公开(公告)号：US08471484B2

公开(公告)日：2013-06-25

申请号：US13193862

申请日：2011-07-29

Applicant: Kiyomi Watanabe ,  Kazuo Sakai ,  Kenichi Nakamura

Inventor： Kiyomi Watanabe ,  Kazuo Sakai ,  Kenichi Nakamura

IPC: H05B37/02

CPC classification number: H05H1/46 ,  H01J37/32027 ,  H01J37/32045 ,  H05H2001/4682

Abstract: A capacitor is connected between direct current voltage terminals, and inductance means is connected between one end of the capacitor and one of load terminals. In a case in which the direct current voltage exceeds a set value, voltage at both ends of the capacitor is shared by the first and second switching elements that are not electrically conductive; in a case in which the direct current voltage is below the set value, the first and second switching elements are electrically conductive on a periodic basis or as needed to output reversed-polarity voltage between load terminals; and in a case in which the first and second switching elements are turned off, voltage at both ends of the capacitor restricts voltage applied to both ends of the first and second switching elements, during a period in which the first and second feedback rectifier elements are electrically conductive.

Abstract translation: 电容器连接在直流电压端子之间，电感装置连接在电容器的一端和负载端子之间。 在直流电压超过设定值的情况下，电容器两端的电压由不导电的第一和第二开关元件共用， 在直流电压低于设定值的情况下，第一和第二开关元件周期性地导电，或者根据需要在负载端子之间输出反极性电压; 并且在第一和第二开关元件截止的情况下，在第一和第二反馈整流元件是第一和第二反馈整流元件的时段期间，电容器两端的电压限制施加到第一和第二开关元件的两端的电压 导电。

公开(公告)号：US20130134890A1

公开(公告)日：2013-05-30

申请号：US13744638

申请日：2013-01-18

Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KG

Inventor： Ulrich Richter

IPC: H01J37/32

CPC classification number: H01J37/32064 ,  H01J37/32018 ,  H01J37/32045 ,  H01J37/32935

Abstract: In a method for extinguishing an arc in a gas discharge chamber in which power is supplied to a gas discharge chamber and in which both with a current flow in a first direction and with a current flow in a second inverse direction there is produced a gas discharge, when an arc is identified, the power supply to the gas discharge chamber is interrupted, and residual energy which is in a supply line to the gas discharge chamber and/or in the gas discharge chamber is supplied to an energy store.

Abstract translation: 在将气体放电室供电的气体放电室中的电弧熄灭的方法中，在第一方向的电流和第二反方向的电流中，产生气体放电 当识别出电弧时，中断对气体放电室的供电，并且向气体放电室和/或气体放电室供电的剩余能量被供应到能量存储器。

公开(公告)号：US08357874B2

公开(公告)日：2013-01-22

申请号：US12178372

申请日：2008-07-23

Applicant: Thomas Kirchmeier ,  Hans-Juergen Windisch ,  Hanns-Joachim Knaus ,  Michael Glueck

Inventor： Thomas Kirchmeier ,  Hans-Juergen Windisch ,  Hanns-Joachim Knaus ,  Michael Glueck

IPC: B23K10/00

CPC classification number: G01R21/06 ,  G01R23/02 ,  H01J37/32045 ,  H02M7/003 ,  H02M7/5383 ,  H03H7/40 ,  H05B41/2806 ,  H05H1/46 ,  Y02B20/22

Abstract: A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to centers of the half bridges between the switching elements. The primary winding includes a tapping connectable to an alternating current center between the potentials of the DC power supply.

Abstract translation: 等离子体供给装置包括全桥电路，其连接到直流电源并且具有两个半桥，每个具有两个串联的开关元件。 等离子体供给装置还包括连接到开关元件之间的半桥的中心的电力变压器的初级绕组。 初级绕组包括可连接到直流电源的电位之间的交流中心的抽头。

公开(公告)号：US08222885B2

公开(公告)日：2012-07-17

申请号：US12177818

申请日：2008-07-22

Applicant: Thomas Kirchmeier ,  Hans-Juergen Windisch ,  Michael Glueck ,  Erich Pivit

Inventor： Thomas Kirchmeier ,  Hans-Juergen Windisch ,  Michael Glueck ,  Erich Pivit

