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    Microscopy feedback for improved milling accuracy
    11.
    发明授权
    Microscopy feedback for improved milling accuracy 有权

    公开(公告)号：US12249482B2

    公开(公告)日：2025-03-11

    申请号：US17873532

    申请日：2022-07-26

    Applicant: FEI Company

    Inventor： Thomas Gary Miller ,  Jason Arjavac ,  Brian Routh, Jr. ,  Mark Biedrzycki

    IPC: H01J37/30 ,  H01J37/147 ,  H01J37/28 ,  H01J37/305

    Abstract: Methods and apparatus are disclosed for integration of image-based metrology into a milling workflow. A first ion beam milling operation is performed to an edge at a distance from a final target position on a sample. An SEM image of the sample is used to determine a distance between the milled edge and a reference structure on the sample. Based on the determined distance, the ion beam is adjusted to perform a second milling operation to shift the milled edge to the final target position. Extensions to iterative procedures are disclosed. Various geometric configurations and corrections are disclosed. Manufacturing and analytic applications are disclosed in a variety of fields, including read-write head manufacture and TEM sample preparation. Other combinations of imaging and milling tools can be used.

    FAST AND ACCURATE STRAIN MAPPING USING ELECTRON DIFFRACTION
    13.
    发明申请
    FAST AND ACCURATE STRAIN MAPPING USING ELECTRON DIFFRACTION 有权

    公开(公告)号：US20250076038A1

    公开(公告)日：2025-03-06

    申请号：US18458929

    申请日：2023-08-30

    Applicant: FEI Company

    Inventor： Stefano Vespucci ,  Wouter René J. Van den Broek

    IPC: G01B15/06 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

    Abstract: In some embodiments, a scientific instrument includes an electron-beam column configured to scan an electron beam across a sample and a segmented electron detector configured to receive diffracted beams produced by diffraction of the electron beam in the sample. The segmented electron detector has a plurality of segments arranged in a two-dimensional array, with each of the segments being configured to generate a respective output signal representing a respective integrated flux of electrons received thereat. The scientific instrument also includes an electronic controller configured to receive a set of frames from the segmented electron detector, each of the frames representing a respective set of output signals generated by the segments in response to an electron diffraction pattern projected onto the segmented electron detector, and further configured to communicate with a computing device programmed to generate a strain map of the sample based on the set of frames.

    Method, apparatus, and program for determining condition related to captured image of charged particle beam apparatus
    14.
    发明授权
    Method, apparatus, and program for determining condition related to captured image of charged particle beam apparatus 有权

    公开(公告)号：US12243711B2

    公开(公告)日：2025-03-04

    申请号：US17855888

    申请日：2022-07-01

    Applicant: Hitachi High-Tech Corporation

    Inventor： Takahiro Nishihata ,  Yuji Takagi ,  Takuma Yamamoto ,  Yasunori Goto ,  Yasutaka Toyoda

    IPC: H01J37/22 ,  G01N23/2251 ,  H01J37/28

    Abstract: A method, an apparatus, and a program for more appropriately determining a condition for appropriately recognizing a semiconductor pattern are provided. A method for determining a condition related to a captured image of a charged particle beam apparatus including: acquiring, by a processor, a plurality of captured images, each of the captured images being an image generated by irradiating a pattern formed on a wafer with a charged particle beam, and detecting electrons emitted from the pattern, each of the captured images being an image captured according to one or more imaging conditions, the method further including: acquiring teaching information for each of the captured images; acquiring, by the processor, one or more feature determination conditions; calculating, by the processor, a feature for each of the captured images based on each of the feature determination conditions, at least one of the imaging condition and the feature determination condition being plural.

    Detection of Probabilistic Process Windows
    15.
    发明申请
    Detection of Probabilistic Process Windows 有权

    公开(公告)号：US20250069843A1

    公开(公告)日：2025-02-27

    申请号：US18943131

    申请日：2024-11-11

    Applicant: Fractilia, LLC

    Inventor： Chris Mack ,  Jonathan Yannuzzi

    IPC: H01J37/22 ,  G01Q30/02 ,  G01Q30/06 ,  G06T5/70 ,  G06T7/13 ,  G06T7/40 ,  G06T7/42 ,  G06T7/49 ,  H01J37/28

    Abstract: Methods, systems, and computer-readable mediums for configuring a lithography tool to manufacture a semiconductor device. The method includes selecting a first variable, selecting a second variable, selecting at least one response variable that is a function of the first variable and second variable, determining a measurement uncertainty for each response variable, determining, based on a measurement of the response variable, and the measurement uncertainty for the response variable, a plurality of probabilities representing a plurality of indications of whether a plurality of points associated with a lithography process meet a specification requirement for each response variable, wherein the plurality of probabilities represent a process window, and configuring, based on the process window, a lithography tool to manufacture a semiconductor device.

    Systems and methods for voltage contrast defect detection
    19.
    发明授权
    Systems and methods for voltage contrast defect detection 有权

    公开(公告)号：US12196692B2

    公开(公告)日：2025-01-14

    申请号：US17769690

    申请日：2020-09-30

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Weiming Ren ,  Xuedong Liu ,  Zhong-wei Chen ,  Xiaoyu Ji ,  Xiaoxue Chen ,  Weimin Zhou ,  Frank Nan Zhang

    IPC: G01N23/2202 ,  G01N1/44 ,  G01N23/2251 ,  H01J37/02 ,  H01J37/244 ,  H01J37/28

    Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

    COMPUTER, PROGRAM, AND CHARGED PARTICLE BEAM PROCESSING SYSTEM
    20.
    发明申请
    COMPUTER, PROGRAM, AND CHARGED PARTICLE BEAM PROCESSING SYSTEM 有权

    公开(公告)号：US20250014859A1

    公开(公告)日：2025-01-09

    申请号：US18687252

    申请日：2021-09-01

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Ayana MURAKI ,  Tatsuya ASAHATA ,  Satoshi TOMIMATSU ,  Makoto SATO

    IPC: H01J37/302 ,  H01J37/28

    Abstract: The present invention provides a computer, a program, and a charged particle beam processing system, with which it is possible to reduce adjustment and setting work of conditions for observation or machining by an operator in an FIB-SEM composite device. This computer comprises: an information acquisition unit that acquires information related to a recipe to be executed by a charged particle beam device provided with a charged particle irradiation optical system; and an information management unit that generates recipe management information based on the information acquired by the information acquisition unit and stores the recipe management information in a storage unit.

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