公开(公告)号：US20140185028A1

公开(公告)日：2014-07-03

申请号：US14135372

申请日：2013-12-19

Applicant: Mapper Lithography IP B.V.

Inventor： Guido DE BOER ,  Michel Pieter DANSBERG ,  Pieter KRUIT

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.

Abstract translation: 本发明涉及一种光刻系统，例如用于将图像或图像图案投射到诸如晶片的目标（1）上，所述目标通过目标台（2）包括在所述系统中，夹紧装置是 用于将所述目标夹持在所述台上。 所述夹紧装置包括固定液体层（3），其包括在目标台和目标台之间的这样的厚度上，其设置有液体（C）的材料和目标（1）的相应的接触面（A，B） 和目标表（2），出现压降（PCap）。

公开(公告)号：US20140176920A1

公开(公告)日：2014-06-26

申请号：US14135378

申请日：2013-12-19

Applicant: Mapper Lithography IP B.V.

Inventor： Guido DE BOER ,  Michel Pieter DANSBERG ,  Pieter KRUIT

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer or stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.

Abstract translation: 本发明涉及一种光刻系统，例如用于将图像或图像图案投射到诸如晶片的目标（1）上，所述目标通过目标台（2）包括在所述系统中，夹紧装置是 用于将所述目标夹持在所述台上。 所述夹紧装置包括层或固定液体（3），其包括在目标台和目标台之间的这样的厚度上，其提供液体（C）的材料和目标（1）的相应的接触面（A，B） 和目标表（2），出现压降（PCap）。

公开(公告)号：US20150332899A1

公开(公告)日：2015-11-19

申请号：US14805509

申请日：2015-07-22

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Pieter KRUIT ,  Marc SMITS

IPC: H01J37/32 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  F15D1/025 ,  G03F7/70925 ,  G21K2201/06 ,  H01J9/38 ,  H01J37/3007 ,  H01J37/3177 ,  H01J37/32862 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/327 ,  Y10T137/2082 ,  Y10T137/87571

Abstract: The invention relates to an arrangement for transporting radicals. An electron beam system is presented comprising a beamlet generator; a beamlet manipulator (204) comprising an array of apertures; a plasma generator comprising a chamber for forming a plasma, an inlet receiving input gas and outlets removing plasma or radicals created therein, the plasma generator further comprising outlets in flow connection with the plasma chamber outlets; and a hollow guiding body (309b) guiding radicals formed in the plasma towards the array of apertures for removing contaminant deposition. The hollow guiding body (309b) is removably connectable to an extended portion (307b) of the plasma generator outlet. A cover (400) can be placed over a connection between the hollow guiding body (309b) and the extended portion (307b). The extended portion (307b) of the plasma generator outlet and the hollow guiding body (309b) can be similarly formed as a slit.

Abstract translation: 本发明涉及一种输送自由基的装置。 提出了一种电子束系统，包括一个小波发生器; 小梁操纵器（204），包括孔阵列; 等离子体发生器，其包括用于形成等离子体的腔室，接收输入气体的入口和去除其中产生的等离子体或自由基的出口，等离子体发生器还包括与等离子体室出口流动连接的出口; 以及空心引导体（309b），其将形成在等离子体中的自由基朝向孔阵列排出以除去污染物沉积物。 中空引导体（309b）可移除地连接到等离子体发生器出口的延伸部分（307b）。 盖（400）可以放置在中空引导体（309b）和延伸部分（307b）之间的连接处。 等离子体发生器出口的延伸部分（307b）和中空引导体（309b）可类似地形成为狭缝。

公开(公告)号：US20140014852A1

公开(公告)日：2014-01-16

申请号：US14027697

申请日：2013-09-16

Applicant: Mapper Lithography IP B.V.

Inventor： Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem STEENBRINK

IPC: H01J37/317

CPC classification number: H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/31774

Abstract: A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses.

Abstract translation: 一种用于带电粒子多子束系统的投影透镜装置，所述投影透镜装置包括一个或多个板和一个或多个投影透镜阵列。 每个板具有形成在其中的孔阵列，其中投影透镜形成在孔的位置处。 投影透镜的阵列形成投影透镜系统的阵列，每个投影透镜系统包括一个或多个投影透镜，其形成在一个或多个投影透镜阵列的对应点处。