公开(公告)号：US20110049344A1

公开(公告)日：2011-03-03

申请号：US12936030

申请日：2009-04-03

Applicant: Takashi Dobashi ,  Masanari Koguchi ,  Osamu Kamimura ,  Hiroya Ohta ,  Kazutoshi Gohara

Inventor： Takashi Dobashi ,  Masanari Koguchi ,  Osamu Kamimura ,  Hiroya Ohta ,  Kazutoshi Gohara

IPC: G01D18/00 ,  G01N23/00

CPC classification number: H01J37/222 ,  H01J37/26 ,  H01J37/295 ,  H01J2237/24578

Abstract: A charged particle beam microscope device of the present invention is configured such that in a diffraction pattern obtained by radiating a parallel charged particle beam onto a sample (22) having a known structure, a distance (r) between spots of a diffraction pattern, which reflects the structure of the sample, is measured, and the variation of a distance (L) between the sample and a detector, which depends on a diffraction angle (θ), is corrected. This enables the correction of distortion that varies with an off-axis distance from the optical axis in a diffraction pattern, and a high precision structural analysis by performing accurately analyzing the spot positions of the diffraction pattern.

Abstract translation: 本发明的带电粒子束显微镜装置被构造成使得在通过将平行带电粒子束照射到具有已知结构的样品（22）上获得的衍射图案中，衍射图案的点之间的距离（r） 反映样品的结构，被测量，并且校正取决于衍射角（＆amp; s）的样品和检测器之间的距离（L）的变化。 由此，能够通过对衍射图案的光斑位置进行精确的分析，能够进行与衍射图案中的离开光轴的离轴距离变化的畸变校正。

公开(公告)号：US20100033695A1

公开(公告)日：2010-02-11

申请号：US12469838

申请日：2009-05-21

Applicant: Seiichiro KANNO ,  Tadashi ARAI ,  Osamu KAMIMURA

Inventor： Seiichiro KANNO ,  Tadashi ARAI ,  Osamu KAMIMURA

IPC: G03B27/52 ,  G03B27/54 ,  G03B27/32

CPC classification number: G03F7/2002 ,  G03F7/70216 ,  G03F7/7035 ,  G03F7/70791 ,  G03F7/70858 ,  G03F7/70958

Abstract: An lithography apparatus for manufacturing an organic transistor that is capable of aligning accurately in self-alignment fashion relative positions of a gate electrode and a pair of source and drain electrodes and has high productivity. In an lithography apparatus for radiating a light to a photosensitive self-assembled film and exposing the same in self-aligning fashion using a gate electrode as a mask, by transporting a flexible translucent substrate from roller to roller and forming a gate electrode, an insulating layer, and the photosensitive self-assembled film on the flexible substrate when an organic transistor is formed on the flexible substrate, a reflection preventing film is provided on an inner wall of the apparatus that is on the opposite side of the flexible substrate as seen from an exposure light source.

Abstract translation: 一种用于制造有机晶体管的光刻设备，其能够以自对准方式准确地对准栅极电极和一对源极和漏极电极的相对位置，并且具有高生产率。 在使用栅电极作为掩模将光照射到光敏自组装膜并以自对准方式曝光的光刻装置中，通过将柔性半透明基板从辊传送到辊并形成栅电极， 层和柔性基板上的感光自组装膜，当在柔性基板上形成有机晶体管时，在柔性基板的相反侧的内壁上设置反射防止膜， 曝光光源。

公开(公告)号：US07173262B2

公开(公告)日：2007-02-06

申请号：US11159356

申请日：2005-06-23

Applicant: Masaki Hosoda ,  Masato Muraki ,  Osamu Kamimura

Inventor： Masaki Hosoda ,  Masato Muraki ,  Osamu Kamimura

IPC: G21K5/10 ,  H01K1/62 ,  H01J37/302

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/31774

Abstract: A charged particle beam exposure apparatus for writing a desired pattern on a substrate using a charged particle beam. The apparatus includes a blanking unit, having a deflector capable of deflecting the charged particle beam in at least two directions, configured to control beam passage to the substrate by deflecting the charged particle beam, and a setting unit configured to set a deflection direction of the charged particle beam by the deflector.

