃光学材料。 当合成石英玻璃材料用单个脉冲的三次或更高次谐波的YAG激光照射时，考虑J / cm 2的损伤阈值（通过照射产生裂纹的能量密度） 或连续。 关于构成用于激光束机的棱镜和透镜的光学部件的合成石英玻璃光学材料，本发明提供了适用于具有第三或更高次谐波的YAG激光器的合成石英玻璃材料，选择 以下条件：OH基浓度在> = 1〜<= 300ppm的范围内; 含有氢分子浓度在> = 2×10 18 /分钟/分钟/分钟的范围内; 波长245nm处紫外线的透过率为99.9％以上; 并且假想温度在> = 880至<= 990℃的范围内。
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公开(公告)号：US20050191019A1
公开(公告)日：2005-09-01
申请号：US11123920
申请日：2005-05-06
Applicant: George Berkey , Dana Bookbinder , Richard Fiacco , Dale Powers
Inventor： George Berkey , Dana Bookbinder , Richard Fiacco , Dale Powers
IPC: C03B37/014 , C03C13/04 , C03C25/60 , G02B6/02 , G02B6/16
CPC classification number: C03C25/607 , C03B37/01446 , C03B37/0146 , C03B37/01486 , C03B2201/075 , C03B2201/22 , C03B2201/31 , C03C3/06 , C03C13/045 , C03C13/047 , C03C2201/21 , C03C2201/22 , C03C2203/54 , G02B6/02
Abstract: Optical waveguide fiber having low water peak as well as optical waveguide fiber preforms and methods of making optical waveguide fiber preforms from which low water peak and/or low hydrogen aged attenuation optical waveguide fibers are formed, including optical waveguide fiber and preforms made via OVD. The fibers may be hydrogen resistant, i.e. exhibit low hydrogen aged attenuation. A low water peak, hydrogen resistant optical waveguide fiber is disclosed which exhibits an optical attenuation at a wavelength of about 1383 nm which is less than or equal to an optical attenuation exhibited at a wavelength of about 1310 nm.
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