公开(公告)号：US20140176920A1

公开(公告)日：2014-06-26

申请号：US14135378

申请日：2013-12-19

Applicant: Mapper Lithography IP B.V.

Inventor： Guido DE BOER ,  Michel Pieter DANSBERG ,  Pieter KRUIT

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer or stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.

Abstract translation: 本发明涉及一种光刻系统，例如用于将图像或图像图案投射到诸如晶片的目标（1）上，所述目标通过目标台（2）包括在所述系统中，夹紧装置是 用于将所述目标夹持在所述台上。 所述夹紧装置包括层或固定液体（3），其包括在目标台和目标台之间的这样的厚度上，其提供液体（C）的材料和目标（1）的相应的接触面（A，B） 和目标表（2），出现压降（PCap）。

公开(公告)号：US20180277334A1

公开(公告)日：2018-09-27

申请号：US15985763

申请日：2018-05-22

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Alexander Hendrik Vincent VAN VEEN ,  Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND

IPC: H01J37/153 ,  H01J37/12 ,  H01J37/09

CPC classification number: H01J37/153 ,  H01J37/023 ,  H01J37/065 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/0264 ,  H01J2237/0453 ,  H01J2237/1207 ,  H01J2237/1534 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/31774 ,  H01J2237/31793

Abstract: A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.

公开(公告)号：US20180122737A1

公开(公告)日：2018-05-03

申请号：US15389581

申请日：2016-12-23

Applicant: MAPPER Lithography IP B.V.

Inventor： Marcel Nicolaas Jacobus van Kervinck ,  Vincent Sylvester Kuiper ,  Marco Jan-Jaco Wieland

IPC: H01L23/528 ,  G06F17/50 ,  G03F7/20

CPC classification number: H01L23/528 ,  G03F7/2059 ,  G06F17/5068 ,  G06F17/5077 ,  H01L21/263 ,  H01L21/768 ,  H01L25/0655 ,  H01L27/0207 ,  H01L27/0617 ,  H01L29/0684 ,  H01L29/0692

Abstract: Method of manufacturing electronic devices using a maskless lithographic exposure system using a maskless pattern writer, wherein beamlet control data is generated for controlling the maskless pattern writer to expose a wafer for creation of the electronic devices. The beamlet control data is generated based on design layout data defining a plurality of structures, such as vias, for the electronic devices to be manufactured from the wafer, and selection data defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, the selection data defining a different set of the structures for different subsets of the electronic devices. Exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of the structures for different subsets of the electronic devices.

公开(公告)号：US20180113386A1

公开(公告)日：2018-04-26

申请号：US15299285

申请日：2016-10-20

Applicant: Mapper Lithography IP B.V.

Inventor： Bart SCHIPPER

IPC: G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/707 ,  G03F9/7011 ,  H01L21/68

Abstract: The invention relates to an alignment apparatus for aligning a substrate, and a substrate processing system comprising such alignment apparatus. The alignment apparatus comprises an alignment base for supporting said substrate and/or a substrate support member, and a force generating device for applying a contact force on said substrate.The force generating device comprises: an arm comprising a rigid proximal end and a rigid distal end, said distal end being provided with a contact section for contacting an edge of said substrate, and an elastically deformable arm section extending between the proximal and distal ends, a connection part connecting said proximal end to said alignment base, said arm being movable with respect to said alignment base via said connection part, and an actuator for causing a displacement of said proximal end, whereby said contact force, defined by said elastically deformable arm section, is applied to said substrate by said contact section.

