公开(公告)号：US11996281B1

公开(公告)日：2024-05-28

申请号：US18206910

申请日：2023-06-07

Applicant: Applied Materials, Inc.

Inventor： Graham Wright ,  Ori Noked ,  Craig R. Chaney ,  Adam M. McLaughlin

IPC: H01J7/02 ,  H01J1/20 ,  H01J7/24

CPC classification number: H01J7/02 ,  H01J1/20 ,  H01J7/24

Abstract: An ion source that may be used to introduce a dopant material into the arc chamber is disclosed. A component containing the dopant material is disposed in the path of an etching gas, which also enters the arc chamber. In some embodiments, the dopant material is in liquid form, and the etching gas travels through the liquid. In other embodiments, the dopant material is a solid material. In some embodiments, the solid material is formed as a porous structure, such that the etching gas flows through the solid material. In other embodiments, one or more components of the ion source are manufactured using a material that includes the dopant material, such that the etching gas etches the component to release the dopant material.

公开(公告)号：US11664192B2

公开(公告)日：2023-05-30

申请号：US17403223

申请日：2021-08-16

Applicant: Applied Materials, Inc.

Inventor： Shreyansh P. Patel ,  Graham Wright ,  Daniel Alvarado ,  Daniel R. Tieger ,  Brian S. Gori ,  William R. Bogiages, Jr. ,  Benjamin Oswald ,  Craig R. Chaney

IPC: H01J37/302 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J37/302 ,  H01J37/08 ,  H01J37/3171

Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.

公开(公告)号：US20240412899A1

公开(公告)日：2024-12-12

申请号：US18206907

申请日：2023-06-07

Applicant: Applied Materials, Inc.

Inventor： Adam M. McLaughlin ,  Craig R. Chaney

IPC: H01B17/32 ,  H01B17/16

Abstract: An insulator that may be self-centering is disclosed. The insulator includes an alignment feature that allows it to self-center during installation. In some embodiments, the insulator is created with a captive fastener with a specific alignment feature. The internal cavity of the insulator is formed so as to have a corresponding alignment feature. When tightened, the captive fastener is pressed into the alignment feature of the internal cavity, allowing it to self-center. In other embodiments, the mating electrode is also modified to include a corresponding alignment feature. For example, in some embodiments, the alignment feature on the electrode comprises a specially shaped depression, while the insulator has a corresponding protrusion. In other embodiments, the insulator also has a protective shield.

公开(公告)号：US20230260745A1

公开(公告)日：2023-08-17

申请号：US18136738

申请日：2023-04-19

Applicant: Applied Materials, Inc.

Inventor： Shreyansh P. Patel ,  Graham Wright ,  Daniel Alvarado ,  Daniel R. Tieger ,  Brian S. Gori ,  William R. Bogiages, Jr. ,  Benjamin Oswald ,  Craig R. Chaney

IPC: H01J37/302 ,  H01J37/08

CPC classification number: H01J37/302 ,  H01J37/08 ,  H01J37/3171

Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.

公开(公告)号：US11239040B2

公开(公告)日：2022-02-01

申请号：US17078262

申请日：2020-10-23

Applicant: Applied Materials, Inc.

Inventor： Adam M. McLaughlin ,  Craig R. Chaney ,  Jordan B. Tye

IPC: H01J27/02

Abstract: An ion source having a thermally isolated repeller is disclosed. The repeller comprises a repeller disk and a plurality of spokes originating at the back surface of the repeller disk and terminating in a post. In certain embodiments, the post may be hollow through at least a portion of its length. The use of spokes rather than a central stem may reduce the thermal conduction from the repeller disk to the post. By incorporating a hollow post, the thermal conduction is further reduced. This configuration may increase the temperature of the repeller disk by more than 100° C. In certain embodiments, radiation shields are provided on the back surface of the repeller disk to reduce the amount of radiation emitted from the sides of the repeller disk. This may also help increase the temperature of the repeller. A similar design may be utilized for other electrodes in the ion source.

公开(公告)号：US12154754B2

公开(公告)日：2024-11-26

申请号：US17835107

申请日：2022-06-08

Applicant: Applied Materials, Inc.

Inventor： Craig R. Chaney ,  Graham Wright

IPC: H01J37/08 ,  H01J27/08 ,  H01J37/34

Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible contains a solid dopant material, such as a metal. A porous wicking tip is disposed in the crucible in contact with the solid dopant material. The porous wicking tip may be a tube with one or more interior conduits. Alternatively, the porous tip may be two concentric cylinders with a plurality of rods disposed in the annular ring between the two cylinders. Alternatively, the porous tip may be one or more foil layers wound together. In each of these embodiments, the wicking tip can be used to control the flow rate of molten dopant material to the arc chamber.

公开(公告)号：US20230402247A1

公开(公告)日：2023-12-14

申请号：US17835107

申请日：2022-06-08

Applicant: Applied Materials, Inc.

Inventor： Craig R. Chaney ,  Graham Wright

IPC: H01J37/08 ,  H01J27/08 ,  H01J37/34

CPC classification number: H01J37/08 ,  H01J27/08 ,  H01J37/3435

Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible contains a solid dopant material, such as a metal. A porous wicking tip is disposed in the crucible in contact with the solid dopant material. The porous wicking tip may be a tube with one or more interior conduits. Alternatively, the porous tip may be two concentric cylinders with a plurality of rods disposed in the annular ring between the two cylinders. Alternatively, the porous tip may be one or more foil layers wound together. In each of these embodiments, the wicking tip can be used to control the flow rate of molten dopant material to the arc chamber.

公开(公告)号：US20210375585A1

公开(公告)日：2021-12-02

申请号：US17403223

申请日：2021-08-16

Applicant: Applied Materials, Inc.

Inventor： Shreyansh P. Patel ,  Graham Wright ,  Daniel Alvarado ,  Daniel R. Tieger ,  Brian S. Gori ,  William R. Bogiages, JR. ,  Benjamin Oswald ,  Craig R. Chaney

IPC: H01J37/302 ,  H01J37/08

Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.

公开(公告)号：US11170973B2

公开(公告)日：2021-11-09

申请号：US16735125

申请日：2020-01-06

Applicant: Applied Materials, Inc.

Inventor： Shreyansh P. Patel ,  Graham Wright ,  Daniel Alvarado ,  Daniel R. Tieger ,  Brian S. Gori ,  William R. Bogiages, Jr. ,  Benjamin Oswald ,  Craig R. Chaney

IPC: H01J37/302 ,  H01J37/08 ,  H01J37/317

Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.

公开(公告)号：US20240112883A1

公开(公告)日：2024-04-04

申请号：US17957095

申请日：2022-09-30

Applicant: Applied Materials, Inc.

Inventor： Diana C. Gronski ,  Alicia Chen ,  Craig R. Chaney ,  Adam M. McLaughlin

IPC: H01J37/317 ,  H01L21/265

CPC classification number: H01J37/3171 ,  H01L21/26513 ,  H01J2237/31701

Abstract: An insulator that has a helical protrusion spiraling around the shaft is disclosed. A lip is disposed on the distal end of the helical protrusion, creating regions on the shaft that are shielded from material deposition by the lip. By proper sizing of the threads, the helical protrusion and the lip, the line-of-sight to the interior wall of the shaft can be greatly reduced. This results in longer times before failure. This insulator may be used in an ion implantation system to physically and electrically separate two components.