Abstract translation: 一种带电粒子束曝光装置，用于使用带电粒子束将所需图案写入基板。 该设备包括一个消隐单元，其具有能够使至少两个方向上的带电粒子束偏转的偏转器，该偏转器被配置成通过偏转带电粒子束来控制光束通向基板;以及设置单元，被配置为设置偏转方向 带电粒子束由偏转器。

公开(公告)号：US07105842B2

公开(公告)日：2006-09-12

申请号：US10958141

申请日：2004-10-05

Applicant: Sayaka Tanimoto ,  Yasunari Sohda ,  Yoshinori Nakayama ,  Osamu Kamimura ,  Haruo Yoda ,  Masaki Hosoda

Inventor： Sayaka Tanimoto ,  Yasunari Sohda ,  Yoshinori Nakayama ,  Osamu Kamimura ,  Haruo Yoda ,  Masaki Hosoda

IPC: H01J37/302 ,  G03F7/20

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/04 ,  H01J37/317

Abstract: Disclosed is equipment for charged-particle beam lithography capable of executing exposure even when an electron beam with a bad property is produced due to a failure in some multibeam forming element, without replacing the failing multibeam forming element and without reducing the exposure accuracy. The equipment includes means for forming a plurality of charged-particle beams arranged at predetermined intervals; a plurality of blankers which act on the plurality of charged-particle beams individually; a common blanker which acts on all of the plurality of charged-particle beams; and a blanking restriction for causing those charged-particle beams which are given predetermined deflection by the plurality of blankers to reach onto a sample, with a signal applied to the common blanker, and blocking those charged-particle beams which are not given the predetermined deflection by the plurality of blankers to the sample. The equipment blocks beams with bad properties to the sample and executes exposure using only those beams which have bad properties.

Abstract translation: 本发明公开了即使由于某些多波束形成元件的故障而产生具有不良特性的电子束也能够进行曝光的带电粒子束光刻设备，而不更换故障多波束形成元件而不降低曝光精度。 该设备包括用于形成以预定间隔布置的多个带电粒子束的装置; 分别作用在多个带电粒子束上的多个阻挡器; 作用于所有多个带电粒子束的常见消隐器; 以及消隐限制，用于使得由多个消隐器给予预定偏转的那些带电粒子束到达样本，信号施加到公共消隐器，并且阻挡未被给予预定偏转的那些带电粒子束 通过多个消隐器到样品。 设备阻挡样品性能不良的光束，并仅使用具有不良特性的光束执行曝光。

公开(公告)号：US07098464B2

公开(公告)日：2006-08-29

申请号：US10957695

申请日：2004-10-05

Applicant: Yasunari Sohda ,  Osamu Kamimura ,  Yoshinori Nakayama ,  Sayaka Tanimoto ,  Masato Muraki

Inventor： Yasunari Sohda ,  Osamu Kamimura ,  Yoshinori Nakayama ,  Sayaka Tanimoto ,  Masato Muraki

IPC: H01J37/304

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J2237/2482

Abstract: The present invention provides a writing technique which can perform high-accuracy overlay writing in electron beam writing equipment performing mark detection by light.Electron beam writing equipment has an electron source; an electron optical system illuminating an electron beam emitted from the electron source onto a sample for scanning to form a desired pattern on the sample; a stage mounting the sample; a mark substrate provided on the stage; means beaming a light beam for position detection which is on the same side as the illumination direction of the electron beam for illuminating the mark substrate; light detection means which is on the same side as the means beaming a light beam for detecting reflected light reflected on the mark substrate; and electron detection means which is on the side opposite the light detection means with respect to the mark substrate for detecting a transmitted electron obtained by illumination of the electron beam onto the mark substrate, wherein relative position information of the light beam and the electron beam is obtained based on the signals of the detected reflected light and transmitted electron.

