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    System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography
    21.
    发明授权
    System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography 有权
    用于无掩模光刻的衍射光学元件的全息制造和复制的系统和方法

    公开(公告)号：US07160673B2

    公开(公告)日：2007-01-09

    申请号：US10677804

    申请日：2003-10-02

    Applicant: Rajesh Menon ,  Dario Gil ,  David J. Carter ,  George Barbastathis ,  Henry I. Smith

    Inventor： Rajesh Menon ,  Dario Gil ,  David J. Carter ,  George Barbastathis ,  Henry I. Smith

    IPC: G02B3/08

    CPC classification number: G03F7/70291 ,  G03F7/0005 ,  G03F7/0757 ,  G03F7/2059 ,  G03F7/70275

    Abstract: A method is disclosed for forming an array of focusing elements for use in a lithography system. In accordance with an embodiment, the method includes the steps of providing a master element that includes at least one diffractive pattern at a first location with respect to a target surface, illuminating the master element to produce a first diffractive pattern on the target surface at the first location, moving the master element with respect to the target surface to a second location with respect to the target surface, and illuminating the master element to produce a second diffractive pattern on the target surface at the second location.

    Abstract translation: 公开了一种用于形成用于光刻系统的聚焦元件阵列的方法。 根据实施例，该方法包括以下步骤：提供在相对于目标表面的第一位置处包括至少一个衍射图案的主元件，照亮主元件以在目标表面上产生第一衍射图案 第一位置，将主元件相对于目标表面移动到相对于目标表面的第二位置，并且照亮主元件以在第二位置处在目标表面上产生第二衍射图案。

    Imaging system and method employing beam folding
    22.
    发明申请
    Imaging system and method employing beam folding 失效
    使用光束折叠的成像系统和方法

    公开(公告)号：US20060232755A1

    公开(公告)日：2006-10-19

    申请号：US11106204

    申请日：2005-04-14

    Applicant: Rajesh Menon ,  Henry Smith

    Inventor： Rajesh Menon ,  Henry Smith

    IPC: G03B27/42

    CPC classification number: G03F7/70291 ,  G03F7/70383

    Abstract: A maskless lithography system is disclosed that includes a spatial light modulator, first and second imaging areas, and first folding optics. The spatial light modulator receives illumination from an illumination source and provides a modulated illumination beam having a first cross-sectional line length in a length-wise direction and a first cross-sectional width in a width-wise direction that is substantially smaller than said first cross-sectional length. The first imaging area receives a first portion of the modulated illumination beam. The first folding optics provides a second portion of the modulated illumination beam that is adjacent the first portion of the modulated illumination beam in the length-wise direction at a second imaging area that is not adjacent the first imaging area in the length-wise direction.

    Abstract translation: 公开了一种无掩模光刻系统，其包括空间光调制器，第一和第二成像区域以及第一折叠光学器件。 空间光调制器从照明源接收照明，并且提供调制照明光束，该调制照明光束在长度方向上具有第一横截面线长度，并且在宽度方向上具有基本上小于所述第一宽度方向的第一横截面宽度 截面长度。 第一成像区域接收调制照明光束的第一部分。 第一折叠光学器件提供调制照明光束的第二部分，该第二部分在长度方向上与第一成像区域不相邻的第二成像区域沿长度方向相邻于调制照明光束的第一部分。

    System and method for proximity effect correction in imaging systems
    24.
    发明申请
    System and method for proximity effect correction in imaging systems 失效
    成像系统中邻近效应校正的系统和方法

    公开(公告)号：US20050224725A1

    公开(公告)日：2005-10-13

    申请号：US10823458

    申请日：2004-04-13

    Applicant: Rajesh Menon ,  Dario Gil ,  George Barbastathis ,  Henry Smith

    Inventor： Rajesh Menon ,  Dario Gil ,  George Barbastathis ,  Henry Smith

    IPC: G03F1/14 ,  G03F7/20 ,  H01J37/304

    CPC classification number: H01J37/304 ,  G03F1/78 ,  G03F7/70383 ,  G03F7/70441 ,  G03F7/70558 ,  H01J2237/31769

    Abstract: A system and method are disclosed for providing error correction in an imaging system. The system includes an error determination unit for determining an amount of error associated with a spot at (x,y) in a binary pattern to be imaged, a determination unit for determining the location of a nearest exposed spot at (xi, yi) for each spot at (x,y), and a dose modification unit for modifying an exposure dose at the nearest exposed spot at (xi, yi) for each spot at (x,y).

