Method for producing titanium-doped silica glass for use in EUV lithography and blank produced in accordance therewith
    222.
    发明授权
    Method for producing titanium-doped silica glass for use in EUV lithography and blank produced in accordance therewith 有权
    用于EUV光刻中使用的掺杂钛的石英玻璃的方法和根据其生产的空白

    公开(公告)号:US09586850B2

    公开(公告)日:2017-03-07

    申请号:US14911506

    申请日:2014-07-22

    Abstract: The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+≦5×10−4.

    Abstract translation: Ti掺杂的二氧化硅玻璃中存在的Ti3 +离子会引起玻璃的棕色染色,导致镜片检查变得更加困难。 在Ti掺杂的二氧化硅玻璃中减少Ti3 +离子有利于Ti4 +离子的已知方法包括足够高比例的OH基,并在玻璃化之前进行氧处理,这两者都有缺点。 为了提供一种Ti掺杂石英玻璃的成本有效的制造方法,其在羟基含量小于120ppm时,在400nm的波长范围内显示出至少70%的内部透射率(样品厚度10mm) 在玻璃化之前,将TiO 2 -SiO 2烟炱体用氮氧化物进行调理处理。 由Ti掺杂的石英玻璃制成的坯料的比例Ti3 + / Ti4 +≤5×10-4。

    LOW SCATTERING SILICA GLASS AND METHOD FOR HEAT-TREATING SILICA GLASS
    223.
    发明申请
    LOW SCATTERING SILICA GLASS AND METHOD FOR HEAT-TREATING SILICA GLASS 审中-公开
    低散射二氧化硅玻璃和加热二氧化硅玻璃的方法

    公开(公告)号:US20160152504A1

    公开(公告)日:2016-06-02

    申请号:US15014359

    申请日:2016-02-03

    Abstract: To provide low scattering silica glass suitable as a material of an optical communication fiber.Silica glass, which has a fictive temperature of at least 1,000° C., and which has a void radius of at most 0.240 nm as measured by positron annihilation lifetime spectroscopy. A method for heat-treating silica glass, which comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200° C. and at most 2,000° C. under a pressure of at least 30 MPa, and cooling the silica glass at an average temperature-decreasing rate of at least 40° C./min during cooling within a temperature range of from 1,200° C. to 900° C. A method for heat-treating silica glass, which comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200° C. and at most 2,000° C. under a pressure of at least 140 MPa, and cooling the silica glass in an atmosphere under a pressure of at least 140 MPa during cooling within a temperature range of from 1,200° C. to 900° C.

    Abstract translation: 提供适合作为光通信光纤的材料的低散射二氧化硅玻璃。 二氧化硅玻璃具有至少1000℃的假想温度,并且通过正电子湮没寿命光谱测定具有至多0.240nm的空隙半径。 一种用于热处理石英玻璃的方法,其包括在至少1200℃和至多2000℃的温度下在至少30MPa的压力下在保持在大气中进行热处理的石英玻璃,以及冷却 二氧化硅玻璃在1200℃〜900℃的温度范围内的冷却时的平均降温速度为40℃/分钟以上。一种石英玻璃的热处理方法,其包括保持石英玻璃 在至少1200℃和最多2000℃的温度的气氛中在至少140MPa的压力下进行热处理,并在气氛中在至少140MPa的压力下冷却石英玻璃 在1200℃〜900℃的温度范围内进行冷却。

    BLANK MADE OF TITANIUM-DOPED SILICA GLASS AND METHOD FOR THE PRODUCTION THEREOF
    227.
    发明申请
    BLANK MADE OF TITANIUM-DOPED SILICA GLASS AND METHOD FOR THE PRODUCTION THEREOF 有权
    钛白粉玻璃的制造方法及其生产方法

    公开(公告)号:US20150376048A1

    公开(公告)日:2015-12-31

    申请号:US14748344

    申请日:2015-06-24

    Abstract: A blank made of titanium-doped silica glass for a mirror substrate for use in EUV lithography is provided. The blank includes a surface portion to be provided with a reflective film and having an optically used area (CA) over which a coefficient of thermal expansion (CTE) has a two-dimensional inhomogeneity (dCTE) distribution profile averaged over a thickness of the blank. A maximum inhomogeneity (dCTEmax) of less than 5 ppb/K is defined as a difference between a CTE maximum value and a CTE minimum value. The dCTEmax is at least 0.5 ppb/K. The CA forms a non-circular area having a centroid. The dCTE distribution profile is not rotation-symmetrical and is defined over the CA, such that straight profile sections normalized to a unit length and extending through the centroid of the area yield a dCTE family of curves forming a curve band with a bandwidth of less than 0.5×dCTEmax.