公开(公告)号：US20180006668A1

公开(公告)日：2018-01-04

申请号：US15198487

申请日：2016-06-30

Applicant: Mapper Lithography IP B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H03M13/29 ,  H04L1/00 ,  H04L27/227

CPC classification number: H03M13/2927 ,  H03M5/00 ,  H04L1/0041 ,  H04L1/0045 ,  H04L27/2278

Abstract: The invention relates to a invention relates to a method and decoding device for receiving an input bit-stream comprising a sequence of n-bit pattern symbols as well as a unique n-bit comma symbol for synchronization, and for generating therefrom a synchronized output comprising a sequence of m-bit pattern words, with m

公开(公告)号：US09613782B2

公开(公告)日：2017-04-04

申请号：US14400815

申请日：2013-05-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Paul IJmert Scheffers

IPC: H01J37/00 ,  H01J37/304 ,  B82Y10/00 ,  H01J37/317 ,  B82Y40/00 ,  G01B11/14

Abstract: The invention relates to a method for determining a beamlet position in a charged particle multi-beamlet exposure apparatus. The apparatus is provided with a sensor comprising a conversion element for converting charged particle energy into light and a light sensitive detector. The conversion element is provided with a sensor surface area provided with a 2D-pattern of beamlet blocking and non-blocking regions. The method comprises taking a plurality of measurements and determining the position of the beamlet with respect to the 2D-pattern on the basis of a 2D-image created by means of the measurements. Each measurement comprises exposing a feature onto a portion of the 2D-pattern with a beamlet, wherein the feature position differs for each measurement, receiving light transmitted through the non-blocking regions, converting the received light into a light intensity value, and assigning the light intensity value to the position at which the measurement was taken.

公开(公告)号：US09551563B2

公开(公告)日：2017-01-24

申请号：US14431765

申请日：2013-09-26

Applicant: Mapper Lithography IP B.V.

Inventor： Godefridus Cornelius Antonius Couweleers ,  Thomas Adriaan Ooms ,  Niels Vergeer

IPC: G01B9/02 ,  G01B11/26 ,  G03F7/20 ,  G01B11/14 ,  H01J37/317

CPC classification number: G01B9/02015 ,  G01B9/02021 ,  G01B9/02027 ,  G01B9/02051 ,  G01B11/14 ,  G01B11/26 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/7085 ,  H01J37/3174 ,  Y10T156/10

Abstract: The invention relates to a multi-axis differential interferometer (1) for measuring a displacement and/or rotation between a first reflective surface (21, 321) and a second reflective surface (81, 381), wherein said measuring is carried out using at least two pairs of beams, wherein each pair is formed by a measurement beam (Mb) to be emitted onto a first one (21, 321) of said reflective surfaces, and a reference beam (Rb) to be emitted onto another one (81, 381) of said reflective surfaces, said interferometer (1) comprising: a first optical module (20) and a second optical module (40), wherein each optical module (20, 40) is configured for receiving a respective coherent beam and for creating one of said pairs therefrom. The invention further relates to a lithography system comprising such an interferometer and to a method for assembling such a multi-axis differential interferometer.

Abstract translation: 本发明涉及一种用于测量第一反射表面（21,321）和第二反射表面（81,381）之间的位移和/或旋转的多轴差分干涉仪（1），其中所述测量使用 至少两对光束，其中每对由测量光束（Mb）形成以被发射到所述反射表面的第一个（21,321）上，以及将要发射到另一个的参考光束（Rb） ，381），所述干涉仪（1）包括：第一光学模块（20）和第二光学模块（40），其中每个光学模块（20,40）构造成用于接收相应的相干光束 从中产生一对所述的对。 本发明还涉及包括这种干涉仪的光刻系统和用于组装这种多轴差分干涉仪的方法。

公开(公告)号：US09447839B2

公开(公告)日：2016-09-20

申请号：US14344903

申请日：2012-09-17

Applicant: Mapper Lithography IP B.V.

Inventor： Alje Geert Dunning

IPC: F16M13/00 ,  F16F15/073 ,  F16F3/02

CPC classification number: F16F15/073 ,  F16F3/023 ,  F16F3/026 ,  F16F2228/063

Abstract: The invention relates to a support structure and support module, for instance for use in a lithography system, comprising a frame and a support for supporting a load, wherein said support is moveable relative to said frame, said support structure further comprising a force compensation spring assembly connecting said support to said frame for at least partially supporting said support and/or said load, wherein said force compensation spring assembly comprises a first spring having a negative stiffness characteristic over a predefined range of motion of said spring, and a second spring having a positive stiffness.

