公开(公告)号：US09937703B2

公开(公告)日：2018-04-10

申请号：US15024650

申请日：2014-09-30

Applicant: Flint Group Germany GmbH

Inventor： Uwe Stebani ,  Gernot Dietz

IPC: G03F7/36 ,  B41C1/055 ,  G03F7/20

CPC classification number: B41C1/055 ,  G03F7/201 ,  G03F7/202 ,  G03F7/2022 ,  G03F7/36

Abstract: A device for automated implementation of preliminary reverse exposure, main exposure, and development of digitally imagable flexographic printing elements, and a method for producing flexographic printing plates starting from digitally imaged flexographic printing elements, using said apparatus.

公开(公告)号：US20180029400A1

公开(公告)日：2018-02-01

申请号：US15463341

申请日：2017-03-20

Applicant: MacDermid Printing Solutions, LLC

Inventor： Ryan W. Vest ,  David A. Recchia ,  Timothy Gotsick

IPC: B41N1/16 ,  B41M1/04

CPC classification number: B41N1/16 ,  B41C1/055 ,  B41M1/04 ,  B41N1/12 ,  B41N1/22 ,  G03F7/09 ,  G03F7/201 ,  G03F7/2012 ,  G03F7/202 ,  Y10T428/24521

Abstract: A method of making a relief image printing element from a photosensitive printing blank is provided. A photosensitive printing blank with a laser ablatable layer disposed on at least one photocurable layer is ablated with a laser to create an in situ mask. The printing blank is then exposed to at least one source of actinic radiation through the in situ mask to selectively cross link and cure portions of the photocurable layer. Diffusion of air into the at least one photocurable layer is limited during the exposing step and preferably at least one of the type, power and incident angle of illumination of the at least one source of actinic radiation is altered during the exposure step. The resulting relief image comprises a plurality of dots and a dot shape of the plurality of dots that provide optimal print performance on various substrates, including corrugated board.

公开(公告)号：US20180011408A1

公开(公告)日：2018-01-11

申请号：US15645979

申请日：2017-07-10

Applicant: Cypre, Inc.

Inventor： Kolin C. Hribar ,  Padraig Buckley

IPC: G03F7/20 ,  G01N33/50

CPC classification number: G03F7/20 ,  G01N33/5008 ,  G01N33/5088 ,  G03F7/2004 ,  G03F7/201 ,  G03F7/7015

Abstract: The inventive subject matter provides an apparatus for reproducibly fabricating hydrogel-based organ and tumor models inside multi-well plates. For example, tumor models made using the inventive apparatus can be used for studying the progression of cancer, cancer diagnostics, and therapeutic screening. A mold controls the thickness of each hydrogel layer. A photomask controls the size and shape of each hydrogel layer, allowing the hydrogel diameter to be smaller than the diameter of each well so that liquid media can be exchanged around both the sides and top of the hydrogels. A holder aligns the photomask with the multi-well plate, and polymerization is initiated by a light source.

公开(公告)号：US20170315435A1

公开(公告)日：2017-11-02

申请号：US15583575

申请日：2017-05-01

Applicant: The Regents of the University of California

Inventor： Thomas G. Mason ,  Kenny Mayoral

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03F7/2022 ,  G03F7/0037 ,  G03F7/201

Abstract: A system and a method of producing sub-millimeter scale particles are provided herein. The method includes providing a substrate that has a layer of photosensitive material thereon; exposing a portion of the layer to a structured beam of light that has a cross-sectional shape, and a cross-sectional size. The cross-sectional size of the structured beam of light at the layer of photosensitive material is smaller than a sub-millimeter scale particle. The method also includes moving the substrate or the beam of light relative to each other to follow a path for making additional exposures or continuous exposure to result in a discrete exposed pattern in the layer that corresponds to the particle being produced, and exposing the layer to the light; and processing the layer to remove unexposed material around the discrete exposed pattern and to separate the discrete exposed pattern from the layer to provide the sub-millimeter scale particle.