IPC: H02M3/158

CPC classification number: G01R21/06 ,  G01R23/02 ,  H01J37/32045 ,  H02M7/003 ,  H02M7/5383 ,  H03H7/40 ,  H05B41/2806 ,  H05H1/46 ,  Y02B20/22

Abstract: A high frequency power supply, in particular a plasma supply device, for generating an output power greater than 1 kW at a basic frequency of at least 3 MHz with at least one switch bridge, which has two series connected switching elements, wherein one of the switching elements is connected to a reference potential varying in operation, and is activated by a driver, and wherein the driver has a differential input with two signal inputs and is connected to the reference potential varying in operation.

Abstract translation: 一种高频电源，特别是等离子体供应装置，用于在具有两个串联连接的开关元件的至少一个开关桥上产生具有至少3MHz的基本频率的大于1kW的输出功率，其中， 开关元件连接到在操作中变化的参考电位，并且由驱动器激活，并且其中驱动器具有具有两个信号输入的差分输入并连接到在操作中变化的参考电位。

公开(公告)号：US20110139748A1

公开(公告)日：2011-06-16

申请号：US12966844

申请日：2010-12-13

Applicant: Vincent M. DONNELLY ,  Demetre J. ECONOMOU

Inventor： Vincent M. DONNELLY ,  Demetre J. ECONOMOU

IPC: C23F1/00 ,  C23F1/08

CPC classification number: H01J37/32174 ,  H01J37/32036 ,  H01J37/32045 ,  H01J37/32082 ,  H01J37/32146 ,  H01L21/30655

Abstract: A system and method for rapid atomic layer etching (ALET) including a pulsed plasma source, with a spiral coil electrode, a cooled Faraday shield, a counter electrode disposed at the top of the tube, a gas inlet and a reaction chamber including a substrate support and a boundary electrode. The method includes positioning an etchable substrate in a plasma etching chamber, forming a product layer on the surface of the substrate, removing a portion of the product layer by pulsing a plasma source, then repeating the steps of forming a product layer and removing a portion of the product layer to form an etched substrate.

Abstract translation: 一种用于快速原子层蚀刻（ALET）的系统和方法，包括脉冲等离子体源，具有螺旋线圈电极，冷却的法拉第屏蔽，设置在管顶部的对置电极，气体入口和包括衬底的反应室 支撑和边界电极。 该方法包括在等离子体蚀刻室中定位可刻蚀的衬底，在衬底的表面上形成产品层，通过脉冲等离子体源去除产物层的一部分，然后重复形成产物层并除去部分 的产品层以形成蚀刻的衬底。

公开(公告)号：US20100140231A1

公开(公告)日：2010-06-10

申请号：US12631735

申请日：2009-12-04

Applicant: Milan Ilic

Inventor： Milan Ilic

IPC: B23K9/06

CPC classification number: B23K10/006 ,  H01J37/32045 ,  H05H1/46

Abstract: A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, the amount of current being drawn away decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time.

Abstract translation: 描述了用于管理传送到处理室的功率的系统和方法。 在一个实施例中，电流从等离子体处理室被拉出，同时在初始时间段期间开始向等离子体处理室施加电力，在初始时间段内电流的量被减少，从而增加量 在初始时间期间施加到等离子体处理室的功率。

公开(公告)号：US20090171508A1

公开(公告)日：2009-07-02

申请号：US12027292

申请日：2008-02-07

Applicant: Nae-II Lee

Inventor： Nae-II Lee

IPC: G05B15/02

CPC classification number: H04B3/54 ,  H01J37/32045 ,  H04B2203/5458

Abstract: A remote control power distribution apparatus (RCPDA) includes a power distributor and a cluster tool controller (CTC). The power distributor distributes user power to provide a plurality of required types of power to each of a plurality of device modules including at least one transfer module and a plurality of process modules through a first plurality of power lines, and the user power is provided from an external source through a main power line. The CTC, connected to the power distributor and the device modules, remotely controls the required types of power provided to the device modules in real time by using power line communication (PLC).