Abstract translation: 本发明涉及支撑结构和支撑模块，例如用于光刻系统，其包括框架和用于支撑负载的支撑件，其中所述支撑件可相对于所述框架移动，所述支撑结构还包括力补偿弹簧 将所述支撑件连接到所述框架上以至少部分地支撑所述支撑件和/或所述负载的组件，其中所述力补偿弹簧组件包括在所述弹簧的预定运动范围上具有负刚度特性的第一弹簧，以及具有 正劲。

公开(公告)号：US20160126055A1

公开(公告)日：2016-05-05

申请号：US14992049

申请日：2016-01-11

Applicant: Mapper Lithography IP B.V.

Inventor： Johan Joost Koning ,  David Johannes van den Bergen

IPC: H01J37/02 ,  H01J37/20

CPC classification number: H01J37/023 ,  B01J19/12 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70975 ,  H01J37/10 ,  H01J37/20 ,  H01J37/3007 ,  H01J37/3177

Abstract: The invention relates to a target processing unit (10) comprising a vacuum chamber (30) for accommodating a target to be processed, a projection column (46) within the vacuum chamber for generating a beam and projecting the beam towards the target, and a first conduit arrangement (26,36,37,60) for connecting the projection column to external equipment (22). The vacuum chamber can comprise a positioning system (114) for supporting the target, and a second conduit arrangement (110) distinct from the first conduit arrangement for connecting the positioning system to external equipment, wherein the positioning system is moveably arranged with respect to the projection column, and wherein the positioning system and the projection column occupy spatially distinct portions of the vacuum chamber. The first conduit arrangement extends through an upper side of the vacuum chamber, and the second conduit arrangement extends through a lower side of the vacuum chamber.

Abstract translation: 本发明涉及一种目标处理单元（10），其包括用于容纳待处理目标物的真空室（30），真空室内的用于产生光束并将光束朝向目标物投影的突出柱（46），以及 用于将投影柱连接到外部设备（22）的第一导管装置（26,36,37,60）。 真空室可以包括用于支撑靶的定位系统（114）和与第一导管装置不同的第二导管装置（110），用于将定位系统连接到外部设备，其中定位系统可相对于 投影柱，并且其中定位系统和投影柱占据真空室的空间上不同的部分。 第一导管装置延伸穿过真空室的上侧，第二导管装置延伸穿过真空室的下侧。

公开(公告)号：US20160066478A1

公开(公告)日：2016-03-03

申请号：US14781594

申请日：2014-04-08

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： David Johannes VAN DEN BERGEN

IPC: H05K7/20

CPC classification number: H05K7/20754 ,  G03F7/708 ,  G03F7/70991 ,  H01J37/3174 ,  H01J2237/31793 ,  H05K7/20145 ,  H05K7/20763

Abstract: Cabinet (10) for accommodating electronic equipment (46). The cabinet comprises a casing (12) with an access opening (24) at a access side (23), and a second side (17) opposite to the access side, an electronic equipment rack (40a), a first plenum space (35) between the access side and the rack, and a channel (36) in fluid communication with the second side and the first plenum space. The cabinet encloses a first cooling medium (27) that is in thermal communication with the electronic equipment. A cooling arrangement (29) is provided at the second side, which comprises a flow generator (30) for generating a flow (Φf) of the first cooling medium from the first plenum space across the electronic equipment toward the second side, and a heat exchanger (31) for extracting heat from the first cooling medium. The first cooling medium is subsequently recirculated through the channel to the first plenum space.

Abstract translation: 用于容纳电子设备（46）的机柜（10）。 所述机柜包括在入口侧（23）具有进入开口（24）的壳体（12）和与所述进入侧相对的第二侧（17），电子设备支架（40a），第一增压空间（35） ）和与所述第二侧和所述第一集气室空间流体连通的通道（36）。 机柜包围与电子设备热连通的第一冷却介质（27）。 冷却装置（29）设置在第二侧，其包括流量发生器（30），用于从跨过电子设备的第一集气室向第二侧产生第一冷却介质的流量（Φf） 交换器（31），用于从第一冷却介质提取热量。 第一冷却介质随后通过通道再循环到第一集气室。