公开(公告)号：US20170261847A1

公开(公告)日：2017-09-14

申请号：US15310108

申请日：2015-09-24

Applicant: USHIO DENKI KABUSHIKI KAISHA

Inventor： Daisuke YAJIMA ,  Kentaro NOMOTO ,  Yohei NAWAKI

IPC: G03F7/00

CPC classification number: G03F7/0005 ,  G02B5/3058 ,  G02B5/3075 ,  G03F7/201 ,  G03F7/203 ,  G03F7/22 ,  G03F7/70408 ,  G03F7/70475

Abstract: Disclosed herein an exposure apparatus capable of implementing a microfabrication onto a work with a higher throughput and a lower cost. The exposure apparatus generates interfering light by crossing two or more branched light beams branched from output light from a coherent light source at a predetermined interfering angle, and exposes the substrate by repeating an irradiation onto the substrate with the interfering light and a conveyance of the substrate. At this moment, the exposure apparatus shapes in interfering light irradiation region on the substrate onto which the interfering light is irradiated into a predetermined shape. Then, the exposure apparatus disposes a plurality of the interfering light irradiation regions in successive shots to be located adjacent to each other on the substrate in a direction of conveying the substrate without the interfering light irradiation regions being overlapped when exposing the substrate while conveying the substrate in a stepwise manner.

公开(公告)号：US09690216B2

公开(公告)日：2017-06-27

申请号：US15093499

申请日：2016-04-07

Applicant: Innolux Corporation

Inventor： Ker-Yih Kao ,  Tsan-Jen Chen ,  Chien-Hsing Lee

IPC: G03B27/32 ,  G03F7/20 ,  G03F7/26

CPC classification number: G03F7/70775 ,  G03F7/201 ,  G03F7/26

Abstract: A display manufacturing method comprises steps of: moving a first substrate and a second substrate by a conveying apparatus; and implementing a first exposure and a second exposure of the first substrate and a first exposure and a second exposure of the second substrate by at least one light emitting element when the conveying apparatus drives the first and second substrates to pass through the light source module. When the first exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite, or when the second exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite. A photo alignment process is also disclosed.

公开(公告)号：US20170131630A1

公开(公告)日：2017-05-11

申请号：US15412121

申请日：2017-01-23

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Naomi SHIDA ,  Kenji TODORI ,  Shigehiko MORI ,  Reiko YOSHIMURA ,  Hiroyuki KASHIWAGI ,  lkuo YONEDA ,  Tsukasa TADA

IPC: G03F1/76 ,  G03F7/40 ,  G03F7/16 ,  G03F7/20 ,  H01L21/308 ,  H01L21/3065

CPC classification number: G03F1/76 ,  G03F1/38 ,  G03F1/80 ,  G03F7/16 ,  G03F7/20 ,  G03F7/201 ,  G03F7/40 ,  G03F7/7035 ,  H01L21/3065 ,  H01L21/3086

Abstract: A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one surface of the substrate; a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials; and a resin filled in each of the concavities.

公开(公告)号：US09588427B2

公开(公告)日：2017-03-07

申请号：US14281276

申请日：2014-05-19

Applicant: InnoLux Corporation

Inventor： Ker-Yih Kao ,  Tsan-Jen Chen ,  Chen-Kuan Kao ,  Chien-Hsing Lee

IPC: G03F7/20

CPC classification number: G03F7/201

Abstract: A light exposure system executing a light exposure process to a plurality of assembly cells, each of which includes a first substrate, a second substrate and a liquid crystal layer disposed between the first and second substrates, comprises: a transmission device; two moving stages disposed on the transmission device and carrying the assembly cells; and a light source module including at least a light emitting element, wherein the transmission device moves at least one of the moving stages carrying the assembly cell or the light source module, and the light emitting element emits the light to the assembly cell, wherein the assembly cells include a first assembly cell and a second assembly cell, the moving stages carry the first assembly cell and the second assembly cell, respectively, wherein when the light exposure process is executed to the first assembly cell, the second assembly cell receives the work of cell replacement and alignment, electrode contact and application of electric field, wherein when the light exposure process is executed to the second assembly cell, the first assembly cell receives the work of cell replacement and alignment, electrode contact and application of electric field. A light exposure process applied to the light exposure system is also disclosed.