Abstract translation: 本发明提供了一种写入技术，其能够通过光执行标记检测的电子束写入设备中执行高精度重叠写入。 电子束写入设备具有电子源; 电子光学系统将从电子源发射的电子束照射到样品上以进行扫描以在样品上形成所需图案; 安装样品的阶段; 设置在台上的标记基板; 意味着将用于位置检测的光束照射在与用于照射标记基板的电子束的照射方向相同的一侧; 光检测装置与发出用于检测在标记基板上反射的反射光的光束相同的一侧; 以及电子检测装置，其相对于用于检测通过将电子束照射到标记基板上而获得的透射电子的标记基板在与光检测装置相反的一侧，其中光束和电子束的相对位置信息为 基于检测到的反射光和透射电子的信号获得。

公开(公告)号：US07005659B2

公开(公告)日：2006-02-28

申请号：US10885666

申请日：2004-07-08

Applicant: Masato Muraki ,  Hiroya Ohta ,  Osamu Kamimura

Inventor： Masato Muraki ,  Hiroya Ohta ,  Osamu Kamimura

IPC: H01J3/26 ,  H01J37/28 ,  G21K5/10

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/153 ,  H01J37/3174

Abstract: A charged particle beam exposure apparatus has a beam shaping optical system which forms an image of a charged particle source that emits charged particle beams, an aperture array and electrostatic lens which form a plurality of images of the charged particle source from the image of the charged particle source, a reduction electron optical system which reduces and projects the plurality of images of the charged particle source onto a wafer, and the first stigmator which generates astigmatism when the beam shaping optical system forms the image of the charged particle source in order to correct astigmatism generated in the reduction electron optical system. A charged particle beam exposure method of exposing a substrate by scanning with charged particle beams includes an adjustment step of making the size in the scanning direction of charged particle beams on the substrate smaller than the size in a direction perpendicular to the direction.

Abstract translation: 带电粒子束曝光装置具有光束整形光学系统，其形成发射带电粒子束的带电粒子源的图像，孔径阵列和静电透镜，其从带电粒子源的图像形成带电粒子源的多个图像 粒子源，还原电子光学系统，其将带电粒子源的多个图像减少并投影到晶片上;以及当束整形光学系统形成带电粒子源的图像以产生像散的第一标示器，以便校正 在还原电子光学系统中产生散光。 通过用带电粒子束扫描使基板曝光的带电粒子束曝光方法包括使基板上的带电粒子束的扫描方向的尺寸小于垂直于该方向的方向上的尺寸的调整步骤。

公开(公告)号：US20060017019A1

公开(公告)日：2006-01-26

申请号：US11159356

申请日：2005-06-23

Applicant: Masaki Hosoda ,  Masato Muraki ,  Osamu Kamimura

Inventor： Masaki Hosoda ,  Masato Muraki ,  Osamu Kamimura

IPC: G21K5/10

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/31774

Abstract: In a charged particle exposure apparatus which exposes a substrate using a blanking unit to repeat blocking and exposure of charged particle beam to the substrate, a blanking direction is adjusted. As an example of the blanking direction, a direction vertical to a raster scanning direction is used.

Abstract translation: 在使用消隐单元曝光基板以重复阻挡和曝光带电粒子束到基板的带电粒子曝光装置中，调整消隐方向。 作为消隐方向的一个例子，使用垂直于光栅扫描方向的方向。

公开(公告)号：US06031494A

公开(公告)日：2000-02-29

申请号：US864199

申请日：1997-05-28

Applicant: Hiroshi Okabe ,  Osamu Kamimura ,  Ken Takei ,  Yoshitaka Imakado

Inventor： Hiroshi Okabe ,  Osamu Kamimura ,  Ken Takei ,  Yoshitaka Imakado

IPC: H01Q1/48 ,  H01Q1/24 ,  H04B1/38

CPC classification number: H04B1/3833 ,  H01Q1/243

Abstract: An improved, compact, lightweight handy-phone provided with a built-in directional planar antenna is provided. The planar antenna is mounted on a portion of a high-frequency printed wiring board, and a shielding case covers the high-frequency printed wiring board with a surface of the portion exposed. A maximum linear size of the shielding case in the direction of main polarization of the planar antenna is nearly equal to half the wavelength of an electromagnetic wave to be radiated by the planar antenna.

Abstract translation: 提供了一种内置方向平面天线的改进，紧凑，重量轻的便携式电话。 平面天线安装在高频印刷线路板的一部分上，并且屏蔽壳覆盖高频印刷布线板，其表面露出。 屏蔽壳在平面天线的主极化方向上的最大线性尺寸几乎等于由平面天线辐射的电磁波的波长的一半。