Abstract translation: 遥控配电装置（RCPDA）包括电力分配器和集群工具控制器（CTC）。 功率分配器分配用户功率以通过第一多个电力线向包括至少一个传输模块和多个处理模块的多个设备模块中的每一个提供多种所需类型的功率，并且从第 通过主电源线的外部源。 连接到配电器和设备模块的CTC通过使用电力线通信（PLC）实时远程控制提供给设备模块的所需类型的电源。

公开(公告)号：US20090081811A1

公开(公告)日：2009-03-26

申请号：US12145389

申请日：2008-06-24

Applicant: Neil Benjamin

Inventor： Neil Benjamin

IPC: H01L21/00 ,  H02J1/10

CPC classification number: H01J37/32045 ,  H01J37/32174 ,  Y10T307/258

Abstract: A distributed power arrangement to provide local power delivery in a plasma processing system during substrate processing is provided. The distributed power arrangement includes a set of direct current (DC) power supply units. The distributed power arrangement also includes a plurality of power generators, which is configured to receive power from the set of DC power supply units. Each power generator of the plurality of power generators is coupled to a set of electrical elements, thereby enabling the each power generator of the plurality of power generators to control the local power delivery.

Abstract translation: 提供了一种用于在衬底处理期间在等离子体处理系统中提供局部电力输送的分布式电力装置。 分布式电源装置包括一组直流（DC）电源单元。 分布式电力布置还包括多个发电机，其被配置为从所述一组直流电源单元接收电力。 多个发电机的每个发电机耦合到一组电气元件，从而使多个发电机中的每个发电机能够控制局部电力输送。

公开(公告)号：US20090026968A1

公开(公告)日：2009-01-29

申请号：US12166963

申请日：2008-07-02

Applicant: Thomas Kirchmeier ,  Hans-Juergen Windisch ,  Hanns-Joachim Knaus ,  Michael Glueck ,  Gerd Hintz

Inventor： Thomas Kirchmeier ,  Hans-Juergen Windisch ,  Hanns-Joachim Knaus ,  Michael Glueck ,  Gerd Hintz

IPC: H05B37/00 ,  H05B41/24

CPC classification number: G01R21/06 ,  G01R23/02 ,  H01J37/32045 ,  H02M7/003 ,  H02M7/5383 ,  H03H7/40 ,  H05B41/2806 ,  H05H1/46 ,  Y02B20/22

Abstract: A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately.

Abstract translation: 等离子体供给装置以大于3MHz的基本上恒定的基本频率产生大于500W的输出功率，并对供给所产生的输出功率的等离子体处理进行供电，并从反射功率返回到等离子体供应装置。 等离子体供给装置包括连接到直流电源的至少一个逆变器，该逆变器具有至少一个开关元件和输出网络。 输出网络布置在印刷电路板上。 因此，输出网络的设计价格低廉且准确。

公开(公告)号：US20040177923A1

公开(公告)日：2004-09-16

申请号：US10802591

申请日：2004-03-17

Applicant: Shibaura Mechantronics Corporation

Inventor： Noboru Kuriyama

IPC: H05B037/02

CPC classification number: C23C14/564 ,  H01J37/32045 ,  H01J37/32082 ,  H01J37/32935 ,  H01J2237/0206 ,  H01L21/67069

Abstract: In a method of detecting arc discharge in a glow-discharge apparatus GD that has a high-frequency power source PS, a cutting pulse is output for time T1 to the high-frequency power source PS to stop a supply of power to the glow-discharge apparatus GD, when dVr/dtnulldVf/dt increases over a first level, where Vf and Vr are a traveling-wave voltage and a reflected-wave voltage applied to the glow-discharge apparatus GD, respectively. Arc discharge is determined to have developed in the glow-discharge apparatus, when Vr/Vf increases to a second level or a higher level within a preset time To after the supply of power to the glow-discharge apparatus is stopped.

Abstract translation: 在具有高频电源PS的辉光放电装置GD中检测电弧放电的方法中，向高频电源PS输出时间T1的切断脉冲，停止向辉光放电装置供电， 放电装置GD，当dVr / dt-dVf / dt在第一电平上增加时，其中Vf和Vr分别是施加到辉光放电装置GD的行波电压和反射波电压。 在辉光放电装置的电力供给停止之后，当预定时间T0内Vr / Vf增加到第二电平或更高电平时，电弧放电被确定为在辉光放电装置中产生。