Abstract translation: 对多个组装单元执行曝光处理的曝光系统，每个组装单元包括第一基板，第二基板和设置在第一和第二基板之间的液晶层，包括：传输装置; 两个移动台设置在传动装置上并且承载组件单元; 以及至少包括发光元件的光源模块，其中所述传输装置移动承载组装单元或光源模块的至少一个移动台，并且所述发光元件将光发射到所述组装单元，其中， 装配单元包括第一组装单元和第二组合单元，所述移动台分别承载第一组装单元和第二组合单元，其中当对第一组装单元执行曝光过程时，第二组合单元接收工件 的电池更换和对准，电极接触和施加电场，其中当对第二组装电池执行曝光处理时，第一组装电池接收电池更换和对准，电极接触和施加电场的工作。 还公开了应用于曝光系统的曝光过程。

公开(公告)号：US09563127B2

公开(公告)日：2017-02-07

申请号：US14501039

申请日：2014-09-30

Applicant: Chengzhang Li ,  Cheng Chun Chris Liang

Inventor： Chengzhang Li ,  Jianbo Li

IPC: G02F1/1335 ,  G03F7/20

CPC classification number: G03F7/201 ,  G02F1/133509 ,  G03F7/2057

Abstract: The invention teaches a system and method for catalyzing on a substrate. The system includes a light source and a digital light patterning device which is controlled by a controller coupled to a computer. The digital patterning device includes an array of liquid crystals, each of which being electronically controlled by the computer through the controller. When a liquid crystal is on, the light from the light source passes through the liquid crystal. When it is off, the light is blocked. According to the visual image pattern presented in the computer's interface, the array, wherein some crystals are on and some are off, shows a light pattern which is consistent with the visual image pattern on the computer screen. Accordingly, the patterned light is shed onto a substrate where the light catalyzes a chemical reaction proximate a substrate.

Abstract translation: 本发明教导了一种在衬底上催化的系统和方法。 该系统包括由与计算机耦合的控制器控制的光源和数字光图案形成装置。 数字图案形成装置包括液晶阵列，每个液晶由计算机通过控制器电子控制。 当液晶开启时，来自光源的光通过液晶。 当它关闭时，灯被遮挡。 根据计算机界面中呈现的视觉图像图案，其中一些晶体开启并且一些关闭的阵列示出了与计算机屏幕上的视觉图像图案一致的光图案。 因此，图案化的光被切割到基底上，其中光催化靠近基底的化学反应。

公开(公告)号：US20160291474A1

公开(公告)日：2016-10-06

申请号：US14801703

申请日：2015-07-16

Applicant: Tokyo Electron Limited

Inventor： Mark L. SCHATTENBURG ,  Rudolf H. HENDEL ,  Michael CARCASI

IPC: G03F7/20

CPC classification number: G03F7/2004 ,  C07K14/47 ,  G03F7/201 ,  G03F7/2022

Abstract: A substrate may be disposed on a substrate support in a flood exposure treatment system. A flood exposure dose profile may be selected. The substrate may be exposed to flood irradiation from a source, and the flood irradiation may be terminated when the selected flood exposure dose profile is achieved. Exposing the substrate to flood irradiation may comprise controlling at least one of a substrate rotation rate, a source scanning rate, a substrate scanning rate, a source power setting, a distance from the source to the substrate, a source aperture setting, an angle of incidence of flood irradiation on the substrate, and a source focus position to achieve the selected flood exposure dose profile.

Abstract translation: 衬底可以设置在淹没暴露处理系统中的衬底支撑件上。 可以选择洪水曝光剂量分布。 衬底可以暴露于来自源的泛光照射，并且当实现所选择的曝光剂量曲线时，可以终止泛光照射。 将衬底暴露于泛光照射可以包括以下步骤中的至少一个：控制衬底旋转速率，源扫描速率，衬底扫描速率，源功率设置，从源到衬底的距离，源孔径设置， 在基板上发生泛光照射，以及源焦点位置以实现所选择的曝光剂量分布。