Multi-gas Detection System and Method
    233.
    发明公开

    公开(公告)号:US20240280494A1

    公开(公告)日:2024-08-22

    申请号:US18598259

    申请日:2024-03-07

    CPC classification number: G01N21/658 G01J3/44 G01N2201/0221 G01N2201/06113

    Abstract: A Raman multi-gas detection system including an enhancement unit coupled between a light source and a detector. The enhancement unit includes a nanogrid having a plurality of nanogaps. A gas is coupled to the enhancement unit and is configured to flow through the plurality of nanogaps of the nanogrid. The nanogrid comprises one or more plasmon-active materials. The light source is configured to generate plasmon-enhanced electric fields in the plurality of nanogaps of the nanogrid to induce enhanced Raman scattering of the constituent molecules in the gas within the plurality of nanogaps such that a plurality of different constituent molecules in the gas can be detected. In one embodiment, a molecule in the gas is configured to scatter the light from the light source at a rate more than 10000 times greater than in the free space in the enhancement unit.

    Spectrometer device for optical analysis of at least one sample

    公开(公告)号:US12050172B2

    公开(公告)日:2024-07-30

    申请号:US17613546

    申请日:2020-05-26

    Applicant: trinamix GmbH

    CPC classification number: G01N21/35 G01N2201/0221

    Abstract: Described herein is a spectrometer device for optical analysis of at least one sample. The spectrometer device includes:



    at least one housing having at least one entrance window;
    at least one wavelength-selective element configured for separating incident light into a spectrum of constituent wavelengths, the wavelength-selective element being disposed within the housing;
    at least one detector device configured for detecting at least a portion of the constituent wavelengths, the detector device being disposed within the housing; and
    at least one contact sensor device for detecting a contact of the spectrometer device with the sample, where the contact sensor device includes at least one optical contact sensor device, where the optical contact sensor device is configured to detect an influence of the presence of the sample onto the transmission of the optical signal.

    MEASUREMENT SYSTEM AND MEASUREMENT METHOD
    235.
    发明公开

    公开(公告)号:US20240230548A9

    公开(公告)日:2024-07-11

    申请号:US18479273

    申请日:2023-10-02

    Applicant: ARKRAY, Inc.

    Abstract: A measurement system including: an insertion gate into which a test strip including first and second regions is inserted; a holder accommodating the test strip; a housing including a window facing the test strip; and a smart device including an illuminator illuminating the second region and including a camera imaging the first and second regions, in which the housing includes a mounting part placing the smart device on an outer surface of the housing in a state in which the camera and the illuminator are disposed at positions facing the window, and a measurement light source provided at a position to irradiate the first region, and in a case in which the camera images the first region, the illuminator is turned off while the measurement light source is turned on, and in a case in which the camera images the second region, the illuminator is turned on.

    WAVEGUIDE SENSOR WINDOW OPENING
    236.
    发明公开

    公开(公告)号:US20240230540A1

    公开(公告)日:2024-07-11

    申请号:US18560163

    申请日:2022-05-04

    Applicant: ams-OSRAM AG

    Abstract: A method for manufacturing a sensor includes providing a lower cladding layer, depositing a waveguide layer on the lower cladding layer, forming a sensing waveguide and a reference waveguide by photolithography and etching the waveguide layer in places, and forming a photoresist structure-on a part of the sensing waveguide by photolithography. The method also includes depositing an upper cladding layer on the photoresist structure, the sensing waveguide, the reference waveguide, and the lower cladding layer. The method further includes removing the photoresist structure with the part of the upper cladding layer deposited on the photoresist structure so that an opening within the upper cladding layer is formed above the sensing waveguide. The method additionally includes depositing a functionalization material within the opening. From the waveguide layer an auxiliary structure is formed by photolithography and etching the waveguide layer, and the opening is above the auxiliary structure.

Patent Agency Ranking