    Abstract translation: 公开了一种用于在成像系统中提供纠错的系统和方法。 该系统包括：误差确定单元，用于确定与待成像的二进制图案中的（x，y）处的斑点相关联的误差量;确定单元，用于确定最近的曝光光斑在（x i）处的位置， （x，y）处的每个斑点的剂量修改单元，以及用于修改在（x，y）处最近的曝光点的曝光剂量的剂量修改单元 （x，y）的每个点的平均值。

    Optical superresolution using multiple images
    28.
    发明授权
    Optical superresolution using multiple images 有权
    使用多个图像的光学超分辨率

    公开(公告)号：US08433158B2

    公开(公告)日：2013-04-30

    申请号：US12253461

    申请日：2008-10-17

    Applicant: Rajesh Menon

    Inventor： Rajesh Menon

    IPC: G06K9/32 ,  G06K9/40 ,  H04N5/217

    CPC classification number: G06T3/4053

    Abstract: An imaging system is provided. The imaging system includes a point spread function (PSF) module producing a diffraction-limited image of a sample. A convolution module performs convolution of the diffraction-limited image with a first image of a focal spot having a first wavelength to produce a first simulated image. The convolution also performs convolution of the diffraction-limited image with a second image of a focal ring having a second wavelength to produce a second simulated image. A difference module subtracts said first simulated image and said second simulated image to produce said high resolution composite image.

    Abstract translation: 提供成像系统。 成像系统包括产生样本的衍射受限图像的点扩散函数（PSF）模块。 卷积模块执行衍射受限图像与具有第一波长的焦点的第一图像的卷积以产生第一模拟图像。 卷积还执行衍射受限图像与具有第二波长的焦环的第二图像的卷积以产生第二模拟图像。 差分模块减去所述第一模拟图像和所述第二模拟图像以产生所述高分辨率合成图像。

    Resolution enhancement in optical lithography via absorbance-modulation enabled multiple exposures
    29.
    发明授权
    Resolution enhancement in optical lithography via absorbance-modulation enabled multiple exposures 有权
    通过吸光度调制进行光学光刻的分辨率增强可实现多次曝光

    公开(公告)号：US07989151B2

    公开(公告)日：2011-08-02

    申请号：US11565051

    申请日：2006-11-30

    Applicant: Rajesh Menon

    Inventor： Rajesh Menon

    IPC: G03B27/54

    CPC classification number: G03F7/70466 ,  G03F1/70 ,  Y10S430/153

    Abstract: A method to enhance resolution in optical lithography via absorbance-modulation involves exposing an opaque absorbance modulation layer (AML) to a first waveform having wavelength, 81, with the first exposure forming a first set of transparent regions in the opaque AML and forming a first pattern made of a set of exposed regions in a photoresist layer. Next, the AML is restored to its original opaque state. Next, the restored AML is re-exposed to the first waveform having wavelength, 81, with the exposure forming a second set of transparent regions in the opaque AML and forming a second pattern having a set of exposed regions in a photoresist layer. The first and second patterns in the photoresist layer form a final pattern with enhanced resolution and decreased spatial period than the first pattern. In another scenario, instead of exposing the AML to a first waveform, two waveforms are used (the second being complimentary to the first) to ensure that the transmitted image has sharper edges compared to the original image.

    Abstract translation: 通过吸光度调制增强光学光刻分辨率的方法包括将不透明吸光度调制层（AML）暴露于具有波长81的第一波形，第一曝光在不透明AML中形成第一组透明区域，并形成第一 图案由光致抗蚀剂层中的一组曝光区域制成。 接下来，AML恢复到原始的不透明状态。 接下来，恢复的AML再次暴露于具有波长81的第一波形，曝光在不透明AML中形成第二组透明区域，并在光致抗蚀剂层中形成具有一组曝光区域的第二图案。 光致抗蚀剂层中的第一和第二图案形成具有比第一图案更高分辨率和减小的空间周期的最终图案。 在另一种情况下，不是将AML暴露于第一波形，而是使用两个波形（第二个与第一波形互补），以确保传输的图像与原始图像相比具有更清晰的边缘。

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