公开(公告)号：US11996281B1

公开(公告)日：2024-05-28

申请号：US18206910

申请日：2023-06-07

Applicant: Applied Materials, Inc.

Inventor： Graham Wright ,  Ori Noked ,  Craig R. Chaney ,  Adam M. McLaughlin

IPC: H01J7/02 ,  H01J1/20 ,  H01J7/24

CPC classification number: H01J7/02 ,  H01J1/20 ,  H01J7/24

Abstract: An ion source that may be used to introduce a dopant material into the arc chamber is disclosed. A component containing the dopant material is disposed in the path of an etching gas, which also enters the arc chamber. In some embodiments, the dopant material is in liquid form, and the etching gas travels through the liquid. In other embodiments, the dopant material is a solid material. In some embodiments, the solid material is formed as a porous structure, such that the etching gas flows through the solid material. In other embodiments, one or more components of the ion source are manufactured using a material that includes the dopant material, such that the etching gas etches the component to release the dopant material.

公开(公告)号：US20230360890A1

公开(公告)日：2023-11-09

申请号：US18131997

申请日：2023-04-07

Applicant: Applied Materials, Inc.

Inventor： Yue CHEN ,  Jinyu LU ,  Yongmei CHEN ,  Jinxin FU ,  Zihao YANG ,  Mingwei ZHU ,  Takashi KURATOMI ,  Rami HOURANI ,  Ludovic GODET ,  Qun JING ,  Jingyi YANG ,  David Masayuki ISHIKAWA

IPC: H01J37/32 ,  H01J7/02

CPC classification number: H01J37/32449 ,  H01J37/32458 ,  H01J37/32724 ,  H01J7/02 ,  H01J2237/332 ,  H01J2237/334

Abstract: A method of processing an optical device is provided, including: positioning an optical device on a substrate support in an interior volume of a process chamber, the optical device including an optical device substrate and a plurality of optical device structures formed over the optical device substrate, each optical device structure including a bulk region formed of silicon carbide and one or more surface regions formed of silicon oxycarbide. The method further includes providing one or more process gases to the interior volume of the process chamber, and generating a plasma of the one or more process gases in the interior volume for a first time period when the optical device is on the substrate support, and stopping the plasma after the first time period. A carbon content of the one or more surface regions of each optical device structure is reduced by at least 50% by the plasma.

公开(公告)号：US4264280A

公开(公告)日：1981-04-28

申请号：US813302

申请日：1977-07-06

Applicant: Stephen J. Hellier

Inventor： Stephen J. Hellier

IPC: H01J7/02 ,  H01J7/18 ,  H01J7/20 ,  H01J9/38 ,  H01J29/94 ,  F04B37/02

CPC classification number: H01J9/38 ,  H01J29/94

Abstract: A device for releasing water vapor in electron tubes comprises a holder and a water vapor releasing material carried by said holder. In one embodiment the water vapor releasing material is a hydroxide or hydrated oxide of a metallic element in combination with a binder. In another embodiment it is hydrated alumina.

公开(公告)号：US3538597A

公开(公告)日：1970-11-10

申请号：US3538597D

申请日：1967-07-13

Applicant: US NAVY

Inventor： LEINKRAM CHARLES Z ,  SHIMKUS MICHAEL A

IPC: H01L21/50 ,  H01L23/047 ,  H01L23/10 ,  B01J17/00 ,  H01J7/02

CPC classification number: H01L23/10 ,  H01L21/50 ,  H01L23/047 ,  H01L2924/0002 ,  H01L2924/00