    Abstract translation: 提供了一种用于EUV光刻的用于镜面基板的掺钛石英玻璃的空白件。 坯料包括具有反射膜并具有光学用途区域(CA)的表面部分,在该区域上的热膨胀系数(CTE)在坯料的厚度上平均的二维不均匀性(dCTE)分布分布平均 。 小于5ppb / K的最大不均匀性(dCTEmax)定义为CTE最大值和CTE最小值之间的差。 dCTEmax至少为0.5 ppb / K。 CA形成具有质心的非圆形区域。 dCTE分布轮廓不是旋转对称的,并且在CA上定义,使得被归一化为单位长度并延伸穿过该区域的质心的直线剖面产生了形成带宽小于的曲线的dCTE曲线族 0.5×dCTEmax。

    TUBULAR SEMIFINISHED PRODUCT FOR PRODUCING AN OPTICAL FIBER
    228.
    发明申请
    TUBULAR SEMIFINISHED PRODUCT FOR PRODUCING AN OPTICAL FIBER 审中-公开
    用于生产光纤的管状半透明产品

    公开(公告)号:US20150299024A1

    公开(公告)日:2015-10-22

    申请号:US14711000

    申请日:2015-05-13

    Abstract: Methods for producing an optical fiber by elongating a silica glass blank or a coaxial group of silica glass components, on the basis of which a fiber is obtained that comprises a core zone, an inner jacket zone enclosing the core zone and a ring zone surrounding the inner jacket zone, are known. In order to provide, proceeding from this, a method, a tubular semi-finished product and a group of coaxial components for the cost-effective production of an optical fiber, which is characterized by a high quality of the boundary between the core and jacket and by low bending sensitivity, according to the invention, the silica glass of the ring zone is provided in the form of a ring zone tube made of silica glass having a mean fluorine content of at least 6000 weight ppm and the tube has an inner tube surface and an outer tube surface, wherein via the wall of the ring zone tube, a radial fluorine concentration profile is adjusted which has an inner fluorine depletion layer with a layer thickness of at least 1 μm and no more than 10 μm, in which the fluorine content decreases toward the inner tube surface and is no more than 3000 weight ppm in a region close to the surface which has a thickness of 1 μm.

    Abstract translation: 通过使二氧化硅玻璃坯料或同轴的二氧化硅玻璃成分体组织进行拉伸来制造光纤的方法,基于该光纤获得包含芯部区域的纤维,包围芯部区域的内部护套区域和围绕该区域的环形区域 内护套区域,已知。 为了提供一种用于成本有效地生产光纤的方法,管状半成品和一组同轴部件,其特征在于芯和夹套之间的边界质量高 并且通过低弯曲灵敏度,根据本发明,环区的石英玻璃以平均氟含量为至少6000重量ppm的石英玻璃制成的环形管的形式提供,并且管具有内管 表面和外管表面,其中通过环带管的壁,调节径向氟浓度分布,其具有层厚度为至少1μm且不大于10μm的内氟耗尽层,其中 氟含量向内管表面减少,并且在接近表面厚度为1μm的区域中不超过3000重量ppm。

    Silica container and method for producing the same
    229.
    发明授权
    Silica container and method for producing the same 有权
    二氧化硅容器及其制造方法

    公开(公告)号:US09145325B2

    公开(公告)日:2015-09-29

    申请号:US14304530

    申请日:2014-06-13

    Abstract: A method for producing a silica container having a rotational symmetry includes forming a preliminarily molded article by feeding a powdered substrate's raw material to an inner wall of an outer frame having aspiration holes with rotating the frame, and forming a silica substrate. The preliminarily molded article is aspirated from an outer peripheral side with controlling a humidity inside the outer frame by ventilating gases present in the outer frame with charging from inside the preliminarily molded article a gas mixture comprised of an O2 gas and an inert gas and made below a prescribed dew-point temperature by dehumidification, and at the same time heated from inside the preliminarily molded article by a discharge-heat melting method with carbon electrodes, thereby making an outer peripheral part of the preliminarily molded article to a sintered body while an inner peripheral part to a fused glass body.

    Abstract translation: 制造具有旋转对称性的二氧化硅容器的方法包括通过将粉末状基材的原料供给到具有旋转框架的具有抽吸孔的外框架的内壁,并形成二氧化硅基板来形成预成型品。 从外周侧抽吸预成型品,通过从外部框架内部充填从O 2气体和惰性气体构成的气体混合物从外部框架内的气体通风来控制外框内的湿度, 通过除湿规定的露点温度,同时用碳电极通过放电加热熔融法从预成型体内部加热,由此使预成型体的外周部分成为烧结体,而内部 周边部分为熔融玻璃体。

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